• Current Photovoltaic Research
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• 제9권1호
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• pp.17-21
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• 2021

In this study, the effect of water level and temperature on the power generation was investigated in a water tank with an aquavoltaic PV module to perform feasibility research for the development of salt farm aquavoltaic system. The silicon solar cell attached to the bottom of each water tank is a 1-cell mini module, and the underwater effects of the crystal phase (19.0~19.9% of single- & 17.9~19.9% of poly-crystalline) of the PV module were investigated, and power generation characteristics for water level (0~10 cm) and temperature (10~40℃) were analyzed. The deterioration coefficients according to the water level and temperature of each single- and poly-crystalline module were investigated at very similar levels such as, -2.01 %/cm and -2.02 %/cm, -0.50 %/℃ and -0.48 %/℃, respectively. Therefore, in salt farm aquavoltaic system, water levels need to maintain as low as possible, and heat-induced degradation is similar to those shown in general land, and no factors have been found to be affected by the underwater environment depending on the determination.

• 한국주조공학회지
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• 제44권2호
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• pp.31-39
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• 2024

제2세대 단결정 초내열합금 CMSX-4은 1310℃ 이상의 온도로 용체화처리에 의해 수지상 경계와 γ/γ'공정조직이 제거되었으며, γ'상의 크기는 용체화처리 온도와 시간의 증가에 따라 수지상간 영역에서 감소하는 경향을 보였다. γ'상의 크기는 수지상 중심과 수지상간 영역에서 큰 차이를 보였다. 모든 열처리 조건에서 수지상간 영역에서 γ'상이 크게 나타났다. 용체화처리 온도와 시간의 증가에 따라 수지상 중심과 수지상간 영역의 γ'합금형성 원소 편석은 크게 감소하였으나, W, Co, Re과 같은 고용 강화원소들의 편석은 모든 열처리 후에도 어느 정도 잔존하였다. 특히, Re은 편석이 완전히 해소되지 않았다. 새로운 유해상의 생성이 없는 상온 인장 특성은 용체화처리 온도와 시간의 증가에 따라 개선되는 경향을 보였다.

• Bulletin of the Korean Chemical Society
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• 제30권1호
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• pp.219-223
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• 2009

$TiO_2$ doped with $Er^{3+\;and\;Yb^{3+}$ was used for fabricating a scattering layer and a nano-crystalline $TiO_2$ electrode layer to be used in dye-sensitized solar cells. The material was prepared using a new sol-gel combustion hybrid method with acetylene black as fuel. The $Er^{3+}$-$Yb^{3+}$ co-doped titanium oxide powder synthesized at 700oC had embossed structure morphology with a size between 27 to 54 nm that agglomerated to produce micron size particles, as observed by the scanning electron micrographs. The XRD patterns showed that the $Er^{3+}$-$Yb^{3+}$ co-doped titanium oxide had an amorphous structure, while using the same method without doping $Er^{3+}\;or\;Yb^{3+},\;TiO_2$ was obtained in the crystallite form with thea dominance of rutile phase. Fabricating a bilayer structure consisting of nano-crystalline $TiO_2$ and the synthesized $Er^{3+}$-$Yb^{3+}$ co-doped titanium oxide showed better scattering property, with an overall increase of 15.6% in efficiency of the solar cell with respect to a single nano-crystalline $TiO_2$ layer.

• 한국진공학회지
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• 제22권6호
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• pp.306-312
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• 2013

