• 제목/요약/키워드: Sn-Ag-Cu

검색결과 421건 처리시간 0.023초

Effect of Different Aging Times on Sn-Ag-Cu Solder Alloy

  • Ervina Efzan, M.N.;Siti Norfarhani, I.
    • Transactions on Electrical and Electronic Materials
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    • 제16권3호
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    • pp.112-116
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    • 2015
  • This work studied the thickness and contact angle of solder joints between SAC 305 lead-free solder alloy and a Copper (Cu) substrate. Intermetallic compound (IMC) thickness and contact angle of 3Sn-Ag-0.5Cu (SAC 305) leadfree solder were measured using varying aging times, at a fixed temperature at 30℃. The thickness of IMC and contact angle depend on the aging time. IMC thickness increases as the aging increases. The contact angle gradually decreased from 39.49° to 27.59° as aging time increased from zero to 24 hours for big solder sample. Meanwhile, for small solder sample, the contact angle increased from 32.00° to 40.53° from zero to 24 hours. The IMC thickness sharply increased from 0.007 mm to 0.011 mm from zero to 24 hours aging time for big solder. In spite of that, for small solder the IMC thickness gradually increased from 0.009 mm to 0.017 mm. XRD analysis was used to confirm the intermetallic formation inside the sample. Cu6Sn5, Cu3Sn, Ni3Sn and Ni3Sn2 IMC layers were formed between the solder and the copper substrate. As the aging time increased, the strength of the solder joint mproved due to reduced contact angle.

Sn-3.0Ag-0.5Cu 솔더재료의 피로 균열진전에 관한 연구 (Fatigue Crack Propagation Behavior of Sn-3.0Ag-0.5Cu Solder Material)

  • 우태욱;김광수
    • 대한기계학회:학술대회논문집
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    • 대한기계학회 2008년도 추계학술대회A
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    • pp.333-337
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    • 2008
  • This study investigates crack propagation behavior of Sn-3.0Ag-0.5Cu solder under pull-push loading conditions. Fatigue Crack Growth (FCG) tests were conducted on Center Cracked Plate (CCP) specimens in fast-fast (pp) strain waveform. The fast-slow (pc), slow-fast (cp) and slow-slow (cc) strain waveforms were also used to study the effect of strain rates. The crack propagation rates for the four strain waveforms were correlated with J-integral range and a scatter band of factor 4 was found. The crack growth rates for the pc waveform was highest, followed by cp, cc and then pp waveforms.

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Development of Copper Cored Solder Ball(CCSB) by Sn-Ag-Cu Alloy Plating Process

  • 이덕행;정운석;김종욱;김판수
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2015년도 추계학술대회 논문집
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    • pp.284-284
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    • 2015
  • 반도체 Ball Grid Array(BGA)에 사용되던 종래의 Solder Ball은 Sn96.3 Ag3.0 Cu0.7의 용융솔더를 이용하여 제작하고 있다. 이는 SMT Reflow공정에서 BGA Ball의 퍼짐현상으로 인해 원래의 Ball Height에 영향을 미쳐 접합불량의 원인이 되고 있다. 이러한 문제를 해결하기 위해 Copper Core Ball위에 SnAgCu 삼원합금도금공정을 이용해 문제점을 해결하고자 했으며, 본 실험을 통해 구현한 CCSB를 이용해 SMT Reflow를 진행한 결과 종래의 BGA Ball보다 우수한 효과를 확인할 수 있었다.

