• 제목/요약/키워드: Substrate system

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접촉형 변위센서를 이용한 LCD노광기용 스테이지 시스템 (Stage System for LCD Exposure Equipment Using Touch-type Displacement Sensor)

  • 임광국;서화일;조현찬;김광선;강흥석
    • 반도체디스플레이기술학회지
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    • 제6권1호
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    • pp.7-10
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    • 2007
  • In an effort to reduce weaknesses of existing laser displacement sensor-based system, a sensing device for distance and balance of mask-substrate gap using touch-type displacement sensor was suggested. The device suggested in this study is expected to solve the problems of prices and reflections, by means of a touch-type sensor. LCD exposure equipment stage system including suggested sensing device was realized to assess the characteristics of sensing the balance and gap between mask and substrate. It was verified that a touch-type displacement sensor-based device to adjust the balance and distance of mask-substrate gap suggested in this study can be applicable to LCD expose equipment in practice.

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기질에 따른 미생물 전해 전지-혐기성 소화의 미생물 군집 특성 (Effect of Substrates on the Microbial Communities in a Microbial Electrolysis Cell and Anaerobic Digestion Coupled System)

  • 이채영;한선기
    • 한국수소및신에너지학회논문집
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    • 제30권3호
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    • pp.269-275
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    • 2019
  • This study was conducted to evaluate the microbial communities in coupled system of a microbial electrolysis cell and an anaerobic digestion. Glucose, butyric acid, propionic acid and acetic acid were used as substrates. The maximum methane production and methane production rate of propionic acid respectively were $327.9{\pm}6.7mL\;CH_4/g\;COD$ and $28.3{\pm}3.1mL\;CH_4/g\;COD{\cdot}d$, which were higher than others. Microbial communities' analyses indicated that acetoclastic methangens were predominant in all systems. But the proportion of hydrogenotrophic methanogens was higher in the system using propionic acid as a substrate when compared to others. In coupled system of a microbial electrolysis cell and anaerobic digestion, the methane production was higher as the distribution of hydrogen, which was generated by substrate degradation, and proportion of hydrogenotrophic methanogens was higher.

실험실 규모 Cometabolic Air Sparging 공정 적용 특성 평가 : 토양 내 활성미생물 별 MTBE 분해특성 (Evaluation of the Laboratory-Scale Cometabolic Air Sparging Process : Characterization of Indigeneous Microorganism on MTBE Degradation)

  • 안상우;이시진;장순웅
    • 한국지하수토양환경학회지:지하수토양환경
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    • 제15권1호
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    • pp.1-8
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    • 2010
  • Cometabolic air sparging (CAS) is a new and innovative technology that uses air sparging principles but attempts to optimize in situ contaminant degradation by adding a growth substrate to saturated zone. CAS relies on the degradation of the primary growth substrate and cometabolic substrate transformation in the saturated zone and in the vadose zone for volatilized contaminants. In this study, we have investigated to determine MTBE degradation pattern and microbial activity variation if using propane as a primary substrate at the condition of considering air injection rate and air injection pattern. Laboratory-scale two-dimentional aquifer physical model studies were used and the experimental results were represented that the optimal conditions were as air injection rate of 1,000 mL/min and pulsed air injection pattern (15 min on/off). Over 1,000 mL/min air injection rate and continuous air injection pattern was no affected to increase DO concentration. On the other hand, Injection of propane and propane-utilizing bacteria degraded MTBE partially. And also, injection of propane- and MTBE-utilizing bacteria effectively degraded MTBE and TBA production was observed.

감광성 폴리이미드를 모울드로 이용한 기반층이 없는 선택적 금속 도금에 관한 기초 연구 (A Fundamental Study of Selective Metal Electroplating Without Seed Layers Using a Photosensitive Polyimide as Molds)

  • 안동섭;이상욱;김호성;김용권
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1993년도 정기총회 및 추계학술대회 논문집 학회본부
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    • pp.204-206
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    • 1993
  • In this paper we represented electroplating process without seed layers for making metal micro structures needed for applying terminal voltage for one-to-one cell fusion system. In this system, we need thick insulator and metal structures because the diameter of a cell is approximately $40{\mu}m$. So, we adopted the photo-sensitive polyimide as electroplating molds and structural material. Generally, the processes utilizing the photo-sensitive polyimide as molds have metal seed layers on the substrate as electroplating electrodes and requires wiring tasks to these seed layers. We proposed electroplating process without any seed layer on the Si-substrate and simulated P-N-P (electrode - Si substrate - electrode) junction on N-type silicon substrate. Leakage current from one metal structure to another which arise when terminal voltage is applied can be remarkably decreased by doping Boron in the region to be electroplated.

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펨토초 레이저를 이용한 플렉시블 ITO 패터닝 연구 (Femtosecond laser pattering of ITO film on flexible substrate)

  • 손익부;김영섭;노영철
    • 한국레이저가공학회지
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    • 제13권1호
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    • pp.11-15
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    • 2010
  • Indium tin oxide (ITO) provides high electrical conductivity and transparency in the visible and near IR (infrared) wavelengths. Thus, it is widely used as a transparent electrode for the fabrication of liquid crystal displays (LCDs) and organic light emitting diode displays (OLRDs), photovoltaic devices, and other optical applications. Lasers have been used for removing coating on polymer substrate for flexible display and electronic industry. In selective removal of ITO layer, laser wavelength, pulse energy, scan speed, and the repetition rate of pulses determine conditions, which are efficient for removal of ITO coating without affecting properties of the polymer substrate. ITO coating removal with a laser is more environmentally friendly than other conventional etching methods. In this paper, pattering of ITO film from polymer substrates is described. The Yb:KGW femtosecond laser processing system with a pulse duration of 250fs, a wavelength of 1030nm and a repetition rate of 100kHz was used for removing ITO coating in air. We can remove the ITO coating using a scanner system with various pulse energies and scan speeds. We observed that the amount of debris is minimal through an optical and a confocal microscope, and femtosecond laser pulses with 1030nm wavelength are effective to remove ITO coating without the polymer substrate ablation.