화학적 증기증착(Chemical Vapor Deposition, CVD) 방법을 이용하여 단결정 Indium antimonide (InSb) 나노와이어를 $SiO_2$ wafer 위에 성장시켰으며, 성장된 InSb 나노와이어의 결정성과 조성비를 X-Ray Diffraction (XRD)과 Energy Dispersive x-ray Spectroscopy (EDS)의 측정을 통하여 확인하였다. 또한, 반응 source로 사용된 InSb 분말의 기상화(vaporization) 정도를 source container의 모형, 즉 open 및 close 시스템으로 변형하여 조절하였고 이렇게 성장된 InSb 나노와이어들의 구조적 특성을 주사전자현미경(Scaning Electron Microscopy, SEM)을 통하여 자세히 분석함으로써, 그들의 성장과정을 Vapor-Liquid-Solid (VLS) 및 Vapor-Solid (VS) 메커니즘으로 설명하였다. Open-boat를 사용하여 나노와이어를 성장시켰을 경우, close-boat 의 경우와 비교하여 합성된 나노와이어의 yield가 높았으며 나노와이어의 길이와 두께도 증가하는 현상이 관측되었다. 이러한 결과는, InSb source 의 기상화 정도가 close-boat에서 보다 open-boat에서 더욱 가속화되면서 공통적으로 일어나는 VLS 성장 이외에 VS 성장이 추가적으로 진행되어지기 때문으로 추측되어진다. 또한, 반응시간을 증가시켰을 때, 나노와이어의 두께가 증가하는 결과를 통하여 InSb 나노와이어의 성장에서 VS 메커니즘이 우세하게 작용하고 있음을 확인할 수 있었다.

• 한국결정성장학회지
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• 제25권4호
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• pp.127-134
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• 2015

AlN 단결정은 넓은 밴드갭(6.2 eV), 높은 열 전도도($285W/m{\cdot}K$), 높은 비저항(${\geq}10^{14}{\Omega}{\cdot}cm$), 그리고 높은 기계적 강도와 같은 장점들 때문에 차세대 반도체 적용을 위한 많은 흥미를 끈다. 벌크 AlN 단결정 또는 박막 템플릿(template)들은 주로 PVT(Physical vapor transport)법, 플럭스(flux)법, 용액 성장(solution growth)법, 그리고 증기 액상 증착(HVPE)법에 의해 성장된다. 단결정이 성장하는 동안에 발생하는 결함들 때문에 상업적으로 어려움을 갖게 된 이후로 결함들 분석을 통한 결정 품질 향상은 필수적이다. 격자결함 밀도(EPD)분석은 AlN 표면에 입자간 방위차와 결함이 존재하고 있는 것을 보여준다. 투과전자현미경(TEM)과 전자후방산란회절(EBSD)분석은 전체적인 결정 퀄리티와 다양한 결함의 종류들을 연구하는데 사용된다. 투과전자현미경(TEM)관찰로 AlN의 형태가 적층 결함, 전위, 이차상 등에 의해 크게 영향을 받는 것을 알 수 있었다. 또한 전자후방산란회절(EBSD)분석은 전위의 생성을 유도하는 성장 결함으로서 AlN의 zinc blende 폴리모프(polymorph)가 존재하고 있는 것을 나타내고 있었다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.100-101
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• 2012

