• Title/Summary/Keyword: Reverse Tunneling

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Tunneling Current Calculation in HgCdTe Photodiode (HgCdTe 광 다이오드의 터널링 전류 계산)

  • 박장우;곽계달
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.29A no.9
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    • pp.56-64
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    • 1992
  • Because of a small bandgap energy, a high doping density, and a low operating temperature, the dark current in HgCdTe photodiode is almost composed of a tunneling current. The tunneling current is devided into an indirect tunneling current via traps and a band-to-band direct tunneling current. The indirect tunneling current dominates the dark current for a relatively high temperature and a low reverse bias and forward bias. For a low temperature and a high reverse bias the direct tunneling current dominates. In this paper, to verify the tunneling currents in HgCdTe photodiode, the new tunneling-recombination equation via trap is introduced and tunneling-recombination current is calculated. The new tunneling-recombination equation via trap have the same form as SRH (Shockley-Read-Hall) generation-recombination equation and the tunneling effect is included in recombination times in this equation. Chakrabory and Biswas's equation being introduced, band to band direct tunneling current are calculated. By using these equations, HgCdTe (mole fraction, 0.29 and 0.222) photodiodes are analyzed. Then the temperature dependence of the tunneling-recombination current via trap and band to band direct tunneling current are shown and it can be known what is dominant current according to the applied bias at athe special temperature.

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Contact Area-Dependent Electron Transport in Au/n-type Ge Schottky Junction

  • Kim, Hogyoung;Lee, Da Hye;Myung, Hye Seon
    • Korean Journal of Materials Research
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    • v.26 no.8
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    • pp.412-416
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    • 2016
  • The electrical properties of Au/n-type Ge Schottky contacts with different contact areas were investigated using current-voltage (I-V) measurements. Analyses of the reverse bias current characteristics showed that the Poole-Frenkel effect became strong with decreasing contact area. The contribution of the perimeter current density to the total current density was found to increase with increasing reverse bias voltage. Fitting of the forward bias I-V characteristics by considering various transport models revealed that the tunneling current is dominant in the low forward bias region. The contributions of both the thermionic emission (TE) and the generation-recombination (GR) currents to the total current were similar regardless of the contact area, indicating that these currents mainly flow through the bulk region. In contrast, the contribution of the tunneling current to the total current increased with decreasing contact area. The largest $E_{00}$ value (related to tunneling probability) for the smallest contact area was associated with higher tunneling effect.

Electron Transport Mechanisms in Ag Schottky Contacts Fabricated on O-polar and Nonpolar m-plane Bulk ZnO

  • Kim, Hogyoung
    • Transactions on Electrical and Electronic Materials
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    • v.16 no.5
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    • pp.285-289
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    • 2015
  • We prepared silver Schottky contacts to O-polar and nonpolar m-plane bulk ZnO wafers. Then, by considering various transport models, we performed a comparative analysis of the current transport properties of Ag/bulk ZnO Schottky diodes, which were measured at 300, 200, and 100 K. The fitting of the forward bias current-voltage (I-V) characteristics revealed that the tunneling current is dominant as the transport component in both the samples. Compared to thermionic emission (TE), a stronger contribution of tunneling current was observed at low temperature. The reverse bias I-V characteristics were well fitted with the thermionic field emission (TFE) in both the samples. The presence of acceptor-like adsorbates, such as O2 and H2O, modulated the surface conductive state of ZnO, thereby affecting the tunneling effect. The degree of activation/passivation of acceptor-like adsorbates might be different in both the samples owing to their different surface morphologies and surface defects (e.g., oxygen vacancies).

