• 제목/요약/키워드: SnZnO

검색결과 355건 처리시간 0.03초

장군 연-아연-은 광상의 모암변질에 따른 원소분산 (Element Dispersion by the Wallrock Alteration of Janggun Lead-Zinc-Silver Deposit)

  • 유봉철
    • 자원환경지질
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    • 제45권6호
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    • pp.623-641
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    • 2012
  • 장군 연-아연-은 광상은 열수교대형 광상이다. 모암변질시 원소 분산을 알아보기 위해 모암, 열수변질대 및 연-아연-은 광맥에서 시료를 채취하였다. 이 광상은 능망간석화작용과 돌로마이트화작용으로 구성된 열수작용이 현저히 인지된다. 모암은 돌로마이트와 석회암이며 구성광물은 방해석, 돌로마이트, 석영, 금운모 및 흑운모 이다. 연-아연-은 광맥과 접촉한 부분에서 관찰되는 능망간석대는 주로 능망간석이 산출되며 소량 방해석, 돌로마이트, 쿠트나호라이트, 유비철석, 황철석, 황동석, 섬아연석, 방연석 및 황석석 등이 산출된다. 연-아연-은 광맥으로부터 멀어짐에 따라 관찰되는 돌로마이트대는 주로 돌로마이트가 산출되고 소량 방해석, 능망간석, 황철석, 섬아연석, 황동석, 방연석 및 황석석 등이 산출된다. 모암변질시 주원소, 미량 및 희토류원소들간의 상관계수는 $Fe_2O_3(T)$/MnO, Ga/MnO 및 Rb/MnO(돌로마이트 및 석회암)가 정의 상관관계를 갖고 MgO/MnO, CaO/MnO, $CO_2$/MnO 및 Sr/MnO(돌로마이트)와 CaO/MnO 및 Sr/MnO(석회암)가 부의 상관관계를 갖는다. 모암변질시 이득원소들은 $Fe_2O_3(T)$, MnO, As, Au, Cd, Cu, Ga, Pb, Rb, Sb, Sc, Sn 및 Zn 이고 손실원소들은 CaO, MgO, $CO_2$ 및 Sr 이다. 따라서 CaO, $CO_2$, $Fe_2O_3(T)$, MgO, MnO, Ga, Pb, Rb, Sb, Sn, Sr 및 Zn 등의 원소들은 모암이 돌로마이트내지 석회암인 열수교대형 광상의 탐사에 지시원소로서 활용될 수 있을 것이다.

비정질 실리콘 태양전지 고효율화를 위한 전면투명전도막/p 최적연구 (A optimum studies of TCO/p-layer for high Efficiency in Amorphous Silicon Solar cell)

  • 이지은;이정철;오병성;송진수;윤경훈
    • 한국신재생에너지학회:학술대회논문집
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    • 한국신재생에너지학회 2007년도 추계학술대회 논문집
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    • pp.275-277
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    • 2007
  • 유리를 기판으로 하는 superstrate pin 비정질 태양전지에서 전면투명전도막(TCO)과 p-layer의 계면이 태양전지의 효율을 내는데 가장 큰 기여를 한다. 전면투명전도막(TCO)으로 현재 일반적으로 사용되는 ZnO:Al는 $SnO_2:F$ 보다 전기,광학적으로 우수하고, 안개율(Haze)높으며, 수소 플라즈마에서의 안정성이 높은 특정을 갖고 있다. 그래서 박막 태양전지 특성향상에 매우 유리하나, 태양전지로 제조했을 때, $SnO_2:F$보다 충진율(Fill factor:F.F)과 V_{\infty}$ 가 감소한다는 단점을 가지고 있다. 본 실험실에서는 $SnO_2:F$의 F.F가 72%이 나온 반면 ZnO:Al의 F.F은 68%에 그쳤다. 이들 원인을 분석하기 위해 TCO/p-layer의 전기적 특성을 알아 본 결과, $SnO_2:F$보다 ZnO:Al의 직렬저항이 높게 측정되었다. 이러한 결과를 바탕으로 p-layer 에 R={$H_2/SiH_4$}=25로 변화, p ${\mu$}c$-Si:H/p a-SiC:H 로 p-layer 이중 증착, p-layer의 boron doping 농도를 증가시키는 실험을 하였다. 직렬저항이 가장 낮았던 p ${\mu$}c$-Si:H/p a-SiC:H 로 p-layer 이중 증착에서 Voc는 0.95V F.F는 70% 이상이 나왔다. 이들 각 p층의 $E_a$(Activation Energy)를 구해본 결과, ${\mu$}c$-Si:H의 Ea 가 가장 낮은 것을 관찰 할 수 있었다.

