• 제목/요약/키워드: Reverse Tunneling

검색결과 19건 처리시간 0.023초

HgCdTe 광 다이오드의 터널링 전류 계산 (Tunneling Current Calculation in HgCdTe Photodiode)

  • 박장우;곽계달
    • 전자공학회논문지A
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    • 제29A권9호
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    • pp.56-64
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    • 1992
  • Because of a small bandgap energy, a high doping density, and a low operating temperature, the dark current in HgCdTe photodiode is almost composed of a tunneling current. The tunneling current is devided into an indirect tunneling current via traps and a band-to-band direct tunneling current. The indirect tunneling current dominates the dark current for a relatively high temperature and a low reverse bias and forward bias. For a low temperature and a high reverse bias the direct tunneling current dominates. In this paper, to verify the tunneling currents in HgCdTe photodiode, the new tunneling-recombination equation via trap is introduced and tunneling-recombination current is calculated. The new tunneling-recombination equation via trap have the same form as SRH (Shockley-Read-Hall) generation-recombination equation and the tunneling effect is included in recombination times in this equation. Chakrabory and Biswas's equation being introduced, band to band direct tunneling current are calculated. By using these equations, HgCdTe (mole fraction, 0.29 and 0.222) photodiodes are analyzed. Then the temperature dependence of the tunneling-recombination current via trap and band to band direct tunneling current are shown and it can be known what is dominant current according to the applied bias at athe special temperature.

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Contact Area-Dependent Electron Transport in Au/n-type Ge Schottky Junction

  • Kim, Hogyoung;Lee, Da Hye;Myung, Hye Seon
    • 한국재료학회지
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    • 제26권8호
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    • pp.412-416
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    • 2016
  • The electrical properties of Au/n-type Ge Schottky contacts with different contact areas were investigated using current-voltage (I-V) measurements. Analyses of the reverse bias current characteristics showed that the Poole-Frenkel effect became strong with decreasing contact area. The contribution of the perimeter current density to the total current density was found to increase with increasing reverse bias voltage. Fitting of the forward bias I-V characteristics by considering various transport models revealed that the tunneling current is dominant in the low forward bias region. The contributions of both the thermionic emission (TE) and the generation-recombination (GR) currents to the total current were similar regardless of the contact area, indicating that these currents mainly flow through the bulk region. In contrast, the contribution of the tunneling current to the total current increased with decreasing contact area. The largest $E_{00}$ value (related to tunneling probability) for the smallest contact area was associated with higher tunneling effect.

Electron Transport Mechanisms in Ag Schottky Contacts Fabricated on O-polar and Nonpolar m-plane Bulk ZnO

  • Kim, Hogyoung
    • Transactions on Electrical and Electronic Materials
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    • 제16권5호
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    • pp.285-289
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    • 2015
  • We prepared silver Schottky contacts to O-polar and nonpolar m-plane bulk ZnO wafers. Then, by considering various transport models, we performed a comparative analysis of the current transport properties of Ag/bulk ZnO Schottky diodes, which were measured at 300, 200, and 100 K. The fitting of the forward bias current-voltage (I-V) characteristics revealed that the tunneling current is dominant as the transport component in both the samples. Compared to thermionic emission (TE), a stronger contribution of tunneling current was observed at low temperature. The reverse bias I-V characteristics were well fitted with the thermionic field emission (TFE) in both the samples. The presence of acceptor-like adsorbates, such as O2 and H2O, modulated the surface conductive state of ZnO, thereby affecting the tunneling effect. The degree of activation/passivation of acceptor-like adsorbates might be different in both the samples owing to their different surface morphologies and surface defects (e.g., oxygen vacancies).

