• Title/Summary/Keyword: Rubbing angle

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Investigation of High Pretilt Angle Generation in Nematic Liquid Crtstal by Using Transcription alignment Techniques (전사배향기술을 이용한 네마틱액정의 고프리틸트각 발생에 관한 연구)

  • Seo, Dae-Shik;Han, Jeong-Min;Kim, Jin-Ho;Lee, Bo-Ho
    • Proceedings of the KIEE Conference
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    • 1997.07d
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    • pp.1582-1584
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    • 1997
  • We investigated the transcription of liquid crystal (LC) alignment method by using memory effect of nematic (N) LC on polyimide (PI) surface with side chain as for non-rubbing alignment techniques. That the monodomain alignment of aligned NLC is observed by polarizing microscope textures in the cells on PI surface with side chain, We obtained that the pretilt angle of NLC are generated about 3.7 degree on PI surface. We suggest that the LC alignment by using transcription aligngnment method is attributed to memory effect of NLC on PI surface.

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A New Method for Measuring Azimuthal Anchoring Energy of Rubbed and UV-Exposed Polyimide Alignment Layers

  • Park, H.J.;Lee, W.K.;Kim, D.G.;Shin, D.C.;Woo, J.W.;Shin, H.H.
    • 한국정보디스플레이학회:학술대회논문집
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    • 2007.08b
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    • pp.1619-1621
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    • 2007
  • Novel optical measurement systems and improved cell configurations for measuring of azimuthal anchoring energies were developed. The difference between the mechanical rubbing direction and the optical easy axis that caused errors in the previous azimuthal anchoring energy measurement was compensated. In addition, the measurement accuracy of the twist angle and therefore the azimuthal anchoring energy was greatly enhanced. As a result, we were able to obtain valid azimuthal anchoring energy values for different alignment layers.

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Statistical Modeling of Pretilt Angle in NLC on the Polyimide Surface

  • Kang, Hee-Jin;Lee, Jung-Hwan;Kim, Jong-Hwan;Yun, Il-Gu;Seo, Dae-Shik
    • 한국정보디스플레이학회:학술대회논문집
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    • 2006.08a
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    • pp.1442-1446
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    • 2006
  • In this paper, the response surface modeling of the pretilt angle control in the nematic liquid crystal (NLC) on the homogeneous polyimide surface with different surface treatment is investigated The rubbing strength and the hard baking temperature are considered as input factors. After the design of experiments is performed, the process model is then explored using the response surface methodology. The analysis of variance is used to analyze the statistical significance and the effect plots are also investigated to examine the relationship between the process parameters and the response.

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화학기계적 연마 가공에서의 윤활 특성 해석

  • 박상신;조철호;안유민
    • Proceedings of the Korean Society of Tribologists and Lubrication Engineers Conference
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    • 1998.10a
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    • pp.272-277
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    • 1998
  • Chemical-Mechanical Polishing (CMP) refers to a material removal process done by rubbing a work piece against a polishing pad under load in the presence of chemically active, abrasive containing slurry. CMP process is a combination of chemical dissolution and mechanical action. The mechanical action of CMP involves tribology. The liquid slurry is trapped between the wafer(work piece) and pad(tooling) forming a lubricating film. For the first step to understand material removal rate of the CMP process, the lubricational analyses were done with commercial 100mm diameter silicon wafers to get nominal clearance of the slurry film, roll and pitch angle at the steady state. For this purpose, we calculate slurry pressure, resultant forces and moments at the steady state in the range of typical industrial polishing conditions.

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Analysis of the Lubricational Characteristics for Chemical-Mechanical Polishing Process (화학기계적 연마 가공에서의 윤활 특성 해석)

  • 박상신;조철호;안유민
    • Tribology and Lubricants
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    • v.15 no.1
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    • pp.90-97
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    • 1999
  • Chemical-Mechanical Polishing (CMP) refers to a material removal process done by rubbing a work piece against a polishing pad under load in the presence of chemically active, abrasive containing slurry. CU process is a combination of chemical dissolution and mechanical action. The mechanical action of CMP involves tribology. The liquid slurry is trapped between the wafer (work piece) and pad (tooling) forming a lubricating film. For the first step to understand material removal rate of the CMP process, the lubricational analyses were done with commercial 100mm diameter silicon wafers to get nominal clearance of the slurry film, roll and pitch angle at the steady state. For this purpose, we calculate slurry pressure, resultant forces and moments at the steady state in the range of typical industrial polishing conditions.

