• Title/Summary/Keyword: Size uniformity

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Numerical analysis of the gas flow distribution characteristics in the anode flow channel of the molten carbonate fuel cell (MCFC) (용융탄산염 연료전지 anode 유로 채널에서의 가스 유동 분포에 관한 수치해석적 연구)

  • Cho, Jun-Hyun;Ha, Tae-Hun;Kim, Han-Sang;Min, Kyoung-Doug;Park, Jong-Hoon;Chang, In-Gab;Lee, Tae-Won
    • Proceedings of the KSME Conference
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    • 2008.11b
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    • pp.3120-3124
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    • 2008
  • A three-dimensional computational fluid dynamics (CFD) analysis is performed to investigate flow characteristics in the anode channels and manifold of the internal reforming type molten carbonate fuel cell (MCFC). Considering the computational difficulties associated with the size and geometric complexity of the MCFC system, the polyhedral meshes that can reduce mesh connectivity problems at the intersection of the channel and the manifold are adopted and chemical reactions inside the MCFC system are not included. Through this study, the gas flow rate uniformity of the anode channels is mainly analyzed to provide basic insights into improved design parameters for anode flow channel design. Results indicate that the uniformity in flow-rate is in the range of ${\pm}1%$ between the anode channels. Also, the mal-distributed inlet flow-rate conditions and the change in the size of the manifold depth have no significant effect on the flow-rate uniformity of the anode channels.

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High-Tc superconducting magnet properites with design conditions (설계조건에 따른 고온 초전도 마그넷의 특성변화)

  • Kim, Min-Ki;Ko, Yo;Han, Byoung-Sung
    • Electrical & Electronic Materials
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    • v.8 no.4
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    • pp.451-457
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    • 1995
  • Most important study on development of high-Tc superconducting magnet is magnetic properties with design conditions To study optimal design condition of high-Tc superconducting magnet, small size solenoid magnet was designed and simulated. Design conditions are radius of bobbin, radius of magnet, length of magnet, critical cur-rent and notch size. We know that intensity of magnetic fields was controled by critical current and uniformity of magnetic fields was controled by notch size. The optimal design conditions to get the high intensity and uniformity of magnetic field in this experiments were radius of bobbin=3[cm], radius of magnetic=12[cm], length of Z=10[cm], notch size=6[cm] and critical current=12[A].

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Design and simulation of small size high-Tc superconducting magnet (소형 고온 초전도 마그넷 설계 및 시뮬레이션)

  • 김민기;강형곤;정동철;한병성
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1994.11a
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    • pp.192-197
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    • 1994
  • High-Tc superconducting magnet properties were dependent upon design conditions such as its radius, length, critical current and notch size. In order to study, design and the simulation for small size magnet were implemented. We know that intensity of magnetic fields controled by critical current and factor ${\alpha}$( R$_2$/R$_1$) and uniformity controled by notch size. The optimal condition of intensity and uniformity magnetic field in this experiments are R$_1$=3[cm], R$_2$=12[cm], Z=10[cm], ${\alpha}$=4, notch=6[cm], critical current=12[A].

Study on Ammonia Uniformity and DeNOx Analysis in the Urea-SCR System for Construction Machinery (건설기계용 Urea-SCR 시스템의 촉매전단에서 암모니아 균질도 해석 및 DeNOx 성능에 관한 연구)

  • Kim, Donghwan;Park, Junkyu;Kang, Joung-ho;Moon, Seonjoon;Park, Sungwook
    • Journal of ILASS-Korea
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    • v.24 no.2
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    • pp.51-57
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    • 2019
  • In this study, the spray atomization characteristics of urea injector used in SCR system for construction machinery was analyzed, and the uniformity index at the front of mixer and NOx conversion efficiency were evaluated through numerical analysis. Spray visualization and droplet size/velocity measurement were performed and the measured results were used to verify the spray analysis model to calculate the uniformity index in the exhaust gas after-treatment system. For the flow analysis, STAR-CCM, a three-dimensional CFD, was used and the uniformity index of the SCR system at the front of the mixer was calculated using the droplet dissociation model and the wall collision model. Finally, the DeNOx performance for the average condition of the NRTC driving mode was calculated to understand the NOx conversion efficiency reflecting the exhaust gas temperature. The simulation results show that the uniformity index at the front of mixer was calculated as 0.862 and DeNOx efficiency was 75.9%.

CFD Analysis on Effect of Pressure Drop and Flow Uniformity with Geometry in 13" Asymmetric DPF (13" 비대칭 DPF 내 형상에 따른 배압 및 유동균일도 영향에 관한 전산해석연구)

  • HAN, DANBEE;BYUN, HYUNSEUNG;BAEK, YOUNGSOON
    • Transactions of the Korean hydrogen and new energy society
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    • v.31 no.6
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    • pp.614-621
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    • 2020
  • Recently, as the fine dust is increased and the emission regulations of diesel engines are strengthened, interest in diesel soot filtration devices is rapidly increased. In particular, there is a demand for technology development for higher efficiency of diesel exhaust gas after-treatment devices. As part of this, many studies conducted to increase the exhaust gas treatment efficiency by improving the flow uniformity of the exhaust gas in the DPF and reducing the pressure drop between the inlet and outlet of disel particle filter (DPF). In this study, computational fluid dynamics (CFD) simulation was performed when exhaust gas flows into the canning reduction device equipped with a 13" asymmetric DPF in order to maintain the flow uniformity in the diesel exhaust system and reduce the pressure. In particular, a study was conducted to find the geometry with the smallest pressure drop and the highest flow uniformity by simulating the DPF I/O ratio, exhaust gas temperature, inlet-outlet pressure and flow uniformity according to the geometry and hole size of distributor.

