• Title/Summary/Keyword: Soft-Lithography

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무전해 식각법으로 합성된 Si 나노와이어를 이용한 CMOS 인버터

  • Mun, Gyeong-Ju;Lee, Tae-Il;Lee, Sang-Hun;Hwang, Seong-Hwan;Myeong, Jae-Min
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2011.10a
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    • pp.22.2-22.2
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    • 2011
  • Si 나노와이어를 합성하는 다양한 방법들 중에서 Si 기판을 나노와이어 형태로 제작하는 무전해 식각법은 쉽고 간단하기 때문에 최근 많은 연구가 진행되고 있다. 무전해 식각법을 이용한 Si 나노와이어는 p 또는 n형의 전기적 특성을 갖는 Si 기판의 도핑농도에 따라 원하는 전기적 특성을 갖는 나노와이어를 얻을 수 있을 것이라는 기대가 있었지만 n형으로 제작된 나노와이어의 경우 식각에 의한 표면의 거칠기 때문에 그 특성을 나타내지 못하는 문제점을 가지고 있다. 본 연구에서는 무전해 식각법을 이용하여 p와 n형 나노와이어를 합성하고 field-effect transistors (FETs) 소자를 제작하여 각각의 특성을 구현하였다. 나노와이어와 절연막 사이의 계면 결함을 최소화하기 위하여 poly-4-vinylphenol (PVP) 고분자 절연막에 나노와이어를 삽입시킨 형태로 소자를 제작하였고, 특히 n형 나노와이어의 표면을 보다 평평하게 하기 위하여 열처리를 진행 하였다. 이렇게 각각의 특성이 구현된 나노와이어를 이용하여 soft-lithography 공정을 통해 complementary metal-oxide semiconductor (CMOS) 구조의 인버터 소자를 제작하였으며 그 전기적 특성을 평가하였다.

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A Study on a Microreplication Process for Real 3D Structures Using a Soft Lithography (동분말이 함유된 에폭시 수지를 이용한 마이크로 기어의 제작에 관한 연구)

  • Chung Sungil;Park Sunjoon;Lee Inhwan;Jeong Haedo;Cho Dongwoo
    • Journal of the Korean Society for Precision Engineering
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    • v.21 no.12
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    • pp.29-36
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    • 2004
  • In this paper, a new replication technique for a real 3D microstructure was introduced, in which a master Pattern WES made of photo-curable epoxy using a microstereolithography technology, and then it was transferred onto an epoxy-copper particle composite. A helical gear was selected as one of the real 3D microstructure for this study, and it was replicated from a pure epoxy to an epoxy composite. In addition, the transferability of the microreplication process was evaluated, and the properties of :he epoxy composite were compared to that of the pure epoxy, including hardness, wear-resistance and thermal conductivity.

Fabrication of nanofluidic channels with directed wrinkle/buckling patterns (Wrinkle / buckling 현상을 이용한 나노채널의 제작과 그 응용)

  • Chung, Seok;Moon, Myoung-Woon;Lee, Jeong-Hoon;Han, Jong-Yoon;Kamm, Roger D.
    • Proceedings of the KIEE Conference
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    • 2009.07a
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    • pp.1517_1518
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    • 2009
  • Interest has grown recently in the concept of "unconventional nanofabrication", the creation of nanoscale features by methods that avoid the technical hurdles and high cost of nano-lithographic processes. One of the challenges has been to reliably and inexpensively produce channels of nanometer dimension, as small as 60 nm, in the materials commonly used for soft lithography. In this manuscript, we present new approaches based on simple concepts of wrinkle and buckling patterns.

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Fabrication of a novel dry adhesive structure with reduced effective stiffness (유효강성을 줄인 새로운 형상의 건식부착물 제작)

  • Cho, Young-Sam;Jung, Dae-Hwan;Han, Houk-Seop;Kim, Wan-Doo
    • Proceedings of the KSME Conference
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    • 2007.05a
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    • pp.421-425
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    • 2007
  • In the fabrication of dry adhesive structure, increasing contact-points or contact-area is the primary goal because the adhesive force grows in proportion to the contact-area. The simplest way to extend the contact surface is the fabrication by using soft materials. However, the column-array structure could confront the matting phenomenon which columns are stuck together. Therefore, we need a novel design to reduce the effective stiffness with adequate stiff materials like a gecko's setae. In this study, we propose a novel design for the dry adhesive structure. Moreover, we analyzed whether the adhesive structure conforms the rough surface sufficiently through finite element method adopted the non-bonding interaction as the body force. Also, we fabricated the novel structures via UV lithography and some techniques. In addition, we examined the adhesive force of the novel structures.

