• Title/Summary/Keyword: SiH4/O2

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Analyses on Viscosity Properties of $TiO_2$ Sol and $SiO_2$ Sol using Sol-Gel Method (솔젤법에 의해 제작된 $TiO_2$ 솔과 $SiO_2$ 솔의 점도 특성에 대한 분석)

  • You Do-Hyun
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.54 no.12
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    • pp.573-577
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    • 2005
  • [$TiO_2$] sol and $SiO_2$ sol were prepared using sol-gel method. As $H_{2}O$/Alkoxide ratios increased, sol had cluster structure and as $H_{2}O$/Alkoxide ratios decreased, sol had linear structure. Gelation time of $TiO_2$ sol was faster than that of $SiO_2$ sol according to the time. In comparison with initial viscosity between $TiO_2$ sol and $SiO_2$ sol, $TiO_2$ sol was highest at $H_{2}O/Ti(OC_{3}H_{7})_{4}=5$, $SiO_2$ sol was almost constant according to $H_{2}O/Si(OC_{2}H_{5})_{4}$ ratios.

Electrochemical Performance of Hollow Silicon/Carbon Anode Materials for Lithium Ion Battery (리튬이차전지용 Hollow Silicon/Carbon 음극소재의 전기화학적 성능)

  • Jung, Min Ji;Lee, Jong Dae
    • Applied Chemistry for Engineering
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    • v.27 no.4
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    • pp.444-448
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    • 2016
  • Hollow silicon/carbon (H-Si/C) composites as anode materials for lithium ion batteries were investigated to overcome the large volume expansion. H-Si/C composites were prepared as follows; hollow $SiO_2\;(H-SiO_2)$ was prepared by adding $NaBH_4$ to $SiO_2$ synthesized using $st{\ddot{o}}ber$ method followed by magnesiothermic reduction and carbonization of phenolic resin. The H-Si/C composites were analyzed by XRD, SEM, BET and EDX. To improve the capacity and cycle performance, the electrochemical characteristics of H-Si/C composites synthesized with various $NaBH_4$ contents were investigated by charge/discharge, cycle, cyclic voltammetry and impedance tests. The coin cell using H-Si/C composite ($SiO_2:NaBH_4=1:1$ in weight) in the electrolyte of $LiPF_6$ dissolved in organic solvents (EC : DMC : EMC = 1 : 1 : 1 vol%) has better capacity (1459 mAh/g) than those of other composition coin cells. It is found that the coin cell ($SiO_2:NaBH_4=1:1$ in weight) has an excellent capacity retention from 2nd cycle to 40th cycle.

Reliability Analysis of 4H-SiC CMOS Device for High Voltage Power IC Integration (고전압 Power IC 집적을 위한 4H-SiC CMOS 신뢰성 연구)

  • Kang, Yeon-Ju;Na, Jae-Yeop;Kim, Kwang-Soo
    • Journal of IKEEE
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    • v.26 no.1
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    • pp.111-118
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    • 2022
  • In this paper, we studied 4H-SiC CMOS that can be integrated with high-voltage SiC power devices. After designing the CMOS on a 4H-SiC substrate, we compared the electrical characteristics with the reliability of high temperature operation by TCAD simulation. In particular, it was confirmed that changing HfO2 as the gate dielectric for reliable operation at high temperatures improves the thermal properties compared to SiO2. By researching SiC CMOS devices, we can integrate high-power SiC power devices with SiC CMOS for excellent performance in terms of efficiency and cost of high-power systems.

Separation of $H_2$/$N_2$ Gas Mixture by SiO$_2$-B$_2$O$_3$ Membrane (SiO$_2$-B$_2$O$_3$ 막에 의한 수소/질소 혼합기체 분리)

  • Kang Tae-Bum;Park Jin-Ho
    • Membrane Journal
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    • v.14 no.4
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    • pp.312-319
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    • 2004
  • The porous SiO$_2$-B$_2$O$_3$ membrane was prepared from Si(OC$_2$$H_5$)$_4$-($CH_3$O)$_3$B-C$_2$$H_5$OH-$H_2O$ system by sol-gel method. In order to investigate the characteristics of this membrane, we examined that using BET, IR spectrophotometer, X-ray diffractometer, SEM and TEM. At $700^{\circ}C$, the surface area of SiO$_2$-B$_2$O$_3$ membrane was 354.398 $m^2$/, the median pore diameter was 0.0048 ${\mu}{\textrm}{m}$, and the particle size of SiO$_2$-B$_2$O$_3$ membrane was 7 nm. The separation properties of the gas mixture ($H_2$/$N_2$) through the SiO$_2$-B$_2$O$_3$ membrane was studied as a function of pressure. The real separation factor($\alpha$) of SiO$_2$-B$_2$O$_3$ membrane for $H_2$/$N_2$ gas mixture was 4.68 at 155.15 cmHg and $25^{\circ}C$. The real separation factor($\alpha$), head separation factor($\beta$) and tail separation factor((equation omitted)) were increased as the pressure of permeation cell increased.

