• Journal of the Korean Applied Science and Technology
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• v.30 no.4
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• pp.575-585
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• 2013

This research was performed to evaluate the recycling feasibility as a construction material of dredged harbor soil mixed with clay and glass frit. Concentration of heavy metals of the dredged soil from D harbor was severly high, showing Zn of 526.0~13,150.1 mg/kg. The dredged soil was maily composed of 48.30 wt% $SiO_2$, 16.60 wt% $Al_2O_3$, 10.10 wt% CaO, 7.75 wt% $Fe_2O_3$. The clay and the glass frit contained 70.82 wt% $SiO_2$ and $Al_2O_3$ 18.78 wt%, and 71.75 wt% $SiO_2$, 13.99 wt% CaO, 8.51 wt% $Na_2O$, respectively. After adding 10~40 wt% to the clay and sintering them at $1,000^{\circ}C$ or $1,100^{\circ}C$, the compressive strength of the sintered specimens showed $132.6{\sim}178.5kgf/cm^2$ or $581.2{\sim}793.7kgf/cm^2$, respectively. In case of SC46 with the addition 40 wt% of the dredged soil to the clay, the compressive strength ($793.7kgf/cm^2$) of specimen sintered at $1,100^{\circ}C$ was over 5 times higher than that at $1,000^{\circ}C$. The specimen mixed with 40 wt% of dredged soil, 60 wt% of clay and 1 wt% of glass frit satisfied the 1st grade standard for clay brick by KS L 4201. The results of all specimens by Korean Standard Leaching Test also satisfied the standard criteria.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.54 no.7
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• pp.308-314
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• 2005

The 2 GHz film bulk acoustic wave resonator(FBAR), one of the most necessary device of the next generation mobile communication system, consisted of solidly mounted resonator(SMR) structure using Brags reflector, was researched in this paper The FBAR applied SiO$_{2}$ and W had large difference of the acoustic impedance to reflector Al to electrode and ZnO to piezoelectric layer. Specially, the FBAR applied the two-step deposition method to improve the c-axis orientation and increase reproducibility of the fabrication device had good performance. The electrical properties of plasma such as impedance, resistance, reactance, $V_{pp},\;I{pp}$, VSWR and phase difference of voltage and current, was analyzed and measured by RF sensor with the variable experiment process factors such as gas ratio, RF power and base vacuum level about concerning the thickness, c-axis orientation, adhesion and roughness. The FBAR device about the optimum condition resulted reflection loss(S$_{11}$) of -17 dB, resonance frequency of 1.93 GHz, electric-mechanical coefficient(k$_{eff}$) of 2.38 $\%$ and Qualify factor of 580. It was seen better qualify than the common dielectric filter at present and expected on business to the filter device of 2 GHz bandwidth with the MMIC technology.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.373-373
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• 2014

Resistive-change random access memory (ReRAM) device is one of the promising candidates owing to its simple structure, high scalability potential and low power operation. Many resistive switching devices using transition metal oxides materials such as NiO, Al2O3, ZnO, HfO2, $TiO_2$, have attracting increased attention in recent years as the next-generation nonvolatile memory. Among various transition metal oxides materials, HfO2 has been adopted as the gate dielectric in advanced Si devices. For this reason, it is advantageous to develop an HfO2-based ReRAM devices to leverage its compatibility with Si. However, the annealing temperature of these high-k thin films for a suitable resistive memory switching is high, so there are several reports for low temperature process including microwave irradiation. In this paper, we demonstrate the bipolar resistive switching characteristics in the microwave irradiation annealing processed Ag/HfO2/Pt ReRAM device. Compared to the as-deposited Ag/HfO2/Pt device, highly improved uniformity of resistance values and operating voltage were obtained from the micro wave annealing processed HfO2 ReRAM device. In addition, a stable DC endurance (>100 cycles) and a high data retention (>104 sec) were achieved.

