• Title/Summary/Keyword: Slit-Coater

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Coating Characteristics of Photo Resist in a Slit-Coater (Slit-Coater내의 Photo Resist의 코팅 특성)

  • 김장우;정진도;김성근
    • Journal of the Semiconductor & Display Technology
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    • v.3 no.3
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    • pp.41-44
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    • 2004
  • The aim of this study is the confirmation of the coating uniformity affected by the surface tension and wall attachment angle in a slit-coater model. In this work, we use the commercial code (Fluent) to solve the two-phase flow formed with air and photo resist numerically. The results show that the surface tension is the most important factor to determine the coating efficiency in the view of coating uniformity, and the coating uniformity is 2% for our slit-coater model and conditions. To improve the coating uniformity, it is in need of minimization of the sidewall effect of slit-coater.

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Flow Characteristics of Photo Resist in a Slit-Coater Nozzle (Slit-Coater 노즐에서 Photo Resist의 유동 특성)

  • 김장우
    • Journal of the Semiconductor & Display Technology
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    • v.3 no.3
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    • pp.37-40
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    • 2004
  • This study presents numerical solutions of three-dimensional laminar flow-field formed by photo resist flow in a slit-coater model. We discuss on the governing equations, laminar viscosities and the computational model applied in our numerical calculation and some results. We prove that the structure of tapered-cavity aid to make uniform pressure-field and boundary effect is an important problem to improve coating uniformity. In view of uniformity improvement, it is necessary to study for the structure of cavity and flow path.

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슬릿 코터 노즐의 최적 설계 및 고속도포 공정의 적용 가능성에 대한 연구

  • Kim, Tae-Min;Kim, Gwang-Seon;Kim, Gi-Un;Im, Tae-Hyeon;Jeong, Eun-Mi
    • Proceedings of the Korean Society Of Semiconductor Equipment Technology
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    • 2007.06a
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    • pp.169-173
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    • 2007
  • Slit-coater nozzle is one of core equipments of coating process in LCD panel manufactory. As a glass substrate size become bigger, a nozzle performance and a high-speed coating process are considered important issues. To design the optimal nozzle, the characteristics of fluid inside nozzle are studied using CFD (Computational Fluid Dynamics) method. Through research on design factors, we can know the coating uniformity influenced by lip length, cavity angle and gap size. The future work for this study is to find the factors in high-speed coating process and function between factors of design.

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Study on Correlation Between the Internal Pressure Distribution of Slit Nozzle and Thickness Uniformity of Slit-coated Thin Films (슬릿 노즐 내부 압력 분포와 코팅 박막 두께 균일도 간의 상관관계 연구)

  • Gieun Kim;Jeongpil Na;Mose Jung;Jongwoon Park
    • Journal of the Semiconductor & Display Technology
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    • v.22 no.4
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    • pp.19-25
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    • 2023
  • With an attempt to investigate the correlation between the internal pressure distribution of slit nozzle and the thickness uniformity of slot-coated thin films, we have performed computational fluid dynamics (CFD) simulations of slit nozzles and slot coating of high-viscosity (4,800 cPs) polydimethylsiloxane (PDMS) using a gantry slot-die coater. We have calculated the coefficient of variation (CV) to quantify the pressure and velocity distributions inside the slit nozzle and the thickness non-uniformity of slot-coated PDMS films. The pressure distribution inside the cavity and the velocity distribution at the outlet are analyzed by varying the shim thickness and flow rate. We have shown that the cavity pressure uniformity and film thickness uniformity are enhanced by reducing the shim thickness. It is addressed that the CV value of the cavity pressure that can ensure the thickness non-uniformity of less than 5% is equal to and less than 1%, which is achievable with the shim thickness of 150 ㎛. It is also found that as the flow rate increases, the average cavity pressure is increased with the CV value of the pressure unchanged and the maximum coating speed is increased. As the shim thickness is reduced, however, the maximum coating speed and flow rate decrease. The highly uniform PDMS films shows the tensile strain as high as 180%, which can be used as a stretchable substrate.

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