• Title/Summary/Keyword: Surface activation

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The Effect of Temperature on the Corrosion of Mild Steel in H3PO4 Containing Halides and Sulfate Ions

  • Chandrasekaran, V.;Kannan, K.;Natesan, M.
    • Corrosion Science and Technology
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    • v.4 no.1
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    • pp.8-14
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    • 2005
  • The corrosion behaviour of mild steel in phosphoric acid solution in the presence and absence of pollutants viz. Chloride, Fluoride and Sulfate ions at 302K-333K was studied using mass loss and potentiostatic polarization methods. The addition of chloride and sulfate ions inhibits the mild steel corrosion in phosphoric acid while fluoride ions stimulate it. The effect of temperature on the corrosion behaviour of mild steel indicated that inhibition of chloride and sulfate ions decreased with increasing temperature. The adsorption of these ions (Chloride and sulfate) on the mild steel surface in acid has been found to obey Langmuir adsorption isotherm. The values of activation energy (Ea) and free energy of adsorption ($\Delta$) indicated physical adsorption of these ions (chloride and sulfate) on the mild steel surface. The plot of $logW_{f}$ against time (days) at 302K gives a straight line, which suggested that it obeys first order kinetics and also calculate the rate constant k and half-life time $t_{1/2}$.

Notch Signal Transduction Induces a Novel Profile of Kaposi's Sarcoma-Associated Herpesvirus Gene Expression

  • Chang Hee-Soon
    • Journal of Microbiology
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    • v.44 no.2
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    • pp.217-225
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    • 2006
  • Kaposi's sarcoma-associated herpesvirus (KSHV) RTA transcription factor is recruited to its responsive elements through interaction with RBP-Jk that is a downstream transcription factor of the Notch signaling pathway that is important in development and cell fate determination. This suggests that KSHV RTA mimics cellular Notch signal transduction to activate viral lytic gene expression. Here, I demonstrated that unlike other B lymphoma cells, KSHV -infected primary effusion lymphoma BCBL1 cells displayed the constitutive activation of ligand-mediated Notch signal transduction, evidenced by the Jagged ligand expression and the complete proteolytic process of Notch receptor I. In order to investigate the effect of Notch signal transduction on KSHV gene expression, human Notch intracellular (hNIC) domain that constitutively activates RBP-Jk transcription factor activity was expressed in BCBL1 cells, TRExBCBL1-hNIC, in a tetracycline inducible manner. Gene expression profiling showed that like RTA, hNIC robustly induced expression of a number of viral genes including KS immune modulatory gene resulting in downregulation of MHC I and CD54 surface expression. Finally, the genetic analysis of KSHV genome demonstrated that the hNIC-mediated expression of KS during viral latency consequently conferred the downregulation of MHC I and CD54 surface expression. These results indicate that cellular. Notch signal transduction provides a novel expression profiling of KSHV immune deregulatory gene that consequently confers the escape of host immune surveillance during viral latency.

Effects of Alloying Elements on the Corrosion Layer Formation of Pb-Grid/Active Materials Interface (Pb 기판/활물질 계면의 부식층형성에 미치는 합금원소영향)

  • Oh, Se-Woong;Choe, Han-Cheol
    • Journal of the Korean institute of surface engineering
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    • v.40 no.5
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    • pp.225-233
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    • 2007
  • Effects of alloying elements on the corrosion layer formation of Pb-grid/active materials interface has been researched for improvement of corrosion resistance of Pb-Ca alloy. For this research, various amounts of alloying elements such as Sn, Ag and Ba were added to the Pb-Ca alloys and investigated their corrosion behaviors. Batteries fabricated by using these alloys as cathode grids were subjected to life cycle test. Overcharge life cycle test was carried out at $75^{\circ}C$, 4.5 A, for 110 hrs. with KS standard (KSC 8504). And then, after keeping the battery with open circuit state for 48 hr, discharge was carried out at 300A for 30 sec. Corrosion morphology and interface between Pb-grid and active materials were investigated by using ICP, SEM, WDX, and LPM. Corrosion layer of Pb-Ca alloy got thicken with increasing Ca content. For Pb-Ca-Sn alloy, thickness of corrosion layer decreased as Sn and Ag content increased gradually. In case of Pb-Ca-Sn-Ba alloy, thickness of corrosion layer decreased up to 0.02 wt% Ba addition, whereas, it was not changed in case of above 0.02 wt% Ba addition.