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산화아연 나노로드 전극을 이용한 전기화학발광 셀의 제작 및 발광특성 고찰 (Fabrication of ZnO Nanorod-based Electrochemical Luminescence Cells and Fundamental Luminescence Properties)

  • 오형석;성열문
    • 전기학회논문지
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    • 제63권1호
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    • pp.76-79
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    • 2014
  • We report Zinc oxide (ZnO) nanorods synthesis and electrochemical luminescence (ECL) cell fabrication. The ECL cell was fabricated using the electrode of ZnO nanorods and Ru(II) complex ($Ru(bpy)_3{^{2+}}$) as a luminescence materials. The fabricated ECL cell is composed of F-doped $SnO_2$ (FTO) glass/ Ru(II)/ZnO nanorods/FTO glass. The highest intensity of the emitting light was obtained at the wavelength of ~620 nm which corresponds to dark-orange color. At a bias voltage of 3V, the measured ECL efficiencies were 5 $cd/m^2$ for cell without ZnO nanorod, 145 $cd/m^2$ for ZnO nanorods-$5{\mu}m$, 208 $cd/m^2$ for ZnO nanorods-$8{\mu}m$ and 275 $cd/m^2$ for ZnO nanorods-$10{\mu}m$, respectively. At a bias voltage of 3.5V, the use of ZnO nanorods increases ECL intensities by about 3 times compared to the typical ECL cell without the use of ZnO nanorods.

Sn2O3가 첨가된 ZnO-Pr6O11-CoO계 세라믹스의 바리스터 특성 (Varistor Properties of Sn2O3- Doped ZnO-Pr6O11-CoO-Doped -Based Ceramics)

  • 남춘우
    • 한국전기전자재료학회논문지
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    • 제16권1호
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    • pp.39-45
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    • 2003
  • The varistor properties of ZnO-Pr$_{6}$O$_{11}$-CoO-based ceramics doped with Sm$_2$O$_3$were investigated in the addition range of 0.0~2.0 mol% Sm$_2$O$_3$at sintering temperature of 130$0^{\circ}C$ and 135$0^{\circ}C$. As Sm$_2$O$_3$ content is increased, the breakdown voltage was increased in the range of 348.9~521.8 V/mm for ceramics sintered at 130$0^{\circ}C$ and 8.5~381.3 V/mm for ceramics sintered at 135$0^{\circ}C$. On the whole, the increase of sintering temperature led to the low nonlinearity regardless of Sm$_2$O$_3$content. ZnO-Pr$_{6}$O$_{11}$-CoO-based ceramics doped with 1.0 mol% at each sintering temperature exhibited the most superior varistor properties, with the nonlinear exponent of 42.1 at 130$0^{\circ}C$, 36.8 at 135$0^{\circ}C$ and the leakage current of 9.2 $\mu$A at 130$0^{\circ}C$, 11.7 $\mu$A at 135$0^{\circ}C$.EX>.EX>.

