Journal of the Korean Society for Precision Engineering (한국정밀공학회지)

Korean Society for Precision Engineering (한국정밀공학회)
권호 표지

Fabrication of Nanoscale Structures using SPL and Soft Lithography

SPL과 소프트 리소그래피를 이용한 나노 구조물 형성 연구

  • 류진화 (부산대학교 나노시스템공정공학과 대학원) ;
  • 김창석 (부산대학교 나노시스템공정공학과) ;
  • 정명영 (부산대학교 나노시스템공정공학과)
  • Published : 2006.07.01
Download PDF
⟨ Previous Next ⟩

Abstract

A nanopatterning technique was proposed and demonstrated for low cost and mass productive process using the scanning probe lithography (SPL) and soft lithography. The nanometer scale structure is fabricated by the localized generation of oxide patterning on the H-passivated (100) silicon wafer, and soft lithography was performed to replicate of nanometer scale structures. Both height and width of the silicon oxidation is linear with the applied voltagein SPL, but the growth of width is more sensitive than that of height. The structure below 100 nm was fabricated using HF treatment. To overcome the structure height limitation, aqueous KOH orientation-dependent etching was performed on the H-passivated (100) silicon wafer. Soft lithography is also performed for the master replication process. Elastomeric stamp is fabricated by the replica molding technique with ultrasonic vibration. We showed that the elastomeric stamp with the depth of 60 nm and the width of 428 nm was acquired using the original master by SPL process.

Keywords

References

  1. Geppert, L., 'semiconductor lithography for the next millennium,' IEEE Spectrum, Vol. 33, pp. 33-38 1996 https://doi.org/10.1109/6.486632
  2. Mizuno, H., Sugihara, O., Kaino, T., Okamoto, N. and Hosino, M., 'Low-loss polymeric optical waveguides with large cores fabricated by hot embossing,' Optics Letters, Vol. 28, pp. 2378-2380, 2003 https://doi.org/10.1364/OL.28.002378
  3. Choi, S. J., Yoo, P. J., Baek, S. J., Kim, T. W. and Lee, H. H., 'An Ultraviolet-Curable Mold for Sub-100-nm,' J. Am. Chem. Soc., Vol. 126, pp. 7744-7745, 2004 https://doi.org/10.1021/ja048972k
  4. Garcia, R., Calleja, M. and Rohrer, H., 'Patterning of silicon surfaces with noncontact atomic force microscopy Field-induced formation of nanometer-size water bridges,' J. Appl. Phys., Vol. 86, pp. 1898-1903, 1999 https://doi.org/10.1063/1.370985
  5. Calleja, M. and Garcia, R., 'Nano-oxidation of silicon surfaces by noncontact atomic-force microscopy : Size dependence on voltage and pulse duration,' Appl. Phys. Lett., Vol. 76, pp. 3427-3429, 2000 https://doi.org/10.1063/1.126856
  6. Snow, E. S., Jernigan, G. G. and Campbell, P. M., 'The kinetics and mechanism of scanned probe oxidation of Si,' Appl. Phys. Lett., Vol. 76, pp. 1782-1784, 2000 https://doi.org/10.1063/1.126166
  7. Tsau, L., Wang, D. and Wang, K. L., 'Nanometer scale patterning of silicon (100) surfaces by an atomic force microscope operating in air,' Appl. Phys. Lett., Vol. 64, pp. 2133-2135, 1994 https://doi.org/10.1063/1.111707
  8. Chien, F. S. S., Chang, J. W., Lin, S. W., Chou, Y. C., Chen, T. T. and Gwo, S., 'Nanometer-scale conversion of Si3N4 to SiOx,' Appl. Phys. Lett., Vol. 76, pp. 360-362, 2000 https://doi.org/10.1063/1.125754
  9. Madou, M. J., 'Fundamentals of microfabrication,' CRC press, pp. 183-258, 2002
  10. Xia, M. and Whitesides, G. M., 'Soft lithography,' Annu. Rev. Mater. Sci., Vol. 28, pp. 153-184, 1998 https://doi.org/10.1146/annurev.matsci.28.1.153
  11. Narasimhan, J. and Papautsky, I., 'Polymer embossing tools for rapid prototyping of plastic microfluidic devices,' J. Micromech, Microeng., Vol. 14, pp. 96-103, 2004 https://doi.org/10.1088/0960-1317/14/1/013