• 한국전기전자재료학회논문지
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• 제14권9호
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• pp.707-713
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• 2001

As the integrated circuit device shrinks to smaller dimensions, chemical mechanical polishing (CMP) process was requirdfo the global planarization of inter-metal dielectric (IMD) layer with free-defect. However, as the IMD layer gest thinner, micro-scratches are becoming as major defects. However, as the IMD layer gets thinner, micro-scratches are becoming as major defects. Micro-scratches are generated by agglomerated slurry, solidified and attached slurry in pipe line of slurry supply system. To prevent agglomerated slurry particle from inflow, we installed 0.5${\mu}{\textrm}{m}$ point of use (POU) filter, which is depth-type filter and has 80% filtering efficiency for the 1.0${\mu}{\textrm}{m}$ size particle. In this paper, we studied the relationship between defect generation and polished wafer counts to understand the exact efficiency fo the slurry filteration, and to find out the appropriate pad usage. Our experimental results showed that it sis impossible to prevent defect-causing particles perfectly through the depth-type filter. Thus, we suggest that it is necessary to optimize the slurry flow rate, and to install the high spray bar of de-ionized water (DIW) with high pressure, to overcome the weak-point of depth type filter.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2003년도 춘계학술대회 논문집 센서 박막재료 반도체 세라믹
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• pp.158-161
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• 2003

The primary aim of this study is to investigate new semi-abrasive free slurry including acid colloidal silica and hydrogen peroxide for copper chemical-mechanical planarization (CMP). In general, slurry for copper CMP consists of colloidal silica as an abrasive, organic acid as a complex-forming agent, hydrogen peroxide as an oxidizing agent, a film forming agent, a pH control agent and several additives. We developed new semi-abrasive free slurry (SAFS) including below 0.5% acid colloidal silica. We evaluated additives as stabilizers for hydrogen peroxide as well as accelerators in tantalum nitride CMP process. We also estimated dispersion stability and Zeta potential of the acid colloidal silica with additives. The extent of enhancement in tantalum nitride CMP was verified through anelectrochemical test. This approach may be useful for the application of single and first step copper CMP slurry with one package system.

• 한국환경농학회지
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• 제29권4호
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• pp.348-353
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• 2010

본 연구에서는 돈분 슬러리의 저장형태 및 온도에 따른 유기물의 거동을 관찰하였는데, closed system과 open system의 저장형태에 따른 유기물 농도는 $20^{\circ}C$에서 30일 저장 후 약 2배 정도의 차이를 보였다. 또한 온도에 의한 유기물 농도의 거동은 온도가 증가할수록 TS 및 VS 농도가 감소하였고, $20^{\circ}C$ 약 23%, $35^{\circ}C$ 약 29% 정도가 감소되는 것으로 나타났다. 하절기 외부온도 특성을 반영한 온도조건(20, $35^{\circ}C$) 및 저장기간 따른 생성된 유기산 종류는 비슷하였고, 저장기간 15일 이후부터 분변내 포함된 가수분해 및 산생성 미생물의 성장이 증대되어 유기산의 생성이 증가하였다. 반응시간 30일 후 생성된 총유기산 농도는 $20^{\circ}C$에서 $2,829\;mg{\cdot}COD/L$이었으며, $30^{\circ}C$에서는 $9,123\;mg{\cdot}COD/L^{\circ}C$로 초기 유기물농도 대비 각각 5.4, 17.4%의 유기산 전환율을 나타내었다. 따라서 돈분슬러리의 저장기간이 길어질수록 외부온도에 따라 가수분해 및 산생성 반응으로 유기산이 생성되고, 메탄생성균의 기질이용으로 유기물의 손실이 발생하여 온실가스 배출도 증가할 것으로 예상된다.

• International Journal of Air-Conditioning and Refrigeration
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• 제13권4호
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• pp.175-183
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• 2005

The present study has been conducted for manufacturing MPCM (microencapsulated phase change material) slurry with in-situ polymerization and proving their applicabilities for cooling system. The tetradecane as a core material of MPCM is coated with melamine. The produced capsules are observed by the optical microscope and SEM for superficial shapes and analysed their properties by DSC and particle size distribution by FA particle analyzer. It is found that narrow size distribution in 1 to $10{\mu}m$ is resulted in $5{\mu}m$ of average diameter and $9^{\circ}C$ melting temperature. The durability of MPCM capsules is tested with various types of pumps such as centrifugal, peristaltic, and mono. For the centrifugal and peristaltic pumps the breakage fraction of the capsules is resulted within $6\%$ during 10,000 cycles, while the mono is over $8\%$. The cooling system, which has adopted MPCM slurry as a medium for transporting cold thermal energy, is designed to investigate the performance of newly developed coolant. The discharging times of cold energy in circulating 10 and $20wt\%$ MPCM slurry are lasted to 105 and 285 minutes, respectively.

• 설비공학논문집
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• 제18권10호
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• pp.776-782
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• 2006

A new district cooling system using ice slurry for the uncertain cooling load of the future is presented. The chilled water produced by the absorption chillers is used for the base cooling load. The temperature of the chilled water is reduced by mixing of ice slurry depending on increasing of the cooling load. Finally, IF of the ice slurry is increased up to 10% at the peak load. The transporting mass flow rate is decreased down to 44.7%, and the diameter of the main pipe is decreased down to 66.7%, but the diameter of the branched pipe is designed as the same size of the chilled water.

