• Title/Summary/Keyword: Switching room

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Resistance Switching Mechanism of Metal-Oxide Nano-Particles Memory on Graphene Layer

  • Lee, Dong-Uk;Kim, Dong-Wook;Kim, Eun-Kyu
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.318-318
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    • 2012
  • A graphene layer is most important materials in resent year to enhance the electrical properties of semiconductor device due to high mobility, flexibility, strong mechanical resistance and transparency[1,2]. The resistance switching memory with the graphene layer have been reported for next generation nonvolatile memory device[3,4]. Also, the graphene layer is able to improve the electrical properties of memory device because of the high mobility and current density. In this study, the resistance switching memory device with metal-oxide nano-particles embedded in polyimide layer on the graphene mono-layer were fabricated. At first, the graphene layer was deposited $SiO_2$/Si substrate by using chemical vapor deposition. Then, a biphenyl-tetracarboxylic dianhydride-phenylene diamine poly-amic-acid was spin coated on the deposited metal layer on the graphene mono-layer. Then the samples were cured at $400^{\circ}C$ for 1 hour in $N_2$ atmosphere after drying at $135^{\circ}C$ for 30 min through rapid thermal annealing. The deposition of aluminum layer with thickness of 200 nm was done by a thermal evaporator. The electrical properties of device were measured at room temperature using an HP4156a precision semiconductor parameter analyzer and an Agilent 81101A pulse generator. We will discuss the switching mechanism of memory device with metal-oxide nano-particles on the graphene mono-layer.

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Electrical Characteristics of ZnO Varistor for Transmission Class Arrester (송전급 피뢰기용 ZnO 바리스터 소자의 전기적 특성)

  • Kim, Seok-Sou;Park, Choon-Hyun;Cho, I-Gon;Park, Tae-Gon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.04b
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    • pp.179-182
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    • 2004
  • ZnO varistor for transmission class arrester$({\Phi}65{\times}20mm)$ of 10kA(Class 3) grade was recently developed in korea and is tested for the properties by switching surge operating duty test to know the line discharge class and complex surge property in electric properties. To find out changing rate of residual voltage before and after lightning impulse residual voltage testing, the sample is cool to room temperature after finishing switching surge operating duty test, and the rate is good as 1.0~1.7%. The element had been considered as applicable ZnO varistor for electricity transmission from the test results of state conterl, switching surge operating duty, thermal stability and above test. But various test should be required for actual application because this is a part of the to be needed for application.

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Use of 1.7 kV and 3.3 kV SiC Diodes in Si-IGBT/ SiC Hybrid Technology

  • Sharma, Y.K.;Coulbeck, L.;Mumby-Croft, P.;Wang, Y.;Deviny, I.
    • Journal of the Korean Physical Society
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    • v.73 no.9
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    • pp.1356-1361
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    • 2018
  • Replacing conventional Si diodes with SiC diodes in Si insulated gate bipolar transistor (IGBT) modules is advantageous as it can reduce power losses significantly. Also, the fast switching nature of the SiC diode will allow Si IGBTs to operate at their full high-switching-speed potential, which at present conventional Si diodes cannot do. In this work, the electrical test results for Si-IGBT/4HSiC-Schottky hybrid substrates (hybrid SiC substrates) are presented. These substrates are built for two voltage ratings, 1.7 kV and 3.3 kV. Comparisons of the 1.7 kV and the 3.3 kV Si-IGBT/Si-diode substrates (Si substrates) at room temperature ($20^{\circ}C$, RT) and high temperature ($H125^{\circ}C$, HT) have shown that the switching losses in hybrid SiC substrates are miniscule as compared to those in Si substrates but necessary steps are required to mitigate the ringing observed in the current waveforms. Also, the effect of design variations on the electrical performance of 1.7 kV, 50 A diodes is reported here. These variations are made in the active and termination regions of the device.

