• Title/Summary/Keyword: Silicon substrate

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Structural Variation of Diamond-like Carbon Thin Film According to the Annealing Temperature (열처리온도에 따른 다이아몬드상 카본박막의 구조적 특성변화)

  • Choi Won-Seok;Park Mun-Gi;Hong Byung-You
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.19 no.8
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    • pp.701-706
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    • 2006
  • In addition to its similarity to genuine diamond film, diamond-like carbon (DLC) film has many advantages, including its wide band gap and variable refractive index. In this study, DLC films were prepared by the RF PECVD (Plasma Enhanced Chemical Vapor Deposition) method on silicon substrates using methane $(CH_4)$ and hydrogen $(H_2)$ gas. We examined the effects of the post annealing temperature on the structural variation of the DLC films. The films were annealed at temperatures ranging from 300 to $900^{\circ}C$ in steps of $200^{\circ}C$ using RTA equipment in nitrogen ambient. The thickness of the film and interface between film and substrate were observed by surface profiler, field emission scanning electron microscopy (FESEM), high resolution transmission electron microscopy (HRTEM), respectively. Raman and X-ray photoelectron spectroscopy (XPS) analysis showed that DLC films were graphitized ($I_D/I_G$, G-peak position and $sp^2/sp^3$ increased) ratio at higher annealing temperature. The variation of surface as a function of annealing treatment was verified by a AFM and contact angle method.

The Analysis of Degradation Characteristics in Poly-Silicon Thin film Transistor Formed by Solid Phase Crystallization (고상 결정화로 제작한 다결성 실리콘 박막 트랜지스터에서의 열화특성 분석)

  • 정은식;이용재
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.16 no.1
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    • pp.26-32
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    • 2003
  • Then-channel poly-Si thin-film transistors (poly-Si TFT's) formed by solid phase crystallization (SPC) method on glass were measured to obtain the electrical parameters such as of I-V characteristics, mobility, leakage current, threshold voltage, and subthreshold slope. Then, devices were analyzed to obtain the reliability and appliability on TFT-LCD with large-size and high density. In n-channel poly-Si TFT with 5$\mu\textrm{m}$/2$\mu\textrm{m}$, 8$\mu\textrm{m}$, 30$\mu\textrm{m}$ devices of channel width/length, the field effect mobilities are 111, 116, 125 $\textrm{cm}^2$/V-s and leakage currents are 0.6, 0.1, and 0.02 pA/$\mu\textrm{m}$, respectively. Low threshold voltage and subthreshold slope, and good ON-OFF ratio are shown, as well. Thus. the poly-Si TFT's used by SPC are expected to be applied on TFT-LCD with large-size and high density, which can integrate the display panel and peripheral circuit on a targe glass substrate.

Crystal Characteristics of 3C-SiC Thin-films Grown on 2 inch Si(100) wafer (2 inch Si(100)기판위에 성장된 3C-SiC 박막의 결정특성)

  • Chung, Su-Young;Chung, Yun-Sik;Ryu, Ji-Goo;Chung, Gwiy-Sang;Shigehiro, Nishino
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.11a
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    • pp.452-455
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    • 2002
  • Single crystal 3C-SiC(cubic silicon carbide) thin-films were deposited on Si(100) substrate up to a thickness of $4.3{\mu}m$ by APCVD method using HMDS(hexamethyildisilane) at $1350^{\circ}C$. The HMDS flow rate was 0.5 sccm and the carrier gas flow rate was 2.5 slm. The HMDS flow rate was important to get a mirror-like crystal surface. The growth rate of the 3C-SiC films was $4.3{\mu}m/hr$. The 3C-SiC epitaxical films grown on Si(100) were characterized by XRD, AFM, RHEED, XPS and raman scattering, respectively. The 3C-SiC distinct phonons of TO(transverse optical) near $796cm^{-1}$ and LO(longitudinal optical) near $974{\pm}1cm^{-1}$ were recorded by raman scattering measurement. The heteroepitaxially grown films were identified as the single crystal 3C-SiC phase by XRD spectra$(2{\theta}=41.5^{\circ})$.

