• 제목/요약/키워드: Roughness pattern

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Lubrication Properties of Various Pattern Shapes on Rough Surfaces Considering Asperity Contact (돌기접촉을 고려한 거친 표면 위 다양한 패턴 형상에 따른 윤활 특성 연구)

  • Kim, Mi-Ru;Lee, Seung-Jun;Jeong, Jae-Ho;Lee, Deug-Woo
    • Journal of the Korean Society of Manufacturing Process Engineers
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    • v.17 no.4
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    • pp.39-46
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    • 2018
  • Two surfaces that have relative motion show different characteristics according to surface roughness or surface patterns in all lubrication areas. For two rough surfaces with mixed lubrication, this paper proposes a new approach that includes the contact characteristics of the surfaces and a probabilistic method for a numerical analysis of lubrication. As the contact area of the two surfaces changes according to the loading conditions, asperity contact is very important. An average flow model developed by Patir-Cheng is central to the study of lubrication for rough surfaces. This average flow model also refers to a multi-asperity contact model for deriving a modified Reynolds equation and calculating the lubricant characteristics of a bearing surface with random roughness during fluid flow. Based on the average flow model, this paper carried out a numerical analysis of lubrication using a contact model by considering a load change made by the actual contact of asperities between two surfaces. Lubrication properties show different characteristics according to the surface patterns. This study modeled various geometric surface patterns and calculated the characteristics of lubrication.

Characterization of Hydrogen Gas Sensitivity of ZnO Thin Films (고감도 ZnO 박막센서의 수소가스 검출 특성 연구)

  • Kong, Young-Min;Lee, Hak-Min;Huh, Sung-Bo;Kim, Sun-Kwang;You, Yong-Zoo;Kim, Dae-Il
    • Korean Journal of Materials Research
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    • v.20 no.12
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    • pp.636-639
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    • 2010
  • ZnO thin films were prepared on a glass substrate by radio frequency (RF) magnetron sputtering without intentional substrate heating and then surfaces of the ZnO films were irradiated with intense electrons in vacuum condition to investigate the effect of electron bombardment on crystallization, surface roughness, morphology and hydrogen gas sensitivity. In XRD pattern, as deposited ZnO films show a higher ZnO (002) peak intensity. However, the peak intensity for ZnO (002) is decreased with increase of electron bombarding energy. Atomic force microscope images show that surface morphology is also dependent on electron bombarding energy. The surface roughness increases due to intense electron bombardment as high as 2.7 nm. The observed optical transmittance means that the films irradiated with intense electron beams at 900 eV show lower transmittance than the others due to their rough surfaces. In addition, ZnO films irradiated by the electron beam at 900 eV show higher hydrogen gas sensitivity than the films that were electron beam irradiated at 450 eV. From XRD pattern and atomic force microscope observations, it is supposed that intense electron bombardment promotes a rough surface due to the intense bombardments and increased gas sensitivity of ZnO films for hydrogen gas. These results suggest that ZnO films irradiated with intense electron beams are promising for practical high performance hydrogen gas sensors.

Role of CH2F2 and N-2 Flow Rates on the Etch Characteristics of Dielectric Hard-mask Layer to Extreme Ultra-violet Resist Pattern in CH2F2/N2/Ar Capacitively Coupled Plasmas

  • Kwon, B.S.;Lee, J.H.;Lee, N.E.
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.210-210
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    • 2011
  • The effects of CH2F2 and N2 gas flow rates on the etch selectivity of silicon nitride (Si3N4) layers to extreme ultra-violet (EUV) resist and the variation of the line edge roughness (LER) of the EUV resist and Si3N4 pattern were investigated during etching of a Si3N4/EUV resist structure in dual-frequency superimposed CH2F2/N2/Ar capacitive coupled plasmas (DFS-CCP). The flow rates of CH2F2 and N2 gases played a critical role in determining the process window for ultra-high etch selectivity of Si3N4/EUV resist due to disproportionate changes in the degree of polymerization on the Si3N4 and EUV resist surfaces. Increasing the CH2F2 flow rate resulted in a smaller steady state CHxFy thickness on the Si3N4 and, in turn, enhanced the Si3N4 etch rate due to enhanced SiF4 formation, while a CHxFy layer was deposited on the EUV resist surface protecting the resist under certain N2 flow conditions. The LER values of the etched resist tended to increase at higher CH2F2 flow rates compared to the lower CH2F2 flow rates that resulted from the increased degree of polymerization.

