• 제목/요약/키워드: Rough polishing

검색결과 39건 처리시간 0.025초

금형의 자동 연마작엉 지원 전문가시스템의 개발 (Development of an Expert System for Supporting Automatic Polishing Operation of Mold and Die)

  • 이태문;정해도;황찬해;조규갑
    • 한국정밀공학회지
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    • 제16권7호
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    • pp.73-84
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    • 1999
  • An advanced expert system for supporting automatic polishing operation of mold and die has been developed. The goal of this system is to minimize the polishing time, the number of polishing and tools used. Also, this paper proposes the advanced concept of the polishing method to perform polishing operation of mold and die, and it has adapted to the orthogonal array method. as a statistical technique, to choose an optimal polishing condition. An expert system consists of the polishing machining database that includes the information of workpiece and polishing tools, and the input/output module.

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자유곡면 연마를 위한 자동 연마 시스템 개발 (Development of Computer Control Polishing System for Free Form Surface)

  • 전문식;오창진;이응석;김옥현
    • 한국공작기계학회:학술대회논문집
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    • 한국공작기계학회 2001년도 춘계학술대회 논문집(한국공작기계학회)
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    • pp.327-331
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    • 2001
  • In the process of optical parts machining, polishing has been applied. Traditional polishing process is suitable for spherical optical parts. But it is very difficult to apply traditional process for aspheric optical parts. Nowadays, as growing needs for aspherical optic parts, many researches have been conducted. In this study, we developed computer controlled polishing system which consists of three major parts of active pressure control for correcting polishing process, mechanical on-machine measurement for rough polishing, and optical on-machine measurement for finish polishing, respectively. In this paper, a systematic stretegy for correcting polishing process, pressure control scheme for polishing tool, and on-machine measurement methods for automated and precise polishing are suggested. The information about developed machine is also included.

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공기 냉각 방식의 래핑을 이용한 구리 기판 연마 공정 개발 (Thick Copper Substrate Fabrication by Air-Cooled Lapping and Post Polishing Process)

  • 이호철;김동준;이현일
    • 한국생산제조학회지
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    • 제19권5호
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    • pp.616-621
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    • 2010
  • New type of the base material of the light-emitting diode requires copper wafer in view of heat and electrical conductance. Therefore, polishing process of the substrate level is needed to get a nanometer level of surface roughness as compared with pattern structure of nano-size in the semiconductor industry. In this paper, a series of lapping and polishing technique is shown for the rough and deflected copper substrate of thickness 3mm. Lapping by sand papers tried air cooling method. And two steps of polishing used the diamond abrasives and the $Al_2O_3$ slurry of size 100mm considering the residual scratch. White-light interferometer proved successfully a mirror-like surface roughness of Ra 6nm on the area of $0.56mm{\times}0.42mm$.

열기계적으로 연마한 다이아몬드 막의 적외선 투과도 및 표면구조 (IR Transmittance and Surface Structure of Diamond Film Polished by Thermomechanical Method)

  • 정상기;최시경;정대영;최한메;권순용
    • 한국세라믹학회지
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    • 제32권6호
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    • pp.697-702
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    • 1995
  • The rough growth surfaces of diamond films fabricated by the hot filament CVD were polished using thermomechanical polishing method. And then, its application to the optical windows was discussed through the measurement of transmittance in the range of infrared radiation and analysis of surfaces structure. The results were compaerd with those of the films polished with conventional mechanicla polishing. The transmittance of the mechanically polished film reached 57~66% over the whole range from 500 to 4000 cm-1. But the transmittance of the film polished with thermomechanical polishing method was reduced below 35%. This decrease in transmittance was due to both the graphitization of diamond on the polished surface and the growth of $\beta$-SiC at diamond/Si interface during polishing. The residual Fe in hte thermomechanically polished surface was confirmed by SIMS analysis. This Fe played the role of the graphitization of near surface region of the diamond film.