• Economic and Environmental Geology
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• v.23 no.4
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• pp.369-381
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• 1990

Most of significant ore deposits in South Korea such as the Sangdong W - Mo, the Yeonhwa Pb-Zn and the Geodo Cu-Fe skarn ore deposits occur at the southern limb of the Hambaeg syncline in the Taebaeg Basin. The mineralization took place in the interbedded limestone of the Myobong Formation and the Pungchon limestone of the Great Limestone Group of the Cambrian age, generally striking E-W and dipping 25-30 degrees north. There are no outcrops of the skarn-type orebody at the northern limb of the syncline. In order to find a clue of a possible hidden orebody localized at the limestones in the northern limb, a lithogeochemical exploration by using carbon isotope and some elements such as Si, Ca, Fe and Al at the Sangdong Mine area has been attempted as for a modelling study. For this study, 45 samples from the Pungchon limestone which do not show any megascopic indication of mineralization have been taken in both the mineralized zone and the unminerallized zone at the Sangdong Mine area. Analytical data show that there are big differences in the contents of CaO and $Al_2O_3$ between the Pungchon limestone of the mineralized zone and that of the unmineralized zone. Carbon isotope data exhibit that ${\delta}^{13}C$ values of the Pungchon limestone in the mineralized zone are highter than those in the unmineralized zone. The difference in the analytical values of CaO, $Al_2O_3$ and the carbon isotope between the mineralized and the unmineralized zones is as follows ; Unminerallized zone Mineralized zone CaO 51.3% 43.5% $Al_2O_3$ 0.6% 2.4% ${\delta}^{13}C$ -0.39 permil -0.56 permil $Fe_2O_3$ 0.9% 1.4% $SiO_2$ 3.0% 2.4% The decrease in the Si content of the Pungchon limestone in the mineralized zone is contrary to the result of the previous study (Moon, 1987). On the basis of identification of the increase in the Al content of the limestone in the mineralized zone, it could be deduced that the decrease in the Si content of the Pungchon limestone might be due to the result of increase in the alteration products mainly occurred along fracture-system such as joint cracks or minor faults and that the phenomena shown by the Si and Al content in the mineralized zone might be derived from the thermal effect of granite extended mineralizing activity to the overlied limestone on the surface. Higher mean values of Fe and Al as well as lower mean values of carbon content and the ${\delta}^{13}C$ than mean values of those in the Pungchon limestone at the northern limb of the Hambaeg Syncline may be applicable in exploration for blind orebodies.

• Electrical & Electronic Materials
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• v.9 no.1
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• pp.1-8
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• 1996

We investigated the effects of doping elements on the Bi-Sr-Ca-Cu-O ceramics. The doping elements can be classified into four groups depending on their supeconducting characteristics in the Bi-Sr-Ca-Cu-O structure. The first group of doping elements(Co, Fe, Ni and Zn) substitute into the copper site and can reduce the critical temperatures of the 2223 and 2212 phases. The second group of doping elements(Y and La) substitute into the Ca site and cause the disappearance of the 2223 phase and increase the critical temperatures in the 2212 phase. The third group of doping elements(P and K) have a tendency to decompose the superconducting phase and reduce the optimal sintering temperature. The fourth group of doping elements(B, Si, Sn and Ba) almost unaffected the superconductivity of the 2223 and 2212 phase.

• Journal of Information Display
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• v.9 no.4
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• pp.21-29
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• 2008

We studied both the wavelength and intensity dependent photo-responses (photofield-effect) in amorphous In-Ga-Zn-O (a-IGZO) thin-film transistors (TFTs). During the a-IGZO TFT illumination with the wavelength range from $460\sim660$ nm (visible range), the off-state drain current $(I_{DS_off})$ only slightly increased while a large increase was observed for the wavelength below 400 nm. The observed results are consistent with the optical gap of $\sim$3.05eV extracted from the absorption measurement. The a-IGZO TFT properties under monochromatic illumination ($\lambda$=420nm) with different intensity was also investigated and $I_{DS_off}$ was found to increase with the light intensity. Throughout the study, the field-effect mobility $(\mu_{eff})$ is almost unchanged. But due to photo-generated charge trapping, a negative threshold voltage $(V_{th})$ shift is observed. The mathematical analysis of the photofield-effect suggests that a highly efficient UV photocurrent conversion process in TFT off-region takes place. Finally, a-IGZO mid-gap density-of-states (DOS) was extracted and is more than an order of magnitude lower than reported value for hydrogenated amorphous silicon (a-Si:H), which can explain a good switching properties observed for a-IGZO TFTs.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.344-344
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• 2014

