• Title/Summary/Keyword: Substrate angle

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NUMERICAL STUDY OF DROPLET IMPACT AND MERGING PROCESSES ON A FLAT SUBSTRATE WITH CONTACT ANGLE HYSTERESIS (동접촉각 이력 효과를 포함한 평판 위에서 액적의 충돌 및 결합 현상에 대한 수치적 연구)

  • Lee, W.;Son, G.
    • 한국전산유체공학회:학술대회논문집
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    • 2009.11a
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    • pp.103-108
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    • 2009
  • The droplet impact and merging process on a flat substrate with contact angle hysteresis is numerically studied. The droplet deformation is determined by an improved level-set method employing a sharp-interface technique for the stress condition at the liquid-gas interface and the contact angle condition at the liquid-gas-solid interline. Based on the computations, the droplet impact and merging pattern is investigated to find the optimal condition in manufacturing a micro-line. The effects of dynamic contact angles and droplet spacing on droplet motion are quantified.

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Liquid Crystal Alignment Effect with in-situ Photoalignment on Plastic Substrates (플라스틱 기판을 이용한 in-situ 광배향법에 의한 액정배향 효과)

  • Hwang, Jeoung-Yeon;Nam, Ki-Hyung;Kim, Jong-Hwan;Kim, Kang-Woo;Seo, Dae-Shik
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.11a
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    • pp.80-83
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    • 2003
  • We have investigated the generation of pretilt angle for a nematic liquid crystal (NLC) alignment with in-situ photoalignment method on polyimide (PI) surfaces using thin plastic substrates. The LC aligning capabilities and pretilt angle of the thin plastic substrates by in-situ photoalignment method were better than that of the glass substrate by general photoalignment. Also, the LC pretilt angle increased with increasing healing temperature and exposure time.

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Control of Contact Angle by Surface Treatment using Sanning Plasma Method (주사 플라즈마 법(SPM)을 이용한 소수성 표면처리)

  • Kim, Young-Gi;Choi, Byoung-Jung;Yang, Sung-Chae
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.23 no.1
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    • pp.10-13
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    • 2010
  • The plasma processing technologies of thin film deposition and surface treatment technique have been applied to many industrial fields. This study is purposed Large-area uniformity and surface treatment on the stainless substrate. We treat surface of stainless by $CF_4$ plasma. $CF_4$ plasma is generated by using SPM(Scanning plasma method)which is kind a of CVD. Generally, SPM has been used for uniform surface treatment using a crossed electromagnetic field. The optimum discharge condition has been studied for the gas pressure, the magnetic flux density and the distance between substrate and electrodes. In result, contact angle is increased by surface treatment using $CF_4$ Plasma. Therefore we expect that SPM to control contact angle is applied to many industries.

Water Contact Angles of Graphene Transferred by Wet and Dry Transfer Methods (전사 방법에 따른 그래핀의 물 접촉각 변화)

  • Yoon, Min-Ah;Kim, Chan;Jung, Hyun-June;Kim, Jae-Hyun;Kim, Kwang-Seop
    • Tribology and Lubricants
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    • v.34 no.2
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    • pp.60-66
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    • 2018
  • Graphene is a monolayer of carbon atoms (approximately 0.34 nm), arranged in a honeycomb network. It has been hailed as a next-generation flexible and transparent material because it has high electrical and thermal conductivities, excellent mechanical properties, as well as flexible and transparent properties. The wettability of graphene alters its adhesion or surface energy, and it is therefore an important parameter influencing its application in the fabrication of next-generation flexible and transparent electronics. Studies on the wettability of graphene are numerous and various opinions exist. However, almost all of these studies use the wet transfer method to transfer the graphene. In this study, therefore, we investigated the effect of wet and dry transfer methods on water contact angles of graphene on a substrate. The contact angles of substrates vary depending on the type of substrate. It was found that after graphene is transferred to the substrate, regardless of transfer method, the graphene/substrate contact angle increases to a value. The contact angle of graphene transferred using the dry transfer method is higher than the contact angle of graphene transferred using wet transfer methods. The wet transferred graphene is affected by the poly(methyl methacrylate) (PMMA) residue and the polar surface of substrate. The dry transferred graphene is influenced by the conformal contact between graphene and substrate.

New Analysis Approach to the Characteristics of Excimer Laser Annealed Polycrystalline Si Thin Film by use of the Angle wrapping (엑시며 레이저에 의해 형성된 다결정 실리콘 박막의 Angle wrapping에 의한 깊이에 따른 특성변화)

  • Lee, Chang-U;Go, Seok-Jung
    • Korean Journal of Materials Research
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    • v.8 no.10
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    • pp.884-889
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    • 1998
  • Amorphous silicon films of large area have been crystallized by a line shape excimer laser beam of one dimensional scanning with a gaussian profile in the scanning direction. In order to characterize the crystalline phase transition of thickness variables in excimer laser annealing(ELA), angle wrapping method was used. And also to characterize the residual stresses of crystalline phase transition in the case of angle wrapped-crystalline silicon on corning 7059 glass, polarized raman spectroscopies were measured at various laser energy density and substrate temperature. The residual stress varies from $9.0{\times}10^9$ to $9.9{\times}10^9$, and from $9.9{\times}10^9$ to $1.2{\times}10^10$dyne/${cm}^2$ of the substrate temperature at room temperature and varies from $8.1{\times}10^9$ to $9.0{\times}10^9$, and from $9.0{\times}10^9$ to $9.9{\times}10^9$dyne/${cm}^2$ of the substrate temperature at $400^{\circ}C$ as a function of direction from surface to substrate. According to the direction from the surface in liquid phase to the interface and from the interface to near the substrate in solid phase of recrystallized Si thin film, respectively. Thus, the stress is increased from(Liquid phase to solid phase) with phase transition.

