• Restorative Dentistry and Endodontics
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• 제40권2호
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• pp.136-142
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• 2015

Objectives: The aim of this study was to evaluate the effects of tri-antibiotic paste (TAP) on microtensile bond strengths (MTBS) of dental adhesives to dentin. Materials and Methods: Sixty extracted molars had their occlusal surfaces flattened to expose dentin. They were divided into two groups, i.e., control group with no dentin treatment and experimental group with dentin treatment with TAP. After 10 days, specimens were bonded using self-etch (Filtek P90 adhesive) or etch-and-rinse (Adper Single Bond Plus) adhesives and restored with composite resin. Teeth were sectioned into beams, and the specimens were subjected to MTBS test. Data were analyzed using two-way ANOVA and post hoc Tukey tests. Results: There was a statistically significant interaction between dentin treatment and adhesive on MTBS to coronal dentin (p = 0.003). Despite a trend towards worse MTBS being noticed in the experimental groups, TAP application showed no significant effect on MTBS (p = 0.064). Conclusions: The etch-and-rinse adhesive Adper Single Bond Plus presented higher mean bond strengths than the self-etch adhesive Filtek P90, irrespective of the group. The superior bond performance for Adper Single Bond when compared to Filtek P90 adhesive was confirmed by a fewer number of adhesive failures. The influence of TAP in bond strength is insignificant.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2010년도 제39회 하계학술대회 초록집
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• pp.124-124
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• 2010

Currently, extreme ultraviolet lithography (EUVL) is being investigated for next generation lithography. EUVL is one of competitive lithographic technologies for sub-22nm fabrication of nano-scale Si devices that can possibly replace the conventional photolithography used to make today's microcircuits. Among the core EUVL technologies, mask fabrication is of considerable importance due to the use of new reflective optics having a completely different configuration compared to those of conventional photolithography. Therefore, new materials and new mask fabrication process are required for high performance EUVL mask fabrication. This study investigated the etching properties of SnO2 (Tin Oxide) as a new absorber material for EUVL binary mask. The EUVL mask structure used for etching is SnO2 (absorber layer) / Ru (capping / etch stop layer) / Mo-Si multilayer (reflective layer) / Si (substrate). Since the Ru etch stop layer should not be etched, infinitely high selectivity of SnO2 layer to Ru ESL is required. To obtain infinitely high etch selectivity and very low LER (line edge roughness) values, etch parameters of gas flow ratio, top electrode power, dc self - bias voltage (Vdc), and etch time were varied in inductively coupled Cl2/Ar plasmas. For certain process window, infinitely high etch selectivity of SnO2 to Ru ESL could be obtained by optimizing the process parameters. Etch characteristics were measured by on scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS) analyses. Detailed mechanisms for ultra-high etch selectivity will be discussed.

• Restorative Dentistry and Endodontics
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• 제39권1호
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• pp.24-31
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• 2014

Objectives: The purpose of present study was to evaluate the internal adaptation of composite restorations using different adhesive systems. Materials and Methods: Typical class I cavities were prepared in 32 human third molars. The teeth were divided into the following four groups: 3-step etch-and-rinse, 2-step etch-and-rinse, 2-step self-etch and 1-step self-etch system were used. After the dentin adhesives were applied, composite resins were filled and light-cured in two layers. Then, silver nitrate solution was infiltrated, and all of the samples were scanned by micro-CT before and after thermo-mechanical load cycling. For each image, the length to which silver nitrate infiltrated, as a percentage of the whole pulpal floor length, was calculated (%SP). To evaluate the internal adaptation using conventional method, the samples were cut into 3 pieces by two sectioning at an interval of 1 mm in the middle of the cavity and they were dyed with Rhodamine-B. The cross sections of the specimens were examined by stereomicroscope. The lengths of the parts where actual leakage was shown were measured and calculated as a percentage of real leakage (%RP). The values for %SP and %RP were compared. Results: After thermo-mechanical loading, all specimens showed significantly increased %SP compared to before thermo-mechanical loading and 1-step self-etch system had the highest %SP (p < 0.05). There was a tendency for %SP and %RP to show similar microleakage percentage depending on its sectioning. Conclusions: After thermo-mechanical load cycling, there were differences in internal adaptation among the groups using different adhesive systems.

