• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제40회 동계학술대회 초록집
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• pp.185-185
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• 2011

ZnTe semiconductor is very attractive materials for optoelectronic devices in the visible green spectral region because of it has direct bandgap of 2.26 eV. The prototypes of ZnTe light emitting diodes (LEDs) have been reported [1], showing that their green emission peak closely matches the most sensitive region of the human eye. Another application to photovoltaics proved that ZnTe is useful for the production of high-efficiency multi-junction solar cells [2,3]. By using the pulse laser deposition system, ZnTe thin films were deposited on ZnO thin layer, which is grown on (0001) Al2O3substrates. To produce the plasma plume from an ablated ZnO and ZnTe target, a pulsed (10 Hz) YGA:Nd laser with energy density of 95 mJ/$cm^2$ and wavelength of 266 nm by a nonlinear fourth harmonic generator was used. The laser spot focused on the surface of the ZnO and ZnTe target by using an optical lens was approximately 1 mm2. The base pressure of the chamber was kept at a pressure around $10^{-6}$ Torr by using a turbo molecular pump. The oxygen gas flow was controlled around 3 sccm by using a mass flow controller system. During the ZnTe deposition, the substrate temperature was $400^{\circ}C$ and the ambient gas pressure was $10^{-2}$ Torr. The structural properties of the samples were analyzed by XRD measurement. The optical properties were investigated by using the photoluminescence spectra obtained with a 325 nm wavelength He-Cd laser. The film surface and carrier concentration were analyzed by an atomic force microscope and Hall measurement system.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제40회 동계학술대회 초록집
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• pp.436-436
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• 2011

Recently, spintronic devices with submicron structures are widely investigated to take advantage of their unique micromagnetic properties. In this work, we study the temperature dependence of exchange bias in bilayer anti-dot arrays made by depositing Co (40 nm)/Ni (5 nm) ferromagnetic bilayer on Si substrate to form anti-dot arrays with a diameter $1{\mu}m$. The anti-dot patterning was done only for the upper Co layer, while the Ni underlayer was kept unperforated. The temperature dependences of magnetoresistance (MR) and exchange bias were studied along magnetic easy and hard axes. The in-plane MR measurements were performed using a physical-property measurement system (PPMS ; Quantum Design Inc.) at various temperatures. The standard in-line four-point probe configuration was used for the electrical contacts. As temperature was varied, the MR data were obtained in which in-plane field (H=3 kOe) was applied in the directions along the hard and the easy axes with respect to the lattice plane. The temperature dependences of magnetic anisotropy and exchange bias were also studied along the magnetic easy and hard axes. As temperature decreases, the single peak splits into two peaks. While no exchange bias was observed along the magnetic easy axis, the exchange bias field steadily increased with decreasing temperature along the magnetic hard axis. These results were interpreted in connection with the magnetic anisotropy and the effect of the anti-dots in pinning domain wall motion along the respective direction.

• 한국재료학회지
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• 제13권9호
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• pp.587-592
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• 2003

The thin films of 316L stainless steel were made on glass and S45C substrate by Ion beam assisted deposition with reactive atmosphere of argon and nitrogen. The films were deposited at the various conditions of ion beam power and the ratios of Ar/$N_2$gas. Properties of these films were analyzed by glancing x-ray diffraction method(GXRD), AES, potentiodynamic test, and salt spray test. The results of GXRD showed that austenite phase could be appeared by $N_2$ion beam treatment and the amount of austenite phase increased with the amount of nitrogen gas. The films without plasma ion source treatment had the weak diffraction peak of ferrite phase. But under the Ar plasma ion beam treatment, the strong diffraction peaks of ferrite phase were appeared and the grain size was increased from 12 to 16 nm. Potentiodynamic polarization test and salt spray test indicated that the corrosion properties of the STS 316L films with nitrogen ion source treatment were better than bulk STS 316L steel and STS 316L films with Ar ion source treatment.