Manufacture and characteristic evaluation of Amorphous Indium-Gallium-Zinc-Oxide (IGZO) Thin Film Transistors

  • 성상윤;한언빈;김세윤;조광민;김정주;이준형;허영우
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2010년도 제39회 하계학술대회 초록집
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    • pp.166-166
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    • 2010
  • Recently, TFTs based on amorphous oxide semiconductors (AOSs) such as ZnO, InZnO, ZnSnO, GaZnO, TiOx, InGaZnO(IGZO), SnGaZnO, etc. have been attracting a grate deal of attention as potential alternatives to existing TFT technology to meet emerging technological demands where Si-based or organic electronics cannot provide a solution. Since, in 2003, Masuda et al. and Nomura et al. have reported on transparent TFTs using ZnO and IGZO as active layers, respectively, much efforts have been devoted to develop oxide TFTs using aforementioned amorphous oxide semiconductors as their active layers. In this thesis, I report on the performance of thin-film transistors using amorphous indium gallium zinc oxides for an active channel layer at room temperature. $SiO_2$ was employed as the gate dielectric oxide. The amorphous indium gallium zinc oxides were deposited by RF magnetron sputtering. The carrier concentration of amorphous indium gallium zinc oxide was controlled by oxygen pressure in the sputtering ambient. Devices are realized that display a threshold voltage of 1.5V and an on/off ration of > $10^9$ operated as an n-type enhancement mode with saturation mobility with $9.06\;cm^2/V{\cdot}s$. The devices show optical transmittance above 80% in the visible range. In conclusion, the fabrication and characterization of thin-film transistors using amorphous indium gallium zinc oxides for an active channel layer were reported. The operation of the devices was an n-type enhancement mode with good saturation characteristics.

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이원 동시 마그네트론 스퍼터링법을 이용하여 증착한 In-Sn-Zn-O 박막의 열전 특성 (Thermoelectric and electrical properties of In-Sn-Zn-O thin films deposited by magnetron co-sputtering)

  • 변자영;송풍근
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2015년도 추계학술대회 논문집
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    • pp.297-298
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    • 2015
  • 우수한 열전 성능의 소자가 되기 위해서는 높은 전기 전도도 및 제백상수 그리고 낮은 열 전도도를 가져야한다. 본 연구에서는 DC 마그네트론 스퍼터링 법을 이용하여 비정질 구조를 갖는 ITZO 박막을 제작하였으며, 전기적 특성과 열전 특성을 조사하였다. 그 결과 ITO에 ZnO 첨가시 전기적 특성 및 열전 특성이 향상 되었다. 또한 비정질 구조를 가지므로 격자에 의한 열 전도도가 낮아 전체 열 전도도가 낮을 것이며 이는 높은 열전 성능 지수(ZT)를 가질 것이라 예상된다.

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Influence of Nanoporous Oxide Substrate on the Performance of Photoelectrode in Semiconductor-Sensitized Solar Cells

  • Bang, Jin Ho
    • Bulletin of the Korean Chemical Society
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    • 제33권12호
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    • pp.4063-4068
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    • 2012
  • Oxide substrates in semiconductor-sensitized solar cells (SSSCs) have a great impact on their performance. $TiO_2$ has long been utilized as an oxide substrate, and other alternatives such as ZnO and $SnO_2$ have also been explored due to their superior physical properties over $TiO_2$. In the development of high-performance SSSCs, it is of significant importance to understand the effect of oxides on the electron injection and charge recombination as these two are major factors in dictating solar cell performance. In addition, elucidating the relationship between these two critical processes and solar cell performance in each oxide is critical in building up the basic foundation of SSSCs. In this study, ultrafast pump-probe laser spectroscopy and open-circuit decay analysis were conducted to examine the characteristics of three representative oxides ($TiO_2$, ZnO, and $SnO_2$) in terms of electron injection kinetics and charge recombination, and the implication of results is discussed.

스퍼터 공정을 이용한 SiZnSnO 산화물 반도체 박막 트랜지스터의 증착 온도에 따른 특성 (Effect of Deposition Temperature on the Electrical Performance of SiZnSnO Thin Film Transistors Fabricated by RF Magnetron Sputtering)

  • 고경민;이상렬
    • 한국전기전자재료학회논문지
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    • 제27권5호
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    • pp.282-285
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    • 2014
  • We have investigated the structural and electrical properties of Si-Zn-Sn-O (SZTO) thin films deposited by RF magnetron sputtering at various deposition temperatures from RT to $350^{\circ}C$. All the SZTO thin fims are amorphous structure. The mobility of SZTO thin film has been changed depending on the deposition temperature. SZTO thin film transistor shows mobility of 8.715 $cm^2/Vs$ at room temperature. We performed the electrical stress test by applying gate and drain voltage. SZTO thin film transistor shows good stability deposited at room temperature while showing poor stability deposited at $350^{\circ}C$. As a result, the electrical performance and stability have been changed depending on deposition temperature mainly because high deposition temperature loosened the amorphous structure generating more oxygen vacancies.

