• 제목/요약/키워드: Self-bias.

검색결과 309건 처리시간 0.025초

Low-Voltage Current Feed-back Amplifier

  • Wisetphanichkij, Sompong;Dejhan, Kobchai;Suklueng, Montri
    • 제어로봇시스템학회:학술대회논문집
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    • 제어로봇시스템학회 2005년도 ICCAS
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    • pp.1877-1880
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    • 2005
  • This paper proposed the new current feed-back amplifier for low supply voltage application. The input stage was designed to be a class-AB circuit and achieve the low supply-voltage operation down to $2V_{TH}+2V_{DS(SAT)}$. With the self-adjust bias current, the high performance can be adopted with high stability. The circuit was successfully proven by the simulation with MOSIS 0.5 ${\mu}$m MOS technology.

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Resonant Loop Design and Performance Test for a Torsional MEMS Accelerometer with Differential Pickoff

  • Sung, Sang-Kyung;Hyun, Chul;Lee, Jang-Gyu
    • International Journal of Control, Automation, and Systems
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    • 제5권1호
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    • pp.35-42
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    • 2007
  • This paper presents an INS(Inertial Navigation System) grade, surface micro-machined differential resonant accelerometer(DRXL) manufactured by an epitaxially grown thick poly silicon process. The proposed DRXL system generates a differential digital output upon an applied acceleration, in which frequency transition is measured due to gap dependent electrical stiffness change. To facilitate the resonance dynamics of the electromechanical system, the micromachined DRXL device is packaged by using the wafer level vacuum sealing process. To test the DRXL performance, a nonlinear self-oscillation loop is designed based on the extended describing function technique. The oscillation loop is implemented using discrete electronic elements including precision charge amplifier and hard feedback nonlinearity. The performance test of the DRXL system shows that the sensitivity of the accelerometer is 24 Hz/g and its long term bias stability is about 2 mg($1{\sigma}$) with dynamic range of ${\sigma}70g$.

부동 게이트를 가진 새로운 구조의 오프셋 다결정 실리콘 박막 트랜지스터 (Novel offset gated poly-Si TFTs with folating sub-gate)

  • 박철민;민병혁;한민구
    • 전자공학회논문지A
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    • 제33A권7호
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    • pp.127-133
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    • 1996
  • In this paper, we propose a new fabrication method for poly-Si TFTs with a self-aligned offset gated structure by employing a photoresist reflow process. Compared with the conventional poly-Si TFTs, the device is consist of two gate electrodes, of which one is the entitled main gate where the gate bias is employed and the other is the entitled subgate which is separate form both sides of the main gate. The poly-Si channel layer below the offset oxide is protected form the injected ion impurities for the source/drain implantation and acts as an offset region of the proposed device. The key feature of oru new device is the offset region due to the offset oxide. our experimental reuslts show that the offset region, due to the photoresist reflow process, has been sucessfully obtained in order to fabricate the offset gated poly-Si TFTs. The maximum ON/OFF ratio occurs at the L$_{off}$ of 1.1${\mu}$m and exceeds 1X10$^{6}$.

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청소년과 부모의 지역감정 관계에 관한 연구 - 영남지역을 중심으로 - (Regional Antagonism of Adolescents and Their Parents in the Youngnam Region)

  • 민하영;공인숙
    • 아동학회지
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    • 제28권4호
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    • pp.277-287
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    • 2007
  • Antagonism between the Youngnam and Honam regions of Korea as expressed by adolescents and their parents was studied in 167 parent-adolescent pairs (total 334) of Youngnam residents. Adolescents were middle school students 71 (42.5%) and high school students 96 (57.5%), 90 boys (53.9%), 77 girls (46.1%). The instruments were subjects' self-reported social distance and stereotypes. Data were analyzed by t-test, paired t-test, Pearson's Correlation, and hierarchical regression. Major findings were that : (1) adolescents' social distance was positively associated with adolescent and parent negative stereotypes. (2) Adolescent positive/negative stereotypes were positively associated with parent positive/negative stereotypes. (3) Adolescent negative stereotypes exerted an indirect effect on social distance, controlled by parents' negative stereotypes.

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Characterization of Diamond-like Carbon Films Prepared by Magnetron Plasma Chemical Vapor Deposition

  • Soung Young Kim;Jai Sung Lee;Jin Seok Park
    • The Korean Journal of Ceramics
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    • 제4권1호
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    • pp.20-24
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    • 1998
  • Thin films of diamond-like carbon(DLC) can be successfully deposited by using a magnetron plasma chemical vapor deposition (CVD) method with an rf(13.56 MHz) plasma of $C_dH_8$. Plasma characteristics are analyzed as a function of the magnetic field. As the magnetic field increases, both electron temperature ($T_e$) and density ($n_e$)increase, but the negative dc self-bias voltage (-$V_{ab}$) decreases, irrespective of gas pressures in the range of 1~7 mTorr. High deposition rates have been obtained even at low gas pressures, which may be attributed to the increased mean free path of electrons in the magentron plasma. Effects of rf power and additive gas on the structural properties of DLC films aer also examined by using various technique namely, TED(transmissio electron diffraction) microanalysis, FTIR, and Raman spectroscopies.

