• 제목/요약/키워드: Sulfate bath

검색결과 86건 처리시간 0.023초

Electrodeposition Characteristics and Magnetic Properties of CoFeNi Thin Film Alloys

  • Song, Jae-Song;Yoon, Do-Young;Han, Choon;Kim, Dae-Heum;Park, Dyuk-Young;Myung, No-Sang
    • 전기화학회지
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    • 제5권1호
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    • pp.17-20
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    • 2002
  • 다양한 조성의 CoFeNi합금이 chloride bath와 sulfate bath에서 전해도금 되어졌고, 합금의 도금 특성과 자기특성이 관찰되어졌다. CoFeNi합금 박막의 전해도금에 있어서 Fe조성의 증가는 chloride bath에서보다 sulfate bath에서 빠르게 증가하였다. 전류효율은 큰 변화가 보이지 않는 chloride bath와 달리 sulfate bath에서는 $750\%$에서 $50\%$로 큰 폭으로 감소하였다. Co, Fe, Ni조성이 $80\%,\;10\%,\;10\%$되는 CoFeNi합금이 이번 실험에서 가장 우수한 연자성 재료로 평가되었으며, 그때의 Coercivity는 3 Oe이고 높은 squareness값을 보였다

3가 크롬도금의 전착속도 및 표면형상에 미치는 첨가제의 영향 (The Effect of Additives on the Deposition Rate and the Surface Morphology of Trivalent Chromium Electrodeposits)

  • 예길촌;서경훈
    • 한국표면공학회지
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    • 제37권1호
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    • pp.13-21
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    • 2004
  • The deposition rate, the current efficiency and surface morphology of trivalent Cr deposits were investigated according to additives in sulfate bath and current density. The deposition rate of the Cr deposits plated from the formic acid complexed bath was noticeably higher than that of the glycine complexed bath. The current efficiency of the deposition from formic acid bath was higher than that of the glycine bath and increased with current density in the range of 20-50 A/d$\m^2$. The current efficiency of the deposition from the formic acid bath with boric acid buffer was higher than that of the bath with aluminum sulfate or boric acid-aluminum sulfate buffers. The nodular crystallite size of the Cr deposits increased with current density and the uniform and crack-free growth of the deposits for the aluminum sulfate was observed compared to the other buffers.

수산을 사용한 크롬도금의 광택성에 미치는 전류밀도와 전류효율의 영향 (Effect of Current Density and Current Efficiency on the Decorative Property of Chromium Deposits using Oxalic Acid)

  • 오이식;박정덕
    • 동력기계공학회지
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    • 제5권1호
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    • pp.89-96
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    • 2001
  • Decorative property of chromium deposition from oxalic acid bath containing chromium oxide and ammonium sulfate, has been examined over a wide range of bath compositions and plating conditions. The followings were determined as optimum bath composition, $CrO_3\;200{\sim}250g/{\ell},\;H_2C_2O_4{\cdot}2H_2O\;500{\sim}700g/{\ell},\;(NH_4){_2}SO_4\;40{\sim}120g/{\ell}$, and operation conditions; pH $2.0{\sim}2.5$, current density of $15{\sim}250Adm^2 $ at the bath temperatures of $30{\sim}80^{\circ}C$. Bright chromium deposits were obtained over a wide range of ammonium sulfate concentration, bath temperature, and current density. The current efficiency decreased with increasing current density and bath pH, and increased with Increasing bath temperature. The highest current efficiency was obtained in the bath containing $80g/{\ell}$ of ammonium sulfate. Bright chromium deposits were not obtained at conditions of all the highest current efficiencies.

