• Current Photovoltaic Research
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• 제2권3호
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• pp.84-87
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• 2014

Protection of solar cell surface is important to prevent from dust, pollen, sand, etc. Therefore, development of large area antifouling film is urgent for high performance of solar cells. The surface of silica spheres was modified to fabricate large area antifouling film. The surface of monodisperse silica spheres has been modified with 3-(trimethoxysilyl) propylmethacrylate (TMSPM) to fabricate large area photonic crystal. Although the surface modification of silica spheres with TMSPM has been failed for the base catalyst, the second trial using acid catalyst showed the following results. The FTIR absorption peak at $1721cm^{-1}$ representing C=O stretching vibration indicates that the TMSPM was attached on the surface of silica spheres. The methanol solution comprised of the surface modified silica spheres (average diameter of 380 nm) and a photoinitiator was poured in the patterned silicon wafer with the dimension of 10 cm x 10 cm and irradiated UV-light during the self-assembly process. The result showed large area crack and defect free nanostructures.

• Current Photovoltaic Research
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• 제3권3호
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• pp.80-84
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• 2015

We suggest new emitter formation method using solid-phase epitaxy (SPE); solid-phase epitaxy emitter (SEE). This method expect simplification and cost reduction of process compared with furnace process (POCl3 or BBr3). The solid-phase epitaxy emitter (SEE) deposited a-Si:H layer by radio-frequency plasma-enhanced chemical vapor deposition (RF-PECVD) on substrate (c-Si), then thin layer growth solid-phase epitaxy (SPE) using rapid thermal process (RTP). This is possible in various emitter profile formation through dopant gas ($PH_3$) control at deposited a-Si:H layer. We fabricated solar cell to apply solid-phase epitaxy emitter (SEE). Its performance have an effect on crystallinity of phase transition layer (a-Si to c-Si). We confirmed crystallinity of this with a-Si:H layer thickness and annealing temperature by using raman spectroscopy, spectroscopic ellipsometry and transmission electron microscope. The crystallinity is excellent as the thickness of a-Si layer is thin (~50 nm) and annealing temperature is high (<$900^{\circ}C$). We fabricated a 16.7% solid-phase epitaxy emitter (SEE) cell. We anticipate its performance improvement applying thin tunnel oxide (<2nm).

• 한국진공학회지
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• 제19권4호
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• pp.314-318
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• 2010

다결정 실리콘 웨이퍼 표면에 대면적 reactive ion etching (RIE) 장비로 표면 텍스쳐를 형성한 뒤 태양전지를 제작하였다. 웨이퍼 표면에 텍스쳐를 형성하는 것은 광학적 손실을 줄이기 위해 일반적으로 사용되는 방법으로 alkaline etching이 사용된다. 그러나 다결정 실리콘 태양전지의 경우 재료의 결정 방향에 따라 식각되는 alkaline etching은 텍스쳐링의 모양을 제어할 수 없어 효과적이지 못하다. 이와 달리 플라즈마 식각방법을 사용하면 표면 텍스쳐의 모양을 효과적으로 제어하여 조금 더 낮은 반사율을 얻을 수 있다. 하지만 텍스쳐 모양 조절로 얻은 낮은 반사율이 항상 높은 변환효율을 얻을 수 있는 것은 아니다. 본 연구에서는 대면적 RIE 공정 조건별로 얻은 태양전지 표면 텍스쳐의 모양에 따라 각각의 반사율과 양자효율 및 변환효율이 미치는 영향을 살펴보았다.

• 대한기계학회:학술대회논문집
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• 대한기계학회 2007년도 춘계학술대회B
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• pp.2148-2153
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• 2007

The electricity conversion-efficiency of solar cell for commercial application is about 6-15%. More than 85% of the incoming solar energy is either reflected or absorbed as heat energy. Consequently, the working temperature of the photovoltaic cells increases considerably after prolonged operations and the cell's efficiency drops significantly. PV/T refers to the integration of a PV module and a solar thermal collector in a single piece of equipment. By cooling the PV module with a fluid steam like air or water, the electricity yield can be improved. At the same time, the heat pick-up by the fluid can be to support space heating or service hot-water systems. In this study, a pulsating heat pipe solar heat collector was combined with single-crystal silicon photovoltaic cell in hybrid energy-generating unit that simultaneously produced low temperature heat and heat and electricity. This experiment was investigating thermal and electrical efficiency for evaluation of a PV/T system.

• Current Photovoltaic Research
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• 제2권3호
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• pp.130-134
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• 2014

We have fabricated the selective emitter solar cell using double textured nanowires structure. The $40{\times}40mm2$-sized silicon substrates were textured to form the pyramid-shaped surface and the nanowires were fabricated by metal assisted chemical etching process using Ag nanoparticles, subsequently. The heavily doped and shallow emitters for selectiv eemitter solar cells were prepared through the thermal $POCl_3$ diffusion and chemical etch-back process, respectively. The front and rear electrodes were prepared following conventional screen printing method and the widths of fingers have been optimized. The selective emitter solar cell using double textured nanowires structure achieved a conversion efficiency of 17.9% with improved absorption and short circuit current density.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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• pp.160-160
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• 2016