• Restorative Dentistry and Endodontics
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• 제46권1호
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• pp.3.1-3.14
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• 2021

Objectives: This study aimed to evaluate the interface between a calcium silicate cement (CSC), Biodentine and dental adhesives in terms of sealing ability. Materials and Methods: Microleakage test: 160 standardized class II cavities were prepared on 80 extracted human molars. The cavities were filled with Biodentine and then divided into 2 experimental groups according to the time of restoration: composite resin obturation 15 minutes after Biodentine handling (D0); restoration after 7 days (D7). Each group was then divided into 8 subgroups (n = 5) according to the adhesive system used: etch-and-rinse adhesive (Prime & Bond); self-etch adhesive 2 steps (Optibond XTR and Clearfil SE Bond); self-etch adhesive 1 step (Xeno III, G-aenial Bond, and Clearfil Tri-S Bond); and universal used as etch-and-rinse or self-etch (ScotchBond Universal ER or SE). After thermocycling, the teeth were immersed in a silver nitrate solution, stained, longitudinally sectioned, and the Biodentine/adhesive percolation was quantified. Scanning electron microscopic observations: Biodentine/adhesive interfaces were observed. Results: A tendency towards less microleakage was observed when Biodentine was etched (2.47%) and when restorations were done without delay (D0: 4.31%, D7: 6.78%), but this was not significant. The adhesives containing 10-methacryloyloxydecyl dihydrogen phosphate monomer showed the most stable results at both times studied. All Biodentine/adhesive interfaces were homogeneous and regular. Conclusions: The good sealing of the CSC/adhesive interface is not a function of the system adhesive family used or the cement maturation before restoration. Biodentine can be used as a dentine substitute.

• Restorative Dentistry and Endodontics
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• 제38권2호
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• pp.73-78
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• 2013

Objectives: This study evaluated the effect of three different air-drying times on microleakage of three self-etch adhesive systems. Materials and Methods: Class I cavities were prepared for 108 extracted sound human premolars. The teeth were divided into three main groups based on three different adhesives: Opti Bond All in One (OBAO), Clearfil $S^3$ Bond (CSB), Bond Force (BF). Each main group divided into three subgroups regarding the air-drying time: without application of air stream, following the manufacturer's instruction, for 10 sec more than manufacturer's instruction. After completion of restorations, specimens were thermocycled and then connected to a fluid filtration system to evaluate microleakage. The data were statistically analyzed using two-way ANOVA and Tukey-test (${\alpha}$ = 0.05). Results: The microleakage of all adhesives decreased when the air-drying time increased from 0 sec to manufacturer's instruction (p < 0.001). The microleakage of BF reached its lowest values after increasing the drying time to 10 sec more than the manufacturer's instruction (p < 0.001). Microleakage of OBAO and CSB was significantly lower compared to BF in all three drying time (p < 0.001). Conclusions: Increasing in air-drying time of adhesive layer in one-step selfetch adhesives caused reduction of microleakage, but the amount of this reduction may be dependent on the adhesive components of self-etch adhesives.

• Restorative Dentistry and Endodontics
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• 제43권2호
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• pp.14.1-14.16
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• 2018

