• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2003년도 International Meeting on Information Display
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• pp.673-674
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• 2003

The reliability of TFT, crystallized by sequential lateral solidification (SLS) technology, has been studied High current damage is characterized by high gate bias (-20V) and drain bias (-10V). It is found that performance of SLS TFTs is enhanced by high current stress up to 300 sec of stress time for 20/8 (W/L) N-TFT. After that, TFT performance is degraded with the increase of the stress time. It is speculated from the experimental data that SLS TFTs initially contain a number of unstable defect states. Then, the defect states seem to be cured by high current stress.

• 한국진공학회:학술대회논문집
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• 한국진공학회 1997년도 제12회 학술발표회 논문개요집
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• pp.70-70
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• 1997

• JSTS:Journal of Semiconductor Technology and Science
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• 제6권1호
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• pp.22-29
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• 2006

We demonstrate highly manufacturable Multi-channel Field Effect Transistor (McFET) on bulk Si wafer. McFET shows excellent transistor characteristics, such as $5{\sim}6 times higher drive current than planar MOSFET, ideal subthreshold swing, low drain induced barrier lowering (DIBL) without pocket implantation and negligible body bias dependency, maintaining the same source/drain resistance as that of a planar transistor due to the unique feature of McFET. And suitable threshold voltage ($V_T$) for SRAM operation and high static noise margin (SNM) are achieved by using TiN metal gate electrode.

• JSTS:Journal of Semiconductor Technology and Science
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• 제6권2호
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• pp.68-73
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• 2006

We propose a damascene gate FinFET with Si nanocrystals implemented on bulk silicon wafer for low voltage flash memory device. The use of optimized SRON (Silicon-Rich Oxynitride) process allows a high degree of control of the Si excess in the oxide. The FinFET with Si nanocrystals shows high program/erase (P/E) speed, large $V_{TH}$ shifts over 2.5V at 12V/$10{\mu}s$ for program and -12V/1ms for erase, good retention time, and acceptable endurance characteristics. Si nanocrystal memory with damascene gate FinFET is a solution of gate stack and voltage scaling for future generations of flash memory device. Index Terms-FinFET, Si-nanocrystal, SRON(Si-Rich Oxynitride), flash memory device.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권1호
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• pp.39-42
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• 2007

Since the scalability of OLED process is crucial factor for large-sized TV manufacturing, various technologies are reviewed based on the published information. Despite of recent technology advancement enabling high color purity, large-sized AMOLED, a lot of problems to solve still exist to enter the large-sized display market. Here, Samsung will discuss what has to be concerned for large panel and how far the OLED technologies need to go more for the large-sized AMOLED TV marketplace.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권2호
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• pp.1639-1641
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• 2007

We have designed cost competitive pixel structures for high performance mobile PVA LCDs. These new structures significantly bring down the price by the use of a conventional polarizer for lowest possible cost. A 4.3" prototype based on these techniques was built, achieving the world's highest mobile display contrast ratio of 1200:1, while maintaining wide viewing angle with no loss of transmittance

• 한국방송∙미디어공학회:학술대회논문집
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• 한국방송공학회 2003년도 정기총회 및 학술대회
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• pp.69-72
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• 2003

This paper presents a signal processing IC for digital HDTV, which is designed to operate in bunt-in HDW or in HD-set-top Box. The chip supports de-multiplexing an ISO/IEC 13818-1 MPEG-2 TS stream. It decodes MPEG-2 MP@HL video bitstream, and provides high-quality scaled video for display on HDTV monitor. The chip consists of ARM7TDMI for TS-Demux, PCI interface, Audio interface, MPEG2 MP@HL video decoder Display processor, Graphic processor, Memory controller, Audio int3face, Smart Card interface and UART. It is fabricated using Sam sung's 0.18-um and the package of 492-pin BGA is used.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2004년도 Asia Display / IMID 04
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• pp.205-208
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• 2004

The switching mechanism of multi-domain vertical alignment mode LCD and delayed on response time phenomenon in special conditions are investigated. A modified DCC (Dynamic Capacitance Compensation), DCCII has been developed for the fast response time performance in PVA TFT-LCD TVs. DCCII applies a pre-tilt voltage to addressed pixels during the previous frame in addition to an overshoot voltage. In result, the response time less than 8 msec, has been obtained for all moving images through the DCCII technique.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2002년도 제23회 학술발표회 초록집
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• pp.172-173
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• 2002

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권2호
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• pp.1323-1326
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• 2007

A new driving method employing 2-dimensional spatial averaging is proposed. This method successfully eliminates the vertical line artifact caused by luminance difference from unbalanced charging voltage between polarities. This spatial averaging method can secure charging time, minimize driver heating, and achieve higher display quality.