• 열처리공학회지
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• 제24권1호
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• pp.31-36
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• 2011

$TiO_2$ films were deposited on a glass substrate with RF magnetron sputtering and then surface of $TiO_2$ films were electron beam irradiated in a vacuum condition to investigate the effect of electron bombardment on the thin film crystallization, surface roughness and gas sensitivity for hydrogen. $TiO_2$ films that electron beam irradiated at 450eV were amorphous phase, while the films irradiated at 900 eV show the anatase (101) diffraction peak in XRD pattern. AFM measurements show that the roughness is depend on the electron irradiation energy. As increase the hydrogen gas concentration and operation temperature, the gas sensitivity of $TiO_2$ and $TiO_2$/ZnO films is increased proportionally and $TiO_2$ films that electron beam irradiated at 900 eV show the higher sensitivity than the films were irradiated at 450eV. From the XRD pattern and AFM observation, it is supposed that the crystallization and rough surface promote the hydrogen gas sensitivity of $TiO_2$ films.

• 센서학회지
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• 제11권3호
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• pp.183-190
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• 2002

실리콘 기판 위에 형성한 열산화막에 실리콘이온을 주입하고 열처리를 수행한 후, 광루미네센스(photoluminescence:PL) 스펙트럼을 조사하였다. 실리콘 이온도즈의 변화와 열처리 온도의 변화에 따른 PL스펙트럼을 조사하고, 이를 TEM과 XRD 데이터와 비교하여 분석한 결과, 광루미네센스 특성은 산화막내의 실리콘 나노결정으로부터 기인함을 알 수 있었다. 또 산화막을 1분 간격으로 습식 식각하면서 매 식각 시마다 PL스펙트럼을 관측하여 그 변화를 조사하였다. 이러한 실험을 통하여 산화막내에 분포하고 있는 실리콘 나노결정의 크기와 그 수가 PL피크 파장과 강도에 직접적으로 영향을 줌을 알 수 있었다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 추계학술대회 논문집 Vol.15
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• pp.159-162
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• 2002

Ferroelectric $YMnO_{3}$ thin films were etched with $Ar/Cl_{2}$ and $CF_{4}/Cl_{2}$ inductivly coupled plasma (ICP). The maximum etch rate of $YMnO_{3}$ thin film was $300{\AA}/min$ at a $Ar/Cl_{2}$ gas mixing ratio of 2/8, a RF power of 800 W, a dc bias of 200 V, a chamber pressure of 15 mTorr, and a substrate temperature of ${30^{\circ}C}$. From the X-ray photoelectron spectroscopy (XPS) analysis ， yttrium not only etched by chemical reactions with Cl radicals, but also assisted by Ar ion bombardments in $Ar/Cl_{2}$ plasma. In $CF_{4}/Cl_{2}$ plasma, yttrium are remained on the etched surface of $YMnO_{3}$ and formed of nonvolatile YFx compounds Manganese etched effectively by chemical reactions with Cl and F radicals. From the X-ray diffraction (XRD) analysis, the (0004) diffraction peak intensity of the $YMnO_{3}$ thin film etched in $Ar/Cl_{2}$ plasma shows lower value than that in $CF_{4}/Cl_{2}$ plasma. It is indicates that the crystallinty of $YMnO_{3}$ thin film is more easily damaged by the Ar ion bombardment than the changes of stoichiometry due to nonvolatile etch by-products.

• 한국패류학회지
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• 제6권1호
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• pp.1-10
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• 1990

The occurrence of the larvae, the size of the spats daily attached to the collectors, the difference of the spat size with temperature, and the darly growth of a mussel, Mytilus edulis, were investigated at the off Songpo, Chinhae Bay, the southern part of Korea during the period from March 1 to August 30 in 1986. The water timperature and specific gravity ranged from 7.0 $^{\circ}C$ to 27.4$^{\circ}C$ (mean 17,24$\pm$5.9$0^{\circ}C$), and from 1.0126 to 1.0126(mean, 1.0242$\pm$0.0023), respectively. D-shaped larvae had two peak occurrences in March 8, April 19, Umbo-shaped larvad three peaks in March 8, April 21 and June 17, and full grown larvae two peaks in May 13 and June 23, respectively. Therefore, it is assumed that the mussel had two mass spawning time in early March and mid April and two mass settling time in mid May and alte June. The maximum size of the planktonic mussel larvae ranged from 375-400${\mu}{\textrm}{m}$ and most larvae sizing below 300${\mu}{\textrm}{m}$ long settled in adquate substrate. Spats just after settlement had the range from 26.5 to 547.3${\mu}{\textrm}{m}$ with the minimum of 225.0 ${\mu}{\textrm}{m}$ in mean shell length. The spats settled in summer season, when the water temperature raised above $25^{\circ}C$, were smaller than those settled in spring season in mean shell length. The early growth of the mussel spat had been assumed considerably fast.