SiC/SiO2 Interface Characteristics in N-based 4H-SiC MOS Capacitor Fabricated with PECVD and NO Annealing Processes (PECVD와 NO 어닐링 공정을 이용하여 제작한 N-based 4H-SiC MOS Capacitor의 SiC/SiO2 계면 특성)

  • Song, Gwan-Hoon;Kim, Kwang-Soo
    • Journal of IKEEE
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    • v.18 no.4
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    • pp.447-455
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    • 2014
  • In this research, n-based 4H-MOS Capacitor was fabricated with PECVD (plasma enhanced chemical vapor deposition) process for improving SiC/$SiO_2$ interface properties known as main problem of 4H-SiC MOSFET. To overcome the problems of dry oxidation process such as lower growth rate, high interface trap density and low critical electric field of $SiO_2$, PECVD and NO annealing processes are used to MOS Capacitor fabrication. After fabrication, MOS Capacitor's interface properties were measured and evaluated by hi-lo C-V measure, I-V measure and SIMS. As a result of comparing the interface properties with the dry oxidation case, improved interface and oxide properties such as 20% reduced flatband voltage shift, 25% reduced effective oxide charge density, increased oxide breakdown field of 8MV/cm and best effective barrier height of 1.57eV, 69.05% reduced interface trap density in the range of 0.375~0.495eV under the conduction band are observed.

Study on Improvement of Etch Rate and SiO2 Regrowth in High Selectivity Phosphoric Acid Process (고선택비 인산공정에서의 식각율 향상과 SiO2 재성장에 관한 연구)

  • Lee, Seunghoon;Mo, Sungwon;Lee, Yangho;Bae, JeongHyun
    • Korean Journal of Materials Research
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    • v.28 no.12
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    • pp.709-713
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    • 2018
  • To improve the etch rate of $Si_3N_4$ thin film, $H_2SiF_6$ is added to increase etching rate by more than two times. $SiO_3H_2$ is gradually added to obtain a selectivity of 170: 1 at 600 ppm. Moreover, when $SiO_3H_2$ is added, the etching rate of the $SiO_2$ thin film increases in proportion to the radius of the wafer. In $Si_3N_4$ thin film, there is no difference in the etching rate according to the position. However, in the $SiO_2$ thin film, the etching rate increases in proportion to the radius. At the center of the wafer, the re-growth phenomenon is confirmed at a specific concentration or above. The difference in etch rates of $SiO_2$ thin films and the reason for regrowth at these positions are interpreted as the result of the flow rate of the chemical solution replaced with fresh solution.

Compositional Effects of $CaO-SiO_2-P_2O_5$ Bioactive Cement on Hardening and Hydroxyapatite Formation ($CaO-SiO_2-P_2O_5$계 바이오 시멘트 유리의 조성이 경화 및 Hydroxyapatite 형성에 미치는 영향)

  • 박상종;김철영
    • Journal of the Korean Ceramic Society
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    • v.31 no.5
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    • pp.505-512
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    • 1994
  • It has been reported that a biocement obtained by mixing CaO-SiO2-P2O5 glass powder and ammonium phosphate solution has biocompatibility as well as high strength. However, the compositional dependence on its hardening and hydroxyapatite formation phenomena has not been studied. Therefore, the main objective of this work is to study the effects of P2O5, MgO in CaO-SiO2 system glass on the hardening and hydroxyapatite formation. When more than 50 mole% of CaO containing CaO-SiO2 glasses was reacted with ammonium phosphate solution, CaNH4PO4.H2O crystal was formed, but the glass with less than 50 mol% of CaO formed (NH4)2HPO4 and NH4H2PO4 crystals which are derived from ammonium phosphate solution without reacting with the glasses. As the amount of P2O5 in CaO-SiO2-P2O5 glass system was increased, the formation of CaNH4PO4.H2O crystal was enhanced. When those hardened samples were reacted with tris-buffer solution, hydroxyapatite was obtained only for the sample with CaNH4PO4.H2O. While the substitution of MgO for CaO decreased the formation of CaNH4PO4.H2O crystal. MgNH4PO4.H2O crystla was formed in high MgO containing glass, which did not react with tris-buffer solution.

