• 한국표면공학회지
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• 제34권5호
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• pp.421-428
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• 2001

New WC-CrN superlattice film was deposited on Si substrate (500$\mu\textrm{m}$) using cathodic arc ion plating system. The microstructure and mechanical properties of the film depend on the superlattice period (λ). In the X-ray diffraction analysis (XRD), preferred orientation of microstructure was changed according to various superlattice periods(λ). During the Transmission Electron Microscope analysis (TEM), microstructure and superlattice period (λ) of the WC - CrN superlattice film was confirmed. Hardness and adhesion of the deposited film was evaluated by nanoindentation test and scratch test, respectively. As a result of nanoindentation test, the hardness of WC - CrN superlattice film was gained about 40GPa at superlattice period (λ) with 7nm. Also residual stress with various superlattice period (λ) was measured on Si wafer (100$\mu\textrm{m}$) by conventional beam-bending technique. The residual stress of the film was reduced to a value of 0.2 GPa by introducing Ti - WC buffer layers periodically with a thickness ratio ($t_{buffer}$/$t_{buffer+superlattice}$ ). To the end, for the evaluation of oxidation resistance at the elevated temperature, CrN single layer and WC - CrN superlattice films with various superlattice periods on SKD61 substrate was measured and compared with the oxidation resistance.

• 한국음향학회지
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• 제19권5호
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• pp.41-45
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• 2000

단결정 초격자 다층박막의 유효탄성계수를 표면탄성파 전파속도에 근거하는 두 가지 방법에 의하여 결정하였다. 첫째 방법은 구성층의 탄성계수로부터 초격자의 유효탄성계수를 계산하는 공식을 사용한다. 계산된 유효탄성계수로 계산한 기판 위 박막의 표면탄성파 전파속도와 선집속 초음파현미경으로 측정한 표면탄성파 전파속도를 비교하여 그 유효탄성계수를 검증한다. 둘째 방법은 선집속 초음파현미경으로 측정한 표면탄성파 전파속도 분산 데이터로부터 역산하여 초격자 다층박막의 유효탄성계수를 결정한다. 두 가지 방법을 TiN/NbN 초격자 다층박막에 적용하여 서로 잘 일치하는 결과를 얻었다.

• Bulletin of the Korean Chemical Society
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• 제30권1호
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• pp.201-204
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• 2009

$BaTiO_3/SrTiO_3$ and $PbTiO_3/PbZrO_3$ superlattice thin films were fabricated on $Pt/Ti/SiO_2/Si$ substrate by the pulsed laser deposition process. The morphologies and physical properties of deposited films were characterized by using X-ray diffractometer, HR-SEM, and Impedance Analyzer. XRD data and SEM images of the films indicate that each layer was well deposited alternatively in the superlattice structure. The dielectric constant of $BaTiO_3/SrTiO_3$ superlattice thin film was higher than that of individual $BaTiO_3$ or $SrTiO_3$ film. Same result was obtained in the $PbTiO_3/PbZrO_3$system. The dielectric constant of a superlattice film was getting higher as the number of layer is increased.

• 대한기계학회:학술대회논문집
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• 대한기계학회 2004년도 춘계학술대회
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• pp.1376-1381
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• 2004

Understanding the thermal conductivity and heat transfer processes in superlattice structures is critical for the development of thermoelectric materials and optoelectronic devices based on quantum structures. $Chen^{(1)}$ developed ballistic diffusive equation(BDE) for alternatives of the Boltzmann equation that can be applied to the complex geometrical situation. In this study, a simulation code based on BDE is developed and applied to the 1-dimensional transient heat conduction across a thin film and transient 2-dimensional heat conduction across the film with heater. The obtained results are compared to the results of the $Chen^{(1)}$ and Yang and $Chen^{(1)}$. Finally, steady 2-dimensional heat conduction in the quantum dot superlattice are solved to obtain the equivalent thermal conductivity of the lattice and also compared with the experimental data from $Borca-Tasciuc^{(2)}$.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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• pp.394-394
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• 2012

We fabricated organic-inorganic superlattice films using molecular layer deposition (MLD) and atomic layer deposition (ALD). The MLD is a gas phase process in the vacuum like to atomic layer deposition (ALD) and also relies on a self-terminating surface reaction of organic precursor which results in the formation of a monolayer in each sequence. In the MLD process, 'Alucone' is very famous organic thin film fabricated using MLD. Alucone layers were grown by repeated sequential surface reactions of trimethylaluminum and ethylene glycol at substrate temperature of $80^{\circ}C$. In addition, we developed UV-assisted $Al_2O_3$ with gas diffusion barrier property better than typical $Al_2O_3$. The UV light was very effective to obtain defect-free, high quality $Al_2O_3$ thin film which is determined by water vapor transmission rate (WVTR). Ellipsometry analysis showed a self-limiting surface reaction process and linear growth of each organic, inorganic film. Composition of the organic films was confirmed by infrared (IR) spectroscopy. Ultra-violet (UV) spectroscopy was employed to measure transparency of the organic-inorganic superlattice films. WVTR is calculated by Ca test. Organic-inorganic superlattice films using UV-assisted $Al_2O_3$ and alucone have possible use in gas diffusion barrier for OLED.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제40회 동계학술대회 초록집
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• pp.115-115
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• 2011