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이중 편파 위상 배열 시스템을 위한 기판 집적 슬롯 배열 안테나 (SIW Slot Array Antenna for Dual-Polarization Phased Array System)

  • 조대근;변진도;이해영
    • 한국전자파학회논문지
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    • 제22권2호
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    • pp.228-235
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    • 2011
  • 본 논문에서는 위상 배열 시스템에서 활용 가능한 $4{\times}8$ 이중 편파 기판 집적 도파관(SIW: Substrate Integrated Waveguide) 슬롯 배열 안테나를 제안한다. 제안된 배열 안테나는 수직 편파 안테나와 수평 편파 안테나로 구성 되어 이중 편파가 가능하며, 수직 편파 안테나는 기존의 기판 집적 도파관을 이용하여 가로 슬롯 선형 안테나를 배열하였으며, 수평 편파 안테나는 half mode 기판 집적 도파관(HMSIW: Half Mode Substrate Integrated Waveguide)을 사용하여 세로 슬롯 선형 안테나를 배열하였다.

기판의 왕복 운동을 이용한 인라인 식각세정장치 내 ITO 식각특성 (ITO Wet Etch Properties in an In-line Wet Etch/Cleaning System by using an Alternating Movement of Substrate)

  • 홍성재;권상직;조의식
    • 한국전기전자재료학회논문지
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    • 제21권8호
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    • pp.715-718
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    • 2008
  • An in-line wet etch/cleaning system was established for the research and development in wet etch process. The system was equipped with a reverse moving system for the reduction in the size of the in-line wet etch/cleaning system and it was possible for the glass substrate to be moved back and forth and alternated in a wet etch bath. For the comparison of the effect of the normal motion and that of the alternating motion on the in-line wet etch process, indium tin oxide(ITO) pattern was obtained through both wet etch process conditions. The results showed that the alternating motion is not inferior to the normal motion in etch rate and in etch uniformity. It is concluded that the alternating motion is possible to be applied to the in-line etch process.

저온실링용 ZnO-V2O5-P2O5계 봉착재의 물성에 미치는 TiO2 의 영향 (Effect of TiO2 on the Properties of ZnO-V2O5-P2O5 Low Temperature Sealing Glasses)

  • 이헌석;황종희;임태영;김진호;이석화;김일원;김남석;김형순
    • 한국재료학회지
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    • 제19권11호
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    • pp.613-618
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    • 2009
  • We designed new compositions for lead free and low temperature sealing glass frit of $ZnO-V_2O_5-P_2O_5$ system, which can be used for PDP (Plasma Display Panel) or other electronic devices. The $ZnO-V_2O_5-P_2O_5$ system can be used as a sealing material at temperatures even lower than 430$^{\circ}C$. This system, however, showed lower bonding strength with glass substrate compared to commercialized Pb based sealing materials. So, we added $TiO_2$ as a promoter for bonding strength. We examined the effect of $TiO_2$ addition on sealing behaviors of $ZnO-V_2O_5-P_2O_5$ glasses with the data for flow button, wetting angle, temporary & permanent residual stress of glass substrate, EPMA analysis of interface between sealing materials and glass substrate, and bonding strength. As a result, sealing characteristics of $ZnO-V_2O_5-P_2O_5$ system glasses were improved with $TiO_2$ addition, but showed a maximum value at 5 mol% $TiO_2$ addition. The reason for improved bonding characteristics was considered to be the chemical interaction between glass substrate and sealing glass, and structural densification of sealing glass itself.

Synthesis of diamond thin films by hot-filament C.V.D

  • 최진일
    • 한국결정성장학회지
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    • 제8권2호
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    • pp.227-232
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    • 1998
  • Si, Mo 등을 substrate로 하고 Hot-Filament C.V.D법으로 저압으로 다이아몬드 박막을 생성시킬 때 탄화수소의 부착과정, 핵생성 및 성장을 조사하였다. 특성은 substrate의 종류, 온도, 압력, 유속 및 $CH_4-H_2$가스의 몰분율과 같은 process 변수로 조사하였으며 다이아몬드는 Ra-man spectroscopy로 측정하였다. 특히 다이아몬드 핵생성과 성장은 scratch와 같은 결함이 있는 곳에 발생하였고 표면확산 등이 핵생성 초기단계에서 중요한 역할을 하였다.

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Effect of substrate bias on electrical property of ZnO films deposited by magnetron sputtering

  • Jin, Hu-Jie;So, Soon-Jin;Park, Choon-Bae
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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    • pp.302-303
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    • 2008
  • Nominally undoped (intrinsic) ZnO thin films were deposited by magnetron sputtering system with utilization of substrate bias on silicon at $450^{\circ}C$. Oxygen gas was selected as sputtering gas. The deposited thins were evaluated with X-ray diffraction (XRD) for their microstructure analysis and Hall effect in Van der Pauw configuration for their electrical property. The XRD shows that the magnitude and polarity of substrate bias significantly influence the microstructure and electrical properties.

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