Mobile IPv4 네트워크에서 접속제어리스트와 역터널링을 이용한 IP Spoofing 제거 방안 (Defeating IP Source Address Spoofing with Foreign Agent Care-of-Address in Mobile IPv4)

  • 김한림;김성일;김상언;박세준
    • 한국정보통신설비학회:학술대회논문집
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    • 한국정보통신설비학회 2005년도 하계학술대회
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    • pp.313-317
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    • 2005
  • 고정된 호스트의 출발지 주소 변조(IP Source Address Spoofing)를 막는 가장 단순하면서도 효과적인 해결방법으로 네트워크 진입여과(Network Ingress Filtering)가 있다. 이동(Mobile) IPv4 네트워크에서는 이러한 네트워크 진입 여과가 설정될 경우 이동 호스트의 통신이 불가능해지기 때문에 이를 피하기 위한 방법으로 역터널링(Reverse Tunneling)이 고안되었지만 이에 따라 이동 호스트의 출발지 주소 변조를 통한 서비스 공격을 막을 수가 없게 되었다. 본 논문에서는 이동 IPv4 네트워크에서 외부 에어전트에 이동 호스트들만이 연결되고 각각의 외부 에이전트(Foreign Agent)가 관리하는 네트워크가 작다는 가정하에, 이동 호스트의 출발지 주소 변조를 효과적으로 막는 방법에 대해 제안하고자 한다.

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리버스 터널링을 이용한 차량용 CCTV 영상 통합 관리 시스템 (Integrated Management System for Vehicle CCTV Video Using Reverse Tunneling)

  • 양선진;박재표;양승민
    • 한국인터넷방송통신학회논문지
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    • 제19권5호
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    • pp.19-24
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    • 2019
  • ICT 기술의 발달은 기존의 폐쇄형 CCTV 보안 장비 시장에도 크나큰 영향을 일으켰다. 특히 자율주행 자동차와 무인 자동차, 스마트 시티 같은 분야에서 영상 데이터의 중요성이 부각되면서, 영상을 활용한 다양한 기술이 나오고 있다. 본 논문에서는 차량용 CCTV 영상을 단순 녹화 용도로 사용하지 않고, 스마트 시티의 한 부분으로 통합하기 위해 영상과 메타 데이터를 전송하고, 그 메타 데이터를 활용하여 도시 생활 속에서 유발되는 교통, 환경, 보안 문제를 해결할 수 있는 방법을 제안하고, 차량용 CCTV 영상을 원격지에서 접속하기 위한 방법으로 리버스 터널링 기법을 설계하고 구현하였다. 폐쇄적인 환경에서 제한적인 용도로만 사용되던 차량용 CCTV 영상과 메타 데이터를 실시간으로 통합 관리함으로써, 차량 상태 검사 뿐 아니라 도로와 각종 시설물 관리처럼 스마트시티에서 요구하는 효율적인 통합센터 운영을 가능하게 한다.

온도변화에 따른 백금 실리사이드-엔 실리콘 접합의 전자 터널링 특성 (Electron Tunneling Characteristics of PtSi-nSi Junctions according to Temperature Variations)

  • 장창덕;이정석;이광우;이용재
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1998년도 춘계학술대회 논문집
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    • pp.87-91
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    • 1998
  • In this paper, We analyzed the current-voltage characteristics with n-type silicon substrates concentration and temperature variations (Room temperature, 50$^{\circ}C$, 75$^{\circ}C$) in platinum silicide and silicon junction. The electrical parameters of measurement are turn-on voltage, saturation current, ideality factor, barrier height, dynamic resistance in forward bias and reverse breakdown voltage according to variations of junction concentration of substrates and measurement temperature variations. As a result, the forward turn-on voltage, reverse breakdown voltage, barrier height and dynamic resistance were decreased but saturation currents and ideality factor were increased by substrates increased concentration variations in platinum silicide and n-silicon junction. In increased measurement temperature (RT, 50$^{\circ}C$, 75$^{\circ}C$), the extracted electrical parameter values of characteristics were rises by increased temperature variations according to the forward and reverse bias.

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Gate-Induced-Drain-Leakage (GIDL) Current of MOSFETs with Channel Doping and Width Dependence

  • Choi, Byoung-Seon;Choi, Pyung-Ho;Choi, Byoung-Deog
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.344-345
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    • 2012
  • The Gate-Induced-Drain-Leakage (GIDL) current with channel doping and width dependence are characterized. The GIDL currents are found to increase in MOSFETs with higher channel doping levels and the observed GIDL current is generated by the band-to-band-tunneling (BTBT) of electron through the reverse-biased channel-to-drain p-n junction. A BTBT model is used to fit the measured GIDL currents under different channel-doping levels. Good agreement is obtained between the modeled results and experimental data. The increase of the GIDL current at narrower widths in mainly caused by the stronger gate field at the edge of the shallow trench isolation (STI). As channel width decreases, a larger portion of the GIDL current is generated at the channel-isolation edge. Therefore, the stronger gate field at the channel-isolation edge causes the total unit-width GIDL current to increases for narrow-width devices.