Photoluminescence properties of Mn4+-activated Li2ZnSn2O6 red phosphors

  • Choi, Byoung Su;Lee, Dong Hwa;Ryu, Jeong Ho;Cho, Hyun
    • Journal of Ceramic Processing Research
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    • 제20권1호
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    • pp.80-83
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    • 2019
  • The Mn4+-activated Li2ZnSn2O6 (LZSO:Mn4+) red phosphors were synthesized by the solid-state reaction at temperatures of 1100-1400 ℃ in air. The synthesized LZSO:Mn4+ phosphors were confirmed to have a single hexagonal LZSO phase without the presence of any secondary phase formed by the Mn4+ addition. With near UV and blue excitation, the LZSO:Mn4+ phosphors exhibited a double band deep-red emission peaked at ~658 nm and ~673 nm due to the 2E → 4A2 transition of Mn4+ ion. PL emission intensity showed a strong dependence on the Mn4+ doping concentration and the 0.3 mol% Mn4+-doped LZSO phosphor produced the strongest PL emission intensity. Photoluminescence emission intensity was also found to be dependent on the calcination temperature and the optimal calcination temperature for the LZSO:Mn4+ phosphors was determined to be 1200 ℃. Dynamic light scattering (DLS) and field-effect scanning electron microscopy (FE-SEM) analysis revealed that the 0.3 mol% Mn4+-doped LZSO phosphor particles have an irregularly round shape and an average particle size of ~1.46 ㎛.

Investigation of Effective Contact Resistance of ZTO-Based Thin Film Transistors

  • 강유진;한동석;박재형;문대용;신소라;박종완
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.543-543
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    • 2013
  • Thin-film transistors (TFTs) based on oxide semiconductors have been regarded as promising alternatives for conventional amorphous and polycrystalline silicon TFTs. Oxide TFTs have several advantages, such as low temperature processing, transparency and high field-effect mobility. Lots of oxide semiconductors for example ZnO, SnO2, In2O3, InZnO, ZnSnO, and InGaZnO etc. have been researched. Particularly, zinc-tin oxide (ZTO) is suitable for channel layer of oxide TFTs having a high mobility that Sn in ZTO can improve the carrier transport by overlapping orbital. However, some issues related to the ZTO TFT electrical performance still remain to be resolved, such as obtaining good electrical contact between source/drain (S/D) electrodes and active channel layer. In this study, the bottom-gate type ZTO TFTs with staggered structure were prepared. Thin films of ZTO (40 nm thick) were deposited by DC magnetron sputtering and performed at room temperature in an Ar atmosphere with an oxygen partial pressure of 10%. After annealing the thin films of ZTO at $400^{\circ}C$ or an hour, Cu, Mo, ITO and Ti electrodes were used for the S/D electrodes. Cu, Mo, ITO and Ti (200 nm thick) were also deposited by DC magnetron sputtering at room temperature. The channel layer and S/D electrodes were defined using a lift-off process which resulted in a fixed width W of 100 ${\mu}m$ and channel length L varied from 10 to 50 ${\mu}m$. The TFT source/drain series resistance, the intrinsic mobility (${\mu}i$), and intrinsic threshold voltage (Vi) were extracted by transmission line method (TLM) using a series of TFTs with different channel lengths. And the performances of ZTO TFTs were measured by using HP 4145B semiconductor analyzer. The results showed that the Cu S/D electrodes had a high intrinsic field effect mobility and a low effective contact resistance compared to other electrodes such as Mo, ITO and Ti.

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