Transparent amorphous oxide semiconductors such as a In-Ga-Zn-O (a-IGZO) have advantages for large area electronic devices; e.g., uniform deposition at a large area, optical transparency, a smooth surface, and large electron mobility >10 cm2/Vs, which is more than an order of magnitude larger than that of hydrogen amorphous silicon (a-Si;H).1) Thin film transistors (TFTs) that employ amorphous oxide semiconductors such as ZnO, In-Ga-Zn-O, or Hf-In-Zn-O (HIZO) are currently subject of intensive study owing to their high potential for application in flat panel displays. The device fabrication process involves a series of thin film deposition and photolithographic patterning steps. In order to minimize contamination, the substrates usually undergo a cleaning procedure using deionized water, before and after the growth of thin films by sputtering methods. The devices structure were fabricated top-contact gate TFTs using the a-IGZO films on the plastic substrates. The channel width and length were 80 and 20 um, respectively. The source and drain electrode regions were defined by photolithography and wet etching process. The electrodes consisting of Ti(15 nm)/Al(120 nm)/Ti(15nm) trilayers were deposited by direct current sputtering. The 30 nm thickness active IGZO layer deposited by rf magnetron sputtering at room temperature. The deposition condition is as follows: a rf power 200 W, a pressure of 5 mtorr, 10% of oxygen [O2/(O2+Ar)=0.1], and room temperature. A 9-nm-thick Al2O3 layer was formed as a first, third gate insulator by ALD deposition. A 290-nm-thick SS6908 organic dielectrics formed as second gate insulator by spin-coating. The schematic structure of the IGZO TFT is top gate contact geometry device structure for typical TFTs fabricated in this study. Drain current (IDS) versus drain-source voltage (VDS) output characteristics curve of a IGZO TFTs fabricated using the 3-layer gate insulator on a plastic substrate and log(IDS)-gate voltage (VG) characteristics for typical IGZO TFTs. The TFTs device has a channel width (W) of $80{\mu}m$ and a channel length (L) of $20{\mu}m$. The IDS-VDS curves showed well-defined transistor characteristics with saturation effects at VG>-10 V and VDS>-20 V for the inkjet printing IGZO device. The carrier charge mobility was determined to be 15.18 cm^2 V-1s-1 with FET threshold voltage of -3 V and on/off current ratio 10^9.

• Korean Journal of Materials Research
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• v.19 no.10
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• pp.533-537
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• 2009

This paper presents a new method for the improvement of color temperature without the change of the driving scheme using transparent dielectric layers with various metal oxides (CeO$_2$, Co$_3$O$_4$, CuO, Fe$_2$O$_3$, MnO$_2$, NiO) in plasma display panels (PDP). In this study, we fabricated ZnO-B$_2$O$_3$-SiO$_2$-Al$_2$O$_3$ glasse with various metal oxides and examined the optical properties of these glasses. As the metal oxides were added to the glasses, the visible transmittances of the dielectric layers decreased and the transmittances in special wavelength regions were reduced at different rates. The change of the transmittance in each wavelength range induced the variation of the visible emission spectra and the change of the color temperature in the PDP. The addition of Co$_3$O$_4$ and CuO slightly decreased the intensity of the blue light, but the intensities of the green and the red light were significantly decreased. Therefore, the color temperature can be improved from 6087K to 7378K and 7057K, respectively.

• Economic and Environmental Geology
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• v.38 no.4 s.173
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• pp.481-492
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• 2005

