• Bulletin of the Korean Chemical Society
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• v.34 no.2
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• pp.367-373
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• 2013

The ruthenium(II) ferrocenyl heterocyclic thiosemicarbazone complexes of the type $[RuCl(CO)(EPh_3)]_2L$ (where E = P/As; L = binucleating monobasic tridendate thiosemicarbazone ligand) have been investigated. Strutural features were determined by analytical and spectral techniques. Binding of these complexes with CT-DNA by absorption spectral study indicates that the ruthenium(II) complexes form adducts with DNA and has intrinsic binding constant in the range of $3.3{\times}10^4-1.2{\times}10^5M^{-1}$. The complexes exhibit a remarkable DNA cleavage activity with CT-DNA in the presence of hydrogen oxide and the cleavage activity depends on dosage.

• Bulletin of the Korean Chemical Society
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• v.28 no.6
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• pp.921-928
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• 2007

Three different phosphonated trisbipyridine ruthenium complexes, [(4-CH3-4'-CH2PO(OH)2-2,2'-bipyridine)- (bpy)2Ru]·(PF6)2 (Ru-P1), [(4-CH3-4'-CH2PO(OH)2-2,2'-bipyridine)3Ru]·(PF6)2 (Ru-P2), and [(4,4'-CH2PO- (OH)2-2,2'-bipyridine)3Ru]·(PF6)2 (Ru-P3) were synthesized and their photochemical and electrochemical properties were studied. These ruthenium complexes were strongly adsorbed on the surface of the layered metal oxide semiconductor K4Nb6O17 that was partially acid-exchanged and sensitized up to pH 10, while the carboxylated ruthenium complex, (4,4'-COOH-2,2'-bipyridine)3Ru·Cl2 (Ru-C) that was previously studied was sensitized only below pH 4. The visible light water reduction at K4Nb6O17 that was internally platinized and sensitized by these phosphonated Ru-complexes was comparatively studied using a reversible electron donor iodide.

• Bulletin of the Korean Chemical Society
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• v.13 no.3
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• pp.265-268
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• 1992

Ruthenium(III) unsymmetrical Schiff base complexes, $[Ru(CHBPH-TP)Cl_2]$ and $K[Ru(CHBPH-HB)Cl_2]$ were synthesized, where CHBPH-TP and CHBPH-HB are 5-chloro-2-hydroxybenzophenonethiophencarba aldehydephenylenediimine and 5-chloro-2-hydroxybenzophenonehydroxybenzophe nonephenylenediimine. These Schiff bases were obtained from the reactions of 5-chloro-2-hydroxybenzophenone (CHB) and 2-thiophenecarbaldehyde (TP) or hyroxybenzophenone (HB) and 1,2-diaminobenzene. Elemental analysis, conductivity and infrared studies of the complexes suggest an octahedral geometry around ruthenium. Magnetic moments of the complexes indicate a single unpaired electron in alow spin $d^5$ configuration. The complexes are capable of catalyzing the oxidation of styrene with sodium hypochlorite in the presence of phase transfer agent. Oxidative cleavage of C=C bond is the major reaction pathway to form benzaldehyde for styrene oxidation.

• Bulletin of the Korean Chemical Society
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• v.29 no.10
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• pp.2057-2060
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• 2008

• Bulletin of the Korean Chemical Society
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• v.17 no.8
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• pp.765-766
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• 1996

• Bulletin of the Korean Chemical Society
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• v.16 no.12
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• pp.1239-1241
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• 1995

• Bulletin of the Korean Chemical Society
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• v.15 no.6
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• pp.460-465
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• 1994

New silicon-monosubstituted (${\eta}^4$-2,3,4,5-tetraphenyl-l-silacyclopentadiene)transi tion metal complexes are described. (7-Alkyl-7-silanorbornadienyl)MLn(Alkyl=Methyl: MLn=CpRu$(CO)_2$: Alkyl=Methyl: MLn=CpNi(CO): Alkyl=Ethyl: MLn=CpNi(CO)) complexes were prepared from the corresponding silole-transition metal complexes with dimethylacetylenedicarboxylate. Cycloaddition products were obtained with 2,3-dimethyl-1,3-butadiene, 2,3-butanedione, and 1,4-benzoquinone through the ruthenium-substituted silylene. We have determined the crystal structure of (1-methyl-2,3,4,5-tetraphenyl-l-silacyclopentadien yl)cyclopentadienyldicarbonylruthenium by using graphite monochromated Mo-Ka radiation. The compound was crystallized in the monoclinic space group $P2_{1/c}$ with a = 9.838(l), b = 15.972(3), c = 18.327(3) ${\AA}$, and ${\beta}= 94.28(l)^{circ}$. The ruthenium moiety CpRu$(CO)_2$ on silicon is in an axial position.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.363-363
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• 2014

Ruthenium (Ru) has attractive material properties due to its promising characteristics such as a low resistivity ($7.1{\mu}{\Omega}{\cdot}cm$ in the bulk), a high work function of 4.7 eV, and feasibility for the dry etch process. These properties make Ru films appropriate for various applications in the state-of-art semiconductor device technologies. Thus, it has been widely investigated as an electrode for capacitor in the dynamic random access memory (DRAM), a metal gate for metal-oxide semiconductor field effect transistor (MOSFET), and a seed layer for Cu metallization. Due to the continuous shrinkage of microelectronic devices, better deposition processes for Ru thin films are critically required with excellent step coverages in high aspect ratio (AR) structures. In these respects, atomic layer deposition (ALD) is a viable solution for preparing Ru thin films because it enables atomic-scale control of the film thickness with excellent conformality. A recent investigation reported that the nucleation of ALD-Ru film was enhanced considerably by using a zero-valent metallorganic precursor, compared to the utilization of precursors with higher metal valences. In this study, we will present our research results on the synthesis and characterization of novel ruthenium complexes. The ruthenium compounds were easy synthesized by the reaction of ruthenium halide with appropriate organic ligands in protic solvent, and characterized by NMR, elemental analysis and thermogravimetric analysis. The molecular structures of the complexes were studied by single crystal diffraction. ALD of Ru film was demonstrated using the new Ru metallorganic precursor and O2 as the Ru source and reactant, respectively, at the deposition temperatures of $300-350^{\circ}C$. Self-limited reaction behavior was observed as increasing Ru precursor and O2 pulse time, suggesting that newly developed Ru precursor is applicable for ALD process. Detailed discussions on the chemical and structural properties of Ru thin films as well as its growth behavior using new Ru precursor will be also presented.

• Bulletin of the Korean Chemical Society
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• v.19 no.11
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• pp.1207-1210
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• 1998

The diamagnetic six-coordinate ruthenium polypyridyl complexes have been prepared and assigned. 1H NMR spectral studies were used to unravel the ligand field strength and the basicity on the chemical shift to the particular proton of ligand L in [(tpy)(L)RuⅡ(X)]+/2+ (L=bpy, bqi, dmbpy, phen; X=Cl, CN, N3, NCCD3, NO2, SCN) complexes.

• Bulletin of the Korean Chemical Society
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• v.31 no.3
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• pp.697-699
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• 2010