• Korean Chemical Engineering Research
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• v.51 no.5
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• pp.622-627
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• 2013

Colloidal silica is used in various industrial products such as chemical mechanical polishing slurry for planarization of silicon and sapphire wafer, organic-inorganic hybrid coatings, binder of investment casting, etc. An accurate determination of particle size and dispersion stability of silica sol is demanded because it has a strong influence on surface of wafer, film of coatings or bulks having mechanical, chemical and optical properties. The study herein is discussed on the effect of measurement results of average particle size, sol viscosity and electrophoretic mobility of particle according to the volume fraction of eight types of silica sol with different size and surface properties of silica particles which are presented by the manufacturer. The measured particle size and the mobility of these sol were changed by volume fraction or particle size due to highly active surface of silica particle and change of concentration of counter ion by dilution of silica sol. While in case the measured sizes of small particles less than 60 nm are increased with increasing volume fraction, the measured sizes of larger particles than 60 nm are slightly decreased. The mobility of small particle such as 12 nm are decreased with increase of viscosity. However, the mobility of 100 nm particles under 0.048 volume fraction are increased with increasing volume fraction and then decreased over higher volume fraction.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.06a
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• pp.141-141
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• 2009

Blue light-emitting diodes (LEDs), violet laser diodes 같은 광전소자들은 질화물 c-plane 기판위에 소자로 응용되어 이미 상품화 되어 왔다. 그러나 2족-질화물 재료들은 wurtzite 구조를 가지므로 c-plane에 평행한 자연적인 극성을 띌 뿐만 아니라 결정 내부 stress로 인한 압전현상 또한 나타나 큰 내부 전기장을 형성하게 된다. 이렇게 생성된 내부 전기장은 전자와 홀의 재결합 효율을 감소시키고 소자 응용 시 red-shift의 원인이 되곤 한다. 따라서 최근 들어 m-plane(1-100), a-plane (11-20)같은 무극성을 뛰는 기판 위에 소자를 만드는 방법이 각광을 받고 있는 추세다. 그러나 무극성 기판을 소자에 응용 시 Chemical Mechanical Planarization (CMP)에 의한 가공은 반도체 기판으로써 이용하기 위한 필수 불가결의 공정이다. c면(0001) SiC wafer에 대한 연구는 현재 많이 발표가 되어 있으나 무극성면 SiC wafer에 대한 CMP 공정에 대한 연구사례는 없는 실정이다. 본 연구에서는 C면 (0001)으로 성장된 잉곳을 a면(11-20)과 m(1-100)면으로 절단 후, slurry type (KOH-based colloidal silica slurry, NaOCl), 산화제, 연마제등을 변화하여 CMP 공정을 거침으로서 일어나는 기계 화학적 가공 양상에 대하여 알아보았다. 그 후 표면 형상 분석 하기위해 Atomic Force Microscope(AFM)을 사용하였고, 표면 스크레치를 SEM을 이용해서 알아보았다.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2001.11b
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• pp.341-345
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• 2001

In this study, nano-sized powders of $Si0_2-0^{\sim}15mol%B_2O_3$ composition were prepared by sol-gel processing method using TEOS(Tetra ethyl ortho silicate) and $H_3BO_3$ solution. The powders were tape-cast on High silicate glass sheet(HSG) substrate and sintered to form a layer of undercladding for the planar light wave module, During the sol-gel processing, $H_2O/Si$ mole ratio were varied to modify the size of the powders in a range from 600 to 75nm. The dispersion of the powder was modified by changing the pH of the slurry. Sintering temperature of the tape was observed to decrease with the size of the powder and the $B_2O_3$ content in the powder. When the silica powders of 75-125nm in diameter containing 15mol% $B_2O_3$ were used, 98 TD% was obtained at $1250^{\circ}C$, which is approximately $300^{\circ}C$ reduction in sintering temperature compared with micrometer-sized powders.

• Transactions on Electrical and Electronic Materials
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• v.7 no.4
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• pp.157-162
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• 2006

Chemical-mechanical polishing (CMP), one of the dominant technology for ULSI planarization, is used to flatten the micro electro-mechanical systems (MEMS) structures. The objective of this paper is to achieve good planarization of the deposited film and to improve deposition efficiency of subsequent layer structures by using surface-micromachining process in MEMS technology. Planarization characteristic of poly-Si film deposited on thin oxide layer with MEMS structures is evaluated with different slurries. Patterns used for this research have shapes of square, density, line, hole, pillar, and micro engine part. Advantages of CMP process for MEMS structures are observed respectively by using the test patterns with structures larger than 1 urn line width. Preliminary tests for material selectivity of poly-Si and oxide are conducted with two types of silica slurries: $ILD1300^{TM}\;and\;Nalco2371^{TM}$. And then, the experiments were conducted based on the pretest. A selectivity and pH adjustment of slurry affected largely step heights of MEMS structures. These results would be anticipated as an important bridge stone to manufacture MEMS CMP slurry.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2001.11a
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• pp.341-345
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• 2001

In this study, nano-sized powders of SiO$_2$-0∼15mo1%B$_2$O$_3$ composition were prepared by sol-gel processing method using TEOS(Tetra ethyl ortho silicate) and H$_3$BO$_3$ solution. The powders were tape-cast on High silicate glass sheet(HSG) substrate and sintered to form a layer of undercladding for the planar light wave module. During the sol-gel processing, H$_2$O/Si mole ratio were varied to modify the size of the powders in a range from 600 to 75nm. The dispersion of the powder was modified by changing the pH of the slurry. Sintering temperature of the tape was observed to decrease with the size of the powder and the B$_2$O$_3$ content in the powder. When the silica powders of 75∼125nm in diameter containing 15mo1% B$_2$O$_3$ were used, 98 TD% was obtained at 1250$^{\circ}C$, which is approximately 300$^{\circ}C$ reduction in sintering temperature compared with micrometer-sized powders.

