• Journal of the Korean Society for Precision Engineering
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• 제24권4호
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• pp.153-158
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• 2007

Recently nano imprint lithography to fabricate photonic crystal on polymer is preferred because of its simplicity and short process time and ease of precise manufacturing. But, the technique requires the precise mold as an imprinting tool for good replication. These molds are made of the silicon, nickel and quartz. But this is not desirable due to complex fabrication process, high cost. So, we describe a simple, precise and low cost method of fabricating PDMS stamp to make the photonic crystals. In order to fabricate the PDMS mold, we make the original pattern with designed hole array by finding the optimal electron beam writing condition. And then, we have tried to fabricate PDMS mold by the replica molding with ultrasonic vibration and pressure system. We have used the cleaning process to solve the detaching problem on the interface. Using these methods, we acquired the PDMS mold for photonic crystals with characteristics of a good replication. And the accuracy of replication shows below 1% in 440nm at diameter and in 610nm at lattice constant by dimensional analysis by SEM and AFM.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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• pp.270-270
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• 2008

We present details of experimental results in the fabrication of high density line patterns, using imprint technique that can provide a simple and comparatively cost-effective manufacturing means. Barrier array structures for display or interconnects for semiconductor applications were the aims of this study. For pattern fabrication, a polymer layer (Ajinomoto GX-13 dielectric film) with a thickness of 38um that can act as either an insulating or a dielectric layer was laminated on a substrate. Fine tracks were then formed using a patterned stamp under isostatic pressure. The line width was ranged between 10 to 60 mm. A self-assembled monolayer (SAM) of fluorinated alkylchlorosilane [$CF_3(CF_2)5(CH_2)2SiCl_3$] as an anti-sticking layer was coated on the surface of the stamp prior to thermal imprint to improve the de-molding characteristic.

• The Transactions of the Korea Information Processing Society
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• 제7권6호
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• pp.1980-1987
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• 2000

In this paper, an efficient watermarking technique in wavelet transform domain is proposed. Watermarking is embedding a digital signal called as 'watermark' into images to claim the ownership. In the proposed method, the image is 1-level wavelet transformed, and then the watermark with a binary stamp is embedded into the baseband. The watermark is embedded by inverting the polarities of he selected coefficient paris. In the inverting process, we can increase image quality by finding means and differences of the selected neighboring coefficient paris, and then adding values, which are inversely proportional to the differences, to th means. The experimental results show that the proposed method has good quality and is robust to various attacks such as the JPEG lossy comparison, noise addition, clipping, blurring, etc.

• Transactions of Materials Processing
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• 제9권3호
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• pp.257-264
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• 2000

In this study, optimization for press forming condition of low arm was performed with explicit dynamic FEM code, Pam-Stamp. FEM simulation was coupled with the Taguchi's experiment technique having three design variables - friction coefficient, plastic anisotropy parameter, and blank shape - which are chosen to be optimized. The simulation results were compared with those of experiment. We found out the change of blank shape among these three design variables is very effective in optimizing press forming condition of low arm. In addition, the modified blank shape shows high yield of slitting coil.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• 제19권2호
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• pp.130-138
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• 2006

We have investigated pattern scaling down of silicon stamps through the oxidation technique, During oxidizing the silicon stamps, silicon dioxide that has 300 nm and 500 nm thickness was grown, and critical deformations were not observed in the patterns. There was positive effect to reduce size of patterns because vertical and horizontal patterns have different orientation. We achieved pattern reduction rate of $26\%$. In addition, the formation of polymer patterns had been investigated with varied temperature and pressure conditions to improve the filling characteristics of polymers during nanoimprint lithography when pattern sizes were few micrometers. In these varied conditions, polymers had been affected by free space compensation and elastic stress relaxation for filling the cavities. Based on the results, defect control which is an important issue in the nanoimprint lithography were facilitated.