Objectives: The aim of this systematic review was to critically analyze previously published studies of the effects of dentin surface pretreatment with deproteinizing agents on the bonding of self-etch (SE) adhesives to dentin. Additionally, a meta-analysis was conducted to quantify the effects of the above-mentioned surface pretreatment methods on the bonding of SE adhesives to dentin. Materials and Methods: An electronic search was performed using the following databases: Scopus, PubMed and ScienceDirect. The online search was performed using the following keywords: 'dentin' or 'hypochlorous acid' or 'sodium hypochlorite' and 'self-etch adhesive.' The following categories were excluded during the assessment process: non-English articles, randomized clinical trials, case reports, animal studies, and review articles. The reviewed studies were subjected to meta-analysis to quantify the effect of the application time and concentration of sodium hypochlorite (NaOCl) and hypochlorous acid (HOCl) deproteinizing agents on bonding to dentin. Results: Only 9 laboratory studies fit the inclusion criteria of this systematic review. The results of the meta-analysis revealed that the pooled average microtensile bond strength values to dentin pre-treated with deproteinizing agents (15.71 MPa) was significantly lower than those of the non-treated control group (20.94 MPa). Conclusions: In light of the currently available scientific evidence, dentin surface pretreatment with deproteinizing agents does not enhance the bonding of SE adhesives to dentin. The HOCl deproteinizing agent exhibited minimal adverse effects on bonding to dentin in comparison with NaOCl solutions.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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• pp.198-198
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• 2013

Metal-Oxide-Semiconductor (MOS)에서 사용되는 다양한 channel materials로 high electron mobility을 가지는 III-V compound semiconductor가 대두되고 있다 [1,2]. 하지만 이러한 III-V compound semiconductor는 Si에 비해 안정적인 native oxide가 부족하기 때문에 Si, Ge, Al2O3과 BeO 등과 같은 다양한 물질들의 interface passivation layers (IPLs)에 대한 연구가 많이 되고 있다. 이러한 IPLs 물질은 0.5~1.0 nm의 매우 얇은 physical thickness를 가지고 있고 또한 chemical inert하기 때문에 플라즈마 식각에 대한 연구가 되고 있지만 IPLs 식각 후 기판인 III-V compound semiconductor에 physical damage과 substrate recess를 줄이기 위해서 높은 선택비가 필요하다. 이러한 식각의 대안으로 원자층 식각이 연구되고 있으며 이러한 원자층 식각은 반응성 있는 BCl3의 adsorption과 low energy의 Ar bombardment로 desorption으로 self-limited한 one monolayer 식각을 가능하게 한다. 그러므로 본 연구에서는, III-V compound semiconductor 위에 IPLs의 adsorption과 desorption의 cyclic process를 이용한 원자층식각으로 다양한 물질인 SiO2, Al2O3 (self-limited one monolayer etch rate=about 1 ${\AA}$/cycle), BeO (self-limited one monolayer etch rate=about 0.75 ${\AA}$/cycle)를 얻었으며 그 결과 precise한 etch depth control로 minimal substrate recess 식각을 할 수 있었다.

• Restorative Dentistry and Endodontics
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• 제33권6호
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• pp.526-536
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• 2008

이 연구의 목적은 수종의 상아질 접착시스템이 즉시 및 지연 상아질 봉쇄에서 미세인장결합강도에 미치는 영향을 평가하는 것이었다. 18개의 발거된 대구치를 사용하여 지연 상아질 봉쇄그룹은 노출된 상아질면을 임시수복하였으며, 1주간 보관 후, 접착제에 따라 3개의 소그룹으로 나누어 도포하였다; SB 그룹 (3 단계 산 부식 접착제), SE 그룹 (2단계 자가 부식 접착제), XE 그룹 (1단계 자가 부식 접착제). 즉시 상아질 봉쇄그룹은 3개의 소그룹으로 나누어 접착제를 도포하고 임시수복 후 1주간 보관하였다. 모든 시편은 간접 복합레진과 레진 시멘트로 합착하고 미세인장결합강도를 측정하여, 다음과 같은 결과를 얻었다. 1. 즉시 상아질 봉쇄그룹은 지연 상아질 봉쇄그룹에 비해 3단계 산 부식과 2단계 자가 부식 접착제에서 높은 미세인장결합강도를 보였다 (p < 0.05). 2. 즉시 및 지연 상아질 봉쇄그룹 모두 미세인장결합강도는 3단계 산 부식, 2단계 자가 부식, 1단계 자가 부식 접착제순으로 감소하였고, 즉시 상아질 봉쇄그룹에서는 1단계 자가 부식 접착제와 다른 소그룹간 유의한 차이가 있었으며 (p< 0.05), 지연 상아질 봉쇄 그룹에서는 모든 소그룹간 유의한 차이가 있었다 (p < 0.05). 3. 파절 양상은 대부분 혼합성 파절을 보였으며, 1단계 자가 부식 접착제에서만 접착성 파절을 보였다.

