• Journal of the Korean Society of Radiology
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• v.13 no.4
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• pp.661-666
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• 2019

Diverging collimators is used to obtain reduced images of an object, or to detect a wide filed-of-view (FOV) using a small gamma camera. In the gamma camera using the diverging collimators, the block scintillator, and the pixel scintillator array, gamma rays are obliquely incident on the scintillator surface when the source is located the periphery of the FOV. Therefore, the spatial resolution is reduced because it is obliquely detected in depth direction. In this study, we designed a novel system to improve the spatial resolution in the periphery of the FOV. Using a tapered crystal array to configure the scintillation pixels to coincide with the angle of the collimator's hole allows imaging to one scintillation pixel location, even if events occur to different depths. That is, even if is detected at various points in the diagonal direction, the gamma rays interact with one crystal pixel, so resolution does not degrade. The resolution of the block scintillator and the tapered crystal array was compared and evaluated through Geant4 Application for Tomographic Emission (GATE) simulation. The spatial resolution of the obtained image was 4.05 mm in the block scintillator and 2.97 mm in the tapered crystal array. There was a 26.67% spatial resolution improvement in the tapered crystal array compared to the block scintillation.

• Current Optics and Photonics
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• v.5 no.3
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• pp.250-260
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• 2021

A tapered As₂S₃ photonic crystal fiber (PCF) with four layers of air holes in a hexagonal array around the core is designed in this paper. Numerical simulation shows that the dispersion D decreases and the nonlinearity coefficient γ increases from the thick to the thin end along the tapered PCF. We simulate the midinfrared pulse compression in the tapered As₂S₃ PCF using the adaptive split-step Fourier method. Initial Gaussian pulses of 4.4 ps and a central wavelength of 2.5 ㎛ propagating in the tapered PCF are located in the anomalous dispersion region. With an average power of assumed input pulses at 3 mW and a repetition frequency of 81.0 MHz, we theoretically obtain a pulse duration of 56 fs and a compression factor of 78 when the pulse propagates from the thick end to the thin end of the tapered PCF. When confinement loss in the tapered PCF is included in the simulation, the minimum pulse duration reaches 72 fs; correspondingly, the maximum compression factor reaches 61. The results show that in the anomalous-dispersion region, midinfrared pulses can be efficiently compressed in a dispersion-decreasing and nonlinearity-increasing tapered As₂S₃ PCF. Due to confinement loss in the tapered fiber, the efficiency of pulse compression is suppressed.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2001.11a
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• pp.67-67
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• 2001

The structure zone model has been used to provide an overview of the relationship between the microstructure of the films deposited by PVD and the most prominent deposition condition.s. B.AMovchan and AV.Demchishin have proposed it firstls such model. They concluded that the general features of the resulting structures could be correlated into three zones depending on $T/T_m$. Here T m is the melting point of the coating material and T is the substrate temperature in kelvines. Zone 1 ($T/Tm_) is dominated by tapered macrograins with domed tops, zone 2 ($O.3) by columnar grains with denser boundaries and zone 3 ($T/T_m>O.5$) by equiaxed grains formed by recrystallization. J.AThomton has extended this model to include the effect of the sputtering gas pressure and found a fourth zone termed zone T(transition zone) consisting of a dense array of poorly defined fibrous grains. R.Messier found that the zone I-T boundary (fourth zone of Thorton) varies in a fashion similar to the film bias potential as a function of gas pressure. However, there has not nearly enough model for explaining the change in morphology with crystal orientation of the films. The structure zone model only provide an information about the morphology of the deposited film. In general, the nucleation and growth mechanism for granular and fine structure of the deposited films are very complex in an PVD technique because the morphology and orientation depend not only on the substrate temperature but also on the energy of deposition of the atoms or ions, the kinetic mechanism between metal atoms and argon or nitrogen gas, and even on the presence of impurities. In order to clarify these relationship, AI and Mg thin films were prepared on SPCC steel substrates by PVD techniques. The influence of gas pressures and bias voltages on their crystal orientation and morphology of the prepared films were investigated by SEM and XRD, respectively. And the effect of crystal orientation and morphology of the prepared films on corrosion resistance was estimated by measuring polarization curves in 3% NaCI solution.