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Sn3.5Ag0.7Cu 솔더의 계면위치에 따른 금속간 화합물과 강도 연구 (A Study on the of Intermetallic compound and shear strength of Sn3.5Ag0.7Cu ball with interface position)

  • 신규식;박지호;정재필
    • 한국표면공학회지
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    • 제35권1호
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    • pp.47-52
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    • 2002
  • Intermetallic compound on the soldered interface plays important role on the bondability and mechanical properties of soldered joint. The formation of intermetallic compounds are influenced by many factors such as temperature, holding time, base metals and so on. On this study the effect of number of reflow times on the intermetallic growth was investigated. For the experimental materials, Sn-3.5Ag-0.7Cu solder ball of 0.3mm diameter and RMA-type flux were used. Thickness of intermetallic compound of solder ball by 2nd reflow showed nearly 60% higher than that of 1st reflow, and shear strength showed 10% higher value. Thickness and shear strength according to the position of interface such as upper side or lower side between two substrates were also investigated.

솔더 층의 증착 순서에 따른 저 융점 극 미세 솔더 범프의 볼 형성에 관한 연구 (Formation of Low Temperature and Ultra-Small Solder Bumps with Different Sequences of Solder Layer Deposition)

  • 진정기;강운병;김영호
    • 마이크로전자및패키징학회지
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    • 제8권1호
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    • pp.45-51
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    • 2001
  • UBM층과의 젖음 특성 및 표면 산화정도가 미세 피치를 갖는 저 융점 솔더 범프의 볼 형성에 미치는 영향을 연구하였다. Au/Cu/Cr 과 Au/Ni/Ti UBM 위에 공정 조성에 가까운 In-Ag와 공정 조성의 Bi-Sn 솔더를 솔더 층의 증착 순서를 달리하여 증발 증착한 후 lift-off 공정과 열처리 공정을 사용하여 솔더 범프를 형성하였다. In-Ag솔더의 경우 In이 UBM 층과 접한 범프가, 또한 Bi-Sn 솔더의 경우 Sn을 먼저 UBM층위에 먼저 증착시켜 리플로 한 범프가 솔더 볼 형성 경향이 다른 범프에 비해 높았다. 구형의 솔더 범프 형성 정도는 UBM 층과의 젖음 특성에 따라 크게 달라졌다.

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인공시효시간에 따른 Ni 기판 Pb-free 솔더접합부의 기계적 물성평가 (Evaluation of Mechanical Property for Pb-free Solder/Ni Plate Joints with Artificial Aging Time)

  • 박소영;양성모;유효선
    • 대한기계학회논문집A
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    • 제39권5호
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    • pp.467-471
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    • 2015
  • 최근까지, 전자제품에 사용되는 솔더는 납성분이 남아 있으며, 전자부품 및 시스템의 무연 (Pb-free) 솔더에 대한 관심은 반도체 및 전자산업에서 증가하고 있다. 본 논문에서 사용된 솔더접합부는 Sn-37Pb, Sn-4Ag 및 Sn-4Ag-0.5Cu/Ni 기판 이다. 인공시효처리는 $150^{\circ}C$에서 각각 0hr, 100hr, 200hr, 400hr, 600hr 그리고 1000hr 동안 수행되었으며, SP 시험을 이용해 $30^{\circ}C$$50^{\circ}C$에서 접합강도를 평가했다. 전단강도는 인공시효시간과 온도가 증가함에 따라 전반적으로 감소하였다. 무연솔더는 Sn-37Pb 보다 총파괴 에너지가 높았으며, Sn-4Ag-0.5Cu/Ni 접합부는 고온에서 기계적 물성치가 가장 우수하였다.

Sn-Bi도금 $Sn-3.5\%Ag$ 솔더를 이용한 Capacitor의 저온 솔더링 (Lower Temperature Soldering of Capacitor Using Sn-Bi Coated $Sn-3.5\%Ag$ Solder)