Study on Electro-optic Characteristics of Fringe-field Switching Twisted Nematic Mode using a Liquid Crystal with Negative Dielectric Anisotropy (유전율 이방성이 음인 액정을 이용한 Fringe-field Switching Twisted Hematic 모드의 전기광학 특성 연구)

  • 송일섭;신성식;이종문;이승희
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.17 no.5
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    • pp.530-535
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    • 2004
  • We have studied 90$^{\circ}$ twisted nematic mode switching by fringe electric field(F-TN mode) using a liquid crystal (LC) with negative dielectric anisotropy. In the device, two polarizers are parallel each other, electrodes exist only on bottom substrate, and one of rubbing direction is coincident with polarizer axis. Therefore, the cell shows a black state before a voltage is applied. With a bias voltage generating fringe-electric field, the LC twists perpendicular to fringe electric field such that the LCs are almost homogeneously aligned except near the bottom surface since the negative type of the LC is used. Consequently, the new device exhibits much wider viewing angle than that of the conventional TN mode due to in-plane switching and relatively high transmittance since the LC director above whole electrode area aligns parallel to the polarizer axis.

A Study on Electro-optical Characteristics of a-TN-LCD with Polarization of Orientation Film (배향막의 극성에 따른 a-TN-LCD의 전기광학특성에 관한 연구)

  • 서대식;이창훈
    • Electrical & Electronic Materials
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    • v.10 no.10
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    • pp.1011-1015
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    • 1997
  • In this paper we investigated the electro-optical characteristics of amorphous (a)- twisted nematic (TN)-liquid crystal display(LCD) on polymide (PI) surfaces with different molecular structure. It was found that the domaine size of a-TN-LCD on PI with high polarization is small compared to a-TN-LCD on PI with medium polarization. It is considered that the response time of a-TN-LCd contributes to surface effect between the substrate surfaces and the LC molecules. Finally we obtained that the viewing angle of a-TN-LCD on PI surfaces increases with decreasing the domain size.

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The liquid crystal alignment effect of in-cell retarder using homogeneous alignment layer (수평 배향막을 이용한 내장형 위상지연 박막의 액정 배향 효과)

  • Choi, Min-Oh;Lim, Young-Jin;Lee, Seung-Hee
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.07a
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    • pp.449-450
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    • 2005
  • Alignment characteristic of liquid crystal (LC) on in-cell retarder which is composed of reactive mesogens has been tested. The in-cell retarder which is polymerized on top of the homogeneous alignment layer (AL) has an optic axis along the rubbing direction of the homeogenous AL and does show good alignment effect of the LC without showing any defects, which possibly allows a skip of another AL on the in-cell retarder that was required conventionally to control alignment of the LC. However, the measured pretilt angle is only 0.04 degree so that disclination lines are generated for a cell that uses the in-cell retarder as an AL when the LC is tilted upward by a vertical electric field.

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A Study on the Liquid Crystal Orientation Characteristics of the Inorganic NiOx Film with Aligned Nanopattern Using Imprinting Process (무기막 NiOx의 정렬 패턴 전사를 이용한 액정의 배향 특성 연구)

  • Oh, Byeong-Yun
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.32 no.5
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    • pp.357-360
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    • 2019
  • We demonstrate an alignment technology using an imprinting process on an inorganic NiOx film. The aligned nanopattern was fabricated on a silicon wafer by laser interference lithography. The aligned nano pattern was then imprinted onto the sol-gel driven NiOx film using an imprinting process at an annealing temperature of $150^{\circ}C$. After the imprinting process, parallel grooves had been formed on the NiOx film. Atomic force microscopy and water contact angle measurements were performed to confirm the parallel groove on the NiOx film. The grooves caused liquid crystal alignment through geometric restriction, similar to grooves formed by the rubbing process on polyimide. The liquid crystal cell exhibited a pretilt angle of $0.2^{\circ}$, which demonstrated homogeneous alignment.

EO Characteristics of photo-aligned TN-LCD on Soluble Polyimide Surface (가용성 폴리이미드 표면을 이용한 광배향 TN-LCD의 전기광학 특성)

  • Park, Tae-Kyu;Lee, Jeong-Ho;Seo, Dae-Shik
    • Proceedings of the KIEE Conference
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    • 1999.07d
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    • pp.1759-1761
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    • 1999
  • The generation of pretilt in nematic liquid crystal(NLC)and electro-optical(EO) characteristics of photo-aligned twisted nematic (TN)-LCD with oblique p-polarized ultraviolet (UV) light irradiation on the two kinds of the soluble polyimide (PI) surfaces containing trifluoromethyl moieties were investigated. The generated pretilt angle of NLC is about $2.5^{\circ}$ with p-polarized UV light irradiation of $20^{\circ}$ on PI-3 surface at 20 min.; However pretilt angle of about $0.5^{\circ}$ are observed on PI-1 and PI-2 surfaces. The generated pretilt angle of NLC on PI-3 surface may be attributed to the trifluoromethyl moieties attached to the lateral benzene rings. The voltage-transmittance and response time characteristics of photo-aligned TN-LCD with p-polarized UV light irradiation of $20^{\circ}$ on PI-1 surfaceat at 20 min were almost same in comparison with the rubbing-aligned TN-LCD. However, the high threshold voltage and slow response are observed on PI-3 surface. Also, the decay time $\tau_d$ of photo-aligned TN-LCD is attributed to the anchoring energy of NLC.

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