• Proceedings of the Korean Institute of Building Construction Conference
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• 2009.11a
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• pp.121-125
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• 2009

The recycling of waste concrete is increasing for the environment protection and the shortage of aggregate according to the large scale construction project in Korea. The more manufacturing high quality recycled aggregate is produced, the more waste concrete powder generated from the manufacture process of recycled aggregate, and the consideration about the recycling of waste concrete powder is need. Waste concrete powder was used for the partial replacement of silica powder, which is a main raw material for the manufacture of autoclave foamed concrete. According to the results of research, the slurry density, flow, compressive strength mainly depend on the replacement ratio of particle size and waste concrete powder. At the SEM analysis, the more high-waste concrete powder was the less there are generated tobermorite. But we conclude that it is possible to replace WCP as silica source in the manufacture of the lightweight foamed concrete.

• Journal of the Korean Ceramic Society
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• v.35 no.12
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• pp.1280-1285
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• 1998

Foaming method is presented the preparation of porous materials from high-concentrated kaolin silica and flyash slurries. The slurries were foamed dried and sintered respectively. The porosity of sintered ma-terials was about 70-75% Mean pore-size was the range of 70-150$\mu\textrm{m}$ and pore structure was continuous Sodium lauryl sulfate anionic surfactant was used as a foaming agent. The foaming ability and the froth sta-bility were increased with increasing the concentration of the foaming agent. But the size of the constituent bubble of froth after foaming process was not affected by the concentration of the foaming agent. These results showed that the mean pore-size of sintered materials was closely related to the froth stability which is related to the change of bubble-size during the drying process.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.06a
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• pp.543-543
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• 2008

반도체 집적회로의 제조 공정 중 CMP 공정이 필수 핵심기술이 되었다. 이처럼 CMP 공정 기술이 다층 배선 구조의 광역 평탄화를 위해서는 매우 효과적이지만 기계적인 연마패드와 화학적인 식각 작용을 하는 슬러리를 이용하여 연마가 진행되므로 공정 결함이 문제시되어 왔다. 그 중에서도, 소모자재의 비용이 CMP 공정비용의 70% 이상을 차지하는 제조단가가 높다는 단점이 있다. 특히 고가의 슬러리가 차지하는 비중이 40% 이상을 넘고 있어, 슬러리 원액의 소모량을 줄이기 위한 연구들이 현재 활발히 연구 중에 있다. 본 논문에서는 새로운 혼합 연마제 슬러리에 대한 CMP 특성을 통해 기존에 상용화된 슬러리의 CMP 특성과 비교 고찰하여 MAS의 우수성을 입증하고, 최적화된 공정기술 연구의 기반으로 활용하고자 실리카 슬러리에 $MnO_2$ 연마제를 혼합하여 연마특성을 비교분석하였고, AFM, EDX, XRD, TEM분석을 통해 그 가능성을 알아보았다.

• Journal of the Korean Ceramic Society
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• v.42 no.4
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• pp.260-268
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• 2005

A heat-resisting diatomite protection tube, using diatomite as a main component, was manufactured through an extrusion molding of ceramic slurry in different component ratios. And its mechanical strength, carbon analysis and microstructural non-homogeneity were investigated. After fixing $60wt\%$ of porous diatomite whose particle size was $50\~100\;{\mu}m$, the optimum mixture ratio with composition variables by changing $1\;wt\%$ of each component that was silica sol$(4.3\~7.3\;wt\%)$ as an inorganic binder, CMC (Sodium CarboxyMethyl Cellulose $(6\~9\;wt\%)$) as an organic binder and paper powder$(4.7\~7.7\;wt\%)$ was obtained. As a result of the investigation on a composition containing $60\;wt\%$ diatomite, $5.3\;wt\%$ silica sol, and $7\;wt\%$ CMC, a heat-resisting protection tube that could be used as a molten steel probe for measuring the temperature and components of molten steel was developed. The bending strength, compressive strength, and elastic modulus of the protection tube developed, that contained $\le2.3\;wt\%$ carbon, were 7.1 MPa, 7.5 MPa, and 1090 MPa, respectively.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.06a
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• pp.545-545
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• 2008

Poly-Si is an essential material for floating gate in NAND Flash memory. To fabricate this material within region of floating gate, chemical mechanical polishing (CMP) is commonly used process for manufacturing NAND flash memory. We use colloidal silica abrasive with alkaline agent, polymeric additive and organic surfactant to obtain high Poly-Si to SiO2 film selectivity and reduce surface defect in Poly-Si CMP. We already studied about the effects of alkaline agent and polymeric additive. But the effect of organic surfactant in Poly-Si CMP is not clearly defined. So we will examine the function of organic surfactant in Poly-Si CMP with concentration separation test. We expect that surface roughness will be improved with the addition of organic surfactant as the case of wafering CMP. Poly-Si wafer are deposited by low pressure chemical vapor deposition (LPCVD) and oxide film are prepared by the method of plasma-enhanced tetra ethyl ortho silicate (PETEOS). The polishing test will be performed by a Strasbaugh 6EC polisher with an IC1000/Suba IV stacked pad and the pad will be conditioned by ex situ diamond disk. And the thickness difference of wafer between before and after polishing test will be measured by Ellipsometer and Nanospec. The roughness of Poly-Si film will be analyzed by atomic force microscope.