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글레이징처리한 도재와 연마한 도재의 표면조도에 관한 연구 (A STUDY ON THE SURFACE ROUGHNESS OF GLAZED PORCELAIN AND POLISHED PORCELAIN)

  • 최미라;정헌영;이선형;양재호
    • 대한치과보철학회지
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    • 제36권4호
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    • pp.549-565
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    • 1998
  • Porcelain is considered to be one of the materials of choice for restoration where esthetics is of concern. But porcelain surface without final glazing treatment may induce undesirable results such as inflammatory response on adjacent soft tissues due to plaque accumulation and increased wear of opposing teeth. Therefore, rough porcelain surface must be smoothened by final glazing treatment or chairside polishing procedure. The purpose of this study was to compare the surface roughness among self-glazed, overglazed and polished porcelain with various polishing kit, and to detect which phase of polishing is optimal in clinic. Specimens were fabricated with Vita VMK porcelain. The surface treatment of each group was performed as follows. Group 1 : overglazing treatment Group 2 : self-glazing treatment Group 3 : polishing with the Truluster Polishing System for Porcelain(Brasseler, U.S.A.) Group 4 : polishing with the Exa Cerapol Adjustment kit (Edenta dental products, Switzerland) followed by finishing with diamond-filled polishing paste Group 5 : polishing with the Shofu Porcelain Adjustment kit (Shofu inc., Japan) followed by finishing with diamond-filled polishing paste. At each polishing steps, the measurement of Ra and Rq values were performed, and the surface was examined by scanning electron microscope. The results were as follows : 1. Overglazing treatment brought smoother surface than self-glazing treatment. 2. Polishing systems without porcelain polishing paste did not make better result than self-glazing treatment. 3. Polishing system with porcelain polishing paste made similar result to overglazing treatment. 4. Applying diamond-filled polishing paste after using polishing system which has no porcelain polishing paste produced surface as smooth as overglazing treatment does.

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AAO 나노기공을 나노 임프린트 리소그래피의 형틀로 이용한 PMMA 나노패턴 형성 기술 (Fabrication of Nanometer-sized Pattern on PMMA Plate Using AAO Membrane As a Template for Nano Imprint Lithography)

  • 이병욱;홍진수;김창교
    • 제어로봇시스템학회논문지
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    • 제14권5호
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    • pp.420-425
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    • 2008
  • PMMA light guiding plate with nano-sized pattern was fabricated using anodized aluminum oxide membrane as a template for nano imprint lithography. Nano-sized pore arrays were prepared by the self-organization processes of the anodic oxidation using the aluminum plate with 99.999% purity. Since the aluminum plate has a rough surface, the aluminum plate with thickness of 1mm was anodized after the pre-treatments of chemical polishing, and electrochemical polishing. The surface morphology of the alumina obtained by the first anodization process was controlled by the concentration of electrochemical solution during the first anodization. The surface morphology of the alumina was also changed according to temperature of the solution during chemical polishing performed after first anodization. The pore widening process was employed for obtaining the one-channel with flat surface and height of the channel because the pores of the alumina membrane prepared by the fixed voltage method shows the structure of two-channel with rough surface. It is shown from SPM results that the nano-sized pattern on PMMA light guiding plate fabricated by nano imprint lithography method was well transferred from that of anodized aluminum oxide template.

Silicon/Pad Pressure Measurements During Chemical Mechanical Polishing

  • Danyluk, Steven;Ng, Gary;Yoon, In-Ho;Higgs, Fred;Zhou, Chun-Hong
    • 한국윤활학회:학술대회논문집
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    • 한국윤활학회 2002년도 proceedings of the second asia international conference on tribology
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    • pp.433-434
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    • 2002
  • Chemical mechanical polishing refers to a process by which silicon and partially-processed integrated circuits (IC's) built on silicon substrates are polished to produce planar surfaces for the continued manufacturing of IC's. Chemical mechanical polishing is done by pressing the silicon wafer, face down, onto a rotating platen that is covered by a rough polyurethane pad. During rotation, the pad is flooded with a slurry that contains nanoscale particles. The pad deforms and the roughness of the surface entrains the slurry into the interface. The asperities contact the wafer and the surface is polished in a three-body abrasion process. The contact of the wafer with the 'soft' pad produces a unique elastohydrodynamic situation in which a suction force is imposed at the interface. This added force is non-uniform and can be on the order of the applied pressure on the wafer. We have measured the magnitude and spatial distribution of this suction force. This force will be described within the context of a model of the sliding of hard surfaces on soft substrates.

