• 한국신재생에너지학회:학술대회논문집
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• 2006.11a
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• pp.463-466
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• 2006

직접 알콜 연료전지는 액체인 알콜을 직접 연료전지에 공급하여 연소시킴으로써 높은 효율을 갖는 휴대용전원으로 주목받는 장치이다. 직접 알콜 연료전지에 담지체로 사용되는 탄소 소재는 넓은 표면적과 우수한 전기전도도를 가지고 있다는 장점 있으나 금속 촉매와의 상호작용이 약하여 촉매 활성에 영향을 주지 못한다. 산화물을 담지체로 사용할 경우 이러한 금속-담지체 간의 상호작용으로 인한 촉매활성 증가 및 입자성장 억제의 효과를 기대할 수 있다. 본 연구에서는, 안티몬 도핑된 주석산화물 (Sb-doped SnO2 : ATO nanoparticle)을 직접 메탄올 연료전지용 담지체어 적용하였으며 합성 과정은 다음과 같다. SnC14 5H2O SbC13, NaOH, HCl 수용액 혼합물을 삼구 플라스크에 넣고 $100^{\circ}C$ 온도에서 환류(reflux) 시킨 후 세척 및 건조하여 Air 분위기에서 열처리하였다. 합성된 산화물 수용액에 폴리올 방법으로 합성된 백금 콜로이드를 담지하였으며, 세척과 건조를 통하여 산화물에 담지된 백금 촉매를 촉매를 합성하였다. 촉매의 구조분석을 위해 XRD, TEM을 사용하였으며, 전극촉매로서의 활성을 평가하기 위해 cyclic voltammetry을 평가하였다. 본 연구에서는 백금의 담지량에 따른 Costripping voltammetry특성과 메탄올 및 에탄올 산화 반응 특성에 대하여, 탄소를 담지체로 사용한 Pt/C 촉매와 비교 평가하였다. 알콜 산화반응 평가결과, 주석산화물에 담지한 촉매가 탄소를 담지체로 사용한 촉매보다 우수한 활성을 나타내었으며 활성증가는 메탄올에 비해 에탄올 산화 반응의 경우 크게 증가하였다. 막과 비교해 보았다. $ZrO_2$ 입자는 전도성이며 동시에 친수성을 나타내기 때문에 상용 막에 비하여 함수율 및 수소이온 전도도가 우수하게 나타났다. 복합막의 이러한 물성은 $100^{\circ}C$이상의 고온에서 전해질 막 내의 물 관리를 용이하게 한다. 단위 전지 운전 온도 $130^{\circ}C$, 상대습도 37%의 운전 조건에서도 상당히 우수한 전지 성능을 보임에 따라 고온/저가습 조건에서 상용 Nafion 112 막보다 우수한 막 특성을 나타냄을 확인하였다.소/배후방사능비는 각각 $2.18{\pm}0.03,\;2.56{\pm}0.11,\;3.08{\pm}0.18,\;3.77{\pm}0.17,\;4.70{\pm}0.45$ 그리고 $5.59{\pm}0.40$이었고, $^{67}Ga$-citrate의 경우 2시간, 24시간, 48시간에 $3.06{\pm}0.84,\;4.12{\pm}0.54\;4.55{\pm}0.74 $이었다. 결론 : Transferrin에 $^{99m}Tc$을 이용한 방사성표지가 성공적으로 이루어졌고, $^{99m}Tc$-transferrin의 표지효율은 8시간까지 95% 이상의 안정된 방사성표지효율을 보였다. $^{99m}Tc$-transferrin을 이용한 감염영상을 성공적으로 얻을 수 있었으며, $^{67}Ga$-citrate 영상과 비교하여 더 빠른 시간 안에 우수한 영상을 얻을 수 있었다. 그러므로 $^{99m}Tc$<

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.34 no.2
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• pp.99-104
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• 2021

Ion-beam sputtering (IBS) was used to deposit semiconducting IZTO (indium zinc tin oxide) thin films onto heavily-doped Si substrates using a sintered ceramic target with the nominal composition In0.4Zn0.5Sn0.1O1.5, which could work as a channel layer for oxide TFT (oxide thin film transistor) devices. The crystallization behavior and electrical properties were examined for the films in terms of deposition parameters, i.e. target tilt angle and substrate temperature during deposition. The thickness uniformity of the films were examined using a stylus profilometer. The observed difference in electrical properties was not related to the degree of crystallization but to the deposition temperature which affected charge carrier concentration (n), electrical resistivity (ρ), sheet resistance (Rs), and Hall mobility (μH) values of the films.

