• 공업화학
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• 제34권5호
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• pp.522-528
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• 2023

반도체 제조공정인 다이싱 공정용 점착 테이프를 제조하기 위해 다양한 개수의 광 반응기를 갖는 화합물을 합성하였고 아크릴 공중합체에 도입하여 UV 경화형 아크릴 점착제를 제조하였다. 합성된 광반응성 화합물(f = 2 또는 3)의 구조는 NMR을 이용하여 확인하였다. 광반응성 화합물(f = 1~3)은 우레탄 반응을 통해 아크릴 점착제의 곁가지로 도입되었고, FT-IR 측정을 통해 UV 경화형 아크릴 점착제가 성공적으로 합성되었음을 확인하였다. UV 조사 전 후의 박리강도 변화는 실리콘 웨이퍼를 기재로 하여 평가되었으며, UV 조사 전 점착제의 높은 박리강도(~2000 gf/25 mm)가 UV조사 후 크게 감소(~5 gf/25 mm)하였다. 다 관능성 광 반응기가 도입된 점착제의 점착력 감소 효과가 가장 컸으며 FE-SEM을 통한 표면 잔류물 측정 결과, UV 조사 후의 표면 잔류물도 매우 낮은 수준(~0.2%)으로 관찰되었다.

• 한국식품과학회지
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• 제8권2호
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• pp.85-89
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• 1976

Gas chromatography를 이용하여 methylglyoxal, diacetyl 및 triose reductone과 같은 dicarbonyl류(類)를 분리측정(分離測定)할 수 있는 조건(條件)을 실험(實驗)하였던 바 다음과 같은 결과(結果)를 얻었다. 1. MG, DAc, DTR의 혼합물(混合物)에 OPD를 반응시켜 quinoxaline 유도체(誘導體)를 만들고 이것을 클로로포름으로 추출(抽出)하면 MG 및 DAc는 거의 100%추출(抽出)되었고, DTR은 에틸에테르에 추출(抽出)되었다. 2. SE-30을 충진제로하여 얻어진 column 조건(條件)에서 MG-OPD와 DAc-OPD는 완전히 분리측정(分離測定)할 수 있었다. 3. 당류중(糖類中) glucose의 OPD 축합물형성조건(縮合物形成條件)은 D-glucose 180mg을 0.1N-NaOH 용액 10ml에서 5분간(分間) 가열후 OPD와 반응(反應)시켜 pH 6. 0에서 클로로포름으로 추출(抽出)하여 GLC에 겉면 5개의 peak가 나타났고, 그 중에서 2개는MG-OPD와 DAo-OPD임을 확인하였다. 그러나 중성(中性) 및 산성가열(酸性加熱)인 경우는 peak가 확실치 않았다.

• Journal of Information Display
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• 제7권3호
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• pp.13-18
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• 2006

Currently, the flexible organic light emitting devices (OLEDs) are investigated. They are very vulnerable to moisture, and thus have been found to show some problems. Thus, an effective barrier layer is needed to protect from moisture in air. We deposited thin films with magnesium oxide (MgO) and silicon oxide $(SiO_{2})$ compounds mixed at various mixture ratios on flexible polyether sulfone (PES) substrates by an electron-beam evaporator to investigate their applizability for transparent barrier applications. In this study, we found that as the MgO fraction increased, thin films comprised of MgO and $(SiO_{2})$ compounds became more amorphous and their surface morphologies become smoother and denser. In addition, zirconium oxide $(ZrO_{2})$ was added to the above-mentioned compound mixtures. $ZrO_{2}$ made thin mixture films more amorphous and made the surface morphology denser and more uniform. The water vapor transmission rates (WVTRs) of the whole films decreased rapidly. The best WVTR was obtained by depositing thin films of Mg-Si-Zr-O compound among the whole thin films. As the thin mixture films became more amorphous, and the surface morphology become denser and more uniform, the WVTRs decreased. Therefore, the thin mixture films became more suitable for flexible OLED applications as transparent passivation layers against moisture in air.

• 한국폐기물자원순환학회지
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• 제35권7호
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• pp.670-682
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• 2018

Engineered nanomaterials (ENMs) can be released to humans and the environment through the generation of waste containing engineered nanomaterials (WCNMs) and the use and disposal of nano-products. Nanoparticles can also be introduced intentionally or unintentionally into waste streams. This study examined WCNMs in domestic industries, and target nanomaterials, such as silicon dioxide, titanium oxide, zinc oxide, nano silver, and carbon nanotubes (CNTs), were selected. We tested 48 samples, such as dust, sludge, ash, and by-products from manufacturing facilities and waste treatment facilities. We analyzed leaching and content concentrations for heavy metals and hazardous constituents of the waste. Chemical compositions were also measured by XRD and XRF, and the unique properties of nano-waste were identified by using a particle size distribution analyzer and TEM. The dust and sludge generated from manufacturing facilities and the use of nanomaterials showed higher concentrations of metals such as lead, arsenic, chromium, barium, and zinc. Oiled cloths from facilities using nano silver revealed high concentrations of copper, and the leaching concentrations of copper and lead in fly ash were higher than those in bottom ash. In XRF measurements at the facilities, we detected compounds such as silicon dioxide, sulfur trioxide, calcium oxide, titanium dioxide, and zinc oxide. We found several chemicals such as calcium oxide and silicon dioxide in the bottom ash of waste incinerators.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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• pp.354.2-354.2
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• 2016

Mycosporine-like amino acids (MAAs) are small secondary metabolites produced by organisms that live in environments with high volumes of sunlight, is an important group of novel bioactive compounds having immense biotechnological poten-tials due to their UV screening properties and Polypyrrole (PPy) is a type of organic polymer formed by polymerization of pyrrole. A novel composite nanofilm (~60 nm) of mycosporine-like amino acid (MAA) and polypyrrole is synthesized by interfacial polymerization technique. This composite nanofilm is conductive and has strong photoresponse. A photoelectric UV sensor is fabricated by depositing the composite film onto a silicon chip. This UV sensor shows good sensitivity, selectivity and stability for UV detection.

