• Title/Summary/Keyword: Scanning Probe Microscopy

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Design, Fabrication and Evaluation of Diamond Tip Chips for Reverse Tip Sample Scanning Probe Microscope Applications (탐침과 시편의 위치를 역전시킨 주사 탐침 현미경용 다이아몬드 탐침의 제작 및 평가)

  • Sugil Gim;Thomas Hantschel;Jin Hyeok Kim
    • Korean Journal of Materials Research
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    • v.34 no.2
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    • pp.105-110
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    • 2024
  • Scanning probe microscopy (SPM) has become an indispensable tool in efforts to develop the next generation of nanoelectronic devices, given its achievable nanometer spatial resolution and highly versatile ability to measure a variety of properties. Recently a new scanning probe microscope was developed to overcome the tip degradation problem of the classic SPM. The main advantage of this new method, called Reverse tip sample (RTS) SPM, is that a single tip can be replaced by a chip containing hundreds to thousands of tips. Generally for use in RTS SPM, pyramid-shaped diamond tips are made by molding on a silicon substrate. Combining RTS SPM with Scanning spreading resistance microscopy (SSRM) using the diamond tip offers the potential to perform 3D profiling of semiconductor materials. However, damage frequently occurs to the completed tips because of the complex manufacturing process. In this work, we design, fabricate, and evaluate an RTS tip chip prototype to simplify the complex manufacturing process, prevent tip damage, and shorten manufacturing time.

Microscopic Surface Dynamics Studied by Scanning Probe Microscopy

  • Gwon, Gi-Yeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.08a
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    • pp.111-111
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    • 2011
  • Arrangement of individual atoms and molecules with atomic precision and understanding the resulting properties at the molecular level are ultimate goals of chemistry, biology, and materials science. For the past three decades, scanning probe microscopy has made strides towards these goals through the direct observation of individual atoms and molecules, enabling the discovery of new and unexpected phenomena. This talk will discuss the origin of forces governing motion of small organic molecules and their extended self-assembly into two-dimensional surface structures by direct observation of individual molecules using scanning tunneling microscopy (STM). In addition, atomic force microscopy (AFM) is utilized for the investigation of fundamental mechanisms of bone mineral dissolution by examining atomically well characterized simulated bone minerals under aqueous solution environments.

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Electrical property analysis of Si nanocrystal by SPM(Scanning Probe Microscopy) on insulating substrate (SPM(Scanning Probe Microscopy)을 이용한 국소영역에서 실리콘 나노크리스탈의 전기적 특성 분석)

  • Choi, Min-Ki;Kim, Jung-Min;Kang, Chi-Jung;Khang, Yoon-Ho;Kim, Young-Sang
    • Proceedings of the KIEE Conference
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    • 2004.11a
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    • pp.95-97
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    • 2004
  • 본 연구에서는 Scanning Capacitance Microscopy (SCM)와 Electrostatic Force Microscopy (EFM)을 이용하여 국소영역에서 실리콘나노 크리스탈의 전기적 특성을 분석하였다. 실리콘 나노 크리스탈은 에어로솔 방식으로 P-type 실리콘웨이퍼 위에 $10{\sim}40\;nm$의 크기와 약 $10^{11}/cm^2$의 밀도를 갖도록 제작하였다. 실리콘 나노 크리스탈에서 전자와 정공의 trapping 현상은 EFM, SCM 이미지를 통하여 관찰하였고 이러한 나노 크리스탈의 국소영역 특성을 MOS 캐패시터 구조의 C-V 특성을 비교 분석하였다. 또한, 나노 크리스탈에 trapping된 전하의 detrapping 과정을 스트레스 조건에 따라 분석하였다.

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Manufacturing of SPL system having a large scanning area (대면적 SPL(Scanning Probe Lithography) 시스템 제작)

  • Yoon, Sang-Joon;Kim, Won-Hyo;Seong, Woo-Kyeong;Park, Young-Geun;Hwang, Kyu-Ho;Chung, Kwan-Soo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.11a
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    • pp.699-702
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    • 2004
  • Next generation lithography technologies, such as EBL(Electron Beam Lithography), X-ray lithography, SPL(Scanning Probe Lithography), have been studied widely for getting over line width limitation of photolithography. Among the next generation lithography technologies, SPL has been highlighted because of its high resolution advantage. But is also has problem which are slow processing time and sample size limitation. The purpose of this study is complement of present SPL system. Brand new SPL system was made. SPL test was performed with the system in ultra thin PMMA(polymethlymethacrylate) film.

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Confocal Scanning Microscopy with Multiple Optical Probes for High Speed 3D Measurements and Color Imaging (고속 3차원 측정 및 칼라 이미징을 위한 다중 광탐침 공초점 주사 현미경)

  • Chun, Wan-Hee;Lee, Seung-Woo;Ahn, Jin-Woo;Gweon, Dae-Gab
    • Journal of the Semiconductor & Display Technology
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    • v.7 no.1
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    • pp.11-16
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    • 2008
  • Confocal scanning microscopy is a widely used technique for three dimensional measurements because it is characterized by high resolution, high SNR and depth discrimination. Generally an image is generated by moving one optical probe that satisfies the confocal condition on the specimen. Measurement speed is limited by movement speed of the optical probe; scanning speed. To improve measurement speed we increase the number of optical probes. Specimen region to scan is divided by optical probes. Multi-point information each optical probe points to can be obtained simultaneously. Therefore image acquisition speed is increased in proportion to the number of optical probes. And multiple optical probes from red, green and blue laser sources can be used for color imaging and image quality, i.e., contrast, is improved by adding color information by this way. To conclude, this technique contributes to the improvement of measurement speed and image quality.

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Realization for Each Element for capturing image in Scanning Electron Microscopy (주사 전자 현미경에서 영상 획득에 필요한 구성 요소 구현)

  • Lim, Sun-Jong;Lee, Chan-Hong
    • Laser Solutions
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    • v.12 no.2
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    • pp.26-30
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    • 2009
  • Scanning Electron Microscopy (SEM) includes high voltage generator, electron gun, column, secondary electron detector, scan coil system and image grabber. Column includes electron lenses (condenser lens and objective lens). Condenser lens generates fringe field, makes focal length and control spot size. Focal length represents property of lens. Objective lens control focus. Most of the electrons emitted from the filament, are captured by the anode. The portion of the electron current that leaves the gun through the hole in the anode is called the beam current. Electron beam probe is called the focused beam on the specimen. Because of the lens and aperture, the probe current becomes smaller than the beam current. It generate various signals(backscattered electron, secondary electron) in an interaction with the specimen atoms. In this paper, we describe the result of research to develop the core elements for low-resolution SEM.

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