Numerical Analysis of Flow Uniformity in Selective Catalytic Reduction (SCR) Process Using Computational Fluid Dynamics (CFD)

  • Shon, Byung-Hyun
    • International Journal of Advanced Culture Technology
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    • v.10 no.3
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    • pp.295-306
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    • 2022
  • The NOx removal performance of the SCR process depends on various factors such as catalytic factors (catalyst composition, shape, space velocity, etc.), temperature and flow rate distribution of the exhaust gas. Among them, the uniformity of the flow flowing into the catalyst bed plays the most important role. In this study, the flow characteristics in the SCR reactor in the design stage were simulated using a three-dimensional numerical analysis technique to confirm the uniformity of the airflow. Due to the limitation of the installation space, the shape of the inlet duct was compared with the two types of inlet duct shape because there were many curved sections of the inlet duct and the duct size margin was not large. The effect of inlet duct shape, guide vane or mixer installation, and venturi shape change on SCR reactor internal flow, airflow uniformity, and space utilization rate of ammonia concentration were studied. It was found that the uniformity of the airflow reaching the catalyst layer was greatly improved when an inlet duct with a shape that could suppress drift was applied and guide vanes were installed in the curved part of the inlet duct to properly distribute the process gas. In addition, the space utilization rate was greatly improved when the duct at the rear of the nozzle was applied as a venturi type rather than a mixer for uniform distribution of ammonia gas.

Analysis of temperature distribution of wafers inside LPCVD chamber for improvement of thickness uniformity (두께 균일도 향상을 위한 LPCVD 챔버 내 웨이퍼 온도 분포 분석)

  • Kang, Seung-Hwan;Kim, Byeong Hoon;Kong, Byung Hwan;Lee, Jae Won;Ko, Han Seo
    • Journal of the Korean Society of Visualization
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    • v.14 no.2
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    • pp.25-30
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    • 2016
  • The wafer temperature and its uniformity inside the LPCVD chamber were analyzed. The temperature uniformity at the end of the wafer load depends on the heat-insulating cap. The finite difference method was used to investigate the radiation and conduction heat transfer mechanisms, and the temperature field and heat diffusion in the LPCVD chamber was visualized. It was found that the temperature uniformity of the wafers could be controlled by the size and distance of the heat-insulating cap.

Color and Luminance Compensation for Large AMOLEDs

  • Park, Kyong-Tae;Arkipov, Alexander;Lee, Baek-Woon;Kim, Seon-Min
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.850-853
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    • 2009
  • Many well-known pixel compensation circuits have been applied to control TFT $V_{th}$ variations on small size AMOLED panels. For large (>30-inch) AMOLEDs, luminance and color uniformity are affected by TFT variations, but also by ELVDD IR drop and cavity non-uniformity which are not easily compensated by in-pixel circuits. AMOLED panels may also suffer from manufacturing-induced mura. An external compensation method based on optical measurements is proposed and applied to large AMOLED panels. It improves luminance uniformity by up to 95% at 200nits and color uniformity by up to 99% (${\Delta}$u'v' <0.004) on large AMOLED panels, and provides-increased margin against processinduced mura.

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Temperature Uniformity Control of Wafer During Vacuum Soldering Process (진공 솔더링 공정 중 웨이퍼 온도균일화 제어)

  • Kang, Min Sig;Jee, Won Ho;Yoon, Wo Hyun
    • Journal of the Semiconductor & Display Technology
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    • v.11 no.2
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    • pp.63-69
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    • 2012
  • As decreasing size of chips, the need of wafer level packaging is increased in semi-conductor and display industries. Temperature uniformity is a crucial factor in vacuum soldering process to guarantee quality of bonding between chips and wafer. In this paper, a stepwise iterative algorithm has been suggested to obtain output profile of each heat source. Since this algorithm is based on open-loop stepwise iterative experimental technique, it is easier to implement and cost effective than real time feedback controls. Along with some experiments, it was shown that the suggested algorithm can remarkably improve temperature uniformity of wafer during whole heating process compared with the ordinary manual trial-and error method.

The Conditions of a Holographic Homogenizer to Optimize the Intensity Uniformity (주기적인 홀로그램을 이용한 레이저 광 세기 균일화기에서 균일도를 최적화하기 위한 홀로그램의 조건)

  • Go, Chun-Soo;Oh, Yong-Ho;Lim, Sung-Woo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.24 no.7
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    • pp.578-583
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    • 2011
  • We report on the design of a holographic homogenizer composed of a periodic hologram and a condensing lens. If the hologram is periodic, the homogenizer is free from the alignment error of the incident laser beam. Holographic homogenizer also has an advantage of the flexibility in the size of the target beam. We calculated theoretically the Fraunhofer diffracted wave function when a rectangular laser beam is incident on a periodic hologram. The diffracted wave is the sum of sinc functions at regular distance. The width of each sinc function depends on the size of the incident laser beam and the distance between the sinc functions depends on the period of the hologram. We calculated numerically the diffracted light intensity for various ratios of the size of the incident laser beam to the period of the hologram. The results show that it is possible to make the diffracted beam uniform at a certain value of the ratio. The uniformity is high at the central part of the target area and low near the edge. The more sinc functions are included in the target area, the larger portion of the area becomes uniform and the higher is the uniformity at the central part. Therefore, we can make efficient homogenizer if we design a hologram so that the maximum number of the diffracted beams may be included in the target area.