• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1996.05a
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• pp.72-75
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• 1996

A hydride vapor phase epitaxy (HVPE) method is performed to prepare the GaN thin films on c-plane sapphire substrate. The full-width at half maximum of double crystal X-ray rocking curves from 20$\mu\textrm{m}$-thick GaN was 576 arcsecond. The photoluminescence spectrum measured 10 K shows the hallow bound exciton (I$_2$) line and weak donor-acceptor peak, however, there was not observed deep donor-acceptor pair recombination indicate the GaN crystals prepared in this study are of high purity and high crystalline quality. The GaN layer is n-type conducting with electron mobility of 72 $\textrm{cm}^2$/V$.$sec and with carrier concentration of 6 x 10$\^$18/cm/sup-3/.

• Korean Journal of Materials Research
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• v.13 no.9
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• pp.598-605
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• 2003

The optimized conditions for the cross-sectional TEM sample preparation using tripod polisher and ion-beam miller was confirmed by AFM and TEM. For the TEM observation of interfaces including InGaN layers like InGaN/GaN MQW structures, the sample preparation by the only tripod polishing was useful due to the reduction of artifacts. On the other hand, in case of the thick nitride films like ELO, PE, and superlattice, both tripod polishing and controlled ion-beam milling were required to improve the reproducibility. As a result, the ion-beam milling with the $60^{\circ}$modulation showed the minimum height difference between film and sapphire interface and the ion-beam milling of the $80^{\circ}$modulation showed the broad observable width.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1996.11a
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• pp.5-9
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• 1996

As optical massmemories, (Se, S)-based chalcogenide amorphous films are used for a holographic supermicrofiche by using the refractive-index change. In 1000$\AA$thick-As$_{40}$ Ge$_{10}$Se$_{100-x}$S$_{x}$(x=0.25, 35at.%), the amount of refractive index change $\Delta$n reaches 0.01~0.53 at 6328, 7800$\AA$ by exposing for 15minutes plue-pass filtered mercury lamp(~4300$\AA$) and annealing 20$0^{\circ}C$. And in initially annealed As$_{40}$ Ge$_{10}$Se$_{15}$ S$_{35}$, photodarkening(PD) and thermalbleaching(TB) was founded.ded.B) was founded.d.

• Transactions on Electrical and Electronic Materials
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• v.11 no.2
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• pp.77-80
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• 2010

Indium tin oxide (ITO) films with a 5 nm thick Au interlayer were prepared on glass substrates. The effects of the Au interlayer on the gas sensitivity for detecting methanol vapors were investigated at room temperature. The conductivity of the film sensor increased upon exposure to methanol vapor and the sensitivity also increased proportionally with the methanol vapor concentration. In terms of the sensitivity measurements, the ITO film sensor with an Au interlayer shows a higher sensitivity than that of the conventional ITO film sensor. This approach is promising in gaining improvement in the performance of ITO gas sensors used for the detection of methanol vapor at room temperature.

• Food Science and Preservation
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• v.1 no.2
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• pp.93-98
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• 1994

Fresh ginseng was packed by using available commercial plastic films of polyvinyl chloride (PVC), cast polypropylene (CPP) and low density polyethylene (LDPE). PVC was used as a wrapping on polystyrene tray, and CPP and LDPE were applied as pouch packages. Gas composition of the package and keeping quality of ginseng in the packages were evaluated for 20 day storage at 5$^{\circ}C$. LDPE (27$\mu\textrm{m}$ thick) Package modified the Package atmosphere to 11.7% O2 and 2.1% CO2, gave low microbial growth and good sensory score after 20 day storage.

• Journal of the Korean Ceramic Society
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• v.38 no.5
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• pp.485-491
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• 2001

일반 산업 및 원자력 관련 산업용 구조소재의 표면특성 향상을 위해 저압 화학기상 증착법에 의해 15~25cm 직경의 흑연기판 위에 고순도의 치밀한 SiC 증착층을 제조하였다. 미세구조와 두께가 균일한 증착층을 얻기 위하여 증착온도의 균일성, 반응가스 고갈효과, 가스 흐름 형태 등의 영향을 고려하였다. 이중에서 반응 용기내의 가스 흐름 형태가 증착층의 균일도에 가장 큰 영향을 주는 것으로 판단되었으며 가스 주입구의 위치와 크기를 조정함으로써 25cm의 직경을 갖는 흑연 기판에 두께 편차가 $\pm$12% 이내인 SiC 증착막을 제조할 수 있었다.

• Carbon letters
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• v.7 no.4
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• pp.245-248
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• 2006

Thin films of carbon-nano materials (CNMs) of different morphology have been successfully deposited on ceramic substrate by CVD at temperatures $800^{\circ}C$, $850^{\circ}C$ and $900^{\circ}C$ using plant based oils in the presence of transition metal catalysts (Ni, Co and Ni/Co alloys). Based on the return and insertion loss, microwave absorption properties of thin film of nanocarbon material are measured using passive micro-Strip line components. The result indicates that amongst CNMs synthesized from oil of natural precursors (mustered oil - Brassica napus, Karanja oil - Pongamia glabra, Cotton oil - Gossipium hirsuta and Neem oil - Azadirachta indica) carbon nano fibers obtained from neem's seed oil showed better microwave absorption (~20dB) in the range of 8.0 GHz to 17.90 GHz.

• 한국정보디스플레이학회:학술대회논문집
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• 2007.08a
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• pp.659-662
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• 2007

The characteristics of a $SiN_x$ passivation layer grown by a specially designed catalyzer enhanced chemical vapor deposition (CECVD) system and electrical and optical properties of OLEDs passivated with the $SiN_x$ layer are described. Despite the low substrate temperature, the single $SiN_x$ passivation layer, grown on the PC substrate, exhibited a low water vapor transmission rate of $2{\sim}6{\times}10^{-2}\;g/m^2/day$ and a high transmittance of 87 %. In addition, current-voltage-luminescence results of an OLED passivated with a 150 nm-thick $SiN_x$ film compared to nonpassivated sample were identical indicating that the performance of an OLED is not critically affected by radiation from tungsten catalyzer during the $SiN_x$ deposition.

• Proceedings of the KIEE Conference
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• 2000.07c
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• pp.1637-1639
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• 2000

Resister networks are used widely in many, high frequency applications for attenuators. In this paper we studied the frequency characteristics of attenuator using network analyzer and compared Ni-Cr thin film resistor with thick film resistor attenuator. Also from return loss, insertion loss and VSWR we obtained the maximum available frequency of these attenuators.

• Proceedings of the Korea Association of Crystal Growth Conference
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• 1998.09a
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• pp.47-51
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• 1998

The GaN thick films were deposited on sapphire substrates by the chloride vapor phase epitaxy (CVPE) technique suing the GaCl3-NH3-N2 chemistry. Thermodynamic simulations were carried out to predict the optimum process windows, and the results were compared with the experiments. A large difference in the growth temperature was observed between the calculation an the experiment, and it indicated that the growth of GaN by the CVPE technique is kinetically limited.