• 제목/요약/키워드: Substrate stage

검색결과 357건 처리시간 0.022초

기판스테이지 온도에 관한 연구 (A Study on Substrate Stage Temperature)

  • 김선기;이우영;강흥석
    • 반도체디스플레이기술학회지
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    • 제5권4호
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    • pp.35-40
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    • 2006
  • This paper shows that the effect of exposing on the top area and a solution which using a water circulation system. Semiconductor substrate stage is made from Aluminum and is repeated the sequence of exposing (150), turning OFF shutter, taking 30 sec. interval at the top area of stage. So the temperature of substrate temperature rises continuously. On this, we made a waterway at the inner part of the substrate stage and operated a water circulation system. We measured the temperature of a substrate stage surface with a thermocouple attached to the substrate stage. To analyze the top area's temperature, we used Analysis Program ANSYS for analysis and 3D CAD program Solid-Works for modeling.

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A theoritical study on spin coating technique

  • Tyona, M.D.
    • Advances in materials Research
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    • 제2권4호
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    • pp.195-208
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    • 2013
  • A comprehensive theory of the spin coating technique has been reviewed and the basic principles and parameters controlling the process are clearly highlighted, which include spin speed, spin time, acceleration and fume exhaust. The process generally involves four stages: a dispense stage, substrate acceleration stage, a stage of substrate spinning at a constant rate and fluid viscous forces dominate fluid thinning behaviour and a stage of substrate spinning at a constant rate and solvent evaporation dominates the coating thinning behaviour. The study also considered some common thin film defects associated with this technique, which include comet, striation, chucks marks environmental sensitivity and edge effect and possible remedies.

浸漬型 生物膜反應槽에 의한 負荷變動에서의 基質除去에 관한 연구 (A Study of Substrate Removal in Wastewater Flow Variations by Submerged Biofilm Reactor)

  • Nam, Chul-Hyun;Park, Jong-Woong
    • 한국환경보건학회지
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    • 제13권2호
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    • pp.83-90
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    • 1987
  • The objective of this study is to review the basic theories related substrate removal in wastewater flow variations using submerged biofilm reactor. An aerated biofilm reactor is that in which influent organic substrates are aerobically oxidized by the microorganisms of biofilm grown on the surface of submerged media. No sludge is returned, and oxygen is supplied by diffusers. Three types of aerated biofilm reactor are one stage-central aeration, one stageup flow aeration and two stage-side aeration. The orders of substrate removal capacity in wastewater flow variations showed two stage-side aeration, one stage-upflow aeration and one stage-central aeration. The phenonmenon of nonclosing volid in upflow aeration type was superior to these in central-side aeration type. Attached biofilm masses in case of upflow, side and central aeration reactor were 1.0mg/cm$^2$, 4.1 mg/cm$^2$ and 0.93 mg/cm$^2$, respectively. Yield coefficient for biofilm was 0.31 to 0.48. Especially, removal efficiency can be increased remarkably according to the number of biofilm reactor and the packed condition of media.

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FPD용 노광 스테이지의 통합 제어시스템 구현 (Implementation of Exposure Stage Integrated Control System for FPD)

  • 김종원;서재용;조현찬;조태훈;강흥석
    • 반도체디스플레이기술학회지
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    • 제5권4호
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    • pp.11-15
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    • 2006
  • Expose equipment system that is used for manufacturing process of Flat Panel Display, is most important equipment in whole process. Expose equipment that is for making pattern of mask on substrate, consists of optical part, stage part and transport part. The stage is an important part that aligns mask and substrate for delivering pattern of mask to substrate exactly. In this paper, control system of expose stage that is able to use mask and substrate of diverse size, with PC controller using GUI interface instead of PLC control system. The existing PLC control system does not have the suitable structure for using mask of diverse size. GUI interface integration control system is based on PC. So it has the advantage of convenient use and active operation. We embodied PLC control system in integration control system based on PC, and verified utility possibility through the standard test course.

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동시진공증발법을 이용한 Cu(In,Ga)Se2 박막 제작에 관한 연구 (A study on Cu(In,Ga)Se2 thin film fabarication using to co-evaporation)

  • 박정철;추순남
    • 한국정보통신학회논문지
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    • 제16권10호
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    • pp.2273-2279
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    • 2012
  • 동시진공증발법(co-evaporation)으로 Cu(In,Ga)$Se_2$ 박막을 제작하는 논문으로서 1단계($1^{st}$-stage)에서 기판온도(substrate temperature)가 $400^{\circ}C$에서 $In_2Se_3$상($In_2Se_3$ phase)이 존재하였으며 2,3단계($2^{nd}$-stage, $3^{rd}$-stage)에서 기판온도 변화에 따른 흡수 스펙트럼(absorbency spectrum)은 차이가 크지 않다. 이것은 박막의 두께가 전부 $1{\mu}m$ 이상이므로 흡수 스펙트럼(absorbency spectrum)은 거의 차이가 없다. 2,3단계에서 기판온도 변화에 따른 SEM과 XRD를 분석한 결과, 기판온도가 증가할수록 결정구조(crystal structure)의 밀도(density)가 증가하고 기공(vacancy)이 감소하며 $480^{\circ}C$, $500^{\circ}C$에서 Cu(In0.7Ga0.3)$Se_2$상(${\mu}m$)이 형성되었다.