Defeating IP Source Address Spoofing with Foreign Agent Care-of-Address in Mobile IPv4 (Mobile IPv4 네트워크에서 접속제어리스트와 역터널링을 이용한 IP Spoofing 제거 방안)

  • Kim, Han-Lim;Kim, Sung-Il;Kim, Sang-Eun;Park, Se-Jun
    • 한국정보통신설비학회:학술대회논문집
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    • 2005.08a
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    • pp.313-317
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    • 2005
  • The network ingress filtering is a simple and efficient method for preventing IP source spoofing of fixed nodes. Since mobile hosts cannot communicate with its correspondent nodes if the network ingress filtering is configured in mobile IPv4 network, reverse tunneling was considered as a method for avoiding network ingress filtering. But, unfortunately this method does not solve IP source spoofing of mobile nodes. In this paper, we propose a simple and efficient method for preventing IP source spoofing of mobile nodes assuming that only the mobile hosts connected to foreign agents and the network that foreign agent manages is small.

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Integrated Management System for Vehicle CCTV Video Using Reverse Tunneling (리버스 터널링을 이용한 차량용 CCTV 영상 통합 관리 시스템)

  • Yang, Sun-Jin;Park, Jae-Pyo;Yang, Seung-Min
    • The Journal of the Institute of Internet, Broadcasting and Communication
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    • v.19 no.5
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    • pp.19-24
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    • 2019
  • The development of ICT technology has a huge impact on the existing closed CCTV security equipment market. With the importance of video data particularly highlighted in areas such as self-driving cars, unmanned vehicles and smart cities, various technologies using video are emerging. In this paper, we proposed a method to transmit videos and metadata as a part of smart city integration, and to solve the traffic, environment and security problems caused in urban life by utilizing the metadata instead of using CCTV videos for simple recording purposes, and reverse tunneling technique was designed and implemented as a method for accessing CCTV videos for vehicles from remote locations. Integrated management of CCTV videos and metadata for vehicles that have been used only for limited purposes in closed environments will enable efficient operation of integrated centers in real time required by smart cities, such as vehicle status check, road conditions and facility management.

Electron Tunneling Characteristics of PtSi-nSi Junctions according to Temperature Variations (온도변화에 따른 백금 실리사이드-엔 실리콘 접합의 전자 터널링 특성)

  • 장창덕;이정석;이광우;이용재
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1998.06a
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    • pp.87-91
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    • 1998
  • In this paper, We analyzed the current-voltage characteristics with n-type silicon substrates concentration and temperature variations (Room temperature, 50$^{\circ}C$, 75$^{\circ}C$) in platinum silicide and silicon junction. The electrical parameters of measurement are turn-on voltage, saturation current, ideality factor, barrier height, dynamic resistance in forward bias and reverse breakdown voltage according to variations of junction concentration of substrates and measurement temperature variations. As a result, the forward turn-on voltage, reverse breakdown voltage, barrier height and dynamic resistance were decreased but saturation currents and ideality factor were increased by substrates increased concentration variations in platinum silicide and n-silicon junction. In increased measurement temperature (RT, 50$^{\circ}C$, 75$^{\circ}C$), the extracted electrical parameter values of characteristics were rises by increased temperature variations according to the forward and reverse bias.

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Gate-Induced-Drain-Leakage (GIDL) Current of MOSFETs with Channel Doping and Width Dependence

  • Choi, Byoung-Seon;Choi, Pyung-Ho;Choi, Byoung-Deog
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.344-345
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    • 2012
  • The Gate-Induced-Drain-Leakage (GIDL) current with channel doping and width dependence are characterized. The GIDL currents are found to increase in MOSFETs with higher channel doping levels and the observed GIDL current is generated by the band-to-band-tunneling (BTBT) of electron through the reverse-biased channel-to-drain p-n junction. A BTBT model is used to fit the measured GIDL currents under different channel-doping levels. Good agreement is obtained between the modeled results and experimental data. The increase of the GIDL current at narrower widths in mainly caused by the stronger gate field at the edge of the shallow trench isolation (STI). As channel width decreases, a larger portion of the GIDL current is generated at the channel-isolation edge. Therefore, the stronger gate field at the channel-isolation edge causes the total unit-width GIDL current to increases for narrow-width devices.