• Current Optics and Photonics
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• 제1권2호
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• pp.143-149
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• 2017

LED arrays with pixel numbers of $3{\times}3$, $4{\times}4$, and $5{\times}5$ have been studied in this paper in order to enhance the optical output power and decrease heat dissipation of an AlGaInP-based light emitting diode display device (pixel size of $280{\times}280{\mu}m$) fabricated by micro-opto-electro-mechanical systems. Simulation results showed that the thermal resistances of the $3{\times}3$, $4{\times}4$, $5{\times}5$ arrays were $52^{\circ}C/W$, $69.7^{\circ}C/W$, and $84.3^{\circ}C/W$. The junction temperature was calculated by the peak wavelength shift method, which showed that the maximum value appears at the center pixel due to thermal crosstalk from neighboring pixels. The central temperature would be minimized with $40{\mu}m$ pixel pitch and $150{\mu}m$ substrate thickness as calculated by thermal modeling using finite element analysis. The modeling can be used to optimize parameters of highly integrated AlGaInP-based LED arrays fabricated by micro-opto-electro-mechanical systems technology.

• 대한화학회지
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• 제37권12호
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• pp.1068-1075
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• 1993

토마토(Lycopersicum esculentum)를 파종하여 1년간 성장시키면서 성장기간에 따른 잎과 뿌리의 catalase 활성 변화를 측정하였다. 뿌리에 있어서의 catalase 활성은 잎의 경우에 비해 전반적으로 매우 미약하였다. 반면에 잎의 catalase 활성은 매우 현저한 변화 양상을 나타냈는데 주로 peroxisomal 분획에 존재하였고 특히 발아 후 2주 이내의 발아초기에 76 ${\mu}mol$/ml/min의 최고 활성은 기점으로 하여 급격히 감소했다가 성장기 4 ∼ 5 개월에 즈음하여 상당히 증가된 활성을 보였으며 11 ∼ 12개월째 노화기에 가장 저조한 활성을 보였다. 이와 같이 성장시기에 따라서 변화하는 catalase 활성에 영향을 미치는 인자로서 첫째 발아기에는 glyoxylate cycle과 $\beta$-oxidation이 일어나는 glyoxisomal 반응 그리고 둘째 발아기 이후에는 광합성 반응이 각각 해당시기에 $H_2O_2$를 발생시키는 반응으로 작용할 것으로 간주된다. 이 외에도 NADPH는 불활성화된 catalase(compound II)를 다시 활성화시켜 해로운 기질인 $H_2O_2$로부터 catalase 보호제로서의 역할을 함으로써 토마토의 생장기간 전체에 걸쳐 작용하는 것으로 나타났다.

• 한국재료학회지
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• 제23권10호
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• pp.580-585
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• 2013

To observe the formation of defects at the interface between an oxide semiconductor and $SiO_2$, ZnO was prepared on $SiO_2$ with various oxygen gas flow rates by RF magnetron sputtering deposition. The crystallinity of ZnO depends on the characteristic of the surface of the substrate. The crystallinity of ZnO on a Si wafer increased due to the activation of ionic interactions after an annealing process, whereas that of ZnO on $SiO_2$ changed due to the various types of defects which had formed as a result of the deposition conditions and the annealing process. To observe the chemical shift to understand of defect deformations at the interface between the ZnO and $SiO_2$, the O 1s electron spectra were convoluted into three sub-peaks by a Gaussian fitting. The O 1s electron spectra consisted of three peaks as metal oxygen (at 530.5 eV), $O^{2-}$ ions in an oxygen-deficient region (at 531.66 eV) and OH bonding (at 532.5 eV). In view of the crystallinity from the peak (103) in the XRD pattern, the metal oxygen increased with a decrease in the crystallinity. However, the low FWHM (full width at half maximum) at the (103) plane caused by the high crystallinity depended on the increment of the oxygen vacancies at 531.66 eV due to the generation of $O^{2-}$ ions in the oxygen-deficient region formed by thermal activation energy.