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자화된 플라즈마의 특성 및 식각에의 응용 (The characteristics of Magnetized plasma and its applications to Etching)

  • 신경섭;이호준;황기웅
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1993년도 정기총회 및 추계학술대회 논문집 학회본부
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    • pp.261-263
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    • 1993
  • The effects of the magnetic field and gas pressure on the etching characteristics were investigated in the axial magnetic field enhanced RIE system. This system has many advantages compared with the conventional RIE system ; the capability of operating at low pressure, low self-bias voltage, high electron density and high etch rate in the low pressure, but also has disadvantages such as the nonconformity of plasma density which intensifies as the magnitude of magnetic field increases. To overcome this problem we made some grooved anode and tried to find the optimal pressure and B-field strength.

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PCS 용 MMIC Single-blanced upconverting 주파수 혼합기 설계 및 제작 (A GaAs MMIC Single-Balanced Upconverting Mixer With Built-in Active Balun for PCS Applications)

  • 강현일;이원상;정기웅;오재응
    • 전자공학회논문지D
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    • 제35D권4호
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    • pp.1-8
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    • 1998
  • An MMIC single-balanced upconverting mixer for PCS application has been successfully developed using an MMIC process employed by 1 .mu. ion implanted GaAs MESFET and passive lumped elements consisting of spiral inductor, Si3N4 MIM capacitors and NiCr resistors. The configuration of the mixer presented in this paper is two balanced cascode FET mixers with common-source self-bias circuits for single power supply operation. The dimension of the fabricated circuit including two active baluns intermodulation characteristic with two-tone excitation are also measured, showing -28.17 dBc at IF power of -30 dBm.

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Joule Heating of Metallic Nanowire Random Network for Transparent Heater Applications

  • Pichitpajongkit, Aekachan;Eom, Hyeonjin;Park, Inkyu
    • 센서학회지
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    • 제29권4호
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    • pp.227-231
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    • 2020
  • Silver nanowire random networks are promising candidates for replacing indium tin oxide (ITO) as transparent and conductive electrodes. They can also be used as transparent heating films with self-cleaning and defogging properties. By virtue of the Joule heating effect, silver nanowire random networks can be heated when voltage bias is applied; however, they are unsuitable for long-term use. In this work, we study the Joule heating of silver nanowire random networks embedded in polymers. Silver nanowire random networks embedded in polymers exhibit breakdown under the application of electric current. Their surface morphological changes indicate that nanoparticle formation may be the main cause of this electrical breakdown. Numerical analyses are used to investigate the temperatures of the silver nanowire and substrate.

플라즈마 화학증착한 알루미늄 산화박막의 $CCl_4$ 플라즈마에서의 반응성 이온식각 특성 (Reactive Ion Etching Characteristics of Aluminum Oxide Films Prepared by PECVD in $CCl_4$ Dry Etch Plasma)

  • 김재환;김형석;이원종
    • 한국세라믹학회지
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    • 제31권5호
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    • pp.485-490
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    • 1994
  • The reactive ion etching characteristics of aluminum oxide films, prepared by PECVD, were investigated in the CCl4 plasma. The atomic chlorine concentration and the DC self bias were determined at various etching conditions, and their effects on the etch rate of aluminum oxide film were studied. The bombarding energy of incident particles was found to play the more important role in determining the etch rate of aluminum oxide rather than the atomic chlorine concentration. It is considered to be because the bombardment of ions or neutral atoms breaks the strong Al-O bonds of aluminum oxide to help activate the formation reaction of AlCl3 which is the volatile etch product.

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RF Planar Magnetron Plasma CVD에 의한 DLC박막합성에 미치는 RF Power와 반응가스 압력의 영향 (The Effects of Reactive Gas Pressure and RF Power on the Synthesis of DLC Films by RF Planar Magnetron Plasma CVD)

  • 김성영;이재성
    • 한국재료학회지
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    • 제7권1호
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    • pp.27-32
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    • 1997
  • 본 연구에서는 고밀도 플라즈마를 형성하는 planar magnetron RF 플라즈마 CVD를 이용하여 DLC(diamond-like carbon) 박막을 합성하였다. 이 방법을 이용하여 DLC 박막을 합성한다면 고밀도 플라즈마 때문에 종래의 플라즈마 CVD(RF-PECVD)법보다 증착속도가 더욱더 향상될 것이라는 것에 착안하였다. 이를 위해 magnetron에 의한 고밀도 플라즈마가 존재할 때도 역시 DLC박막형성에 미치는 RF 전력과 반응가스 압력이 중요한 반응변수인가에 대해 조사하였고, 일정한 자기장의 세기에서 RF전력과 DC self-bias 전압과의 관계를 조사하였다. 또한 RF전력변화에 따른 박막의 증착속도와 밀도를 측정하였다. 본 연구에 의해 얻어진 박막의 증착속도는 magnetron에 의한 이온화율이 매우 높아 기존의 RF-PECVD 법보다 매우 빠르며, DLC박막의 구조와 물질특성을 알아보기 위해 FTIR(fourier transform infrared)및 Raman 분광분석을 행한 결과 전형적인 양질의 고경질 다이아몬드상 탄소박막임을 알 수 있었다.

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