• Title/Summary/Keyword: Self etching

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Effect of moisture and drying time on the bond strength of the one-step self-etching adhesive system

  • Lee, Yoon;Park, Jeong-Won
    • Restorative Dentistry and Endodontics
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    • 제37권3호
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    • pp.155-159
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    • 2012
  • Objectives: To investigate the effect of dentin moisture degree and air-drying time on dentin-bond strength of two different one-step self-etching adhesive systems. Materials and Methods: Twenty-four human third molars were used for microtensile bond strength testing of G-Bond and Clearfil $S^3$ Bond. The dentin surface was either blot-dried or air-dried before applying these adhesive agents. After application of the adhesive agent, three different air drying times were evaluated: 1, 5, and 10 sec. Composite resin was build up to 4 mm thickness and light cured for 40 sec with 2 separate layers. Then the tooth was sectioned and trimmed to measure the microtensile bond strength using a universal testing machine. The measured bond strengths were analyzed with three-way ANOVA and regression analysis was done (p = 0.05). Results: All three factors, materials, dentin wetness and air drying time, showed significant effect on the microtensile bond strength. Clearfil $S^3$ Bond, dry dentin surface and 10 sec air drying time showed higher bond strength. Conclusions: Within the limitation of this experiment, air drying time after the application of the one-step self-etching adhesive agent was the most significant factor affecting the bond strength, followed by the material difference and dentin moisture before applying the adhesive agent.

Self-assembly of Fine Particles Applied to the Production of Antireflective Surfaces

  • Kobayashi, Hayato;Moronuki, Nobuyuki;Kaneko, Arata
    • International Journal of Precision Engineering and Manufacturing
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    • 제9권1호
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    • pp.25-29
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    • 2008
  • We introduce a new fabrication process for antireflective structured surfaces. A 4-inch silicon wafer was dipped in a suspension of 300-nm-diameter silica particles dispersed in a toluene solution. When the wafer was drawn out of the suspension, a hexagonally packed monolayer structure of particles self-assembled on almost the complete wafer surface. Due to the simple process, this could be applied to micro- and nano-patterning. The self-assembled silica particles worked as a mask for the subsequent reactive ion etching. An array of nanometer-sized pits could be fabricated since the regions that correspond to the small gaps between particles were selectively etched off. As etching progressed, the pits became deeper and combined with neighboring pits due to side-etching to produce an array of cone-like structures. We investigated the effect of etching conditions on antireflection properties, and the optimum shape was a nano-cone with height and spacing of 500 nm and 300 nm, respectively. This nano-structured surface was prepared on a $30\;{\times}\;10-mm$ area. The reflectivity of the surface was reduced 97% for wavelengths in the range 400-700 nm.

화학제재를 이용한 우식상아질 제거효과 및 레진과의 결합강도에 관한 연구 (A STUDY OF THE EFFECT OF CHEMO-MECHANICAL CARIES REMOVAL SYSTEM ON THE REMOVAL OF CARIOUS DENTIN AND RESIN ADHESION TO DENTIN)

  • 강덕일;박인천;이난영;이상호;이창섭
    • 대한소아치과학회지
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    • 제30권4호
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    • pp.581-592
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    • 2003
  • 본연구는 유치와 영구치의 우식상아질을 제거하는 방법에 따른 상아질표면의 변화와 산부식양상, 혼성층의 양상, 그리고 이들이 상아질에 대한 복합레진의 전단결합강도에 미치는 영향을 평가할 목적으로 시행되었다. 92개의 유구치와 92개의 영구 구치를 준비하여 상아질 표면을 노출시키고 인공우식을 유발시켰다. 이중 32개의 유구치와 32개의 영구구치는 $Carisolv^{TM}$과 bur로 삭제후 상아질표면을 SEM관찰하였으며 나머지 치아에서는 레진-상아질간 전단결합강도를 측정하였다. 두가지 접착시스템(Single bond system, self-etching bonding system)과 한 종류의 레진(Z250, 3M)을 사용하였으며 다음과 같은 결과를 얻었다. 1. $Carisolv^{TM}$의 우식치질 제거효과는 영구치보다 유치에서 더 우수하였으며, bur로 제거한 경우보다 더 거친 상아질 표면이 관찰되었다. 2. 산부식처리한 경우 유치와 영구치 모두 우식제거방법과 관계없이 도말층이 제거된 양상을 보였다. 3. Single bond system을 이용한 경우 두터운 $2-4{\mu}m$의 혼성층과 $10-15{\mu}m$의 adhesive layer가 관찰된 반면, self-etching bonding system에서는 비교적 얇은($1-2{\mu}m$) 혼성층만이 형성되었다. 4. 전단결합강도는 유치와 영구치 모두 우식제거방법에 관계없이 Single bonding agent를 적용한 경우에 self-etching bonding agent를 적용한 군보다 유의하게 높게 나타났다(P<0.05). 5. $Carisolv^{TM}$와 self-etching bonding agent 처리군에서 bur와 self-etching system 처리군보다 다소 높은 전단결합강도를 보였으나 유의성은 없었다(P>0.05).

