• Title/Summary/Keyword: Silsesquioxane

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Thermal and Mechanical Properties of OG POSS Filled DGEBA/DDM (OG POSS의 첨가가 DGEBA/DDM의 열적, 기계적 물성에 미치는 영향)

  • Choi, Chunghyeon;Kim, YunHo;Kumar, Sarath Kumar Sathish;Kim, Chun-Gon
    • Composites Research
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    • v.30 no.6
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    • pp.379-383
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    • 2017
  • A study on the low Earth orbit (LEO) space environment have been conducted as a use of composites have increased. Among the LEO environmental factors, atomic oxygen is one of the most critical factors because atomic oxygen can react and erode a surface of polymer-based composite materials. POSS (Polyhedral Oligomeric Silsesquioxane) materials have been widely studied as an atomic oxygen-resistant nanomaterial. In this study, nanocomposites, which are composed of OG (Octaglycidyldimethylsilyl) POSS nanomaterials and DGEBA/DDM epoxy, were fabricated to find out its thermal and mechanical properties. FT-IR results showed that the nanocomposites were fully cured and contained OG POSS enough. Thermogravimetric analysis and differential scanning calorimetry were performed to measure the thermal properties of the nanocomposites. The initial mass loss temperature and char yield were increased through the filling of OG POSS. As the content of OG POSS increased, glass transition temperature tended to increase to 5 wt.% of OG POSS, but the temperature decreased significantly at 10 wt.% of OG POSS. The tensile test results showed that the content of OG POSS did not affect tensile strength and tensile stiffness.

Synthesis of POSS-Functionalized Imidazole

  • Choi, Kyung-Min;Jang, Hee-Jae;Shin, Dong-Soo
    • Journal of the Korean Chemical Society
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    • v.63 no.1
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    • pp.51-55
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    • 2019
  • The synthesis of N-substituted POSS-imidazole in one pot typically prepared using the condensation method from diketone and aminopropylisobutyl-POSS. A wide variety of functional groups and substitution patterns were tolerated under the present procedure. The resulting compounds can be used as valuable products allowing for the elaboration to OLED, DSSC building block.

Characterization of Electrical Properties on Cu Diffusion in Low-k Dielectric Materials for ULSI Interconnect (반도체 배선용 저 유전 물질에서의 구리 확산에 대한 전기적 신뢰성 평가)

  • Lee Hee-Chan;Joo Young-Chang;Ro Hyun-Wook;Yoon Do-Young;Lee Jin-kyu;Char Kook-Heon
    • Journal of the Microelectronics and Packaging Society
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    • v.11 no.3 s.32
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    • pp.9-15
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    • 2004
  • We investigated the electrical properties of copolymer low-k materials that are compromised of the PMSSQ(Poly Methyl Silsesquioxane)-based matrix with the BTMSE (Bis Tri Methoxy Silyl Ethane) additives. We manufactured MIS-type test samples using the copolymer as the insulator and measured their leakage current and failure time by means of the BTS (bias-temperature-stress) test. The failure time was observed to decrease drastically when the porosity of the copolymer was increased over $30\%$. From the measurement of failure time with respect to temperature. the activation energy of Cu drift through the copolymer was calculated to be 1.51 eV.

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Control of Molecular Weight, Stereochemistry and Higher Order Structure of Siloxane-containing Polymers and Their Functional Design

  • Yusuke Kawakami;Yuning Li;Yang Liu;Makoto Seino;Chitsakon Pakjamsai;Motoi Oishi;Cho, Yeong-Bee;Ichiro Imae
    • Macromolecular Research
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    • v.12 no.2
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    • pp.156-171
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    • 2004
  • We describe the precision synthesis schemes of siloxane-containing polymers, i.e., the control of their molecular weight, stereoregularity, and higher-order structures. First, we found a new catalytic dehydrocoupling reaction of water with bis(dimethylsilyl)benzene to give poly(phenylene-disiloxane). Together with this reaction, we applied hetero-condensations to the synthesis of thermally stable poly(arylene-siloxane)s. The dehydrocoupling reaction was applied to the synthesis of syndiotactic poly(methylphenylsiloxane) and poly(silsesquioxane)s, which we also prepared by hydrolysis and deaminative condensation reactions. We discuss the tendency for loop formation to occur in the synthesis of poly(silsesquioxane) by hydrolysis, and provide comments on the design of functionality of the polymers produced. By taking advantage of the low energy barrier to rotation in the silicon-oxygen bond, we designed selective oxygen-permeable membrane materials and liquid crystalline materials. The low surface free energy of siloxane-containing systems allows surface modification of a blend film and the design of holographic grating materials.

Preparation of Silicon-Based Hybrid Gels with POSS Additives and Their Application to LED Encapsulants (POSS계 첨가제를 가지는 실리콘 젤의 제조와 LED 봉지재 응용)

  • Eun, Hee-Chun;Im, Hee-Eun;Lee, Yun Sang;Kwark, Young-Je
    • Polymer(Korea)
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    • v.39 no.2
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    • pp.311-316
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    • 2015
  • Densely structured polyhedral oligomeric silsesquioxane (POSS) was employed as an additive to enhance hardness of silicon-based hybrid gels for LED encapsulants. To improve the miscibility of POSS and polysiloxane resin, alkyl or oligosiloxane branches were introduced to POSS moiety. Platinum-catalyzed hydrosilylation reactions were used to attach branches of 1-decanol, 9-decen-1-ol, and vinyl-terminated oligosiloxane to the POSS molecules. Alkyl-branched POSSs (decyl-POSS and decenyl-POSS) were immiscibile with polysiloxane resin and generated gels with low transparency and low hardness values. On the other hand, oligosiloxane-branched POSS (Siloxy-POSS) showed good miscibility with polysiloxane resin to give gels with high transparency. However, the prepared gels did not show noticeable improvement in hardness compared to the gels without the POSS additive.