Implementation of Video Mirroring System based on IP

  • Lee, Seungwon;Kwon, Soonchul;Lee, Seunghyun
    • International journal of advanced smart convergence
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    • v.11 no.2
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    • pp.108-117
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    • 2022
  • The recent development of information and communication technology has a great impact on the audio/video industry. In particular, IP-based AoIP transmission technology and AVB technology are making changes in the audio/video market. Video signal transmission technology has been introduced to the market through a network, but it has not replaced the video switcher function. Video signals in the conference room or classroom are still controlled by the switching device. In order to switch input/output video devices, a cable that is not limited by distance must be connected to the switcher. In addition, the control of the switching device must be performed by a person who has received professional training. In this paper, it is a technology that can be operated even by non-experts by replacing complex video cables (RGB, DVI, HDMI, DP) with LAN cables and enabling IP-based video switching and transmission (Video Mirroring over IP: VMoIP) to replace video switcher equipment. We are going to do this study, I/O videos were controlled in the form of matrix and high-definition videos were transmitted without distortion, and VMoIP is expected to become the standard for video switching systems in the future.

High Resolution Electrodes Fabrication for OTFT Array by using Microcontact Printing and Room Temperature Process

  • Jo, Jeong-Dai;Choi, Ju-Hyuk;Kim, Kwang-Young;Lee, Eung-Sug;Esashi, Masayoshi
    • 한국정보디스플레이학회:학술대회논문집
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    • 2006.08a
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    • pp.186-189
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    • 2006
  • The flexible organic thin film transistor (OTFT) array to use as a switching device for an organic light emitting diode (OLED) was designed and fabricated in the microcontact printing and room temperature process. The gate, source, and drain electrode patterns of OTFT were fabricated by microcontact printing process. The OTFT array with dielectric layer and organic active semiconductor layer formed at room temperature or at a temperature lower than $40^{\circ}C$. The microcontact printing process using SAM and PDMS stamp made it possible to fabricate OTFT arrays with channel lengths down to even submicron size, and reduced the fabrication process by 10 steps compared with photolithography. Since the process was done in room temperature, there was no pattern shrinkage, transformation, and bending problem appeared. Also, it was possible to improve electric field mobility, to decrease contact resistance, to increase close packing of molecules by SAM, and to reduce threshold voltage by using a big dielectric.

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Graphene Oxide Thin Films for Nonvolatile Memory Applications

  • Kim, Jong-Yun;Jeong, Hu-Young;Choi, Hong-Kyw;Yoon, Tae-Hyun;Choi, Sung-Yool
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.9-9
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    • 2011
  • There has been strong demand for novel nonvolatile memory technology for low-cost, large-area, and low-power flexible electronics applications. Resistive memories based on metal oxide thin films have been extensively studied for application as next-generation nonvolatile memory devices. However, although the metal oxide-based resistive memories have several advantages, such as good scalability, low-power consumption, and fast switching speed, their application to large-area flexible substrates has been limited due to their material characteristics and necessity of a high-temperature fabrication process. As a promising nonvolatile memory technology for large-area flexible applications, we present a graphene oxide-based memory that can be easily fabricated using a room temperature spin-casting method on flexible substrates and has reliable memory performance in terms of retention and endurance. The microscopic origin of the bipolar resistive switching behaviour was elucidated and is attributed to rupture and formation of conducting filaments at the top amorphous interface layer formed between the graphene oxide film and the top Al metal electrode, via high-resolution transmission electron microscopy and in situ x-ray photoemission spectroscopy. This work provides an important step for developing understanding of the fundamental physics of bipolar resistive switching in graphene oxide films, for the application to future flexible electronics.