In this study, we applied the low temperature curing Ag paste to replace PVD System. The electrode formation of low temperature curing Ag paste for silicon Hetero-junction solar cells is important for improving device characteristics such as adhesion, contact resistance, fill factor and conversion efficiency. The low temperature curing Ag paste is composed various additives such as solvent, various organic materials, polymer, and binder. it depends on the curing temperature conditions. The adhesion of the low temperature curing Ag paste was decided by scratch test. The specific contact resistance was measured using the transmission line method. All of the Ag electrodes were experimented at various curing temperatures within the temperature range of $160^{\circ}C-240^{\circ}C$, at $20^{\circ}C$ intervals. The curing time was also changed by varying the conditions of 10-50min. In the optimum curing temperature $200^{\circ}C$ and for 20 min, the measured contact resistance is $19.61m{\Omega}cm^2$. Over temperature $240^{\circ}C$, confirmed bad contact characteristic. We obtained photovoltaic parameter of the industrial size such as Fill Factor (FF), current density (Jsc), open-circuit voltage (Voc) and convert efficiency of up to 76.2%, 38.1 mA/cm2, 646 mV and 18.3%, respectively.

• 자원리싸이클링
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• 제30권4호
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• pp.20-26
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• 2021

태양전지용 실리콘은 주로 반도체급 실리콘 제조공정에서 발생하는 규격외 실리콘을 사용하여 왔다. 태양전지의 보급 활성화를 위해서는 보다 저렴한 정제 공정의 개발이 필요하다. 태양전지용 실리콘을 위한 저비용이면서 효율적인 방법은 금속급 실리콘을 정제하여 고순도화하는 것이다. 본 연구에서는 금속급 용융 실리콘 중의 Fe를 제거하기 위해 고주파 유도로 중에서 일방향 응고를 실시하였다. 실험조건과 실험결과를 유효 편석계수, Scheil 식 및 Peclet 수로 평가하였다. 시료의 하강속도가 감소함에 따라 불순물의 매크로 편석과 잉곳의 순도가 증가하였다. 이러한 결과는 시료의 하강속도 감소에 따른 유효 편석계수의 감소에 의한 것으로 생각된다.

• 한국재료학회지
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• 제20권11호
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• pp.606-610
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• 2010

Films consisting of a silicon quantum dot superlattice were fabricated by alternating deposition of silicon rich silicon nitride and $Si_3N_4$ layers using an rf magnetron co-sputtering system. In order to use the silicon quantum dot super lattice structure for third generation multi junction solar cell applications, it is important to control the dot size. Moreover, silicon quantum dots have to be in a regularly spaced array in the dielectric matrix material for in order to allow for effective carrier transport. In this study, therefore, we fabricated silicon quantum dot superlattice films under various conditions and investigated crystallization behavior of the silicon quantum dot super lattice structure. Fourier transform infrared spectroscopy (FTIR) spectra showed an increased intensity of the $840\;cm^{-1}$ peak with increasing annealing temperature due to the increase in the number of Si-N bonds. A more conspicuous characteristic of this process is the increased intensity of the $1100\;cm^{-1}$ peak. This peak was attributed to annealing induced reordering in the films that led to increased Si-$N_4$ bonding. X-ray photoelectron spectroscopy (XPS) analysis showed that peak position was shifted to higher bonding energy as silicon 2p bonding energy changed. This transition is related to the formation of silicon quantum dots. Transmission electron microscopy (TEM) and electron spin resonance (ESR) analysis also confirmed the formation of silicon quantum dots. This study revealed that post annealing at $1100^{\circ}C$ for at least one hour is necessary to precipitate the silicon quantum dots in the $SiN_x$ matrix.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제52권10호
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• pp.447-450
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• 2003

This paper presents a process optimization of antireflection (AR) coating on crystalline Si solar cells. Theoretical and experimental investigations were performed on a double-layer AR (DLAR) coating of MgF$_2$/CeO$_2$. We investigated CeO$_2$ films as an AR layer because they have a proper refractive index of 2.46 and demonstrate the same lattice constant as Si substrate. RF sputter grown CeO$_2$ film showed strong dependence on a deposition temperature. The CeO$_2$ deposited at 40$0^{\circ}C$ exhibited a strong (111) preferred orientation and the lowest surface roughness of 6.87 $\AA$. Refractive index of MgF$_2$ film was measured as 1.386 for the most of growth temperature. An optimized DLAR coating showed a reflectance as low as 2.04% in the wavelengths ranged from 0.4${\mu}{\textrm}{m}$ to 1.1${\mu}{\textrm}{m}$. We achieved the efficiencies of solar cells greater than 15% with 3.12% improvement with DLAR coatings. Further details on MgF$_2$, CeO$_2$ films, and cell fabrication parameters are presented in this paper.

• 한국전기전자재료학회논문지
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• 제28권9호
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• pp.593-597
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• 2015

Ni ink for electrohydrodynamic (EHD) continuous jet printing has been developed by using Ni nanoparticles mixed with conhesiveness provider. EHD continuous jet printing was used in order to realize $20{\mu}m$ pattern width. Ink stability was investigated by using Turbi-scan which monitors agglomeration and precipitation of nanoparticles in the ink for three days. The Turbi-scan results showed that the formulated Ni ink had been stable for 3 days without any indication of precipitation across the entire ink. Antireflection coating (ARC) layer in crystalline solar cell wafers was removed by laser ablation technique leading to the formation of 84 grooves where the Ni ink was printed by EHD continuous jet printing. The printability and microstructure of EHD-jet-printed Ni lines were investigated by using optical and electron microscopes. 84 Ni lines with the width less than $20{\mu}m$ were successfully printed by one-time printing without any misalignment and fill the laser-ablated ARC grooves.