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측면 완충영역을 갖는 $LiNbO_3$ 자기정렬 리지 광도파로의 제작 ($LiNbO_3$ Self-aligned Ridge Waveguide with Dielectric Side Buffers)

  • 조영보;정형기;신상영
    • 대한전자공학회:학술대회논문집
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    • 대한전자공학회 2003년도 하계종합학술대회 논문집 II
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    • pp.783-786
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    • 2003
  • A simple fabrication method of self-aligned ridge waveguides with dielectric side buffers is demonstrated on +Z- cut LiNbO$_3$. The ridge waveguide is fabricated by a combination of the annealed proton exchange process and the proton-exchanged wet etching technique. The self-aligned process is achieved by wet etching of aluminum.

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Microtensile bond strength of silorane-based composite specific adhesive system using different bonding strategies

  • Bastos, Laura Alves;Sousa, Ana Beatriz Silva;Drubi-Filho, Brahim;Pires-de-Souza, Fernanda de Carvalho Panzeri;Garcia, Lucas da Fonseca Roberti
    • Restorative Dentistry and Endodontics
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    • 제40권1호
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    • pp.23-29
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    • 2015
  • Objectives: The aim of this study was to evaluate the effect of pre-etching on the bond strength of silorane-based composite specific adhesive system to dentin. Materials and Methods: Thirty human molars were randomly divided into 5 groups according to the different bonding strategies. For teeth restored with silorane-based composite (Filtek Silorane, 3M ESPE), the specific self-etching adhesive system (Adhesive System P90, 3M ESPE) was used with and without pre-etching (Pre-etching/Silorane and Silorane groups). Teeth restored with methacrylate based-composite (Filtek Z250, 3M ESPE) were hybridized with the two-step self-etching system (Clearfil SE Bond, Kuraray), with and without pre-etching (Pre-etching/Methacrylate and Methacrylate groups), or three-step adhesive system (Adper Scotchbond Multi-Purpose, 3M ESPE) (Three-step/Methacrylate group) (n = 6). The restored teeth were sectioned into stick-shaped test specimens ($1.0{\times}1.0mm$), and coupled to a universal test machine (0.5 mm/min) to perform microtensile testing. Results: Pre-etching/Methacrylate group presented the highest bond strength values, with significant difference from Silorane and Three-step/Methacrylate groups (p < 0.05). However, it was not significantly different from Pre-etching/Silorane and Methacrylate groups. Conclusions: Pre-etching increased bond strength of silorane-based composite specific adhesive system to dentin.

UV Laser를 이용한 광화학적 패터닝과 습식에칭에 따른 알칸티올 분자 작용기의 특성 연구 (A Study on the Characteristics of the Functional Groups of the Alkanethiol Molecules in UV Laser Photochemical Patterning and Wet Etching Process)

  • 허갑수;장원석
    • 한국정밀공학회지
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    • 제24권5호
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    • pp.104-109
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    • 2007
  • Photochemical patterning of self-assembled mono layers (SAMs) has been performed by diode pumped solid state (DPSS) 3rd harmonic Nd:$YVO_4$ laser with wavelength of 355 nm. SAMs patternings of parallel lines have subsequently been used either to generate compositional chemical patterns or fabricate microstructures by a wet etching. This paper describes a selective etching process with patterned SAMs of alkanetiolate molecules on the surface of gold. SAMs formed by the adsorption of alkanethiols onto gold substrate employs as very thin photoresists. In this paper, the influence of the interaction between the functional group of SAMs and the etching solution is studied with optimal laser irradiation conditions. The results show that hydrophobic functional groups of SAMs are more effective for selective chemical etching than the hydrophilic ones.

이온식각공정의 재증착 현상을 이용한 니켈 마이크로 나노 구조물 제작 (Fabrication of Nickel Nano and Microstructures by Redeposition Phenomena in Ion Etching Process)

  • 정필구;황성진;이상민;고종수
    • 대한기계학회논문집A
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    • 제31권1호
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    • pp.50-54
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    • 2007
  • Nickel nano and microstructures are fabricated with simple process. The fabrication process consists of nickel deposition, lithography, nickel ion etching and plasma ashing. Well-aligned nickel nanowalls and nickel self-encapsulated microchannels were fabricated. We found that the ion etching condition as a key fabrication process of nickel nanowalls and self-encapsulated microchannels, i.e., 40 sccm Ar flow, 550 W RF power, 15 mTorr working pressure, and $20^{\circ}C$ water cooled platen without using He backside cooling unit and with using it, respectively. We present the experimental results and discuss the formational conditions and the effect of nickel redeposition on the fabrication of nickel nano and microstructures.

