• Title/Summary/Keyword: Spectroscopic temperature

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Spectroscopic Studies on Pu(III) Hydrolysis Under Reducing and Elevated Temperatures Conditions

  • Cho, Hye-Ryun;Kim, Hee Kyung;Jung, Euo Chang;Cha, Wansik
    • Proceedings of the Korean Radioactive Waste Society Conference
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    • 2017.10a
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    • pp.137-138
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    • 2017
  • The spectroscopic reference data for plutonium at different temperatures are necessary information for the chemical speciation and evaluation of thermodynamic data at elevated temperature. This work is the initial step to extend research activities for understanding the plutonium chemistry in aquatic solutions at high temperature. The hydrolysis of Pu(III) and the solubility of Pu(III) hydroxide at the elevated temperature will be discussed.

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Temperature Distribution Measurement of High-pressure Mercury Lamp using Spectroscopic Method (분광 분석법에 의한 고압 수은등의 온도분포 측정)

  • 김상용;김창섭;지철근
    • Proceedings of the Korean Institute of IIIuminating and Electrical Installation Engineers Conference
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    • 1989.10a
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    • pp.13-18
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    • 1989
  • Temperature distribution of 250W high-pressure mercury lamp has been measured by the spectroscopic method using relative intensities of spectral lines. To obtain radial temperature distribution, the measured intensity which was integrated along the line of sight was transformed into radial line intensity by Abel's inversion. Temperature was determined from relative intensities of spectral lines of the same atomic species. The measured temperature of 250W high-pressure mercury lamp is 6000K at the axis. In this experiment temperature profile of high-pressure arc is papabolic as known.

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Spectroscopic Measurement of Temperature Distribution in Some Plasma Jets (분광학적 방법에 의한 Plasma Jet의 온도분석 측정)

  • 전춘생;박용관;임명선
    • 전기의세계
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    • v.26 no.2
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    • pp.104-110
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    • 1977
  • This paper investigates temperature distribution of plasma jets which used argon gas, and nitrogen gas mixed with argon as working fluids in spectroscopic method, and studies correlations between them main results are as follows; 1) The temperature at the center of plasma jet increases with are current and gas flow, and decreases with magnetic flux density along the axial direction. 2) The changing rate of temperature of plasma jet in the radial direction decreases rapidly beyond 2mm from central axis. 3) Temperature drop rate of plasma jet in the central axis direction appears most apparant beyond 13mm above the nozzle exit. 4) When argon gas mixed with a small amount of nitrogen, plasma temperature increases at same are current compared with the case of argon gas only.

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Optical Properties of High-k Gate Oxides Obtained by Spectroscopic Ellipsometer (분광 타원계측기를 이용한 고굴절률 게이트 산화막의 광물성 분석)

  • Cho, Yong-Jai;Cho, Hyun-Mo;Lee, Yun-Woo;Nam, Seung-Hoon
    • Proceedings of the KSME Conference
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    • 2003.11a
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    • pp.1932-1938
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    • 2003
  • We have applied spectroscopic ellipsometry to investigate $high-{\kappa}$ dielectric thin films and correlate their optical properties with fabrication processes, in particular, with high temperature annealing. The use of high-k dielectrics such as $HfO_{2}$, $Ta_{2}O_{5}$, $TiO_{2}$, and $ZrO_{2}$ as the replacement for $SiO_{2}$ as the gate dielectric in CMOS devices has received much attention recently due to its high dielectric constant. From the characteristics found in the pseudo-dielectric functions or the Tauc-Lorentz dispersions, the optical properties such as optical band gap, polycrystallization, and optical density will be discussed.

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The Spectroscopic Ellipsometry Application to the Diamond Thin Film Growth Using Carbon Monoxide(CO) as a Carbon Source (탄소의 원료로 일산화탄소를 사용한 다이아몬드 박막 성장 관찰에 대한 분광 Ellipsometry의 응용)

  • 홍병유
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.11 no.5
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    • pp.371-377
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    • 1998
  • The plasma chemical vapor deposition is one of the most utilized techniques for the diamond growth. As the applications of diamond thin films prepared by plasma chemical vapor deposition(CVD) techniques become more demanding, improved fine-tuning and control of the process are required. The important parameters in diamond film deposition include the substrate temperature, $CO/H_2$gas flow ratio, total gas pressure, and gas excitation power. With the spectroscopic ellipsometry, the substrate temperature as well as the various parameters of the film can be determined without the physical contact and the destructiveness under the extreme environment associated with the diamond film deposition. Through this paper, the important parameters during the diamond film growth using $CO+H_2$are determined and it is shown that $sp^2$ C in the diamond film is greatly reduced.

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Real-time Spectroscopic Ellipsometry studies of the Effect of Preparation Parameters on the Coalescence Characteristics of Microwave-PECVD Diamond Films

  • Hong, Byungyou
    • Proceedings of the Korea Association of Crystal Growth Conference
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    • 1998.06a
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    • pp.49-54
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    • 1998
  • The growth of diamond films in plasma enhanced chemical vapor deposition(PECVD) processes requires high substrate temperatures and gas pressures, as well as high-power excitation of the gas source. Thus determining the substrate temperature in this severe environment is a challenge. The issue is a critical one since substrate temperature is a key parameter for understanding and optimizing diamond film growth. The precise Si substrate temperature calibration based on rapid-scanning spectroscopic ellipsometry have been developed and utilized. Using the true temperature of the top 200 ${\AA}$ of the Si substrate under diamond growth conditions, real time spectroellipsometry (RTSE) has been performed during the nucleation and growth of nanocrystallind thin films prepared by PECVD. RTSE shows that a significant volume fraction of nondiamond(or{{{{ {sp }^{2 } -bonded}}}}) carbon forms during thin film coalescence and is trapped near the substrate interface between ∼300 ${\AA}$ diamond nuclei.