PDP용 수직형 구조의 근접 노광장치 개발 (Development of Proximity Exposure System with Vertical Structure for Plasama Display Panel)

  • 박정규;정수화;이항부
    • 대한기계학회논문집A
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    • 제24권9호
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    • pp.2371-2380
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    • 2000
  • In this paper, we developed the proximity exposure system with the vertical structure of glass and mask stage to minimize the mask's warp caused by the pull of gravity. This system, which canirradiate the ultra violet through 1440 H 850 $\textrm{mm}^2$ and 1330X 1015 $\textrm{mm}^2$ exposure area, has the followingcharacteristics. The glass stage can be inclined by 80 degrees at vertical structure to load substrate withsafety on it. When the glass stage is the vertical state, the gap control, alignment control and exposureof ultra violet are executed. So, it enhances the pattern uniformity by minimizing the mask's warp. Theglass stage can also control the gap between the mask and the substrate by the coarse and fine motioncontrol. The mask stage can adjust the posture of photomask to the position of substrate by imageprecessing method. The galss stage for the gap control and the mask stage for the alignment aredesigned independently for each function.

바위털갯지렁이(Marphysa sanguinea) 유생의 착저와 초기 성장에 미치는 기질 크기 및 유기물 함량 (Effects of Substrate Sizes and Organic Contents on Larval Settlement and Growth in the Early Stage of the Polychaete Marphysa sanguinea)

  • 와와푸;김성균;김창훈
    • 한국수산과학회지
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    • 제53권1호
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    • pp.132-138
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    • 2020
  • Marphysa sanguinea is the most well-known polychaete species with a high economic value. However, this species has a high mortality in the early rearing stage of aquaculture. This study was conducted to find out the optimal substrate size and organic contents for the growth and survival rate of M. sanguinea larvae and juveniles. It was observed that the smaller grain size (<Ø 0.063 mm) and high organic contents (5-10%) induced settlement and reduced settlement time of larvae. Moreover, the growth and survival rate of larvae reached high levels at Ø 0.004-0.016 mm of grain sizes and 5-7.5% of organic contents as advantageous substrates for settlement. The survival rate of juveniles reached over 90% in less than Ø 0.016 mm substrate on 15-day experiment for different grain sizes of substrates. These results indicated that substrate compositions of less than Ø 0.016 mm of sand size and 5-7.5% of organic contents in mud will enhance the productivity of M. sanguinea at the early stage.

이단미생물반응조에서 혼합 VOCs의 생분해 특성 (Biological Removal of a VOC Mixture in a Two-stage Bioreactor)

  • 송지현
    • 한국대기환경학회지
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    • 제22권6호
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    • pp.758-766
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    • 2006
  • A two-stage bioreactor, which consists of a biotrickling filter module and a biofilter module in series, was investigated for the enhanced treatment of a VOC mixture, toluene and methyl ethyl ketone (MEK). Throughout the experiments, the overall inlet loading rate was maintained at approximately $43g/m^3/hr$, but the inlet ratios of the VOCs were modified. The experimental results showed that the different ratios of the VOC mixture resulted in changes of overall removal efficiencies, elimination capacities (ECs) and microbial accumulation on the surface of each packing material. The ratio of inlet toluene to MEK at 50 : 150 was found to be most effective in terms of the overall removal efficiency, because, at this condition, MEK (i.e., the hydrophilic compound) was mostly removed in the biotrickling filter module and the following biofilter module was used to remove toluene. It was also found that when the inlet loading rate of the VOC mixture was serially increased stepwise within short-term periods, the ECs for toluene dropped significantly but the ECs for MEK increased at the ratio of the VOC mixture. These results implied that substrate interaction and/or substrate preferable utilization might have an effect on the biological removal of each compound in the two-stage bioreactor; therefore, the bioreactor should be operated in the condition where the substrate interaction could be minimized in order to maximize overall performance of the two-stage bioreactor.

Ultra-small Form-Factor Helix on Pad-Type Stage-Bypass WCDMA Tx Power Amplifier Using a Chip-Stacking Technique and a Multilayer Substrate

  • Yoo, Chang-Hyun;Kim, Jung-Hyun
    • ETRI Journal
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    • 제32권2호
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    • pp.327-329
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    • 2010
  • A fully integrated small form-factor HBT power amplifier (PA) was developed for UMTS Tx applications. For practical use, the PA was implemented with a well configured bottom dimension, and a CMOS control IC was added to enable/disable the HBT PA. By using helix-on-pad integrated passive device output matching, a chip-stacking technique in the assembly of the CMOS IC, and embedding of the bulky inductive lines in a multilayer substrate, the module size was greatly reduced to 2 mm ${\times}$ 2.2 mm. A stage-bypass technique was used to enhance the efficiency of the PA. The PA showed a low idle current of about 20 mA and a PAE of about15% at an output power of 16 dBm, while showing good linearity over the entire operating power range.

(001) Si에서 $NiSi_2$의 핵생성 초기 상태에 관한 투과전자현미경 연구 (A Transmission Electron Microscopy Study of the Initial Stage of $NiSi_2$ Nucleation on the (001) Si)

  • 이상호;이정용
    • Applied Microscopy
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    • 제24권4호
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    • pp.123-131
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    • 1994
  • In this study the initial stage nucleation and growth of Ni silicide on (001) Si by evaporation and furnace annealing have been investigated by transmission electron microscopy. The pressure was $10^{-6}$ Torr during evaporation and annealing. And the annealing temperature to produce $NiSi_2\;was\;800^{\circ}C$. From the evaporated film, $NiSi_2$ nucleus has grown into Si substrate with an epitaxial orientation relationship. Interfaces between $NiSi_2$ and Si were A-type {111} interfaces and {100} $NiSi_2$ interfaces were also observed at the initial stage of nucleation. Ni silicide grew into Si substrate, but the nucleus partly grew into the evaporated film, with no facets, from the nuclei in the Si substrate. $NiSi_2$ nucleus with (111) habit planes was also observed.

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