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Characterization of Hydrogen Gas Sensitivity of TiO2 Thin Films with Electron Beam Irradiation (전자빔 열처리에 따른 TiO2 박막의 수소가스 검출 특성 연구)

  • Heo, S.B.;Lee, H.M.;Jung, C.W.;Kim, S.K.;Lee, Y.J.;Kim, Y.S.;You, Y.Z.;Kim, D.
    • Journal of the Korean Society for Heat Treatment
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    • v.24 no.1
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    • pp.31-36
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    • 2011
  • $TiO_2$ films were deposited on a glass substrate with RF magnetron sputtering and then surface of $TiO_2$ films were electron beam irradiated in a vacuum condition to investigate the effect of electron bombardment on the thin film crystallization, surface roughness and gas sensitivity for hydrogen. $TiO_2$ films that electron beam irradiated at 450eV were amorphous phase, while the films irradiated at 900 eV show the anatase (101) diffraction peak in XRD pattern. AFM measurements show that the roughness is depend on the electron irradiation energy. As increase the hydrogen gas concentration and operation temperature, the gas sensitivity of $TiO_2$ and $TiO_2$/ZnO films is increased proportionally and $TiO_2$ films that electron beam irradiated at 900 eV show the higher sensitivity than the films were irradiated at 450eV. From the XRD pattern and AFM observation, it is supposed that the crystallization and rough surface promote the hydrogen gas sensitivity of $TiO_2$ films.

AN EXPERIMENTAL STUDY ON ADHESION PATTERN, ADHESION STRENGTH AND FRACTURE PATTERN OF THE ADHESIVE CAST GOLD INLAY (접착형 구조 금 인레이의 접착 형태, 강도 및 파절 양태에 관한 실험적 연구)

  • Han, Seoung-Ryul;Hong, Chan-Ui
    • Restorative Dentistry and Endodontics
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    • v.19 no.1
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    • pp.64-72
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    • 1994
  • Zinc Phosphate Cement hand been used for about more than 100 years in luting of cast gold inlay. But many scientists had been trying to develop the new form of luting agent because the ZPC hand shown the lack of adhesiveness on the tooth structure and the toxicity to the pulp tissue. Recently many researches about the surface treatment of the cast body are being done to increase the adhesion of cement to it. The conventional Class I gold inlays were fabricated in the 20 permanent molars. After the internal surface of the cast body was sandblasted with $Al_2O_3$ particles and was tin-plated, the inlays were cemented with adhesive cement [G I cement and resin cement(Super-Bond & $Panavia_{EX}$)] and the evaluation on the adhesion pattern, adhesive strength and the fracture pattern of the adhesive cast gold inlay was compared to that of the cast gold inlay cemented conventionally with ZPC. The results were as follows : 1. The surface roughness of the cast body was increased significantly after sandblasting with the $Al_2O_3$ particles and the tin oxide layer, which was consisted of round particles, came into being. 2. The bond strength was in the order of Super-Bond, ZPC, Fuji I, $Panavia_{EX}$ group. The group cemented with Super-Bond showed statistically greater strength than the other groups(p<0.05). 3. The group cemented with ZPC was fallen apart by principal adhesion failure and that with Fuji I was by complete adhesion failure. But the group with Super-Bond showed pricncipal cohesive failure pattern and in the group with $Panavia_{EX}$, complete cohesive fracture pattern was shown and small protion of tooth structure was fractured out with cast body and the fractured surface showed the figure just as the enamel prism. 4. Various gaps were shown at the pulpal side regardless of little gap at the side walls of the cavity in all groups. Only the Super-Bond was attached to the tooth structure and the other cements were detached from both the tooth and the cast body.

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Highly Tunable Block Copolymer Self-assembly for Nanopatterning

  • Jeong, Yeon-Sik;Jeong, Jae-Won
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2011.05a
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    • pp.6.1-6.1
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    • 2011
  • Nanoscale block copolymer (BCP) patterns have been pursued for applications in sub-30 nm nanolithography. BCP self-assembly processing is scalable and low cost, and is well-suited for integration with existing semiconductor fabrication techniques. However, one of the major technical challenges for BCP self-assembly is limited tunability in pattern geometry, dimension, and functionality. We suggest methods for extending the degree of tunability by choosing highly incompatible polymer blocks and utilizing solvent vapor treatment techniques. Siloxane BCPs have been developed as self-assembling resists due to many advantages such as high etch-selectivity, good etch-resistance, long-range ordering, and reduced line-edge roughness. The large incompatibility leads to extensive degree of pattern tunability since the effective volume fraction can be easily manipulated by solvent-based treatment techniques. Thus, control of the microdomain size, periodicity, and morphology is possible by changing the vapor pressure and the mixing ratio of selective solvents. This allows a range of different pattern geometry such as dots, lines and holes and critical dimension simply by changing the processing conditions of a given block copolymer without changing a polymer chain length. We demonstrate highly extensive tunability (critical dimension ~6~30 nm) of self-assembled patterns prepared by a siloxane BCP with extreme incompatibility.