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A Study on fabrication of the Ag fine pattern using Near Field Electro Spinning(NFES) (근접장 전기방사 방식을 이용한 Ag 미세 패턴 형성)

  • Sim, Hyo-Sun;Seo, Hwa-Il;Youn, Doo-Hyeb
    • Journal of the Semiconductor & Display Technology
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    • v.10 no.4
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    • pp.65-70
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    • 2011
  • These days, printed electronics attract attention from electronics industry. In this paper, the fabrication of the fine patterns by Near Field Electro Spinning (NFES) was studied by using Ag ink on silicon wafer (substrate). Two types of ink, the high viscous ink Ag-200 and low viscous ink Ag-15, were used. The fine and uniform patterns were easily fabricated by using Ag-200 because jet breakup is less occurred in high viscosity solution. As increasing flow rate of solution, aspect ratio of Ag pattern decreased. And there was optimum applied voltage for fine pattern. In case of Ag-200, the optimum applied voltage was about 2.02KV. When pattern was fabricated by NFES, the pattern width and height were affected by many factors such as viscosity, flow rate of solution, applied voltage etc.

Effects of Organic Thin Films on Local Resonance of Metamaterials under Photoexcitation

  • Song, Myeong-Seong;Hwang, In-Wook;Lee, Chang-Lyoul;Kang, Chul;Kee, Chul-Sik;Park, Sae June;Ahn, Yeong Hwan;Park, Doo Jae;Lee, Joong Wook
    • Current Optics and Photonics
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    • v.1 no.4
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    • pp.372-377
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    • 2017
  • We demonstrate that the local resonance of metamaterials can be tuned by the effects of organic thin films under photoexcitation. Tris (8-hydroxyquinolinato) aluminum ($Alq_3$) layers are deposited on metamaterial/silicon hybrid structures. By varying the thickness of the $Alq_3$ layer on the subwavelength scale, the resonant peak of the metamaterial becomes very adjustable, due to the effect of a thin dielectric substrate. In addition, under photoexcitation all the spectral peaks of the resonance shift to higher frequencies. This originates from the reduction of the capacitive response generated inside the gaps of split-ring resonators. The adjustability of the electromagnetic spectrum may be useful for developing optical systems requiring refractive-index engineering and active optical devices.

Effect of Die Bonding Epoxy on the Warpage and Optical Performance of Mobile Phone Camera Packages (모바일 폰 카메라 패키지의 다이 본딩 에폭시가 Warpage와 광학성능에 미치는 영향 분석)

  • Son, Sukwoo;Kihm, Hagyong;Yang, Ho Soon
    • Journal of the Semiconductor & Display Technology
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    • v.15 no.4
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    • pp.1-9
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    • 2016
  • The warpage on mobile phone camera packages occurs due to the CTE(Coefficient of Thermal Expansion) mismatch between a thin silicon die and a substrate. The warpage in the optical instruments such as camera module has an effect on the field curvature, which is one of the factors degrading the optical performance and the product yield. In this paper, we studied the effect of die bonding epoxy on the package and optical performance of mobile phone camera packages. We calculated the warpages of camera module packages by using a finite element analysis, and their shapes were in good agreement showing parabolic curvature. We also measured the warpages and through-focus MTF of camera module specimens with experiments. The warpage was improved on an epoxy with low elastic modulus at both finite element analysis and experiment results, and the MTF performance increased accordingly. The results show that die bonding epoxy affects the warpage generated on the image sensor during the packaging process, and this warpage eventually affects the optical performance associated with the field curvature.