The purpose of this study is to determine geochemical characteristics for stream sediments in the Gwangju area. We collect the stream sediments samples by wet sieving along the primary channels and dry these samples slowly in the laboratory and grind to under 200mesh using an alumina mortar fur chemical analysis. Major elements, trace and rare earth elements are determined by XRF, ICP-AES and NAA analysis methods. For geochemical characteristics on geological groups of stream sediments, we separate geologic groups which are derived from Precambrian granite gneiss area, Jurassic granite area and Cretaceous Hwasun andesite area. Contents range of major elements for stream sediments in the Gwangju area are $SiO_2\;51.89\~70.63\;wt.\%,\;Al_2O-3\;12.91\~21.95\;wt.\%,\;Fe_2O_3\;3.22\~9.89\;wt.\%,\;K_2O\;1.85\~4.49\;wt.\%,\;MgO\;0.68\~2.90\;wt.\%,\;Na_2O\;0.48\~2.34\;wt.\%,\;CaO\;0.42\~6.72\;wt.\%,\;TiO_2\;0.53\~l.32\;wt.\%,\;P_2O_5\;0.06\~0.51\;wt.\%\;and\;MnO\;0.05\~0.69\;wt.\%.$ According to the AMF diagram for stream sediments and rocks, the stream sediments are plotted on boundary of tholeiitic series and calk alkaline series, which shows that contents of $Fe_2O_3$ are higher in stream sediments than rocks. According to variation diagram of $SiO_2$ versus $(K_2O+Na_2O),$ stream sediments are plotted on subalkaline series. Contents range of trace and rare earth elements for stream sediments in the Gwangiu area are Ba$590\~2170$ppm, Be1\~2.4$ppm, Cu$13\~79$ppm, Nb$20\~34$ppm, Ni$10\~50$ppm, Pb$17\~30$ppm, Sr$70\~1025$ ppm, V$42\~135$ppm, Zr$45\~171$ppm, Li$19\~77$ppm, Co$4.3\~19.3$ppm, Cr$28\~131$ppm, Cs$3.1\~17.6$ppm, Hf$5\~27.6$ppm, Rb$388\~202$ppm, Sb$0.2\~l.2$ ppm, Sc$6.4\~17$ppm, Zn$47\~389$ppm, Pa$8.8\~68.8$ppm, Ce$62\~272$ppm, Eu$1\~2.7$ppm and Yb$0.9\~6$ppm.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.08a
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• pp.29-29
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• 2010

건물일체형 태양전지 (BIPV; building integrated photovoltaics)나 야외 태양광 발전 차양 등의 태양광 발전에는 기존의 유리 기판 태양전지보다 가볍고 유연한 flexible 박막 태양전지가 설치하고 운영하는데 적합하다. 이러한 flexible 박막 태양전지는 자동차나 휴대기기의 전원이나 배터리의 충전기기로도 쓰이며 그 수요가 증가 추세에 있다. 특히, flexible Cu(In, Ga)$Se_2$(CIGS) 박막 태양전지는 기존의 flexible 실리콘 박막 태양전지보다 효율이 높아서 앞으로 성장 잠재력이 매우 높다. 세계적으로도 많은 기업이 상용화를 추진하고 있으며, 2007년부터 시장에 진입하고 있다. 그러나 현재의 flexible CIGS 박막 태양전지는 유리 기판 CIGS 박막 태양전지보다 효율이 낮고 패키지를 유리에서 플라스틱으로 대체하기 때문에 수명이 짧다. 또한, 아직도 완전한 양산 체제로 전환이 이루어지지 않았기 때문에 해결해야 할 문제점이 많이 있다. Flexible 기판으로는 스테인리스 스틸이나 폴리머 기판이 사용되는데, 유리 기판에 비해 저가 태양전지를 제조할 수 있을 뿐만 아니라 roll-to-roll 공정을 적용할 수 있어 가격 경쟁력을 확보할 수 있다. 특히, 금속 유연기판을 사용할 경우, 유리 기판에 비해 상대적으로 고온 공정이 가능한 장점이 있다. 그러나, 금속 기판을 사용할 경우 해결해야 할 두 가지 이슈가 있다. 첫째, CIGS 흡수층 형성에 도움을 주는 Na의 공급 문제이다. 유리 기판의 경우 기판에 포함되어 있는 Na이 확산을 통해 공급되지만, 금속 기판의 경우 별도의 Na 공급 방법을 고려해야 한다. 둘째, 불순물 확산 방지막 및 전기 절연층으로 사용되는 유전체 박막의 문제이다. 현재 다양한 금속 산화물 유전체 박막을 사용한 연구가 진행되고 있다. 본 논문에서는 flexible CIGS 박막 태양전지의 기술적 이슈 및 현재 연구 현황을 살펴보고, 스테인리스 스틸 기판을 이용한 CIGS 박막 태양전지에서 유전체 확산 방지막에 따른 특성을 비교하고자 한다. 스테인리스 스틸 기판의 불순물로부터의 확산을 방지하기 위하여 두 종류(intrinsic ZnO와 SiOx)의 유전체 박막을 각각 Na가 도핑된 Mo층과 스테인리스 스틸 기판 사이에 삽입하여 소자를 제작하였다. 확산 방지막이 없는 경우, SiOx층을 사용한 경우, 그리고 intrinsic ZnO 층을 사용한 경우에, 효율은 각각 7.47, 11.64, and 13.95%로 나타났다. 셀의 크기는 $0.47\;cm^2$이고, 반사방지막은 사용하지 않았다.