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The Effect of Salt and pH on the Phase Transition Behaviors of pH and Temperature-Responsive Poly(N,N-diethylacrylamide-co-methylacrylic acid)

  • Liu, Tonghuan;Fang, Jian;Zhang, Yaping;Zeng, Zhengzhi
    • Macromolecular Research
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    • v.16 no.8
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    • pp.670-675
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    • 2008
  • A series of pH and temperature-responsive (N,N-diethylacrylamide-co-methylacrylic acid) copolymers were synthesized by radical copolymerization and characterized by elemental analysis, Fourier-transform infrared (FT-IR), nuclear magnetic resonance (NMR) $^1H$, $^{13}C$ and LLS. The effects of salt and pH on the phase transition behaviors of the copolymers were investigated by uv. With increasing NaCl concentration, significant salt effects on their phase transition behaviors were observed. UV spectroscopic studies showed that the phase transition became faster with increasing NaCl concentration. In addition, the phase transition behaviors of copolymers were sensitive to pH. The pH and temperature sensitivity of these copolymers would make an interesting drug delivery system.

Influences of Environmental Conditions and Refractory Organic Matters on Organic Carbon Oxidation Rates Measured by a High Temperature Combustion and a UV-sulfate Methods (다양한 환경요인과 난분해성 유기물에 따른 고온산화 및 UV산화방식 총 유기탄소 산화율 변화)

  • Jung, Heon-Jae;Lee, Bo-Mi;Lee, Keun-Heon;Shin, Hyun-Sang;Hur, Jin
    • Journal of Korean Society on Water Environment
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    • v.32 no.1
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    • pp.98-107
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    • 2016
  • This study examined the effects of environmental conditions and the presence of refractory organic matter on oxidation rates of total organic carbon (TOC) measurements based on high temperature combustion and ultraviolet-sulfate methods. Spectroscopic indices for prediction of oxidation rates were also explored using the UV spectra and fluorescence excitation-emission matrix (EEM) of humic acids. Furthermore, optimum TOC instrument conditions were suggested by comparing oxidation rates of a standard TOC material under various conditions. Environmental conditions included salts, reduced ions, and suspended solids. Salts had the greatest influence on oxidation rates in the UV-sulfate method. However, no effect was detected in the high temperature combustion method. The UV-sulfate method showed lower humic substance oxidation rates, refractory natural organic matter, compared to the other methods. TOC oxidation rates for the UV-sulfate method were negatively correlated with higher specific-UV absorbance, humification index, and humic-like EEM peak intensities, suggesting that these spectroscopic indices could be used to predict TOC oxidation rates. TOC signals from instruments using the UV-sulfate method increased with increasing chamber temperature and increasing UV exposure durations. Signals were more sensitive to the former condition, suggesting that chamber temperature is important for improving the TOC oxidation rates of refractory organic matter.

Evaporating Particle Behaviors and plasma Parameters by Spectroscopic Method in laser Welding (레이저 용접시 분광학적 수법에 의한 증발입자의 거동과 플라즈마 물성의 계측)

  • 김윤해
    • Journal of Advanced Marine Engineering and Technology
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    • v.23 no.4
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    • pp.514-522
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    • 1999
  • The laser-induced plasma affects greatly on the results of welding process. moreover selective evaporation loss of alloying elements leads to change in chemical composition of weld metal as well as the mechanical properties of welded joint. this study was undertaken to obtain a fundamental knowledge of pulsed laser welding phenomena especially evaporation mechanism of different aluminum alloys. The intensities of molecular spectra of AlO and MgO were different each other depeding on the power density of a laser beam Under the low power density condition the MgO band spectrum was predominant in intensity while the AlO spectra became much stronger with an increase in the power density. These behaviors have been attributed to the difference in evaporation phenomena of Al and Mg metals with different boiling points and latent heats of vaporization. The time-averaged plasma temperature and electron number density were determined by spectroscopic methods and consequently the obtained temperature was $3,280{\pm}150K$ and the electron number density was $1.85{\times}10^{19}\;l/m^3$.

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Complex Detection Between Transcription Regulator and Promoter DNA by UV Spectroscopic Method

  • Lee, Kyungmin;Gang, Jongback
    • Journal of Integrative Natural Science
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    • v.5 no.3
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    • pp.163-167
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    • 2012
  • UV spectrophotometer was used to detect protein-DNA complex from DNA melting profile under constant temperature increase. Melting temperature (Tm) was $43^{\circ}C$ in copA duplex DNA alone. In the presence of Proteus mirabilis transcription regulator protein (PMTR) protein at 0.2 and 0.4 ${\mu}M$, Tm's were $45{\pm}0.5$ and $47.6{\pm}0.6^{\circ}C$, respectively. According to fluorescence polarization and gel shift assay. PMTR:copA complex was detected by the retarded migration on gel and the dissociation constant ($K_d$) was $(9.2{\pm}2.8){\times}10^{-9}M$.