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Fabrication of PDMS Stencil using Gas Blowing for Micropatterned 3T3 Cell Culture (가스 블로잉을 이용한 PDMS 스텐실 제작 및 3T3 세포의 마이크로 패터닝)

  • Choi, Jin Ho;Kim, Gyu Man
    • Journal of the Korean Society for Precision Engineering
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    • v.30 no.2
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    • pp.236-240
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    • 2013
  • In this presentation, we propose a fabrication method of PDMS stencil to apply into a localized culture of NIH/3T3 cells. PDMS stencil was fabricated by nitrogen gas blowing and soft lithography from preparing SU-8 master mold by photolithography. PDMS stencil pattern was production of the circle size 20 to $500{\mu}m$. In the culture test of PDMS stencil, a stencil was placed on a glass disk. The NIH/3T3 cells were successfully cultured into micropatterns by using the PDMS stencil. The results showed that cells could be cultured into micropatterns with precisely controlled manner at any shapes and specific size for bioscience study and bioengineering applications.

Micro-bioreactor for Physical stimulation of endothelial cells using micro-bead impact by gravitational force (미세입자의 중력을 이용한 세포 자극기 개발에 관한 연구)

  • Kim, Young-Hun;Kim, Tae-Jin;Jung, Hyo-Il
    • Proceedings of the KSME Conference
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    • 2008.11a
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    • pp.1690-1691
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    • 2008
  • Micro cell stimulation device is interested in many researchers because it has several advantages such as saving time and reagents. We introduce new micro-bioreactor using micro bead and conduct cell stimulation experiments to verify effective time because cell have operated by cell-cycle (G1, S, G2, and M phase). Micro-bioreactor was made by soft lithography and CAPE (calf pulmonary artery endothelial cell) was cultured in PDMS (polydimethylsiloxane) micro device for 12 hour and cell starvation process was performed for 24 hours. Micro glass beads were rolled only by slating device every hour during 15 hour because of minimizing other stimulation force like flow and pressure. The result represents that cells under exposed under micro bead stimulation show higher growth rate than normal condition and earlier and later stimulation time are more effective.

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Fabrication of Beta-phase Poly(9,9-dioctylfluorene) Nanowire Arrays for Polymer Light-Emitting Diode Using Direct Printing Method

  • Baek, Jang-Mi;Lee, Gi-Seok;Seong, Myeong-Mo
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.560-560
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    • 2012
  • We report a one-step fabrication method of Poly(9,9-dioctylfluorene) (PFO) nanowire array with pronounced ${\beta}$-Phase. We use liquid-bridge-mediated nanotransfer molding (LB-nTM) which is a new direct nano-patterning method based on the direct transfer of various materials from a mold to a substrate via liquid layer. The formation of the ${\beta}$-phase morphology in the resulting PFO nanowire array was evidenced by the presence of an absorption peak at 435nm. With the collection polarizer oriented parallel to the wire long axis, the PL emission was most intense and an emission dichroic ratio, DRE, of 3.7 was determined. The nanowire array have been investigated by scanning electron microscopy (SEM). Also, we simply fabricated structure of device of ITO/PFO nanowire arrays/Al and the electroluminescence spectra were recorded at various applied voltage.

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PDMS Nanoslits without Roof Collapse

  • Lee, Jin-Yong;Yun, Young-Keu;Kim, Yoo-Ri;Jo, Kyu-Bong
    • Bulletin of the Korean Chemical Society
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    • v.30 no.8
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    • pp.1793-1797
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    • 2009
  • Soft lithography of polydimethyl-siloxane (PDMS), an elastomeric polymer, has enabled rapid and inexpensive fabrications of microfluidic devices for various biochemical and bioanalytical applications. However, fabrications of nanostructured PDMS components such as nanoslits remain extremely challenging because of deformation of PDMS material. One of the well-known issues is the unwanted contact between the surfaces of PDMS roof and bottom substrate, called ‘roof collapse’. Here we have developed a novel approach for the facile stabilization of PDMS nanoslits in the low height (130 nm)/width (100 $\mu$m) ratio without roof-collapse. Within 130 nm high nanoslits, we demonstrate the confinement of single DNA molecules. We believe that this approach will serve as a key to utilize PDMS as nanoslits for integrated microfluidic devices.

Patterning of Conductive Polymer Anodes Using a Peel-off Method

  • Park, Jong-Woon;Yim, Youn-Chan;Heo, Gi-Seok;Lee, Jong-Ho;Kim, Tae-Won;Kim, Gwang-Young
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.868-870
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    • 2009
  • Here we report another soft lithography, peel-off method, for patterning conductive polymer anodes in the fabrication of flexible ITO-free organic light-emitting diodes. This method doesn't require any heating process and UV light. We have demonstrated that such a peel-off technique enables the formation of a very sharp edge and the enhancement of edge roughness.

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A tunable inverse-hemisphere-shaped Bragg grating sensor (튜닝가능한 역반구형의 브래그 그레이팅 센서)

  • Ryu, Yunha;Kim, Kyoungsik
    • Transactions of the Society of Information Storage Systems
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    • v.9 no.2
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    • pp.48-50
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    • 2013
  • In this work, we investigated the diffraction of inverse-hemisphere shaped polymer grating. The grating was fabricated by using soft lithography of hexagonally close-packed PS nanospheres. The periodicity of the grating was tuned by swelling in acetone and the diffraction wavelength shift induced from lattice change was measured. This device can be used as a strain gauge or a chemical sensor.