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Effect of Plasma Treatment on Adhesion Strength between Underfill and Substrate (플라즈마 처리에 따른 언더필과 기판 사이의 접착 강도에 관한 연구)

  • No Bo-In;Jeong Seung-Bu
    • Proceedings of the KWS Conference
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    • 2006.05a
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    • pp.13-15
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    • 2006
  • The effects of plasma treatment on the surfaces of the FR-4 (Flame Resistant-4) and copper substrates are investigated in terms of X-ray photoelectron spectroscopy (XPS), contact angle, and atomic force microscopy (AFM). The adhesion strengths of the underfills/FR-4 substrate and underfills/copper substrate are also studied. As experimental results, the plasma treatments of FR-4 and copper substrate surfaces yield several oxygen complexes in hydrophilic surfaces, which can play an important role in increasing the surface polarity, wettability, and adhesion characteristics of the underfills/substrates.

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Gapped Nearly Free-Standing Graphene on an SiC(0001) Substrate Induced by Manganese Atoms

  • Hwang, Jinwoong;Lee, Ji-Eun;Kang, Minhee;Park, Byeong-Gyu;Denlinger, Jonathan;Mo, Sung-Kwan;Hwang, Choongyu
    • Applied Science and Convergence Technology
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    • v.27 no.5
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    • pp.90-94
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    • 2018
  • The electron band structure of manganese-adsorbed graphene on an SiC(0001) substrate has been studied using angle-resolved photoemission spectroscopy. Upon introducing manganese atoms, the conduction band of graphene, that is observed in pristine graphene indicating intrinsic electron-doping by the substrate, completely disappears and the valence band maximum is observed at 0.4 eV below Fermi energy. At the same time, the slope of the valence band decreases by the presence of manganese atoms, approaching the electron band structure calculated using the local density approximation method. The former provides experimental evidence of the formation of nearly free-standing graphene on an SiC substrate, concomitant with a metal-to-insulator transition. The latter suggests that its electronic correlations are efficiently screened, suggesting that the dielectric property of the substrate is modified by manganese atoms and indicating that electronic correlations in grpahene can also be tuned by foreign atoms. These results pave the way for promising device application using graphene that is semiconducting and charge neutral.

The Method and Apparatus for Photoresist Spray Coating with High Temperature Rotational Chuck (고온 회전 척을 구비한 포토레지스트 Spray Coating 방법 및 장치)

  • Park, Tae-Gyu;Kim, Jun-Tae;Kim, Kook-Jin;Suk, Chang-Gil
    • Proceedings of the KIEE Conference
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    • 2003.10a
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    • pp.42-44
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    • 2003
  • The paper presents the method and apparatus for conformal photoresist spray coating on the 3D structured substrate. The system consists of a high-temperature-rotational chuck, ultrasonic spray nozzle module, angle control module and nozzle moving module. The coating uniformity is acquired by controlling the moving speed of the ultrasonic spray nozzle across the substrate which is rotated constantly. To coat the photoresist conformally the spray angle of the nozzle and the temperature of the substrate are controlled during spray coating. The rotational chuck can be heated up by hot air or $N_2$. The photoresist (AZ1512) has been coated on the 3D structured wafer by spray coating system and the characteristics have been evaluated.

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Electro-optical Characteristics on the Rubbing-aligned Flexible Liquid Crystal Display (러빙처리된 플렉시블 액정표시소자의 전기광학특성)

  • 남기형;황정연;김종환;서대식
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.17 no.8
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    • pp.866-870
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    • 2004
  • We have investigated the generation of pretilt angle for a nematic liquid crystal (NLC) alignment with rubbing alignment method on polyimide surfaces using plastic substrates. It was found that monodomain alignment of NLC is obtained with rubbing alignment method on polyimide surfaces using thin plastic substrates. The NLC pretilt angles on thin plastic substrates generated higher than that on glass substrate. Also, EO characteristics of the TN-LCD with a rubbed PI surface based on polymer substrate are almost the same as that of the TN-LCD with a rubbed PI surface based on glass. However, the transmittances of the TN-LCD with a rubbed PI surface based on polymer is less than that with a rubbed PI surface based on g1ass.

Surface Property of PET Fabric Treated with $CF_4$ Plasma and $C_2F_6$ Plasma (플루오르 화합물을 플라즈마 처리한 PET 직물의 표면특성)

  • 김태년;모상영
    • Textile Coloration and Finishing
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    • v.11 no.1
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    • pp.25-33
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    • 1999
  • PET fabric was grafted with $CF_4$ or $C_2F_6$ plasmas generated by glow discharge. The water repellency of plasma-treated fabrics were evaluated with contact angle meter. The change in surface morphologies was observed by SEM, and the change of surface chemical characteristics were analyzed by FT-IR, ESCA and microchemical analysis technique. The results obtained are as follows : 1) The contact angle of plasma-treated fabric was over $150^\circ{C}$. 2) It was observed by SEM that the surface of treated substrate was over coated with thin film formed by the fluorocarbon plasma treatment. 3) According to ESCA analysis, there were prevailing -CHF-, $-CF_2$- and a little $-CF_3$ components on fluorocarbon plasma treated substrate. -CHF- and $-CF_2$- components were reduced by washing, and $-CF_2$- component was recovered by heat treatment. 4) In consideration of quantitative analysis of fluorine and F/C ratio by ESCA, we found that fluorination reached to the inner of substrate.

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