• Proceedings of the KSME Conference
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• 대한기계학회 2003년도 추계학술대회
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• pp.1927-1931
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• 2003

Nanometer-sized structures are being applied to many fields including micro/nano electronics, optoelectronics, quantum computing, biosensors, etc. Micro contact printing is one of the most promising methods for manufacturing the nanometer-sized structures. The crucial element for the micro contact printing is the nano-resolution printing technique using polymeric stamps. In this study, a multi-scale analysis scheme for simulating the micro contact printing process is proposed and some useful analysis results are presented. Using the slip-link model [1], the dependency of viscoelasticity on molecular weight of polymer stamp is predicted. Deformation behaviors of polymeric stamps are analyzed using finite element method based upon the predicted viscoelastic properties.

• Proceedings of the IEEK Conference
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• 대한전자공학회 2000년도 ITC-CSCC -1
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• pp.466-469
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• 2000

In this paper, a watermarking technique for digital images is proposed. In our method, an image is 1-1eve1 wavelet transformed, and then the watermark of a binary stamp is embedded into the baseband. The watermark is embedded by inverting the polarities of the selected coefficient pairs. In the inverting process, we can increase perceptual image quality by finding means and differences of the selected neighboring coefficient pairs, and then adding values, which are inversely proportional to the differences, to the means. The experimental results show that the proposed method has good quality and is robust to JPEG lossy compression and various image processing operations.

• Proceedings of the Korea Information Processing Society Conference
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• 한국정보처리학회 2013년도 춘계학술발표대회
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• pp.490-491
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• 2013

본 논문에서는 WBAN을 위한 무선 USB 프로토콜의 에너지 효율적인 시간동기 알고리즘에 대한 연구이다. 에너지 효율적인 즉, 전력 소모를 최소화하기 위한 정밀한 시간동기 알고리즘을 제안한다. 본 논문에서 제안하는 시간 동기 알고리즘은 WBAN에서 무선 USB의 센서노드의 Time Stamp 패킷을 송수신하는 방식으로 전력소모를 최소화한다.

• Polymer(Korea)
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• 제28권4호
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• pp.305-313
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• 2004

A vacuum pressure-difference technique for making a nano-precision replica is investigated for various applications. Master patterns for replication were fabricated using a nano-replication printing (nRP) process. In the nRP process, any picture and pattern can be replicated from a bitmap figure file in the range of several micrometers with resolution of 200nm. A liquid-state monomer is solidified by two-photon absorption (TPA) induced by a femto-second laser according to a voxel matrix scanning. After polymerization, the remaining monomers were removed simply by using ethanol droplets. And then, a gold metal layer of about 30nm thickness was deposited on the fabricated master patterns prior to polydimethylsiloxane molding for preventing bonding between the master and the polydimethylsiloxane mold. A few gold particles attached on the polydimethylsiloxane stamp during detaching process were removed by a gold selecting etchant. After fabricating the polydimethylsiloxane mold, a nano-precision polydimethylsiloxane replica was reproduced. More precise replica was produced by the vacuum pressure-difference technique that is proposed in this paper. Through this study, direct patterning on a glass plate, replicating a polydimethylsiloxane mold, and reproducing polydimethylsiloxane replica are demonstrated with a vacuum pressure-difference technique for various micro/nano-applications.

• Korean Journal of Optics and Photonics
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• 제16권4호
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• pp.384-391
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• 2005

A polymer optical microring resonator, which is laterally coupled to a straight bus waveguide, has been proposed and demonstrated using a nanoimprint technique. The propagation loss of the ring waveguide and the optical power coupling between the ring and bus waveguides was calculated by using a beam propagation method, then the dependence of the device performance on them was investigated using a transfer matrix method. We have especially introduced an imprint stamp incorporating a smoothing buffer layer made of a silicon nitride thin film. This layer played an efficient role in improving the sidewall roughness of the waveguide pattern engraved on the stamp and thus reducing the scattering loss. As a result the overall Q factor of the resonator was greatly increased. Also it reduced the gap between the ring and bus waveguides effectively to enhance the coupling between them, without relying on the direct writing method based on an e-beam writer. As for the achieved device performance at the wavelength of 1550 nm, the quality factor, the extinction ratio, and the free spectral range were ~103800, ~11 dB, and 1.16 m, respectively.