Tuning Hydrophobicity of TiO2 Layers with Silanization and Self-assembled Nanopatterning

  • Nghia, Van Trong;Lee, Young Keun;Lee, Jaesang;Park, Jeong Young
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.291-291
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    • 2013
  • The wettability of TiO2 layers is controlled by forming highly ordered arrays of nanocones using nanopatterning, based on self-assembly and dry etching. Nanopatterning of TiO2 layers is achieved via formation of self-assembled monolayers of SiO2 spheres fabricated using the Langmuir-Blodgett technique, followed by dry etching. Compared to a thin film TiO2 layer, the nanopatterned TiO2 samples show a smaller static water contact angle, where the water contact angle decreases as the etching time increases, which is attributed to the Wenzel equation. When TiO2 layers are coated by 1H,1H,2H,2H-perfluorooctyltrichlorosilane, we observed the opposite behavior, exhibiting superhydrophobicity (up to contact angle of $155^{\circ}$) on the nanopatterned TiO2 layers. Self-assembled nanopatterning of the TiO2 layer may provide an advanced method for producing multifunctional transparent layers with self-cleaning properties.

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3종의 자가부식 프라이머의 상아질계면 접촉각 및 미세인장결합강도에 관한 연구 (Measurement of Contact Angle and Bond Strength Using 3 Different Self-Etching Primer)

  • 장석우;권호범;유현미;박동성;오태석;배광식
    • 구강회복응용과학지
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    • 제24권1호
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    • pp.105-112
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    • 2008
  • 본 연구의 목적은 3종의 자가부식 프라이머(Clearfil SE Bond, AdheSE, Tyrian) 사용시 상아질계면의 접촉각 및 미세인장결합강도를 측정하는 것이다. 연마된 상아질 표면에 3종의 자가부식 프라이머를 각각 적용한 후 접촉각을 측정하였으며 (n=30), One-way ANOVA를 사용하여 통계처리하였다. 미세인장결합강도측정을 위해서는 상아질 표면에 3종의 자가부식 프라이머 및 상아질 접착제를 각각 적용한 후 광중합 복합레진 (Z 250)을 5mm 두께로 쌓아 올렸다. 그 후 각 시편을 결합계면에 수직으로 분할한 뒤 (n=45) universal testing machine을 사용하여 미세인장강도를 측정하였고, Kruskal-Wallis test를 통하여 통계처리하였다. 접촉각 측정결과, AdheSE, Clearfil SE Bond, Tyrian 순으로 높은 접촉각을 보였으며 각 군간 통계적 유의성 있는 차이를 보였다 (p<0.05). 미세인장결합강도 측정결과 Clearfil SE Bond군과 AdheSE군은 유의성 있는 차이를 보이지 않았으며, Tyrian군은 Clearfil SE Bond 군이나 AdheSE 군에 비해 유의성 있게 작은 미세인장결합강도를 보였다.

치아 맹출 유무에 대한 자가부식 접착제에 의한 교정용 부착장치의 접착강도 (Effects of conventional and self-etching adhesive systems on bond strength of orthodontic attachments bonded to erupted and unerupted teeth)

  • Nur, Metin;Uysal, Tancan;Yesilyurt, Cemal;Bayram, Mehmet
    • 대한치과교정학회지
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    • 제40권4호
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    • pp.267-275
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    • 2010
  • 이번 연구의 목적은 맹출 또는 미맹출된 치아에 교정용 버튼을 부착 후 자가부식 접착제(self-etching adhesive)의 사용 유무에 대한 전단결합강도(shear bond strength)와 탈락모드를 비교하고자 함이다. 각각 84개의 맹출 또는 미맹출된 제3대구치를 사용하였다. 각각 치아의 협측면을 다음의 부착시스템 그룹으로 할당하였다. A, 기존방식: 1, Transbond XT (3M Unitek); 2, Prime & Bond NT (Dentsply/Caulk); 3, Single Bond (3M ESPE); B, 자가부식 접착제; 4, Clearfil SE Bond (Kuraray); 5, Transbond Plus (3M Unitek); 6, Clearfil S3 (Kuraray); 7, G Bond (GC). 부착물의 전단강도와 접착제 잔류지수를 측정하였으며 결과값은 ANOVA와 independent t-test 및 chi-square 검증을 통해 분석되었다. 맹출 또는 미맹출된 치아의 전단결합강도를 비교하였을 때 Clearfil SE와 G Bond에서 유의한 차이가 관찰되었다. Single Bond를 제외한 모든 접착시스템에서 맹출보다는 미맹출 치아면에서 높은 접착강도가 관찰되었다. 기존 접착제를 사용하는 경우 맹출 또는 미맹출 치아에 대한 접착강도에는 차이가 없을 수 있다. 그러나 임상의사는 사용 전에 self-etching system의 종류를 고려할 필요가 있다.