• Korean Journal of Materials Research
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• v.19 no.5
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• pp.245-252
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• 2009

Changes in the surface morphology and light scattering of textured Al doped ZnO thin films on glass substrates prepared by rf magnetron sputtering were investigated. As-deposited ZnO:Al films show a high transmittance of above 80% in the visible range and a low electrical resistivity of $4.5{\times}10^{-4}{\Omega}{\cdot}cm$. The surface morphology of textured ZnO:Al films are closely dependent on the deposition parameters of heater temperature, working pressure, and etching time in the etching process. The optimized surface morphology with a crater shape is obtained at a heater temperature of $350^{\circ}C$, working pressure of 0.5 mtorr, and etching time of 45 seconds. The optical properties of light transmittance, haze, and angular distribution function (ADF) are significantly affected by the resulting surface morphologies of textured films. The film surfaces, having uniformly size-distributed craters, represent good light scattering properties of high haze and ADF values. Compared with commercial Asahi U ($SnO_2$:F) substrates, the suitability of textured ZnO:Al films as front electrode material for amorphous silicon thin film solar cells is also estimated with respect to electrical and optical properties.

• Electrical & Electronic Materials
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• v.7 no.3
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• pp.243-251
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• 1994

ITO(Indium Tin Oxide) film with thickness of 1500.angs. was prepared by an e-beam evaporator onto a glass and a p-type InP wafer (100) LEC grown Zn-doped p=2.3*10$\^$16/cm$\^$-3/), in which the components of ITO used for evaporation source were hot pressed pellets 1 mole% ln$\_$2/O$\_$3/+9 mole% SnO$\_$2/, and evaporated in O$\_$2/ ambient. The optimum conditions to preparation of ITO thin film were the substrate temperature of 350.deg. C, the injected oxygen pressure of 2*10$\^$-4/ torr, and the evaporation speed of 0.2-0.3.angs./sec, respectively. In these optimum conditions, the resistivity and the carrier concentration were 5.3*10$\^$-3/ .ohm.-cm, 6.5*10$\^$20/cm$\^$-3/, and the transmittance was over 80%. From the results of J-V measurements in ITO/p-InP structure solar cells, the higher pressure of injected oxygen, the more open circuit voltage. The efficiency of ITO/p-InP solar cell without the grid line contact, prepared by the optimum evaporation conditions, was 7.19%. By using the grid line contact, the efficiency, the open circuit voltage, the short circuit current density, the fill factor, the series resistance, and the shunt resistance were 8.5%, 0.47V, 29.48 mAcm$\^$-2/ , 61.35%, 3.ohm., and 26.6k.ohm., respectively.

• Journal of the Korean institute of surface engineering
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• v.41 no.5
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• pp.214-219
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• 2008

Indium tin oxide (ITO) films were deposited on PET substrate by RF superimposed DC magnetron sputtering using ITO (doped with 10 wt% $SnO_2$) target. Substrate temperature was maintained below $750^{\circ}C$ without intentionally substrate heating during the deposition. The discharge voltage of DC power supply was decreased from 280 V to 100 V when superimposed RF power was increased from 0 W to 150 W. The electrical properties of the ITO films were improved with increasing of superimposed RF power. In the result of cyclic bending test, relatively high mechanical property was obtained for the ITO film deposited with RF power of 75 W under DC current of 0.75 A which could be attributed to the decrease of internal stress caused by decrease in both deposition rate and plasma impedance.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.276.1-276.1
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• 2016

본 연구에서는 차세대 유연 투명 히터 (Flexible and transparent heater) 제작을 위한 ATO 나노입자-은 네트워크 하이브리드 투명 전극의 특성을 연구하였다. 최적화된 은 네트워크 (Self-assembled Ag network) 투명 전극 상에 20-30 nm의 직경을 가지는 ATO (Sb-doped $SnO_2$) 나노입자를 스프레이 방식으로 상압, 상온에서 코팅하여 인쇄형 ATO-은 네트워크 하이브리드 투명 전극을 구현하였다. 스프레이로 코팅된 투명 ATO 나노 입자는 은 네트워크 전극의 빈 공간을 매워 줌으로써 은 네트워크 간의 연결성 및 표면 조도를 낮춰주어 유연 투명 히터 작동 시 전류의 집중 현상을 막아줄 수 있다. ATO-은 네트워크 하이브리드 투명 전극의 최적화를 위해 스프레이 횟수에 따른 하이브리드 투명 전극의 전기적, 광학적, 표면 특성을 분석하였으며, 최적의 조건에서 14 Ohm/square의 면저항과 66%의 투과도를 가지는 하이브리드 투명 전극을 구현하였다. 또한 FESEM 분석을 통해 ATO-은 네트워크 하이브리드 전극의 표면 및 계면 구조를 연구하고 ATO 코팅이 은 네트워크 전극의 특성에 미치는 영향을 규명하였다. 최적화된 ATO-은 네트워크 하이브리드 투명 전극을 이용하여 유연 투명 히터를 제작하고 전압에 따른 히터의 온도의 변화를 측정하여 차세대 유연 투명 히터용 투명 전극으로 인쇄기반 ATO-은 네트워크 하이브리드 투명 전극의 가능성을 확인하였다.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.54 no.4
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• pp.139-143
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• 2005