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Unusual Electrical Transport Characteristic of the SrSnO3/Nb-Doped SrTiO3 Heterostructure

  • De-Peng Wang;Rui-Feng Niu;Li-Qi Cui;Wei-Tian Wang
    • 한국재료학회지
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    • 제33권6호
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    • pp.229-235
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    • 2023
  • An all-perovskite oxide heterostructure composed of SrSnO3/Nb-doped SrTiO3 was fabricated using the pulsed laser deposition method. In-plane and out-of-plane structural characterization of the fabricated films were analyzed by x-ray diffraction with θ-2θ scans and φ scans. X-ray photoelectron spectroscopy measurement was performed to check the film's composition. The electrical transport characteristic of the heterostructure was determined by applying a pulsed dc bias across the interface. Unusual transport properties of the interface between the SrSnO3 and Nb-doped SrTiO3 were investigated at temperatures from 100 to 300 K. A diodelike rectifying behavior was observed in the temperature-dependent current-voltage (IV) measurements. The forward current showed the typical IV characteristics of p-n junctions or Schottky diodes, and were perfectly fitted using the thermionic emission model. Two regions with different transport mechanism were detected, and the boundary curve was expressed by ln I = -1.28V - 13. Under reverse bias, however, the temperature- dependent IV curves revealed an unusual increase in the reverse-bias current with decreasing temperature, indicating tunneling effects at the interface. The Poole-Frenkel emission was used to explain this electrical transport mechanism under the reverse voltages.

접합 부분의 농도 변화를 갖는 PtSi-nSi 소자에서 신뢰성 분석 (Reliability Analysis in PtSi-nSi Devices with Concentration Variations of Junction Parts)

  • 이용재
    • 한국정보통신학회논문지
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    • 제3권1호
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    • pp.229-234
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    • 1999
  • 측정 온도 변화와 n-형 실리콘 기판 농도의 변화를 갖는 백금 쇼트키 다이오드에서 신뢰성 특성을 분석하였다. 신뢰성 측정분석의 파라미터는 순방향 바이어스에서 포화전류, 임계전압과 이상인자이고, 소자의 모양에 따라서 역방향 바이어스에서 항복전압이다. 소자의 모양은 가장자리 효과를 위한 긴직사각형과 정사각형이다. 결과로써, 백금과 엔-실리콘 접합 부분에서 증가된 농도에 의해 순방향 임계전압, 장벽높이와 역방향 항복전압은 감소되었지만 이상인자와 포화전류는 증가되었다. 순방향과 역방향 바이어스 하에서 신뢰성 특성의 추출된 전기적 파라미터 값들은 측정온도(실온,$50^{\circ}C$, $75^{\circ}C$)에서 더 높은 온도에서 증가되었다. 긴직사각형 소자가 가장자리 부분의 터널링 효과에 의해 역방향 항복 특성에서 정사각형 소자보다 감소되었다.

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고전압 응용분야를 위한 GaN 쇼트키 다이오드의 산화 공정 (Oxidation Process of GaN Schottky Diode for High-Voltage Applications)

  • 하민우;한민구;한철구
    • 전기학회논문지
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    • 제60권12호
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    • pp.2265-2269
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    • 2011
  • 1 kV high-voltage GaN Schottky diode is realized using GaN-on-Si template by oxidizing Ni-Schottky contact. The Auger electron spectroscopy (AES) analysis revealed the formation of $NiO_x$ at the top of Schottky contact. The Schottky contact was changed to from Ni/Au to Ni/Ni-Au alloy/Au/$NiO_x$ by oxidation. Ni diffusion into AlGaN improves the Schottky interface and the trap-assisted tunneling current. In addition, the reverse leakage current and the isolation-leakage current are efficiently suppressed by oxidation. The isolation-leakage current was reduced about 3 orders of magnitudes. The reverse leakage current was also decreased from 2.44 A/$cm^2$ to 8.90 mA/$cm^2$ under -100 V-biased condition. The formed group-III oxides ($AlO_x$ and $GaO_x$) during the oxidation is thought to suppress the surface leakage current by passivating surface dangling bonds, N-vacancies and process damages.