• 동굴
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• 제82호
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• pp.1-4
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• 2007

In this paper, the etching of Au films using photoresist masks on Si substrates was investigated using a capacitively coupled plasma etch reactor. The advantages of plasma etch techniques over current methods for Au metalization include the ability to simplify the metalization process flow with respect to resist lift-off schemes, and the ability to cleanly remove etched material without sidewall redeposition, as is seen in ion milling. The etch properties were measured for different gas mixing ratios of CF4/Ar, and chamber pressures while the other conditions were fixed. According to statistical design of experiment (DOE), etching process of Au films was characterized and also 20 samples were fabricated followed by measuring etch rate, selectivity and etch profile. There is a chemical reaction between CF4 and Au. Au- F is hard to remove from the surface because of its high melting point. The etching products can be sputtered by Ar ion bombardment.

• 한국농공학회:학술대회논문집
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• 한국농공학회 2003년도 학술발표논문집
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• pp.559-562
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• 2003

The results and discussions of surveyed case site at constructed steel pile in potential acid sulfate soil were as follows. Topography at surveyed site was local alluvial valley and that site soils was classified as BanGog and YuGye series as detailed soil surveyed results in RDA and soil texture was Clay/Clay Loam. Soils pH was neutral, which was average 7.5 but much decreased to average 4.2 after $H_2O_2$ treatment. Organic matter and sulfate ions contents were very rich. The corrosion was severe at ground water fluctuation depth. Deposits colored black were attached to steel pile surface, which because of violent reaction in treatment HCI solution, were guessed as corrosion products (FeS) reduced by sulfate reducing bacteria(SRB). Consequently, main cause was thought microbiologically induced corrosion at this site where there is ground water fluctuation occurring oxidation and reduction reactions in turn and the soil is potential acid sulfate soil.

• 한국세라믹학회지
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• 제52권6호
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• pp.489-496
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• 2015

In this study, novel $Ag_2Se$ sensitized $TiO_2$ nanocomposites were prepared by facile sonochemical assisted synthesis method. The as-prepared products were characterized by X-ray diffraction (XRD), Scanning electron microscopy (SEM) with energy dispersive X-ray (EDX) analysis, transmission electron microscopy (TEM), and N2 adsorption BET analysis. The as-prepared $Ag_2Se/TiO_2$ nanocomposites simultaneously possessed great adsorptivity for organic dyes and efficient charge separation properties. In the decolorization of rhodamine B, a significant enhancement in the reaction rate was observed for the $Ag_2Se/TiO_2$ nanocomposite compared to the cases of using pure P25 or $TiO_2$. The sonocatalysis activity was higher due to the greater formation of reactive radicals, as well as to the increase of the active surface area of the $Ag_2Se/TiO_2$ nanocomposite.

• 대한화학회지
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• 제25권3호
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• pp.199-205
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• 1981

Aniline과 alcohol류에서 4-aminoalkylbenzene을 合性하여, 이것을 아세틸化, 니트로化, 加水分解하여 3-nitro-4-aminoalkylbenzene을 얻고 아미노기 이탈반응을 통해 3-nitroalkylbenzene을 合成하여 anthranilic acid와 반응시켜 7-alkyl-1-carboxyphenazine 유도체를 合成하였다. 生成物은 元素分析, IR, NMR 스펙트럼으로 確認하였다. 이들 誘導體들의 水溶液에 대한 表面張力을 測定하였고, 아울러 Gram 陽性菌, Gram 陰性菌, 眞性菌에 대한 抗菌性을 調査하였다. 試驗結果 alkyl기가 치환된 phenazine 誘導體의 抗菌性은 alkyl기가 없는 1-carboxyphenazine 보다 强한 것으로 나타났다.

• 대한화장품학회지
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• 제25권4호
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• pp.43-50
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• 1999

The planarized $SiO_2$ particles were prepared by two-step reduction method of making much smaller particles, micron-sized ones, to improve spreadability, adherence, and smoothness. Various pigments known as flaky extender usually have terrace layers on their surfaces, but $SiO_2$ particles in this study exhibit a smooth surface structure. These single $SiO_2$ particles were used as core particles to prepare the composite particles coated with ultra fine $TiO_2$ particles by a homogeneous precipitation method. The thickness and the morphology of the deposited $TiO_2$ layers could be modified by adjusting the reactant concentrations, the reaction time and the temperature. The characteristics of $SiO_2/TiO_2$ composite in the field of color cosmetics are to give an UV-cut effect and to enhance the chroma of human skin color, one of optical properties.