For application of carbon nano-tube (CNT) as a counter electrode materials of dye-sensitized solar cell (DSSC), the electrochemical behavior of CNT electrode was studied, employing cyclic-voltammetry (C-V) and impedance spectroscopy. Fabrication of CNT-paste and formation of CNT-counter electrode for characteristic measurement have been carried out using ball-milling and doctor blade process, respectively. Unit cell for measurements was assembled using Pt electrode, CNT electrode, and iodine-embedded electrolyte. Field emission-scanning electron microscopy (FE-SEM) was used for structural investigation of CNT powder and electrode. Sheet resistance of electrode was measured with 4-point probe method. Electrochemical properties of electrode, C-V and impedance spectrum, were studied, employing potentiogalvanostat (EG&G 273A) and lock in amplifier (EG&G 5210). As a results, the sheet resistance of CNT electrode is almost similar to that of F-doped SnO2 (FTO) coated glass substrate as approximately 10 ohm/sq. From C-V and impedance spectroscopy measurements, it was found that CNT electrode has high reaction rate and low interface reaction resistance between CNT surface and electrolyte. These results provides that CNT electrode were superior to that of conventional Pt electrode. Particularly, the reaction rate in the CNT electrode is about thrice high than Pt electrode. Therefore. CNT electrode is to be good candidate material for counter electrode in DSSC.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2000.05b
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• pp.307-310
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• 2000

Antimony doped tin oxide (ATO) thin films were deposited at room temperature by ion-beam sputter deposition (IBSD) technique in oxidizing atmosphere utilizing Sb and Sn metal targets. Effect of Sb doping concentration, film thickness and heat treatment on electrical and optical properties was investigated. The thickness of as-deposited films was controlled approximately to $1500{\AA}$ or $2000{\AA}$, and Sb concentration to 10.8 and 14.9 wt%, as determined by SEM and XPS analyses. Heat treatment was performed at the temperature from $400^{\circ}C$ to $600^{\circ}C$ in flowing $O_2$ or forming gas. The resulting ATO films showed widely changing electrical resistivity and optical transmittance values in the visible spectrum depending on the composition, thickness and firing condition.

• Korean Journal of Materials Research
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• v.9 no.5
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• pp.533-537
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• 1999

ATO(Sb doped $SnO_2$) thin films whose thicknesses were 600, 1100 and $2100\AA$ were prepared by DC magnetron sputtering method. They showed the lowest resistivity at DC sputtering power 0.24kW and had lower resistivity with increasing thickness. The power dependence of resistivity among ATO thin films was also different with thickness. The increase of carrier concentration in ATO thin films was responsible for the decrease of resistivity with thickness increase. ATO thin films which were prepared at 30sccm oxygen flow rate showed a great change of sheet resistance under 1M HCl solution. The investigation of SAM(Scanning Auger Microprobe) revealed that oxygen atomic percentage on the surface of ATO thin films was changed. The decrease of sheet resistance also occurred when ATO thin films, prepared at 30sccm oxygen flow rate, were exposed to air for a long period of time. For this reason, it was considered that the desorption of oxygen on ATO surface was accelerated by HCl.

• Journal of the Korean Society for Heat Treatment
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• v.23 no.5
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• pp.245-248
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• 2010

Sn doped $In_2O_3$ (ITO) and ITO/Ni/ITO (INI) multilayer films were deposited on the glass substrates with a reactive magnetron sputtering system without intentional substrate heating and then the influence of the Ni interlayer on the methanol gas sensitivity of ITO and INI film sensors were investigated. Although both ITO and INI film sensors have the same thickness of 100 nm, INI sensors have a sandwich structure of ITO 50 nm/Ni 5 nm/ITO 45 nm. The changes in the gas sensitivity of the film sensors caused by methanol gas ranging from 100 to 1000 ppm were measured. It is observed that the INI film sensors show the higher sensitivity than that of the ITO single layer sensors. Finally, it can be concluded that the INI film sensor have the potential to be used as improved methanol gas sensors.