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Synthesis of TAME, ETBE, and MTBE Using Heteropolyacid Catalyst (헤테로폴리산 촉매를 이용한 TAME, ETBE 및 MTBE 합성반응의 연구)

  • Park, Jin-Hwa;Yi, Yong-Woo
    • Applied Chemistry for Engineering
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    • v.8 no.4
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    • pp.582-588
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    • 1997
  • Synthetic reaction of TAME, ETBE, and MTBE compounds used largely for gasoline octane number enhancer to prevent air pollution was investigated using heteropolyacid catalyst in a fixed bed flow reactor. In the synthetic reaction of TAME, ETBE and MTBE, after hetero atom being replaced with poly atom, the activity of the catalyst, $H_4SiW_{12}O_{40}$ with coordinated bond with W and an hetero atom of Si was the highest among the catalysts tested. Also the activity depended upon the metals replaced which are related to the catalyst acidity. $FeHPW_{12}O_{40}$ and $K_3PM_{o12}O_{40}$ catalysts showed high activity in TAME synthesis, while they were not effective in ETBE and MTBE synthesis. In this study catalysts showing high activity were selected and mixed with equal weight combination of $H_4SiW_{12}O_{40}$ and $Sr_2SiW_{12}O_{40}$ ;$H_4SiW_{12}O_{40}$ and $NaH_2PW_{12}O_{40}$ ; $Fe_{1.5}PW_{12}O_{40}$ and $Mg_2SiW_{12}O_{40}$ ; $Mg_2SiW_{12}O_{40}$ and $Ba_2SiW_{12}O_{40}$. The mixed heteropolyacid catalysts showed higher TBA conversion rate and better selectivity of ETBE and MTBE than the single catalysts.

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Synthesis and Properties of $Al_2O_3-SiC$ Composites from Alkoxides (알콕사이드로부터 $Al_2O_3-SiC$ 복합재료의 제조 및 특성)

  • 이홍림;김규영
    • Journal of the Korean Ceramic Society
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    • v.30 no.2
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    • pp.123-130
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    • 1993
  • Dispersed type Al2O3-SiC composite powders were synthesized from Al-isopropoxide (Al(i-OC3H7)3) and Si(OC2H5)4 precursors by hydrolysis of mixed alkoxides and carbothermal reaction method. The characteristics of the synthesized (dispersed type) Al2O3-SiC composite powders were investigated using XRD, SEM, TEM, BET and particle size analyzer. Carbothermal reaction to produce Al2O3-SiC composite was completed in 10h at 135$0^{\circ}C$ on 3~4㎤/s (0.21~0.28cm/s) of H2 flow rate and about 1/1 of carbon/oxides(=SiO2+Al2O3) molar ratio. The synthesized powders were observed to have the mean particle size range of 0.4~1.26${\mu}{\textrm}{m}$ and showed finer particle size with increasing SiC content.

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Synthesis of Silicon Carbide Whiskers (I) : Reaction Mechanism and Rate-Controlling Reaction (탄화규소 휘스커의 합성(I) : 반응기구의 율속반응)

  • 최헌진;이준근
    • Journal of the Korean Ceramic Society
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    • v.35 no.12
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    • pp.1329-1336
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    • 1998
  • A twt -step carbothermal reduction scheme has been employed for the synthesis of SiC whiskers in an Ar or a H2 atmosphere via vapor-solid two-stage and vapor-liquid-solid growth mechanism respectively. It has been shown that the whisker growth proceed through the following reaction mechanism in an Ar at-mosphere : SiO2(S)+C(s)-SiO(v)+CO(v) SiO(v)3CO(v)=SiC(s)whisker+2CO2(v) 2C(s)+2CO2(v)=4CO(v) the third reaction appears to be the rate-controlling reaction since the overall reaction rates are dominated by the carbon which is participated in this reaction. The whisker growth proceeded through the following reaction mechaism in a H2 atmosphere : SiO2(s)+C(s)=SiO(v)+CO(v) 2C(s)+4H2(v)=2CH4(v) SiO(v)+2CH4(v)=SiC(s)whisker+CO(v)+4H2(v) The first reaction appears to be the rate-controlling reaction since the overall reaction rates are enhanced byincreasing the SiO vapor generation rate.

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