• 한국환경과학회지
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• 제15권3호
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• pp.211-219
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• 2006

An experimental study on the removal of VOCs gas using a biomembrane reactor were carried out at various inlet gas concentration, specific loading rate, retention time and gas flow rate of volume. The variations of efficiency and various parameters, which are relevant to gas removal, with mixing of soluble gas and without have been discussed. More than 95% of the toluene and methanol present in the feed was successfully removed in each study. The elimination of methanol with mixture of soluble compound of about 300 mg/h corresponds to a portion of 21% if there is a feed stream of 1400 mg/h. On the contrary the maximum efficiency of about 72% of toluene was reached. This is to be rated as a treatment of sorption that the limiting factor of the dismantling speed could be represented by this difficult degradable component. Nevertheless the elimination capacities for this reactor for toluene were on a very high level. For substances which show a very high solubility in silicon rubber an advantage of a bio membrane is clearly shown. Therefore a similarly good result is expected for n-hexane, because of its relatively good permeability which was distinguished during permeation experiments.

• 한국세라믹학회지
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• 제24권5호
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• pp.453-460
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• 1987

β'-sialon(Z=2.7) specimens with <30%wt. graphite as a reducing agent were decomposed at 1350°up to 1,450℃ under the atmosphere of 90% N2-10%H2. The decomposition of β'-sialon was calculated from the change in Z-value, and the formation of new minerals was identified from X-ray diffraction patterns. The decomposition reactions of sialon were considered to yield a stable sialon close to β-silicon nitride and some aluminum compounds according to the following equations; β'-sialon(s)＋C(s)＋N2(g)→β2-sialon(metastable)＋β3-sialon(stalbe phase) β2-sialon(s)＋C(s)＋N2(g)→β3-sialon(s)＋AlN(s)＋α-Al2O3(s)＋15R(s)＋SiO(g)＋Al2O(g)＋CO(g) Z-value; β2( 3.5)>β'( 2.7)>β3( 0.5) The decomposition rate of sialon was controlled by two mechanisms ; One was characterized by the interface area of contact, corresponding to an apparent activation energy of 50.5Kcal/mol in the initial stage, and the other by the diffusion, corresponding to that of 104.3Kcal/mol in the final stage of the decomposition.

• 한국결정성장학회:학술대회논문집
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• 한국결정성장학회 1999년도 PROCEEDINGS OF 99 INTERNATIONAL CONFERENCE OF THE KACG AND 6TH KOREA·JAPAN EMG SYMPOSIUM (ELECTRONIC MATERIALS GROWTH SYMPOSIUM), HANYANG UNIVERSITY, SEOUL, 06월 09일 JUNE 1999
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• pp.285-303
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• 1999

Thin films of hydrogenated amorphous silicon carbide compounds (a-SixC1x:H) of different compositions were deposited on Si substrate by RF plasma-enhanced chemical vapor deposition (PECVD). Experiments were carried out using silane(SiH4) and methane(CH4) as the gas precursors at 1 Torr and at low substrate temperature (25$0^{\circ}C$). The gas flow rate was changed with every other parameters (pressure, temperature, RF power) fixed. The substrate was Si(100) wafer and all of the films obtained were amorphous. The bonding structure of a-SixC1x:H films deposited was investigated by X-ray photoelectron spectroscopy (XPS) for the film compositions. In addition, the surface morphology of films was investigated by atomic force microscopy (AFM).

• Bulletin of the Korean Chemical Society
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• 제31권9호
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• pp.2519-2526
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• 2010

Silane-based self-assembly was employed for the surface modification of carbon-coated Si electrodes and their surface chemistry and electrochemical performance in battery electrolyte depending on the molecular structure of silanes was studied. IR spectroscopic analyses revealed that siloxane formed from silane-based self-assembly possessed Si-O-Si network on the electrode surface and high surface coverage siloxane induced the formation of a stable solid-electrolyte interphase (SEI) layer that was mainly composed of organic compounds with alkyl and carboxylate metal salt functionalities, and PF-containing inorganic species. Scanning electron microscopy imaging showed that particle cracking were effectively reduced on the carbon-coated Si when having high coverage siloxane and thickened SEI layer, delivering > 1480 mAh/g over 200 cycles with enhanced capacity retention 74% of the maximum discharge capacity, in contrast to a rapid capacity fade with low coverage siloxane.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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• pp.303.2-303.2
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• 2014

The oxides of group IV transition metals such as titanium, zirconium, hafnium have many important current and future application, including protective coatings, sensors and dielectric layers in thin film electroluminescent (TFEL) devices. Recently, group IV transition metal oxide films have been intensively investigated as replacements for SiO2. Due to high permittivities (k~14-25) compared with SiO2 (k~3.9), large band-gaps, large band offsets and high thermodynamic stability on silicon. Herein, we report the synthesis of new group IV transition metal complexes as useful precursors to deposit their oxide thin films using chemical vapor deposition technique. The complexes were characterized by FT-IR, 1H NMR, 13C NMR and thermogravimetric analysis (TGA). Newly synthesised compounds show high volatility and thermal stability, so we are trying to deposit metal oxide thin films using the complexes by Atomic Layer Deposition (ALD).