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복합레진의 표면조도에 관한 연구 (A STUDY OF SURFACE ROUGHNESS OF COMPOSITE RESIN)

  • 박기현
    • 대한치과보철학회지
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    • 제38권1호
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    • pp.108-115
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    • 2000
  • This study was designed to compare the effect of polishing on surface roughness of composite resin. We used Z100(3M) composite resin and placed the composite resin in the hole (4mm thick and 4mm in diameter) of vinyl plate and polymerized it under manufacturer's instructions. Samples were divided into 5 groups by polishing methods. Group 1 was control: resin was polymerized under glass plate, Group 2: resin was polymerized without any polishing procedure, Group 3: resin was polymerized with a polishing procedure of abrasive disc, Group 4: bonding agent was applyed in thin layer and polymerized on the polished polymerized resin surface. Group 5: resin was polymerized under transparent celluloid strip. The surface roughness of each specimen was measured with Sufacoder SEF-30D (Kosaka lab. Ltd) under 0.08mm cut off, 0.05mm/s stylus speed, ${\times}40$ horizontal magnification, ${\times}5000$ vertical magnification. The results were as follows : 1. Group 1 showed the most smooth surface in this study. 2. Group 3 showed more rough surface than Group 2. Considering the surface roughness, it would be better to make the shape completely before polymerize the resin. To finish and polish after the polymerization of resin makes less smooth surface. 3. When we use the transparent celluloid strip, minimum finishing procedures are recommended. Any polishing procedure could not recover the smooth resin surface of celluloid strip. 4. Application and polymerization of the thin layer of bonding agent on the polished surface showed the minimum surface smoothing effect.

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원형단면의 정밀 원심 배럴가공에 관한 연구 (A Study on the Centrifugal Barrel Machining of Round Face)

  • 고준빈;김우강;원종호
    • 한국정밀공학회지
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    • 제21권4호
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    • pp.179-185
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    • 2004
  • Surface finish technology is highly demanded in the wide field of industry applications from ultra-precision parts to rough casting parts. Therefore, many kinds of surface finish technologies have been developed for each purpose. Because surface of a car's wheel cast is very rough it becomes the reason of the corrosion. This surface is coated to complement such problem but because surface is rough, the result of coating is not good and the coated metal peels off well. Therefore before the wheel is coated, it is necessary to grind the surface. In this study, we devised the plant to apply a barrel machining to improve the surface roughness and enhance the productivity. Also we could obtain the optimum barrel machining conditions for the proper surface roughness.

연마방법에 따른 복합레진의 활택도에 관한 연군 -Atomic Force Microscope를 이용한 연구 (A STUDY ON SURFACE ROUGHNESS OF COMPOSITE RESINS AFTER FINISHING AND POLISHING -an Atomic Force Microscope study)

  • 김형섭;우이형
    • 대한치과보철학회지
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    • 제35권4호
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    • pp.719-741
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    • 1997
  • This study was undertaken to compare by Atomic Force Microscope the effects of various finishing and polishing instruments on surface roughness of filling and veneering composite resins. Seven composite resins were studied : Silux Plus (3M Dental Products, U.S.A.), Charisma (Heraeus Kulzer, Germany), Prisma THP (L.D.Caulk, Dentsply, U.S.A.), Photoclearfil (Kuraray, Japan), Cesead (Kuraray, Japan), Thermoresin LC (GC, Japan), Artglass (Heraeus Kulzer, Germany). Samples were placed and polymerized in holes (2mm thick and 8.5mm in diameter) machined in Teflon mold under glass plate, ensuring excess of material and moulded to shape with polyester matrix strip. Except control group (Polyester matrix strip), all experimental groups were finished and polishied under manufacturer's instructions. The finishing and polishing procedure were : carbide bur (E.T carbide set 4159, Komet, Germany), diamond bur (composite resin polishing bur set, GC, Japan), aluminum-oxide disc (Sof-Lex Pop-On, 3M Dental Products, U.S.A.), diamond-particle disc (Dia-Finish, Renfert Germany), white stone bur & rubber point( composite finishing kit, EDENTA, Swiss), respectively. Each specimens were evaluated for the surface roughness with Atomic Force Microscope (AutoProbe CP, Park Scientific Instruments, U.S.A.) under contact mode and constant height mode. The results as follows : 1. Except Thermoresin LC, all experimental composite resin groups showed more rougher than control group after finishing and polishing(p<0.1). 2. A surface as smooth as control group was obtained by $Al_{2}O_{3}$ disc all filling composite resin groups except Charisma and all veneering composite resin groups except Thermoresin LC(p<0.05). 3. In case of Thermoresin LC, there were no statistically significant differences before and after finishing and polishing(p>0.1). 4. Carbide bur, diamond bur showed rough surfaces in all composite resin groups, so these were inappropriate for the final polishing instruments.

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