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Characterization of Silver Saturated-Ge45Te55 Solid Electrolyte Films Incorporated by Nitrogen for Programmable Metallization Cell Memory Device

  • Lee, Soo-Jin;Yoon, Soon-Gil;Yoon, Sung-Min;Yu, Byoung-Gon
    • Transactions on Electrical and Electronic Materials
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    • v.8 no.2
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    • pp.73-78
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    • 2007
  • The crystallization temperature in GeTe solid electrolyte films was improved by in situ-nitrogen doping by rf magnetron co-sputtering technique at room temperature. The crystallization temperature of $250\;^{\circ}C$ in electrolyte films without nitrogen doping increased by approximately $300\;^{\circ}C$, $350\;^{\circ}C$, and above $400\;^{\circ}C$ in films deposited with nitrogen/argon flow ratios of 10, 20, and 30 %, respectively. A PMC memory device with $Ge_{45}Te_{55}$ solid electrolytes deposited with nitrogen/argon flow ratios of 20 % shows reproducible memory switching characteristics based on resistive switching at threshold voltage of 1.2 V with high $R_{off}/R_{on}$ ratios. Nitrogen doping into the silver saturated GeTe electrolyte films improves the crystallization temperature of electrolyte films and does not appear to have a negative impact on the switching characteristics of PMC memory devices.

Fabrication and Properties of MFISFET using SrBi2Ta2O9SiN/Si Structures (SrBi2Ta2O9SiN/Si 구조를 이용한 MFISFET의 제작 및 특성)

  • 김광호
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.15 no.5
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    • pp.383-387
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    • 2002
  • N-channel metal-ferroelectric-insulator-semiconductor field-effect-transistors (MFISFET's) by using $SrBi_2Ta_2O_9$/Silicon Nitride/Si (100) structure were fabricated. The fabricated devices exhibit comfortable memory windows, fast switching speeds, good fatigue resistances, and long retention times that are suitable for advanced ferroelectric memory applications. The estimated switching time and polarization ($2P_r$) of the fabricated FET measured at applied electric field of 376 kV/cm were less than 50 ns and about 1.5 uC/$\textrm{cm}^2$, respectively. The magnitude of on/off ratio indicating the stored information performance was maintained more than 3 orders until 3 days at room temperature. The $I_DV_G$ characteristics before and after being subjected to $10^11$ cycles of fatigue at a frequency of 1 MHz remained almost the same except a little distortion in off state.

Realistic Visualization of Car Configurator Based On Unreal Engine 4(UE4)

  • Zhong, Yiming;Yun, Tae Soo;Lee, Byung Chun
    • International Journal of Internet, Broadcasting and Communication
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    • v.14 no.1
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    • pp.105-115
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    • 2022
  • The platform for displaying cars has been changing with the times. From the popularity of paper media to the rise of computer graphics, the improvement of technology has brought more space and possibilities to the automotive industry. Yiming Zhong proposed the workflow of car configurator through Unreal Engine 4 to implement the basic functions of configuration in 2021, according to Yiming Zhong's final presentation, there is still room to improve the realism of graphics and functionality of the car configurator. Therefore, in this paper we propose to upgrade the car shaders and lighting environments according to the real-world physics and add multi-scenes switching function to car configurator. However the multi-scenes switching function also brings a large amount of data, which leads to the problem of display lag. At the end of the paper, we use the level of details(LOD) process to reduce the amount of data for real-time computing in Unreal Engine 4 and the increase of frames per second(FPS) values verifies the feasibility of our optimization solution.

Non volatile memory TFT using mobile proton in gate dielectric by hydrogen neutral beam treatment

  • Yun, JangWon;Jang, Jin Nyoung;Hong, MunPyo
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.231-232
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    • 2016
  • We have fabricated the nc-Si, IGZO based nonvolatile memory TFTs using mobile protons, which can be generated by simple hydrogen insertion process via H-NB treatment at room temperature. The TFT devices above exhibited reproducible hysteresis behavior, stable ON/OFF switching, and non-volatile memory characteristics. Also executed hydrogen treatment in order to figure out the difference of mobile proton generation between PECVD and our modified H-NB CVD. The room temperature proton-insertion process can reveal flexible inorganic based all-in-one display panel including driving circuit and memory circuit.

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