Fabrication and Physical Properties of Heterojunction Solar Cell (II-VI) of $n-Cd_{1-x}Zn_xS/p-Si$ (이종접합 태양전지 (II-VI)의 제작과 물성에 대한 연구($n-Cd_{1-x}Zn_xS/p-Si$ 태양전지를 중심으로))

  • Lee, Soo-Il;Kim, Byung-Chul;Seo, Dong-Joo;Choi, Seong-Hyu;Hong, Kwang-Joon;You, Sang-Ha
    • Solar Energy
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    • v.8 no.1
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    • pp.41-48
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    • 1988
  • Heterojunction solar cells of $n-Cd_{1-x}Zn_xS/p-Si$ were fabricated by solution growth technique. The crystal structure, spectral response, surface morphology, and I-V characteristics of the $n-Cd_{1-x}Zn_xS/p-Si$ heterojunction solar cells were studied. The $Cd_{1-x}Zn_xS$ layer deposited on a silicon substrate (111) were found to be a cubic structure with the crystal orientation (111), (220) of the CdS and to be a hexagonal structure with crystal orientation (100) of the ZnS. The open-circuit voltage, short-circuit current, fill factor, and conversion efficiency of $n-Cd_{1-x}Zn_xS/p-Si$ heterojunction solar cell under $100mW/cm^2$ illumination were found to be 0.43V, 38mA. 0.76, and 12.4%, respectively.

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A Self-Consistent Semi-Analytical Model for AlGaAs/InGaAs PMHEMTs

  • Abdel Aziz, M.;El-Banna, M.;El-Sayed, M.
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.2 no.1
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    • pp.59-69
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    • 2002
  • A semi-analytical model based on exact numerical analysis of the 2DEG channel in pseudo-morphic HEMT (PMHEMT) is presented. The exactness of the model stems from solving both Schrodinger's wave equation and Poisson's equation simultaneously and self-consistently. The analytical modeling of the device terminal characteristics in relation to the charge control model has allowed a best fit with the geometrical and structural parameters of the device. The numerically obtained data for the charge control of the channel are best fitted to analytical expressions which render the problem analytical. The obtained good agreement between experimental and modeled current/voltage characteristics and small signal parameters has confirmed the validity of the model over a wide range of biasing voltages. The model has been used to compare both the performance and characteristics of a PMHEMT with a competetive HEMT. The comparison between the two devices has been made in terms of 2DEG density, transfer characteristics, transconductance, gate capacitance and unity current gain cut-off frequency. The results show that PMHEMT outperforms the conventional HEMT in all considered parameters.

A New Accurate Interconnect Delay Model and Its Experiment Verification (연결선에 기인한 시간지연의 정확한 모델 및 실험적 검증)

  • Yoon, Seong-Tae;Eo, Yung-Seon;Shim, Jong-In
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.37 no.9
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    • pp.78-85
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    • 2000
  • A new analytical VLSI interconnect delay model is presented and its accuracy is experimentally verified. In the model, the transmission line parameter variations due to skin effect, proximity effect, and silicon substrate effect are taken into account. That is, the circuit model of the interconnect line that includes these effects is newly developed and analyzed. For the model verification, test patterns combined the coplanar structure with microstrip were designed by using 0.35${\mu}m$ CMOS process technology. It is shown that the accuracy of the model is less than about 10% error.

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Development of microcolumn control unit to detect of via-hole defects on wafer (반도체소자의 Via hole 결함 측정을 위한 전자컬럼 제어기술 개발)

  • Roh, Young-Sup;Kim, Heung-Tae;Kim, H.S.;Kim, D.W.;Ahn, S.J.;Kim, Y.C.;Jin, S.W.;Whang, N.W.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.06a
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    • pp.528-529
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    • 2008
  • A new concept based on sample current measurements for detecting of via-hole defects on wafer has been performed by low energy electron beam microcolumn. The microcolumn has been operated at a low voltage of 290 eV with total emission current of 400 nA, and a sample current of 6 nA. The test sample was fabricated with SiO2 layer of 300 nm thickness on a piece of a silicon substrate. Preliminary results of both sample current method and secondary electron method show microcolumn and its control can be useful technology for detecting of via-hole defects on wafer.

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