Nano hybrid superlattices consisting of organic and inorganic components have great potential for creation of new types of functional material by utilizing the wide variety of properties which differ from their constituents. They provide the opportunity for developing new materials with new useful properties. Herein, we fabricated new type of organic-inorganic nano hybrid superlattice thin films by a sequential, self-limiting surface chemistry process known as molecular layer depostion (MLD) combined with atomic layer deposition (ALD). An organic layer was formed at $150^{\circ}C$ using MLD with repeated sequintial adsorption of Hydroquinone and Titanium tetrachloride. A $TiO_2$ inorganic nanolayer was deposited at the same temperature using ALD with alternating surface-saturating reactions of Titanium tetrachloride and water. Using UV-Vis spectroscopy, we confirmed visible light absorption by LMCT. And FTIR spectroscopy and XPS were employed to determine the chemical composition. Ellipsometry and TEM analysis were also used to confirm linear growth of the film versus number of MLD cycles at all same temperature. In addition, p-n junction diodes domonstrated in this study suggest that the film can be suitable for n-type semiconductors.

• 한국진공학회지
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• 제5권1호
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• pp.73-76
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• 1996

We have prepared hydrogenated amophous silicon (a-si : H) films with superlattice structure by hydrogen radical anneling(HRA) technique. We have studied the preparation of a-Si :H films by HRA and the optical & electronic characteristics. Optical band gap and the hydrogen contents in the a Si : H film is decreased as HRA time increased. We first report a -Si : H film prepared by periodicdeposition of a-Si : H layer and HRA have the superlattice structure using TEM . After 1 hour light soaking on the a-Si :H film prepared by HRA, there are no difference in the temperatre dependence of dark conductivity and the conductivity activation energy. An excellent stability for light in a-Si :H films by HRA can be explained using the long-range structural relaxation of the amorphous network and the propertiesof light -induced defects(LID) proposed by Fritzsche.

• 한국자기학회지
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• 제21권3호
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• pp.93-98
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• 2011

Laser Molecular-Beam Epitaxy 방법을 사용하여 $La_{0.35}Pr_{0.35}Ca_{0.3}MnO_3$(LPCMO)/$LaAlO_3$(LAO) 초격자를 성공적으로 증착하였으며 이의 열처리 전후 결정학적, 자기적 특성을 LPCMO 단층박막, 그리고 LPCMO/$SrTiO_3$(STO) 초격자와 비교 분석하였다. LPCMO 단층박막, 그리고 LPCMO/STO 초격자 단층박막의 경우, 표면이 열처리 전후 모두 거친 양상을 보인 것과는 달리 LPCMO/LAO 초격자 박막은 열처리 전후 모두 상대적으로 매우 매끈하였다. 열처리 후 단층박막, 초격자 박막 시료 모두 강자성 특성이 향상되었으며 특히 초격자의 경우에는 이러한 현상이 두드러졌다. 열처리 후에 보자력과 포화자기장이 감소하는 LPCMO 단층박막과는 달리 LPCMO/LAO 초격자의 경우, 열처리 후에도 보자력은 열처리 전과 같은 값을 보였으며 단층박막과는 반대로 포화자기장은 오히려 증가하였다. 이러한 자기적 특성은 절연체 사이에 강자성체가 끼여 있는 초격자라는 결정구조에서 기인하는 것으로 이해된다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2010년도 하계학술대회 논문집
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• pp.4-4
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• 2010

Single-crystalline IGZO (Indium-Gallium-Zinc oxide) was fabricated on c-sapphire substrate. Single crystal ZnO was used as a buffer layer, and post-annealing was treated in $900^{\circ}C$ for crystallization of IGZO. Crystallized IGZO formed superlattice structure spontaneously induced to c-axis direction by ZnO butTer layer, the composition of IGZO was varied by amount of ZnO. Crystallinity and composition of IGZO was analyzed by X-ray Diffraction and Transmission Electron Microscopy.

• 한국진공학회지
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• 제15권1호
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• pp.110-116
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• 2006

본 연구에서는 나노 두께를 갖는 두 층을 반복적으로 증착하여 나노 다층 구조를 갖는 질화 물이 코팅된 절삭공구의 기계적 성능과 절삭성능의 향상에 대해 고찰하였다. 이러한 질화물계 나노 다층막에 대한 재료는 격자상수와 결정구조에 따라 $Ti_{0.54}Al_{0.46}N-CrN$계와 $Ti_{0.84}Al_{0.16}N-NlN$계를 선택하여, UBM sputtering 증착법을 이용하여 초경(WC-Co) 인서트(insert)위에 증착하였다. 공정 변수들인 증착온도, 압력. 기판 바이어스 전압, 기판회전 속도 등을 조절하여 다른 주기 값을 갖는 일정한 두께의 다층막들을 증착 시켰고, 주기에 따른 초격자 형성, 경도 값과 절삭성능을 관찰하였다. 증착된 다층막들은 그 주기 값에 따라 경도 값이 다르게 나타났으며. 경도 값이 상대적으로 높았던 특정 주기의 다층막이 코팅된 절삭 공구의 경우, 기존의 상용화된 제품에 비해 frank wear로 비교한 절삭 성능이 $20\%$이상 향상됨을 관찰하였다