Glass Transition Temperature and Isothermal Physical Aging of PMMA Thin Films Incorporated with POSS (POSS를 함유한 PMMA 박막의 유리전이온도 및 등온 물리적 시효)

  • Jin, Sil-O;Lee, Jong-Keun
    • Polymer(Korea)
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    • v.36 no.4
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    • pp.507-512
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    • 2012
  • Thin (~650 nm) and ultrathin (~50 nm) films of neat PMMA and PMMA containing 5 wt% of methacryl-polyhedral oligomeric silsesquioxane were prepared in this work. The effects of film thickness and POSS on glass transition temperature ($T_g$) and isothermal physical aging were investigated by means of differential scanning calorimetry (DSC). $T_g$ depression was observed as film thickness was decreased and Ma-POSS molecules were incorporated. Enthalpy relaxation (${\Delta}H_{Relax}$) due to the isothermal physical aging was reduced by ultra-thin film thickness and the addition of Ma-POSS. KWW (Kohlrausch-Williams-Watts) equation was used to fit ${\Delta}H_{Relax}$ vs. aging time data providing the fitting parameters; maximum enthalpy recovery (${\Delta}H_{\infty}$), relaxation time (${\tau}$) and non-exponentiality parameter (${\beta}$).

Synthesis of POSS Derived Organic-Inorganic Hybrid Esters for Insulating Oil Applications

  • Choi, Kyeong-Min;Harshavardhan, S.J.;Sridhar, Ch.;Vijaykumar, B.V.D.;Kumar, Deepak;Jang, Kiwan;Lee, Man-Sig;Shin, Dong-Soo
    • Bulletin of the Korean Chemical Society
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    • v.35 no.9
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    • pp.2769-2773
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    • 2014
  • In this work, a new family of polyhedral oligomeric silsesquioxanes (POSS) based esters have been synthesized that consists eight ester functional groups. These are classified into Type-I and Type-II esters based on the starting materials, octakis(3-chloropropyl)silsesquioxane (Cl-POSS) and octakis(3-hydroxypropyldimethylsiloxy) octasilsesquioxane (OHPS) respectively. These new POSS type ester moieties can be used as insulating oils and oil additives in the transformers and also considered to be alternatives to mineral and vegetable oils that are presently used in the insulation system.

Compatibility of POSS Composites with Silicone Monomers and Application to Contact Lenses Material

  • Lee, Min-Jae;Lee, Kyungmun;Sung, A-Young
    • Journal of the Korean Chemical Society
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    • v.64 no.6
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    • pp.354-359
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    • 2020
  • This research was conducted to analyze the compatibility of used monomers and produce the high functional contact lens material containing silicone monomers. Silicone monomer (Sil-OH), Trimethylsilylmethacrylate (TSMA) were used as additives for the basic combination of Polyhedral Oligomeric Silsesquioxane (POSS), methyl methacrylate (MMA) and methyl acrylate (MA). And also, the materials were copolymerized with ethylene glycol dimethacrylate (EGDMA) as the cross-linking agent, AIBN (thermal polymerization initiator) as the initiator. It is judged that the fabricated lenses of all combinations are optically excellent and thus used monomers have good compatibility. Measurement of the optical and physical characteristics of the manufactured hydrophilic lens material were varied in each case. Especially TSMA with POSS increases the oxygen permeability and Sil-OH with POSS increases the wettability by the addition of Sil-OH. These materials were considered to have compatibility each other, so it can be used in functional contact lens material.

Fabrication of Hybrid Nanocomposites of PAA-grafted Graphene and Pd Nanoparticles having POSS (Pd-POSS) (그래핀과 실세스키옥세인을 포함한 팔라듐 나노입자와의 나노복합체 제조)

  • Lim, Jung-Hyurk;Ko, Yl-Woong;Kim, Ki-Young;Kim, Kyung-Min
    • Polymer(Korea)
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    • v.36 no.5
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    • pp.656-661
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    • 2012
  • The palladium nanoparticles were self-assembled to make Pd-POSS using POSS-$NH_3{^+}$ (polyhedral oligomeric silsesquioxane) as a crosslinker. Graphene oxide (GO) was produced by the reaction of graphite under a strong acid and oxidizer and poly(acrylic acid) (PAA) was covalently grafted on the surface of graphene to make PAA-grafted graphene through the radical polymerization of acrylic acid and GO along with a reduction process under $NaBH_4$. The nanocomposites of Pd-POSS and PAA-grafted graphene were fabricated via ionic interactions between positively charged Pd-POSS and negatively charged PAA-grafted graphene. Pd-POSS nanoparticles were attached to the surface of PAA-grafted graphene through ionic interactions. The thermal stability of Pd-POSS/PAA-grafted graphene was higher than that of PAA and PAA-grafted graphene. The composition, structure, surface morphology, and thermal stability of the Pd-POSS/PAA-grafted graphene were studied by FE-SEM, AFM, TEM, FTIR, and TGA.