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황산아연욕에서 도금층 경도에 미치는 욕조성 및 도금조건의 영향 (Effect of the electrolyte composition and the plating condition on the hardness of zinc deposit in the sulfate bath)

  • 김명수;김영근
    • 한국표면공학회지
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    • 제33권5호
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    • pp.356-364
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    • 2000
  • Factors that affect the hardness of the zinc electrodeposits in the sulfate electrolyte were investigated. The hardness of zinc deposit was enhanced by increasing the concentration of impurities such as iron and nickel in the bath that changed the crystallographic orientation of the zinc deposit from the strong basal plane to the random orientation. The increase of the concentration of sodium sulfate and current density in iron contained bath improved the hardness of zinc deposit because those were easily codeposited in zinc layer. However the increase of the concentration of sodium sulfate up to 80g/$\ell$ in the bath darkened the surface of zinc electrodeposits due to change of morphology by the codeposition of iron.

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피로인산염욕으로부터 Co-P자성막의 무전해 도금 (Electroless Plating of Co-P Magnetic Films from Pyrophosphate Bath)

  • 조정산;고석수;이주성
    • 한국표면공학회지
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    • 제19권4호
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    • pp.140-148
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    • 1986
  • Using sodium pyrophoshate as complexing agent, the characteristics and the magnetic properties of the films deposited from electroless cobalt plating bath have been studied. The result obtained are as following; 1. It was found that the optimum bath compositions consisted of 0.1M cobalt sulfate, 0.2M sodium hypophosphite as reducing agent, 0.4M sodium pyrophosphate as complexing agent and 0.5M ammonium sulfate as buffer agent, whereas good operating conditions were the bath of pH 10.5 adjusted with ammonia and 70$^{\circ}C$ of bath temperature, respectively. 2. The coercive force and the squareness of magnetic films were increased with deposition from the low temperature bath. 3. The phosphorous content in Co-P films deposited from these bath was relatively higher than that from Brenner bath. It was assumed to be due to codeposition of phosphorous from the pyrophosphate anion in the solution.

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고속도금된 3가 크롬도금의 전류효율 및 조직특성에 미치는 첨가제의 영향 (The Effect of Additives on the Current Efficiency and the Microstructure of Trivalent Cr Electrodeposits Plated in Flow Cell System)

  • 예길촌;서경훈
    • 한국표면공학회지
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    • 제37권2호
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    • pp.92-98
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    • 2004
  • The current efficiency and the microstructure of the trivalent Cr deposits plated in flow cell system were investigated according to additives in sulfate bath and current density. The current efficiency of the deposits plated in the formic acid complexed bath was noticeably higher than that of the deposits from glycine complexed bath. The current efficiency of the deposits from the complexed baths with boric acid buffer increased linearly with current density in the range of 60-100 A/dm$^2$, while that of the deposits from the baths with both Al sulfate and mixed buffers increased parabolically with current density. The nodular crystallite size of the deposits increased with current density, and the deposits plated in low current density region had relatively smooth surface appearance with fine grains. The structure of the deposits from the complexed baths with boric acid buffer changed from amorphous structure to crystalline one with strong (110)peak with increasing current density. The deposits from the baths with both Al sulfate and mixed buffers had generally amorphous structure.

황산욕에서 아연의 피막특성에 미치는 pH 및 지지염의 영향 (Effcets od pH and supporting salts on electrogalvanized coaying in sulfate bath)

  • 조용균;김영근;안덕수
    • 한국표면공학회지
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    • 제31권1호
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    • pp.24-33
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    • 1998
  • Effects of pH and supporting salts on the characteristics of electrogalvanzied coating in sulfate bath are investigated. The fine grain size is obtained and the whiteness with the amount of supporting salts or pH increased at more than current density of 100A/$dm^2$<\TEX>, With supporting salts increased, the electro-conductivity of the bulk solution increases and the cell voltage decreases, while the width of the cathode burned edge gets wider because it seems that the increased overpotential the vicinity of cathode causes the decreases, of limiting current density. When the amount of supporting salts or pH of sulfate bath decreases, the zinc crystals have preferred orientation (001) planes. However when the amount of supporting salts or pH increase, the crystal texture has less (001) planes and gets to have random crystal planes.