• 대한설비공학회:학술대회논문집
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• 대한설비공학회 2006년도 하계학술발표대회 논문집
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• pp.138-143
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• 2006

The peculiarity of ice slurry, such as liquidity, high heat transfer rate and easy storage can also find to supercooled type dynamic ice storage system(DISS) which is one of the DISS. However, in order to accomplish continuous ice formation in the system without mechanical moving parts, supercooled aqueous solutionshould be formed stable through cooling heat exchanger and be dissoluted in storage tank. In previous research, the time of ice slurry increased as the pressure of the cooling heat exchanger(PHX) increased. In this study, a cooling experiment of an ethylene glycol 7mass% solution was performed with various inlet temperature of the PHX, which has constant brine inlet temperature of $-7^{\circ}C$. The temperature in the storage tank maintained to freezing point of the solution. At results, the time of ice slurry formation increased as the supercooling degree decreased and the cooling rate increased.

• 한국가시화정보학회:학술대회논문집
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• 한국가시화정보학회 2004년도 추계학술대회 논문집
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• pp.48-51
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• 2004

Chemical Mechanical Polishing(CMP) is popularly used in production of semiconductor because of large area polishing ability probability of improvement for more integrated circuit. However, present CMP processing causes some non-uniformity errors which can be critical for highly integrated circuit. Previous studies predict that flow-field of slurry during CMP can create non-uniformity, but no quantitative measurement has conducted. In this study, using PIV, slurry velocity flow-field during CMP is measured by changing the ratio of RPM of pad and carrier with tuned PIV system adequate for small room in CMP machine and Cabot's non-groove pad Epad-A100. The result show that velocity of slurry is majorly determined by pad-rpm and the ratio of between carrier and pad rpm make some changes in streamlines.

• 설비공학논문집
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• 제17권2호
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• pp.183-190
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• 2005

In the process of ice-slurry making, ice adhesion on cooling wall or in narrow flow Path disturbs continuous ice formation. In this study, the effect on the ice adhesion to cooling surface by some freezing experiments was investigated, quantitatively. Three types of solutions were frozen in various coating vessels with stirring. In the experiment, the ice adhesion between cooling wall and Ice-slurry was evaluated by measuring stirring power. From the result, the stirring power of slurry mixture in PTFE-coating vessel was smaller than those in PE-coating, PFA-coating and bare SUS vessel. Especially, in EG H PG 1.S/ HD 1.5 mass$\%$ solution, the stirring power in the PE-coating vessel was smaller than that in the PFA-coating or SUS vessel.

• 한국항해항만학회지
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• 제35권5호
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• pp.365-370
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• 2011

최근 지구 온난화와 더불어 급격한 기후 변화 등으로 여름철 주간 냉방 수요가 급격히 증가하고 있다. 이에 따른 전력 수요량 또한 증가하고 있다. 이런 이유로 세계적으로 에너지 이용 효율 향상에 대한 관심이 높아지고 있고, 최근 국내 및 국외의 축냉시스템을 이용한 주간 전력 피크값을 최소화 하는 연구개발과 실제 적용 사례가 늘어나고 있다. 빙축열시스템의 경우 그 경제적 효과가 높아 그 관심이 높아지고 있는 추세이다. 축냉시스템은 주간 냉방에 사용하는 냉열을 야간에 만들어 탱크에 저장해 두었다가 그것을 낮에 이용함으로써, 갑작스런 부하 증가에 적절히 대응할 수 있는 등 여러 가지 장점을 갖고 있다. 본 실험에서는 슬러리아이스 생성을 위해 냉각표면에서 생성된 슬러리아이스를 분리시키기 위해 유체보다 밀도가 낮은 역전유동 물질을 삽입하여 역전 유동층을 형성하였으며, 역전유동층의 유동에 의해 관군으로 구성되어 있는 냉각튜브 표면에 빙부착이 심화되기 전에 얼음 입자를 분리시켜 수 내지 수십 미크론 단위의 슬러리아이스를 생성하도록 하였다.

• Geomechanics and Engineering
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• 제34권2호
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• pp.155-171
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• 2023

Aiming at the grouting treatment of water inflow in karst conduits, a visualized experiment system for conduit-type grouting blocking was developed. Through the improved water supply system and grouting system, and the optimized multisource information monitoring system, the real-time observation of diffusion and deposition of slurry, and the data acquisition of pressure and velocity during the whole process of grouting were realized, which breaks through the problem that the monitoring element is easy to fail due to slurry adhesion in conventional test system. Based on the grouting experiments in static and flowing water, the diffusion and deposition behavior of the quick-setting slurry under different working conditions were analyzed. The temporal and spatial variation behavior of the pressure and velocity were studied, and the blocking mechanism of the grouting were further revealed. The results showed that: (1) Under the flowing water condition, the counter-flow diffusion distance of slurry was negatively correlated with the flow water velocity and the volume ratio of cement and sodium silicate (C-S ratio), and positively correlated with the grouting volume. The slurry deposition thickness was negatively correlated with the flowing water velocity, and positively correlated with the grouting volume and C-S ratio. (2) The pressure increased slowly before blocking of the flowing water and rapidly after blocking in karst conduits. (3) With the continuous progress of grouting, the flowing water velocity decreased slowly first, then significantly, and finally tended to be stable. According to the research results, some engineering recommendations were put forward for the grouting treatment of the conduit-type water inflow disaster, which has been successfully applied in the treatment project of the China Resources Cement (Pingnan) Limestone Mine. This study provided some guidance and reference for the parameter optimization of grouting for the treatment projects of water inflow in karst conduits.