• Structural Engineering and Mechanics
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• v.21 no.2
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• pp.205-220
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• 2005

This paper presents the possibilities of adapting artificial neural networks (ANNs) to predict the dimensionless parameters related to the maximum contact pressures of an elasticity problem. The plane symmetric double receding contact problem for a rigid stamp and two elastic strips having different elastic constants and heights is considered. The external load is applied to the upper elastic strip by means of a rigid stamp and the lower elastic strip is bonded to a rigid support. The problem is solved under the assumptions that the contact between two elastic strips also between the rigid stamp and the upper elastic strip are frictionless, the effect of gravity force is neglected and only compressive normal tractions can be transmitted through the interfaces. A three layered ANN with backpropagation (BP) algorithm is utilized for prediction of the dimensionless parameters related to the maximum contact pressures. Training and testing patterns are formed by using the theory of elasticity with integral transformation technique. ANN predictions and theoretical solutions are compared and seen that ANN predictions are quite close to the theoretical solutions. It is demonstrated that ANNs is a suitable numerical tool and if properly used, can reduce time consumed.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2003.06a
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• pp.1224-1226
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• 2003

In this work, we developed a high resolution printing technique based on transferring a pattern from a PDMS stamp to a Pd and Au substrate by microcontact printing Also, we fabricated various 2D metallic and polymeric nano patterns with the feature resolution of sub-micrometer scale by using the method of microcontact printing (${\mu}$CP) based on soft lithography. Silicon masters for the micro molding were made by e-beam lithography. Composite poly(dimethylsiloxane) (PDMS) molds were composed of a thin, hard layer supported by soft PDMS layer. From this work, it is certificated that composite PDMS mold and undercutting technique play an important role in the generation of a clear SAM nanopattern on Pd and Au substrate.

• Journal of Korea Multimedia Society
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• v.15 no.7
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• pp.879-884
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• 2012

In this Paper, we propose an Energy Efficient Time Synchronization technique based on WUSB (Wireless USB) over WBAN (Wireless Body Area Networks) protocol required for Wearable Computer systems. For this purpose, the proposed Time Synchronization algorithm minimizes power consumption and estimates time information with accuracy. It is executed on the basis of WUSB over WBAN protocol at each sensor node comprising peripherals of a wearable computer system. It minimizes power consumption by exchanging time stamp packets and forming a hierarchical structure.

• Journal of the Korean Society for Precision Engineering
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• v.23 no.7 s.184
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• pp.138-145
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• 2006

A nanopatterning technique was proposed and demonstrated for low cost and mass productive process using the scanning probe lithography (SPL) and soft lithography. The nanometer scale structure is fabricated by the localized generation of oxide patterning on the H-passivated (100) silicon wafer, and soft lithography was performed to replicate of nanometer scale structures. Both height and width of the silicon oxidation is linear with the applied voltagein SPL, but the growth of width is more sensitive than that of height. The structure below 100 nm was fabricated using HF treatment. To overcome the structure height limitation, aqueous KOH orientation-dependent etching was performed on the H-passivated (100) silicon wafer. Soft lithography is also performed for the master replication process. Elastomeric stamp is fabricated by the replica molding technique with ultrasonic vibration. We showed that the elastomeric stamp with the depth of 60 nm and the width of 428 nm was acquired using the original master by SPL process.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.55 no.5
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• pp.267-271
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• 2006

A polymeric waveguide-type wavelength filter based on a Bragg grating has been proposed and fabricated using the simple nanoimpring technique, for the first time to our knowledge. An ultraviolet transparent stamp with the single-mode waveguide pattern incorporating a surface-relief-type Bragg grating was specially designed selective dry-etching process. Using this stamp, the device fabrication was substantially involving just a single-step process of imprint followed by polymer spin-coating. The achieved maximum reflection was higher than 25 dB at the center wavelength of 1569 nm. And the 3-dB bandwidth was 0.8 nm for the device length of 1.5 cm.