The plasma damage free and room temperature processedthin film deposition technology is essential for realization of various next generation organic microelectronic devices such as flexible AMOLED display, flexible OLED lighting, and organic photovoltaic cells because characteristics of fragile organic materials in the plasma process and low glass transition temperatures (Tg) of polymer substrate. In case of directly deposition of metal oxide thin films (including transparent conductive oxide (TCO) and amorphous oxide semiconductor (AOS)) on the organic layers, plasma damages against to the organic materials is fatal. This damage is believed to be originated mainly from high energy energetic particles during the sputtering process such as negative oxygen ions, reflected neutrals by reflection of plasma background gas at the target surface, sputtered atoms, bulk plasma ions, and secondary electrons. To solve this problem, we developed the NBAS (Neutral Beam Assisted Sputtering) process as a plasma damage free and room temperature processed sputtering technology. As a result, electro-optical properties of NBAS processed ITO thin film showed resistivity of $4.0{\times}10^{-4}{\Omega}{\cdot}m$ and high transmittance (>90% at 550 nm) with nano- crystalline structure at room temperature process. Furthermore, in the experiment result of directly deposition of TCO top anode on the inverted structure OLED cell, it is verified that NBAS TCO deposition process does not damages to the underlying organic layers. In case of deposition of transparent conductive oxide (TCO) thin film on the plastic polymer substrate, the room temperature processed sputtering coating of high quality TCO thin film is required. During the sputtering process with higher density plasma, the energetic particles contribute self supplying of activation & crystallization energy without any additional heating and post-annealing and forminga high quality TCO thin film. However, negative oxygen ions which generated from sputteringtarget surface by electron attachment are accelerated to high energy by induced cathode self-bias. Thus the high energy negative oxygen ions can lead to critical physical bombardment damages to forming oxide thin film and this effect does not recover in room temperature process without post thermal annealing. To salve the inherent limitation of plasma sputtering, we have been developed the Magnetic Field Shielded Sputtering (MFSS) process as the high quality oxide thin film deposition process at room temperature. The MFSS process is effectively eliminate or suppress the negative oxygen ions bombardment damage by the plasma limiter which composed permanent magnet array. As a result, electro-optical properties of MFSS processed ITO thin film (resistivity $3.9{\times}10^{-4}{\Omega}{\cdot}cm$, transmittance 95% at 550 nm) have approachedthose of a high temperature DC magnetron sputtering (DMS) ITO thin film were. Also, AOS (a-IGZO) TFTs fabricated by MFSS process without higher temperature post annealing showed very comparable electrical performance with those by DMS process with $400^{\circ}C$ post annealing. They are important to note that the bombardment of a negative oxygen ion which is accelerated by dc self-bias during rf sputtering could degrade the electrical performance of ITO electrodes and a-IGZO TFTs. Finally, we found that reduction of damage from the high energy negative oxygen ions bombardment drives improvement of crystalline structure in the ITO thin film and suppression of the sub-gab states in a-IGZO semiconductor thin film. For realization of organic flexible electronic devices based on plastic substrates, gas barrier coatings are required to prevent the permeation of water and oxygen because organic materials are highly susceptible to water and oxygen. In particular, high efficiency flexible AMOLEDs needs an extremely low water vapor transition rate (WVTR) of $1{\times}10^{-6}gm^{-2}day^{-1}$. The key factor in high quality inorganic gas barrier formation for achieving the very low WVTR required (under ${\sim}10^{-6}gm^{-2}day^{-1}$) is the suppression of nano-sized defect sites and gas diffusion pathways among the grain boundaries. For formation of high quality single inorganic gas barrier layer, we developed high density nano-structured Al2O3 single gas barrier layer usinga NBAS process. The NBAS process can continuously change crystalline structures from an amorphous phase to a nano- crystalline phase with various grain sizes in a single inorganic thin film. As a result, the water vapor transmission rates (WVTR) of the NBAS processed $Al_2O_3$ gas barrier film have improved order of magnitude compared with that of conventional $Al_2O_3$ layers made by the RF magnetron sputteringprocess under the same sputtering conditions; the WVTR of the NBAS processed $Al_2O_3$ gas barrier film was about $5{\times}10^{-6}g/m^2/day$ by just single layer.

• 대한금속재료학회지
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• 제46권11호
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• pp.762-769
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• 2008