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Unusual Electrical Transport Characteristic of the SrSnO3/Nb-Doped SrTiO3 Heterostructure

  • De-Peng Wang;Rui-Feng Niu;Li-Qi Cui;Wei-Tian Wang
    • Korean Journal of Materials Research
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    • v.33 no.6
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    • pp.229-235
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    • 2023
  • An all-perovskite oxide heterostructure composed of SrSnO3/Nb-doped SrTiO3 was fabricated using the pulsed laser deposition method. In-plane and out-of-plane structural characterization of the fabricated films were analyzed by x-ray diffraction with θ-2θ scans and φ scans. X-ray photoelectron spectroscopy measurement was performed to check the film's composition. The electrical transport characteristic of the heterostructure was determined by applying a pulsed dc bias across the interface. Unusual transport properties of the interface between the SrSnO3 and Nb-doped SrTiO3 were investigated at temperatures from 100 to 300 K. A diodelike rectifying behavior was observed in the temperature-dependent current-voltage (IV) measurements. The forward current showed the typical IV characteristics of p-n junctions or Schottky diodes, and were perfectly fitted using the thermionic emission model. Two regions with different transport mechanism were detected, and the boundary curve was expressed by ln I = -1.28V - 13. Under reverse bias, however, the temperature- dependent IV curves revealed an unusual increase in the reverse-bias current with decreasing temperature, indicating tunneling effects at the interface. The Poole-Frenkel emission was used to explain this electrical transport mechanism under the reverse voltages.

Reliability Analysis in PtSi-nSi Devices with Concentration Variations of Junction Parts (접합 부분의 농도 변화를 갖는 PtSi-nSi 소자에서 신뢰성 분석)

  • 이용재
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.3 no.1
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    • pp.229-234
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    • 1999
  • We analyzed the reliability characteristics in platinum schottky diodes with variations of n-type silicon substrates concentrations and temperature variations of measurements. The parameters of reliability measurement analysis are saturation current. turn-on voltage and ideality factor in the forward bias, the breakdown voltage in the reverse bias with device shapes. The shape of devices are square type and long rectangular type for edge effect. As a result, we analyzed that the forward turn-on voltage, barrier height, dynamic resistance and reverse breakdown voltage were decreased but ideality factor and saturation current were increased by increased concentration in platinum and n-silicon junction parts. In measurement temperature(RT, $50^{\circ}C$, $75^{\circ}C$), the extracted electrical parameter values of reliability characteristics were increased at the higher temperature under the forward and reverse bias. The long rectangular type devices were more decreased than the square type in reverse breakdown voltage by tunneling effects of edge part.

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Oxidation Process of GaN Schottky Diode for High-Voltage Applications (고전압 응용분야를 위한 GaN 쇼트키 다이오드의 산화 공정)

  • Ha, Min-Woo;Han, Min-Koo;Hahn, Cheol-Koo
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.60 no.12
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    • pp.2265-2269
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    • 2011
  • 1 kV high-voltage GaN Schottky diode is realized using GaN-on-Si template by oxidizing Ni-Schottky contact. The Auger electron spectroscopy (AES) analysis revealed the formation of $NiO_x$ at the top of Schottky contact. The Schottky contact was changed to from Ni/Au to Ni/Ni-Au alloy/Au/$NiO_x$ by oxidation. Ni diffusion into AlGaN improves the Schottky interface and the trap-assisted tunneling current. In addition, the reverse leakage current and the isolation-leakage current are efficiently suppressed by oxidation. The isolation-leakage current was reduced about 3 orders of magnitudes. The reverse leakage current was also decreased from 2.44 A/$cm^2$ to 8.90 mA/$cm^2$ under -100 V-biased condition. The formed group-III oxides ($AlO_x$ and $GaO_x$) during the oxidation is thought to suppress the surface leakage current by passivating surface dangling bonds, N-vacancies and process damages.