  • 김미진;조선연;김숙환;정재필
    • Journal of Welding and Joining
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    • 제23권3호
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    • pp.61-67
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    • 2005
  • Since lead (Pb)-free solders for electronics have higher melting points than that of eutectic Sn-Pb solder, they need higher soldering temperatures. In order to decrease the soldering temperature we tried to coat Sn-Bi layer on $Sn-3.5\%Ag$ solder by electroplating, which applies the mechanism of transient liquid phase bonding to soldering. During heating Bi will diffuse into the $Sn-3.5\%Ag$ solder and this results in decreasing soldering temperature. As bonding samples, the 1608 capacitor electroplated with Sn, and PCB, its surface was finished with electroless-plated Ni/Au, were selected. The $Sn-95.7\%Bi$ coated Sn-3.5Ag was supplied as a solder between the capacitor and PCB land. The samples were reflowed at $220^{\circ}C$, which was lower than that of normal reflow temperature, $240\~250^{\circ}C$, for the Pb-free. As experimental result, the joint of $Sn-95.7\%Bi$ coated Sn-3.5Ag showed high shear strength. In the as-reflowed state, the shear strength of the coated solder showed 58.8N, whereas those of commercial ones were 37.2N (Sn-37Pb), 31.4N (Sn-3Ag-0.5Cu), and 40.2N (Sn-8Zn-3Bi). After thermal shock of 1000 cycles between $-40^{\circ}C$ and $+125^{\circ}C$, shear strength of the coated solder showed 56.8N, whereas the previous commercial solders were in the range of 32.3N and 45.1N. As the microstructures, in the solder $Ag_3Sn$ intermetallic compound (IMC), and along the bonded interface $Ni_3Sn_4$ IMC were observed.

Au 스터드 범프와 Sn-3.5Ag 솔더범프로 플립칩 본딩된 접합부의 미세조직 및 기계적 특성 (Interfacial Microstructure and Mechanical Property of Au Stud Bump Joined by Flip Chip Bonding with Sn-3.5Ag Solder)

  • 이영규;고용호;유세훈;이창우
    • Journal of Welding and Joining
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    • 제29권6호
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    • pp.65-70
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    • 2011
  • The effect of flip chip bonding parameters on formation of intermetallic compounds (IMCs) between Au stud bumps and Sn-3.5Ag solder was investigated. In this study, flip chip bonding temperature was performed at $260^{\circ}C$ and $300^{\circ}C$ with various bonding times of 5, 10, and 20 sec. AuSn, $AuSn_2$ and $AuSn_4$ IMCs were formed at the interface of joints and (Au, Cu)$_6Sn_5$ IMC was observed near Cu pad side in the joint. At bonding temperature of $260^{\circ}C$, $AuSn_4$ IMC was dominant in the joint compared to other Au-Sn IMCs as bonding time increased. At bonding temperature of $300^{\circ}C$, $AuSn_2$ IMC clusters, which were surrounded by $AuSn_4$ IMC, were observed in the solder joint due to fast diffusivity of Au to molten solder with increased bonding temperature. Bond strength of Au stud bump joined with Sn-3.5Ag solder was about 23 gf/bump and fracture mode of the joint was intergranular fracture between $AuSn_2$ and $AuSn_4$ IMCs regardless bonding conditions.

Joule열이 Sn-3.5Ag 플립칩 솔더범프의 Electromigration 거동에 미치는 영향 (Effect of Joule Heating on Electromigration Characteristics of Sn-3.5Ag Flip Chip Solder Bump)

  • 이장희;양승택;서민석;정관호;변광유;박영배
    • 한국재료학회지
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    • 제17권2호
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    • pp.91-95
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    • 2007
  • Electromigration characteristics of Sn-3.5Ag flip chip solder bump were analyzed using flip chip packages which consisted of Si chip substrate and electroplated Cu under bump metallurgy. Electromigration test temperatures and current densities peformed were $140{\sim}175^{\circ}C\;and\;6{\sim}9{\times}10^4A/cm^2$ respectively. Mean time to failure of solder bump decreased as the temperature and current density increased. The activation energy and current density exponent were found to be 1.63 eV and 4.6, respectively. The activation energy and current density exponent have very high value because of high Joule heating. Evolution of Cu-Sn intermetallic compound was also investigated with respect to current density conditions.