Cell Surface Expression of Tumor Necrosis Factor-Alpha by Activated Rat Astrocytes

  • Chung, Il-Yup;Benveniste, Etty N.
    • BMB Reports
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    • v.29 no.6
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    • pp.530-534
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    • 1996
  • Astrocyte are the major glial cell type in the central nervous system (CNS), and analogous to macrophage, mediates the number of immune responses such as production of cytokines including tumor necrosis factor alpha ($TNF-{\alpha}$) upon activation. $TNF-{\alpha}$ has been implicated in neuroimmunological disorders through killing oligodendrocytes and thus causing demyelination. It has been previously demonstrated that mitogen-activated T cells synthesized a 26 kDa precursor form of $TNF-{\alpha}$ which is bound to the surface of a membrane, and is later secreted as a 17 kDa mature version. In order to examine whether astrocytes would produce the transmembrane form of $TNF-{\alpha}$, astrocytes were stimulated with biological stimuli and the membrane form of $TNF-{\alpha}$ was analyzed by Western blot and FACS analysis. When astrocytes are stimulated with lipopolysaccharide (LPS), $IFN-{\gamma}/LPS$, or $IFN-{\gamma}/IL-1{\beta}$, they were able to express a membrane-anchored $TNF-{\alpha}$ of approximately 26 kDa protein which was immunoreactive to an $anti-TNF-{\alpha}$ antibody, whereas unstimulated astrocytes or astrocytes treated with $IFN-{\gamma}$ or $IL-1{\beta}$ alone was not. Our FACS data were also consistent with the immunoblot analysis. Our result suggests that the membrane form of $TNF-{\alpha}$ expressed by activated astrocytes may cause local damage to oligodendrocytes by direct cell-cell contact and contribute to demyelination observed in multiple sclerosis (MS) and experimental allergic encephalomyelitis (EAE).

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Synthesis of Mesoporous TiO2 and Its Application to Photocatalytic Activation of Methylene Blue and E. coli

  • Kim, Eun-Young;Kim, Dong-Suk;Ahn, Byung-Tae
    • Bulletin of the Korean Chemical Society
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    • v.30 no.1
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    • pp.193-196
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    • 2009
  • Mesoporous $TiO_2$ material was synthesized from diblock copolymers with ethylene oxide chains via a sol-gel process in aqueous solution. The properties of these materials were characterized with several analytical techniques including field emission scanning electron microscopy (FE-SEM), transmission electron microscopy (TEM), wide angle X-ray diffraction (XRD), Brunauer-Emmett-Teller (BET) analysis, and Barrett-Joyner-Halenda (BJH) analysis. The mesoporous $TiO_2$ materials calcined at 400${^{\circ}C}$ were found to have specific surface areas 212 $m^2g^-1$, average pore sizes 6.2 nm, and their average crystal sizes were found to be 8.2 nm. The photocatalytic activity of mesoporous $TiO_2$ was characterized with UV-Vis spectroscopy, and it was found to be 5.8 times higher than that of Degussa P25 $TiO_2$ (P25). For deactivation of Escherichia coli, mesoporous $TiO_2$ also has high photocatalytic inactivity than that of P25. Such a high photocatalytic activity is explained with large surface area and small crystal size with wormhole-like mesoporous structure.

Field Emission Enhancement by Electric Field Activation in Screen-printed Carbon Nanotube Film

  • Lee, Hyeon-Jae;Lee, Yang-Doo;Cho, Woo-Sung;Kim, Jai-Kyeong;Hwang, Sung-Woo;Ju, Byeong-Kwon
    • Journal of Information Display
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    • v.6 no.4
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    • pp.45-48
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    • 2005
  • By applying a critical field treatment instead of the conventional surface treatments such as soft rubber roller, ion beam irradiation, adhesive taping, and laser irradiation, electron emission properties of screen-printed carbon nanotubes (CNTs) were enhanced and investigated based on the emission current-voltage characteristics through scanning electron microscopy. After nanotube emitters were activated at the applied electric-field of 2.5 V/um, the electron emission current density with good uniform emission sites reached the value of 2.13 mA/$cm^2$ , which is 400 times higher than that of the untreated sample, and the turn-on voltage decreased markedly from 700 to 460 V. In addition, enhancement of the alignment of CNTs to the vertical direction was observed.