• Korean Journal of Materials Research
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• v.19 no.8
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• pp.437-442
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• 2009

This paper describes an improved strategy for controlling the adhesion force using both the antiadhesion and adhesion layers for a successful large-area transfer process. An MPTMS (3-mercaptopropyltrimethoxysilane) monolayer as an adhesion layer for Au/Pd thin films was deposited on Si substrates by vapor self assembly monolayer (VSAM) method. Contact angle, surface energy, film thickness, friction force, and roughness were considered for finding the optimized conditions. The sputtered Au/Pd ($\sim$17 nm) layer on the PDMS stamp without the anti-adhesion layer showed poor transfer results due to the high adhesion between sputtered Au/Pd and PDMS. In order to reduce the adhesion between Au/Pd and PDMS, an anti-adhesion monolayer was coated on the PDMS stamp using FOTS (perfluorooctyltrichlorosilane) after $O_2$ plasma treatment. The transfer process with the anti-adhesion layer gave good transfer results over a large area (20 mm $\times$ 20 mm) without pattern loss or distortion. To investigate the applied pressure effect, the PDMS stamp was sandwiched after 90$^{\circ}$ rotation on the MPTMS-coated patterned Si substrate with 1-${\mu}m$ depth. The sputtered Au/Pd was transferred onto the contact area, making square metal patterns on the top of the patterned Si structures. Applying low pressure helped to remove voids and to make conformal contact; however, high pressure yielded irregular transfer results due to PDMS stamp deformation. One of key parameters to success of this transfer process is the controllability of the adhesion force between the stamp and the target substrate. This technique offers high reliability during the transfer process, which suggests a potential building method for future functional structures.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2006.05a
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• pp.155-156
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• 2006

UV-NIL is a promising technology for the fabrication of sub-100 nm features. Due to non-uniformity of the residual layer thickness (RLT) and a strong possibility of defects, many UV-NIL processes have been developed and some are commercially available at present, most are based on the 'step-and-repeat' nanoimprint technique, which employs a small-area stamp, much smaller than the substrate. This is mainly because, when a large-area stamp is used, it is difficult to obtain acceptable uniform residual layer thickness and/or to avoid defects such as air entrapment. As an attempt to enable UV_NIL with a large-area stamp for high throughput, we propose a new UV-NIL tool that is able to imprint 4 inch wafer in a low vacuum environment at a single step.

• Korean Journal of Optics and Photonics
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• v.17 no.4
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• pp.317-322
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• 2006

A polymeric arrayed waveguide grating (AWG) has been proposed and demonstrated by exploiting the nanoimprint method. A PDMS(polydimethylsiloxane) stamp with device patterns engraved was developed out of a master mold made of quartz glass. The device was fabricated by transferring the pattern in the PDMS stamp to a spin-coated polymer film without using any etching process. The device had 8 output channels, while the center wavelengths of each output channel were positioned from 1543.7 nm to 1548.3 nm with the spacing of 0.8 nm. The achieved average channel crosstalk and the 3-dB bandwidth were about 10 dB and 0.8 nm respectively.

• Journal of the Korean Society for Aviation and Aeronautics
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• v.28 no.2
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• pp.63-70
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• 2020

Many organizations apply reactive safety management to prevent the same or similar types of accidents by through investigation and analysis of the accident cases. Although research on investigation techniques has contributed a lot to the objective results of safety accidents and the preparation of countermeasures, many accident investigation techniques currently in use treat accidents from a linear perspective, revealing limitations in reflecting current systems dominated by complexity and uncertainty. In order to overcome these limitations, this study will review recent studies and concepts from a system safety perspective and predict future research trends through a case analysis of aviation accident. The models used in the analysis are STAMP, HFACS, and FRAM, and the characteristics of each technique are presented so that analysts who perform related tasks in the field can refer to them.

• Proceedings of the KSME Conference
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• 2000.11a
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• pp.452-457
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• 2000

The object of this study is to develop a reliable FEM simulation technique for the analysis of can making process using PAM-STAMP software. The processes consist of doming and necking in addition to drawing, redrawing. After body making process, this study analyzed the stability for internal pressure by simulating buckling test. Through these technique, we estimated the dome reversal pressure of steel D&I Can for various can profile and process conditions. From this study, we found the cause and mechanism of wrinkling during necking process. This mechanism is largely affected by can wall thickness and the clearance between knock out punch and necking die. The dome reversal pressure improves with increasing dome depth. These results validate the usefulness of the developed simulation technique for the analysis of body making process and optimization of the dome profile.