• 대한화장품학회:학술대회논문집
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• 대한화장품학회 1999년도 IFSCC . ASCS 학술대회 발표 논문
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• pp.43-50
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• 1999

The planarized SiO$_2$ particles were prepared by two-step reduction method of making much smaller particles, micron-sized ones, to improve spreadability, adherence, and smoothness. Various pigments known as flaky extender usually have terrace layers on their surfaces, but SiO$_2$ particles in this study exhibit a smooth surface structure. These single SiO$_2$ particles were used as core particles to prepare the composite particles coated with ultra fine TiO$_2$ particles by a homogeneous precipitation method. The thickness and the morphology of the deposited TiO$_2$ layers could be modified by adjusting the reactant concentrations, the reaction time and the temperature. The characteristics of SiO$_2$/TiO$_2$ composite in the field of color cosmetics are to give an UV-cut effect and to enhance the chroma of human skin color, one of optical properties.

• 대한화학회지
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• 제54권1호
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• pp.131-136
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• 2010

다양한 철 원소의 조성을 갖는 인산알루미늄 철을 합성하여 표면 성질과 벌크 성질을 조사하였다. 벤질 알코올과 디에틸 말론산의 transesterification반응에 의해 촉매 특성을 결정 하였다. 에틸 벤질 말론산과 디벤질 말론산을 유일한 생성물로 얻었다. 철 성분이 0.025 몰 퍼센트인 FeAlP의 경우에 특이한 촉매 특성과 조직상의 특성이 나타난다. 디에스터의 형성은 중간 정도 크기의 산성 자리에서 이루어진다. 물질 안에 수화된 알루미나와 polycondensed인산이 존재할 경우에는 에스터교환 반응에서 인산 알루미늄 철의 촉매 특성이 감소하게 된다.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2005년도 춘계학술대회 논문집
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• pp.434-437
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• 2005

Chemical Mechanical Polishing (CMP) has become an essential step in the overall semiconductor wafer fabrication technology. In general, CMP is a surface planarization method in which a silicon wafer is rotated against a polishing pad in the presence of slurry under pressure. The polishing pad, generally a polyurethane-based material, consists of polymeric foam cell walls, which aid in removal of the reaction products at the wafer interface. It has been found that the material removal rate of any polishing pad decreases due to the so-called 'pad glazing' after several wafer lots have been processed. Therefore, the pad restoration and conditioning has become essential in CMP processes to keep the urethane polishing pad at the proper friction coefficient and to allow effective slurry transport to the wafer surface. Diamond pad conditioner employs a single layer of brazed bonded diamond crystals. Due to the corrosive nature of the polishing slurry required in low pH metal CMP such as copper, it is essential to minimize the possibility of chemical interaction between very low pH slurry (pH <2) and the bond alloy. In this paper, we report an exceptional protective coated conditioner for in-situ pad conditioning in low pH Cu CMP process. The protective Cr-coated conditioner has been tested in slurry with pH levels as low as 1.5 without bond degradation.

• 한국환경보건학회지
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• 제27권3호
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• pp.99-106
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• 2001

A laboratory experiment was performed to investigate phosphorus and nitrogen removal from synthetic wastewater by intermittently activated sludge process packed with aluminium plate. Three continuous experimental systems, I. e. an intermittently activated sludge process(Run A), an intermittently activated sludge process with an aluminium plate packed into the reactor(Run B), and a reactor post stage(Run C) were compared. In the batch experiments, the phosphorus removal time in the reactor packed with copper and aluminium plate simultaneously was faster than that of the reactor packed with only an aluminium plates. However, the reactor packed with only an aluminium plate could be used for phosphorus removal. Move phosphorus was removed with an increase of surface area of aluminium plate and electrolysis(NaCl) concentration. The efficiency of COD and nitrogen removal was not affected in Run B. However, the phosphrus removal efficiency decreased because of reaction products and activated sludge which gradually covered gradually the surface of the aluminium plate. The efficiency of phosphorus removal in Run C was 86.3% at the HRT of 3.2 hours. Especially, the efficiency of phosphorus removal in Run C was higher than that in Run B.

• Nuclear Engineering and Technology
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• 제44권8호
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• pp.945-952
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• 2012

The sorption of selenium ions onto iron and iron compounds as a disposal container material and its corrosion products, and onto bentonite as a buffer material, was studied to understand the behaviors of selenium in a waste repository. Selenite was sorbed onto commercial magnetite very well in solutions at around pH 9, but silicate hindered their sorption onto both magnetite and ferrite. Unlike commercial magnetite and ferrite, flesh synthesized magnetite, green rust and iron greatly decreased selenium concentration even in a silicate solution. These results might be due to the formation of precipitates, or the sorption of selenide or selenite onto an iron surface at below Eh= -0.2 V. Red-colored Se(cr) was observed on the surface of a reaction bottle containing iron powder added into a selenite solution. Silicate influences on the sorption onto magnetite and iron for selenide are the same as those for selenite. Even though bentonite adsorbed a slight amount of selenite, the sorption cannot be ignored in the waste repository since a very large quantity of bentonite is used.