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수산을 사용한 크롬도금의 광택성에 미치는 도금액의 조성과 도금조건의 영향 (Effect of Bath Compositions and Plating Conditions for Decorative Properties of Chromium Deposits using Oxalic Acid)

  • 오이식;박정덕
    • 동력기계공학회지
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    • 제5권3호
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    • pp.80-87
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    • 2001
  • Decorative properties of chromium depositions from oxalic acid bath containing chromium oxide and ammonium sulfate have been examined over a wide range of bath compositions and plating conditions. The obtained results from this experiment are summarized as follow: The followings were determined as a optimum conditions, bath compositions; $CrO_3\;200{\sim}250\;g/{\ell},\;H_2C_2O_4{\cdot}2H_2O\;500{\sim}700\;g/{\ell},\;(NH_4)_2SO_4\;40{\sim}120\;g/{\ell}$, and operation conditions; pH $2.0{\sim}2.5$, current density $15{\sim}250\;A/dm^2$ at bath temperature range of $30{\sim}80^{\circ}C$. Bright chromium deposits were obtained over a wide range of ammonium sulfate concentration and bath temperature. Decorative property for chromium deposition was adopted to apply stoichiometric ratio of $CrO_3$ concentration and $H_2C_2O_4{\cdot}2H_2O$.

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무전해도금에 의한 Ni-Tl-P 피막형성에 관한 연구 (A Study on Formation of Ni-Tl-P deposits by Electroless Plating)

  • 류일광;추현식
    • 한국표면공학회지
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    • 제33권2호
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    • pp.126-134
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    • 2000
  • This study investigated the bath compositions and plating conditions and crystal structure used for achieving nickel-thallium-phosphorus deposits by means electroless plating. The electroless nickel-thallium-phosphorus deposits were achieved with a bath using sodium hypophosphite as the reducing agent and sodium citrate as the complexing agent. The depositing rate was 10.5mg.$cm^{2-1}$ .$hr^{-1 }$ from the optimistic bath composition, 0.1M nickel sulfate, 0.005M thallium sulfate, 0.2M sodium hypophosphite, and 0.05M sodium citrat and the recommended plating conditions, pH 5.5 and $90^{\circ}C$. The composition of alloy deposits determined by X-ray analysis (EDS) that the Thallium was increased with major increasing concentration of complexing agent and thallium ion in bath solution, it decreased according to the increasing concentrations of reduction agent in the bath solution, Bit Phosphorus showed a contrary to the thallium. It was observed from X-ray diffraction analysis, Scanning Electron Microscopy and Transmission Electron Microscopy. The crystalline structure of deposits was amorphous at the first deposited state but it was changed $Ni-T1-Ni_{5}$ $P_2$ polycrystalline when subjected to 1 hour heat treatment of more than $350^{\circ}C$. TEM observation demonstrated that the microstructure was identical to the result of the XRD at as deposited but it became $Ni-Tl-Ni_{5}$ $P_2$ polycrystalline when heated. And grain size was 10-50nm.

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미세 배선 성형을 위한 전주용 동도금액의 특성 (Characteristics of Copper Plating Solutions for Electroforming of Microcircuit)

  • 박해덕;장도연;강성군
    • 한국재료학회지
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    • 제11권10호
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    • pp.820-832
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    • 2001
  • In order to obtain the basic data on the optimum conditions of electroforming process for fabricating the micro wiring pattern for plate type micro- motor core, characteristics of plating bath and properties of deposits were studied with various copper plating baths which contain sulfate, fluoborate, pyrophosphate and cyanide salt, respectively. Cathodic polarization, throwing power, internal stress, texture and surface morphology of deposits were observed. Throwing power of plating solution is deeply related to the polarization curves and the values are in the range of +20∼20%. The order of values ate as follows- pyrophosphate, cyanide, sulfate and fluoborate bath. Internal stresses of deposits are tensile in all of the copper plating bath. Thickness of the deposits plated at the center of holes has the highest value in the pyrophosphate bath and K factor, ratio of height and width of deposit, is 1.44. It was confirmed that the pyrophosphate bath was the best one for the electroforming of wire pattern.

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