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A Study on the Fabrication Method of Mold for 2 inch LCD-BLU by 50μm Microlens : Effect of Different Aspect Ratio (50μm급 마이크로렌즈 적용 2인치 휴대폰 LCD-BLU 금형 개발 : 광학패턴의 세장비 영향)

  • Kim, J.S.;Ko, Y.B.;Min, I.K.;Yu, J.W.;Heo, Y.M.;Yoon, K.H.;Hwang, C.J.
    • Transactions of Materials Processing
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    • v.16 no.1 s.91
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    • pp.48-53
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    • 2007
  • LCD-BLU(Liquid Crystal Display - Back Light Unit) consists of several optical sheets: LGP(Light Guiding Plate), light source and mold frame. The LGP of LCD-BLU is usually manufactured by etching process and forming numerous dots with $50{\mu}m$ in diameter on the surface. But the surface roughness of LGP with etched dots is very high, so there is much loss of light. In order to overcome the limit of current etched dot patterned LGP, optical pattern design with microlens of $50{\mu}m$ diameter was applied in the present study. The microlens pattern fabricated by modified LiGA with thermal reflow process was applied to the optical design of LGP and optical simulation was carried out to know tendency of microlens patterned LGP simultaneously. The attention was paid to the effects of different aspect ratio(i.e. $0.2\sim0.5$) of optical pattern conditions to the brightness distribution of BLU with microlens patterned LGP. Finally, high aspect ratio microlens patterned LGP showed superior results to the one made by low aspect ratio in average luminance.

Effects of Cobalt Ohmic Layer on Contact Resistance (코발트 오믹층의 적용에 의한 콘택저항 변화)

  • 정성희;송오성
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.16 no.5
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    • pp.390-396
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    • 2003
  • As the design rule of device continued to shrink, the contact resistance in small contact size became important. Although the conventional TiN/Ti structure as a ohmic layer has been widely used, we propose a new TiN/Co film structure. We characterized a contact resistance by using a chain pattern and a KELVIN pattern, and a leakage current determined by current-voltage measurements. Moreover, the microstructure of TiN/ Ti/ silicide/n$\^$+/ contact was investigated by a cross-sectional transmission electron microscope (TEM). The contact resistance by the Co ohmic layer showed the decrease of 26 % compared to that of a Ti ohmic layer in the chain resistance, and 50 % in KELYIN resistance, respectively. A Co ohmic layer shows enough ohmic behaviors comparable to the Ti ohmic layer, while higher leakage currents in wide area pattern than Ti ohmic layer. We confirmed that an uniform silicide thickness and a good interface roughness were able to be achieved in a CoSi$_2$ Process formed on a n$\^$+/ silicon junction from TEM images.

Characteristics of a Flexible Transparent Electrode based on a Silver Nanowire-polymer Composite Material with a Mesh Pattern Formed without Lithography (리소그래피 없이 제작된 그물망 구조의 은나노와이어-고분자화합물 복합소재 기반 유연 투명전극의 특성)

  • Park, Tae Gon;Park, Jong Seol;Park, Jin Seok
    • Journal of the Semiconductor & Display Technology
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    • v.19 no.4
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    • pp.11-17
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    • 2020
  • In this study, a new method for fabricating flexible transparent electrodes based on silver nanowire-polymer (AgNW-PEDOT:PSS) composite materials having a mesh pattern formed by a solution-based process without lithography was proposed. By optimizing conditions such as the amount of ultraviolet (UV) photosensitizer injected into the suspension of AgNW and PEDOT:PSS, UV exposure time, and deionized (DI) washing time, a clear and uniform mesh pattern was obtained. For the fabricated AgNW-PEDOT:PSS-based mesh-type electrodes, characteristics such as electrical sheet resistance, light transmittance, haze, and bending flexibility were analyzed according to the mixing ratio of AgNW and PEDOT:PSS included in the suspension. The fabricated mesh electrodes typically exhibited a low electrical sheet resistance of less than 20 Ω/sq while maintaining a high transmittance of 80% or more. In addition, it was confirmed from the results of analyzing the effect of PEDOT:PSS on the characteristics of the mesh-type AgNW-PEDOT electrode that the optical visibility was greatly enhanced by reducing the surface roughness and haze, and the bending flexibility was remarkably improved.

A Development of Interior Decoration Timber with Pinus koraiensis Small Diameter Logs (잣나무 소경재의 재질평가를 통한 실내장식용재 개발)

  • Park, Byung-Ho;Kim, Nam-Hun
    • Journal of Forest and Environmental Science
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    • v.28 no.4
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    • pp.268-277
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    • 2012
  • Among the domestic softwoods, technical value of Pinus koraiensis small diameter logs which have comparatively low applicability was evaluated and sensitive characteristics and physical characteristics were investigated and analyzed for examining if it can be utilized as the interior decoration material. For the sensitive characteristics of Pinus koraiensis, wood figure, wood grain, wood color and odor were evaluated and for the physical characteristics, growth-ring width and latewood percentage, abrasion, density, shrinkage, swelling, absorption, roughness and hardness were evaluated. Then, the possibility to be developed as the interior decoration material was found. As the result of evaluating sensitive characteristics and physical characteristics of domestic Pinus koraiensis, wood figure, wood grain, color and scent clearly were judged to have excellent visual factor as the interior decoration material. And, physical characteristics were also judged to be excellent, so it is judged to be developed as the interior decoration material. Therefore, as the result of various forms of design pattern with domestic Pinus koraiensis small diameter logs, several patterns of interior decoration can be developed by characteristics of each side and colors of heartwood and sapwood. And, in the future, it can be applied to furniture design or interior decoration material for the proper use. Especially, it is considered to contribute to wood applying industry through the study on the quality of domestic small diameter logs which have low applicability.