• Title/Summary/Keyword: Sputter gas

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Field emission properties of Ag-Cu-alloy coated CNT-emitters (Ag-Cu합금 코팅된 탄소나노튜브의 전계방출 특성)

  • Lee, Seung-Youb;Ryul, Dong-Heon;Hong, Jun-Yong;Yeom, Min-Hyeng;Yang, Ji-Hoon;Choi, Won-Chel;Kwon, Myeng-Hoi;Park, Chong-Yun
    • Journal of the Korean Vacuum Society
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    • v.16 no.4
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    • pp.291-297
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    • 2007
  • The field emission properties of CNT-emitters coated with Ag-Cu alloy have been investigated. The vertical aligned multi-walled CNTs were synthesized by dc-plasma enhanced chemical vapor deposition (dc-PECVD) and the Ag-Cu alloy was coated by using dc-magnetron sputter. The morphology of alloy-coated and un-coated CNT-emitters was observed by using SEM and their field emission properties were also measured. Annealing the AgCu-coated CNTs at temperature more than ${\sim}700^{\circ}C$, the Ag-Cu alloy was diffused to and aggregated on the top of the CNT as a Q-tip. A significant progress on the field emission was not observed with coating Ag-Cu alloy on the CNTs, but a certain improvement in a resistance against oxygen gas was made confirmation. It seems to be due to inertness of Ag-Cu alloy on the CNTs.

Colossal Resistivity Change of Polycrystalline NiO Thin Film Deposited by RF Magnetron Sputtering (RF 마그네트론 스퍼터 방법에 의한 다결정 NiO 박막의 비저항 변화)

  • Kim, Youmg-Eun;No, Young-Soo;Park, Dong-Hee;Choi, Ji-Won;Chae, Keun-Hwa;Kim, Tae-Hwan;Choi, Won-Kook
    • Journal of the Korean Vacuum Society
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    • v.19 no.6
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    • pp.475-482
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    • 2010
  • Polycrystalline NiO thin films were deposited on glass substrate by RF magnetron sputtering using only Ar as a plasma sputter gas. based on the analysis of x-ray diffraction (XRD), NiO films had a polycrystalline cubic (NaCl type) structure. NiO thin films grown below and above $200^{\circ}C$ showed preferred orientation of (111) and (220) respectively. It showed colossal change in electrical resistivity as much a ${\sim}10^7$ order form an insulating state of $105\;{\Omega}cm$ below $200^{\circ}C$ to a conducting state of $10^{-2}{\sim}10^{-1}\;{\Omega}cm$ above $300^{\circ}C$ such a Mott metal-insulator transition (MIT) in polycrystalline.

Cu2ZnSn(S,Se)4 Thin Film Solar Cells Fabricated by Sulfurization of Stacked Precursors Prepared Using Sputtering Process

  • Gang, Myeng Gil;Shin, Seung Wook;Lee, Jeong Yong;Kim, Jin Hyeok
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.08a
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    • pp.97-97
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    • 2013
  • Recently, Cu2ZnSn(S,Se)4 (CZTSS), which is one of the In- and Ga- free absorber materials, has been attracted considerable attention as a new candidate for use as an absorber material in thin film solar cells. The CZTSS-based absorber material has outstanding characteristics such as band gap energy of 1.0 eV to 1.5 eV, high absorption coefficient on the order of 104 cm-1, and high theoretical conversion efficiency of 32.2% in thin film solar cells. Despite these promising characteristics, research into CZTSS based thin film solar cells is still incomprehensive and related reports are quite few compared to those for CIGS thin film solar cells, which show high efficiency of over 20%. I will briefly overview the recent technological development of CZTSS thin film solar cells and then introduce our research results mainly related to sputter based process. CZTSS thin film solar cells are prepared by sulfurization of stacked both metallic and sulfide precursors. Sulfurization process was performed in both furnace annealing system and rapid thermal processing system using S powder as well as 5% diluted H2S gas source at various annealing temperatures ranging from $520^{\circ}C$ to $580^{\circ}C$. Structural, optical, microstructural, and electrical properties of absorber layers were characterized using XRD, SEM, TEM, UV-Vis spectroscopy, Hall-measurement, TRPL, etc. The effects of processing parameters, such as composition ratio, sulfurization pressure, and sulfurization temperature on the properties of CZTSS absorber layers will be discussed in detail. CZTSS thin film solar cell fabricated using metallic precursors shows maximum cell efficiency of 6.9% with Jsc of 25.2 mA/cm2, Voc of 469 mV, and fill factor of 59.1% and CZTS thin film solar cell using sulfide precursors shows that of 4.5% with Jsc of 19.8 mA/cm2, Voc of 492 mV, and fill factor of 46.2%. In addition, other research activities in our lab related to the formation of CZTS absorber layers using solution based processes such as electro-deposition, chemical solution deposition, nano-particle formation will be introduced briefly.

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Properties of Indium Tin Oxide Thin Films According to Oxygen Flow Rates by γ-FIB System (γ-FIB 시스템을 이용한 산소 유량 변화에 따른 산화인듐주석 박막의 특성 연구)

  • Kim, D.H.;Son, C.H.;Yun, M.S.;Lee, K.A.;Jo, T.H.;Seo, I.W.;Uhm, H.S.;Kim, I.T.;Choi, E.H.;Cho, G.S.;Kwon, G.C.
    • Journal of the Korean Vacuum Society
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    • v.21 no.6
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    • pp.333-341
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    • 2012
  • Indium Tin Oxide (ITO) thin films were prepared by RF magnetron sputtering with different flow rates of $O_2$ gas from 0 to 12 sccm. Electrical and optical properties of these films were characterized and analyzed. ITO deposited on soda lime glass and RF power was 2 kW, frequency was 13.56 MHz, and working pressure was $1.0{\times}10^{-3}$ Torr, Ar gas was fixed at 1,000 sccm. The transmittance was measured at 300~1,100 nm ranges by using Photovoltaic analysis system. Electrical properties were measured by Hall measurement system. ITO thin films surface were measured by Scanning electron microscope. Atomic force microscope surface roughness scan for ITO thin films. ITO thin films secondary electron emission coefficient(${\gamma}$) was measured by ${\gamma}$-Focused ion beam. The resistivity is about $2.4{\times}10^{-4}{\Omega}{\cdot}cm$ and the weighted average transmittance is about 84.93% at 3 sccm oxygen flow rate. Also, we investigated Work-function of ITO thin films by using Auger neutralization mechanism according to secondary electron emission coefficient(${\gamma}$) values. We confirmed secondary electron emission peak at 3 sccm oxygen flow rate.