A Study on Characteristics of Microcrystalline-silicon Films Fabricated by PECVD Method (플라즈마 화학증착법으로 제작한 미세결정질 실리콘 박막 특성에 관한 연구)

  • Lee, Ho-Nyeon;Lee, Jong-Ha;Lee, Byoung-Wook;Kim, Chang-Kyo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.21 no.9
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    • pp.848-852
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    • 2008
  • Characteristics of microcrystalline-silicon thin-films deposited by plasma-enhanced chemical-vapor deposition (PECVD) method were studied. There were optimum values of RF power density and $H_2$ dilution ratio $(H_2/(SiH_4+H_2))$; maximum grain size of about 35 nm was obtained at substrate temperature of 250 $^{\circ}C$ with RF power density of 1.1 W/$cm^2$ and $H_2$ dilution ratio of 0.91. Larger grain was obtained with higher substrate temperature up to 350 $^{\circ}C$. Grain size dependence on RF power density and $H_2$ dilution ratio could be explained by etching effects of hydrogen ions and changes of species of reactive precursors on growing surface. Surface-mobility activation of reactive precursors by temperature could be a reason of grain-size dependence on the substrate temperature. Microcrystalline-silicon thin-films that could be used for flat-panel electronics such as active-matrix organic-light-emitting-diodes are expected to be fabricated successfully using these results.

The study of Grain boundary diffusion effect in Tin/Cu by Xps (XPS를 이용한 TiN/Cu의 Grain boundary diffusion 연구)

  • 임관용;이연승;정용덕;이경민;황정남;최범식;원정연;강희재
    • Journal of the Korean Vacuum Society
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    • v.7 no.2
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    • pp.112-117
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    • 1998
  • TiN has been investigated as a good candidate for a diffusion barrier of Cu. Therefore, in this study, the grain boundary diffusion of Cu in TiN film was investigated by X-ray photoelectron spectroscopy(XPS). In general, TiN has a columnar grain structure. In the relatively lower temperature, less than 1/3 of the melting point, it was observed that Cu diffused into TiN mainly along the grain boundaries of TiN. The grain size of TiN was measured by atomic force microscope (AFM). In order to estimate the grain boundary diffusion constants, we used the modified surface accumulation method. The activation energy, $Q_b$ was 0.23 eV, and the diffusivity, $D_{bo}$ was $5.5\times10^{-12{\textrm{cm}^2$/sec.

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Non-Thermal Atmospheric-Pressure Plasma Possible Application in Wound Healing

  • Haertel, Beate;von Woedtke, Thomas;Weltmann, Klaus-Dieter;Lindequist, Ulrike
    • Biomolecules & Therapeutics
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    • v.22 no.6
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    • pp.477-490
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    • 2014
  • Non-thermal atmospheric-pressure plasma, also named cold plasma, is defined as a partly ionized gas. Therefore, it cannot be equated with plasma from blood; it is not biological in nature. Non-thermal atmospheric-pressure plasma is a new innovative approach in medicine not only for the treatment of wounds, but with a wide-range of other applications, as e.g. topical treatment of other skin diseases with microbial involvement or treatment of cancer diseases. This review emphasizes plasma effects on wound healing. Non-thermal atmospheric-pressure plasma can support wound healing by its antiseptic effects, by stimulation of proliferation and migration of wound relating skin cells, by activation or inhibition of integrin receptors on the cell surface or by its pro-angiogenic effect. We summarize the effects of plasma on eukaryotic cells, especially on keratinocytes in terms of viability, proliferation, DNA, adhesion molecules and angiogenesis together with the role of reactive oxygen species and other components of plasma. The outcome of first clinical trials regarding wound healing is pointed out.

Chemical Vapor Deposition of Inorganic Thin Films using Atmospheric Plasma : A Review of Research Trend (상압 플라즈마를 이용한 무기박막의 화학기상 증착법에 대한 연구동향)

  • Kim, Kyong Nam;Lee, Seung Min;Yeom, Geun Young
    • Journal of the Korean institute of surface engineering
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    • v.48 no.5
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    • pp.245-252
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    • 2015
  • In recent years, the cleaning and activation technology of surfaces using atmospheric plasma as well as the deposition technology for coating using atmospheric plasma have been demonstrated conclusively and drawn increasing industrial attention. Especially, due to the simplicity, the technology using atmospheric plasma enhanced chemical vapor deposition has been widely studied from many researchers. The plasma source type commonly used as the stabilization of diffuse glow discharges for atmospheric pressure plasma enhanced chemical vapor deposition pressure is the dielectric barrier discharge. In this review paper, some kinds of modified dielectric barrier discharge type will be presented. And, the characteristics of silicon based compound such as SiOx and SiNx deposited using atmospheric plasma enhanced chemical vapor system will be discussed.