Hydrogenated amorphous silicon(a-Si : H) layers, 120 nm and 50 nm in thickness, were deposited on 200 $nm-SiO_2$/single-Si substrates by inductively coupled plasma chemical vapor deposition(ICP-CVD). Subsequently, 30 nm-Ni layers were deposited by E-beam evaporation. Finally, 30 nm-Ni/120 nm a-Si : H/200 $nm-SiO_2$/single-Si and 30 nm-Ni/50 nm a-Si:H/200 $nm-SiO_2$/single-Si were prepared. The prepared samples were annealed by rapid thermal annealing(RTA) from $200^{\circ}C$ to $500^{\circ}C$ in $50^{\circ}C$ increments for 30 minute. A four-point tester, high resolution X-ray diffraction(HRXRD), field emission scanning electron microscopy (FE-SEM), transmission electron microscopy (TEM), and scanning probe microscopy(SPM) were used to examine the sheet resistance, phase transformation, in-plane microstructure, cross-sectional microstructure, and surface roughness, respectively. The nickel silicide on the 120 nm a-Si:H substrate showed high sheet resistance($470{\Omega}/{\Box}$) at T(temperature) < $450^{\circ}C$ and low sheet resistance ($70{\Omega}/{\Box}$) at T > $450^{\circ}C$. The high and low resistive regions contained ${\zeta}-Ni_2Si$ and NiSi, respectively. In case of microstructure showed mixed phase of nickel silicide and a-Si:H on the residual a-Si:H layer at T < $450^{\circ}C$ but no mixed phase and a residual a-Si:H layer at T > $450^{\circ}C$. The surface roughness matched the phase transformation according to the silicidation temperature. The nickel silicide on the 50 nm a-Si:H substrate had high sheet resistance(${\sim}1k{\Omega}/{\Box}$) at T < $400^{\circ}C$ and low sheet resistance ($100{\Omega}/{\Box}$) at T > $400^{\circ}C$. This was attributed to the formation of ${\delta}-Ni_2Si$ at T > $400^{\circ}C$ regardless of the siliciation temperature. An examination of the microstructure showed a region of nickel silicide at T < $400^{\circ}C$ that consisted of a mixed phase of nickel silicide and a-Si:H without a residual a-Si:H layer. The region at T > $400^{\circ}C$ showed crystalline nickel silicide without a mixed phase. The surface roughness remained constant regardless of the silicidation temperature. Our results suggest that a 50 nm a-Si:H nickel silicide layer is advantageous of the active layer of a thin film transistor(TFT) when applying a nano-thick layer with a constant sheet resistance, surface roughness, and ${\delta}-Ni_2Si$ temperatures > $400^{\circ}C$.

• 대한기계학회:학술대회논문집
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• 대한기계학회 2007년도 춘계학술대회A
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• pp.521-526
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• 2007

Density functional calculations have been performed for the reactions of perfluoroalkylsilane and alkylsilane with silica surfaces. The (100) and (111) surfaces of ${\beta}-cristobalite$ are used as two possible models of the hydroxylated amorphous silica surface. This is the crystalline phase of silica with density and refractive index closest to those of amorphous silica. Moreover, two ${\beta}-cristobalite$ surfaces have the two types of silanol groups, namely the single silanols and the geminal silanols. We investigate the possible adsorption structure and formation energy of perfluoroalkylsilane and alkylsilane molecules with two type of silanol groups. The results will be compared with cluster and slab model.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.2
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• pp.1270-1273
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• 2004

The combination of methane-chemical activation and Self-propagating High-temperature synthesis (SHS) has widened the possibilities for both methods. For YBCO systems the investigation showed that a short-term mechano-chemical activation of initial powders before SHS leads to single-phase and ultra-fine products. A new technique for preparation ultra-fine high-temperature superconductors of YBCO composition with a grain size d < $1{\mu}m$ is developed. The specific feature of the technique is formation of the $YBa_2Cu_3O_{7-x}$ crystalline lattice directly from an X-ray amorphous state arising as a result of mechanical activation of the original oxide mixture. The technique allows the stage of formation of any intermediate reaction products to be ruled out. X-ray and magnetic studies of ultra-fine high temperature superconductors (HTS) are carried out. Dimension effects associated with the microstructure peculiarities are revealed. A considerable enhancement of inter-grain critical currents is found to take place in the ultra-fine samples investigated.

• 한국전기전자재료학회논문지
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• 제22권1호
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• pp.53-60
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• 2009

$ZrTiO_4$ dielectric thin films were coated by metal-organic decomposition, and annealed by rapid thermal processing up to $900^{\circ}C$ for their crytallization. Crystallized single-phase $ZrTiO_4$ thin films were fabricated above the annealing temperature of $800^{\circ}C$, but their grains were randomly oriented without specific textured orientation. Best dielectric properties were presented by the sample annealed at $800^{\circ}C$ which had crystalline structure and flat surface. Dielectric constant of the film was maintained at 32 throughout full frequency range up to 6 GHz, and dielectric loss was varied between 0.01 and 0.04.