• The Journal of Advanced Prosthodontics
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• 제5권4호
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• pp.479-484
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• 2013

PURPOSE. The aim of this study was to evaluate the effects of additional acid etching and curing mechanism (light-curing or self-curing) of a composite resin on the dentin bond strength and compatibility of one-step self-etching adhesives. MATERIALS AND METHODS. Sixteen human permanent molars were randomly divided into eight groups according to the adhesives used (All-Bond Universal: ABU, Clearfil S3 Bond: CS3), additional acid etching (additional acid etching performed: EO, no additional acid etching performed: EX), and composite resins (Filtek Z-250: Z250, Clearfil FII New Bond: CFNB). Group 1: ABU-EO-Z250, Group 2: ABU-EO-CFNB, Group 3: ABU-EX-Z250, Group 4: ABU-EX-CFNB, Group 5: CS3-EO-Z250, Group 6: CS3-EO-CFNB, Group 7: CS3-EX-Z250, Group 8: CS3-EX-CFNB. After bonding procedures, composite resins were built up on dentin surfaces. After 24-hour water storage, the teeth were sectioned to make 10 specimens for each group. The microtensile bond strength test was performed using a microtensile testing machine. The failure mode of the fractured specimens was examined by means of an optical microscope at ${\times}20$ magnification. The data was analyzed using a one-way ANOVA and Scheffe's post-hoc test (${\alpha}$=.05). RESULTS. Additional etching groups showed significantly higher values than the no additional etching group when using All-Bond Universal. The light-cured composite resin groups showed significantly higher values than the self-cured composite resin groups in the Clearfil S3 Bond. CONCLUSION. The additional acid etching is beneficial for the dentin bond strength when using low acidic one-step self-etch adhesives, and low acidic one-step self-etch adhesives are compatible with self-cured composite resin. The acidity of the one-step self-etch adhesives is an influencing factor in terms of the dentin bonding strength and incompatibility with a self-cured composite resin.

• 대한소아치과학회지
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• 제33권3호
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• pp.377-387
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• 2006

본 연구는 자가산부식 접착시스템과 자가산부식 프라이머 접착시스템의 다층적용이 혼성층 및 adhesive layer의 형성 양상, 그리고 전단결합강도에 미치는 영향 등을 비교 평가하기 위하여 시행되었다. 영구 구치 140개의 치아를 근원심으로 분할하여 협면 혹은 설면의 상아질을 이용하였다. 각 접착시스템을 1회, 2회, 3회 도포, 그리고 1회 도포 후 광중합한 후 1회의 추가 도포한 군으로 분류하였다. 전단결합강도와 혼성층 및 adhesive layer 두께를 측정하여 분석한 결과 다음과 같은 결론을 얻었다. 1. 모든 접착제에서 도포횟수가 증가함에 따라 adhesive layer의 두께가 증가하였으며 (p<0.05), Adpor Prompt L-Pop과 Xeno III에서는 자가산부식 프라이머 시스템에서보다 작게 나타났다(p<0.05). 2. Adpor Prompt L-Pop에서 혼성층은 도포횟수에 따라 혼성층의 두께도 증가하였다(p<0.05). 3. Unifill Bond와 Clearfill SE Bond의 전단결합강도는 Scotchbond Multi-Purpose Plus와 Adpor Prompt L-Pop에서보다 높게 나타났으며 (p<0.05), Xeno III와는 유사하였다. 4. Adpor Prompt L-Pop은 접착제의 도포횟수가 증가함에 따라 전단결합강도는 유의하게 증가되었으며(p<0.05), AdheSE에서는 3회 도포한 경우 전단결합강도가 감소하는 경향을 보였다(p>0.05). 5. Adpor Prompt L-Pop과 Xeno III에서 첫 층을 중합한 후 두 번째 층을 추가 도포한 경우 전단결합강도는 감소하였다(p<0.05).