• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2009.11a
• /
• pp.252-252
• /
• 2009

In this work, the nanocrystalline ZnO/polycrystalline (poly) aluminum nitride (AlN)/Si structure was fabricated for humidity sensor applications based on surface acoustic wave (SAW). In this structure, the ZnO film was used as sensing material layer. These ZnO and AlN(0002) were deposited by so-gel process and a pulse reactive magnetron sputtering, respectively. These experimental results showed that the obtained SAW velocity on AlN film was about 5128 m/s at $h/\lambda$=0.0125 (h and $\lambda$ is thickness and wavelength, respectively). For ZnO sensing layers coated on AlN, films have hexagonal wurtzite structure and nanometer particle size. The crystalline size of ZnO films annealed at 400, 500, and 600 $^{\circ}C$ is 10.2, 29.1, and 38 nm, respectively. Surface of the film exhibits spongy which can adsorb steam in the air. The best quality of the ZnO film was obtained with annealing temperature at 500 $^{\circ}Cis$. The change in frequency response (127.9~127.85 MHz) of the SAW humidity sensor based on ZnO/AlN structure was measured along the change in humidity (41~69%). The structural properties of thin films wereinvestigated by XRD and SEM.

• Journal of the Microelectronics and Packaging Society
• /
• v.16 no.1
• /
• pp.13-19
• /
• 2009

A 440MHz wireless and passive surface acoustic wave (SAW) based chemical sensor was developed on a $41^{\circ}YX\;LiNbO_3$ piezoelectric substrate for simultaneous measurement of $CO_2$ gas and relative humidity (RH) using a reflective delay line pattern as the sensor element. The reflective delay line is composed of an interdigital transducer (IDT) and several shorted grating reflectors. A Teflon AF 2400 and a hydrophilic $SiO_2$ layer were used as $CO_2$ and water vapor sensitive films. The coupling of mode (COM) modeling was conducted to determine optimal device parameters prior to fabrication. According to simulation results, the device was fabricated and then wirelessly measured using the network analyzer. The measured reflective coefficient $S_{11}$ in the time domain showed high signal/noise (S/N) ratio, small signal attenuation, and few spurious peaks. In the $CO_2$ and humidity testing, high sensitivity ($2^{\circ}/ppm$ for $CO_2$ detection and $7.45^{\circ}/%$RH for humidity sensing), good linearity and repeatability were observed in the $CO_2$ concentration ranges of $75{\sim}375ppm$ and humidity levels of $20{\sim}80%$RH. Temperature and humidity compensations were also investigated during the sensitivity evaluation process.

• Korean Chemical Engineering Research
• /
• v.49 no.2
• /
• pp.224-229
• /
• 2011

In this study, we have developed shear horizontal(SH) surface acoustic wave(SAW) sensors for the detection of immunoglobulin G(IgG) on the gold coated delay line of SH-SAW devices. As the result of the experiment, we could uniformly immobilize anti-MIgG(mouse IgG) conjugate on the surface of gold. When displaying results of immobilization on the surface of gold using G-anti MIgG conjugate and blocking buffer in frequency shift, G-anti MIgG conjugate showed frequency shift of 75.1 kHz in the initial frequency, and blocking buffer showed frequency shift of 215.7 kHz. When various concentrations of MIgG was added in 100MHz type sensor, the sensor showed 46.3, 127.45, 161.21 and 262.39 kHz frequency shift at 25, 50, 75 and 100 ${\mu}g$ MIgG concentration, respectively.

• Proceedings of the Korean Society of Crop Science Conference
• /
• 2006.04a
• /
• pp.40-54
• /
• 2006

It's not easy to detect the high quality and functional compounds for control quality of food materials. The electronic nose was an instrument, which comprised of an array of electronic chemical sensors with partial specificity and an appropriate pattern recognition system, capable of recognizing simple or complex odors. It can conduct fast analysis and provide simple and straightforward results and is best suited for quality control and process monitoring in the field of functional foods. Numbers of applications of an electronic nose in the functional food industry include discrimination of habitats for medicinal food materials, monitoring storage process, lipid oxidation, and quality control of food and/or processing with principal component analysis, neural network analysis and the electronic nose based on GC-SAW sensor. The electronic nose would be possibly useful for a wide variety of quality control in the functional food and plant cultivation when correlating traditional analytical instrumental data with sensory evaluation results or electronic nose data.

• Tribology and Lubricants
• /
• v.33 no.3
• /
• pp.106-111
• /
• 2017

Sapphire is an anisotropic material with excellent physical and chemical properties and is used as a substrate material in various fields such as LED (light emitting diode), power semiconductor, superconductor, sensor, and optical devices. Sapphire is processed into the final substrate through multi-wire saw, double-side lapping, heat treatment, diamond mechanical polishing, and chemical mechanical polishing. Among these, chemical mechanical polishing is the key process that determines the final surface quality of the substrate. Recent studies have reported that the material removal characteristics during chemical mechanical polishing changes according to the crystal orientations, however, detailed analysis of this phenomenon has not reported. In this work, we carried out chemical mechanical polishing of C(0001), R($1{\bar{1}}02$), and A($11{\bar{2}}0$) substrates with different sapphire crystal planes, and analyzed the effect of crystal orientation on the material removal characteristics and their correlations. We measured the material removal rate and frictional force to determine the material removal phenomenon, and performed nano-indentation to evaluate the material characteristics before and after the reaction. Our findings show that the material removal rate and frictional force depend on the crystal orientation, and the chemical reaction between the sapphire substrate and the slurry accelerates the material removal rate during chemical mechanical polishing.