• Title/Summary/Keyword: Resistive Switching

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Eigenvalue Analysis of Power Systems with GTO Controlled SSSC by the RCF Method (GTO 제어 SSSC가 설치된 계통의 RCF 해석법에 의한 고유치 해석)

  • Dong, Moo-Hwan;Kim, Deok-Young
    • Proceedings of the KIEE Conference
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    • 2006.07a
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    • pp.230-231
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    • 2006
  • In this paper, the RCF(Resistive Companion Form) analysis method is used to analyze small signal stability of power systems including GTO controlled FACTS equipment such as SSSC. To apply the RCF analysis method in power system small signal stability problems, state transition equations of power system equipments and power systems with SSSC are presented. In eigenvalue analysis of power systems by the RCF analysis method, SSSC is modelled into the equivalents voltage source model and PWM switching circuit model. As a result of simulation, the RCF method is very powerful to calculate the oscillation modes exactly after the switching operations, and useful to analyze the small signal stability of power systems with periodic switching device such as SSSC.

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Small signal stability analysis of power systems with non-continuous operating elements by using RCF method : Modeling of the state transition equation (불연속 동작특성을 갖는 전력계통의 RCF법을 사용한 미소신호 안정도 해석 : 상태천이 방정식으로의 모델링)

  • Kim Deok Young
    • Proceedings of the KIEE Conference
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    • summer
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    • pp.342-344
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    • 2004
  • In conventional small signal stability analysis, system is assumed to be invariant and the state space equations are used to calculate the eigenvalues of state matrix. However, when a system contains switching elements such as FACTS devices, it becomes non-continuous system. In this case, a mathematically rigorous approach to system small signal stability analysis is by means of eigenvalue analysis of the system periodic transition matrix based on discrete system analysis method. In this research, RCF(Resistive Companion Form) method is used to analyse small signal stability of a non-continuous system including switching elements'. Applying the RCF method to the differential and integral equations of power system, generator, controllers and FACTS devices including switching elements should be modeled in the form of state transition matrix. From this state transition matrix eigenvalues which are mapped to unit circle can be calculated.

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Field-induced Resistive Switching in Ge25Se75-based ReRAM Device (Ge25Se75-based ReRAM 소자의 전계에 의한 저항 변화에 대한 연구)

  • Kim, Jang-Han;Nam, Ki-Hyun;Chung, Hong-Bay
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.25 no.3
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    • pp.182-186
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    • 2012
  • Resistance-change Random Access Memory(ReRAM) memory, which utilizes electrochemical control of metal in thin films of solid electrolyte, shows great promise as a future solid state memory. The technology utilizes the electrochemical formation and removal of metallic pathways in thin films of solid electrolyte. Key attributes are low voltage and current operation, excellent scalability, and a simple fabrication sequence. In this work, we investigated the nature of thin films formed by photo doping of $Ag^+$ ions into chalcogenide materials for use in solid electrolyte of Resistance-change RAM devices and switching characteristics according to field-effect.

Current Versus Voltage Characteristics of a Si Based 1-Diode Type Resistive Memory with Cr-SrTiO3 Films (Cr-SrTiO3 박막을 이용한 Si 기반 1D 형태 저항 변화 메모리의 전류-전압 특성 고찰)

  • Song, Min-Yeong;Seo, Yu-Jeong;Kim, Yeon-Soo;Kim, Hee-Dong;An, Ho-Myoung;Kim, Tae-Geun
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.24 no.11
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    • pp.855-858
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    • 2011
  • In this paper, in order to suppress unwanted current paths originating from adjacent cells in a passive crossbar array based on resistive random access memory (RRAM) without extrinsic switching devices, 1-diode type RRAM which consists of a 0.2% chromium-doped strontium titanate (Cr-$SrTiO_3$) film deposited on a silicon substrate, was proposed for high packing density, and intrinsic rectifying characteristics from the current versus voltage characteristics were successfully demonstrated.

Improving the Reliability by Straight Channel of As2Se3-based Resistive Random Access Memory (As2Se3 기반 Resistive Random Access Memory의 채널 직선화를 통한 신뢰성 향상)

  • Nam, Ki-Hyun;Kim, Chung-Hyeok
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.29 no.6
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    • pp.327-331
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    • 2016
  • Resistive random access memory (ReRAM) of metallic conduction channel mechanism is based on the electrochemical control of metal in solid electrolyte thin film. Amorphous chalcogenide materials have the solid electrolyte characteristic and optical reactivity at the same time. The optical reactivity has been used to improve the memory switching characteristics of the amorphous $As_2Se_3$-based ReRAM. This study focuses on the formation of holographic lattices patterns in the amorphous $As_2Se_3$ thin film for straight conductive channel. The optical parameters of amorphous $As_2Se_3$ thin film which is a refractive index and extinction coefficient was taken by n&k thin film analyzer. He-Cd laser (wavelength: 325 nm) was selected based on these basic optical parameters. The straighten conduction channel was formed by holographic lithography method using He-Cd laser.$ Ag^+$ ions that photo-diffused periodically by holographic lithography method will be the role of straight channel patterns. The fabricated ReRAM operated more less voltage and indicated better reliability.

Study on Current Switching in Electronic Devices Based on Vanadium Dioxide Thin Films Using CO2 Laser (이산화탄소 레이저를 이용한 바나듐 이산화물 박막 전자 소자에서의 전류 스위칭에 관한 연구)

  • Kim, Jihoon;Lee, Yong Wook
    • Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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    • v.30 no.1
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    • pp.1-7
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    • 2016
  • With a collimated $CO_2$ laser beam, the bidirectional current switching was realized in a two-terminal electronic device based on a highly resistive vanadium dioxide($VO_2$) thin film. A $VO_2$ thin film was grown on a $Al_2O_3$ substrate by a pulsed laser deposition method. For the fabrication of a two-terminal electronic device, the $VO_2$ thin film was etched by an ion beam-assisted milling method, and the $VO_2$ device, of which $VO_2$ patch width and electrode separation were 50 and $100{\mu}m$, respectively, was fabricated through a photolithographic method. A bias voltage range for stable bidirectional current switching was found by using the current-voltage property of the device measured in a current-controlled mode. The transient responses of bidirectionally switched currents were analyzed when the laser was modulated at a variety of pulse widths and repetition rates. A switching contrast was measured as ~3333, and rising and falling times were measured as ~39 and ~21ms, respectively.

Analysis of degradation of distribution lightning arresters as degradation degree (열화정도에 따른 배전용 피뢰기의 열화특성 분석)

  • 장동욱;박동배;박영국;이용희;강성화;임기조
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.07a
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    • pp.140-143
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    • 2000
  • The primary function of ZnO lightning arrester is to protect transmission and distribution equipment from overvoltages and to absorb electrical energy resulting from lightning or switching surges and form temporary overvoltage. However, ZnO lightning arrester are known to exhibit an increases in resistive current with time, the rate of increase being exacerbated with increasing applied voltage and ambient temperature. So, it is important to the leakage current measurement of ZnO lightning arrester. In addition, since the resistive leakage current caused by deterioration of ZnO lightning arrester mainly caused an increase of the third harmonic component, thereby it is possible the arrester degradation diagnosis by measuring the third harmonic component in the total leakage current. The leakage current and third harmonic component are measured and used to investigate the degradation diagnosis of ZnO element of arrester. Also the SEM photography is used to investigate the change of crystal structure of ZnO element with degradation.

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Resistance Switching Enhancement in Multi-step Deposition by Multi-deposition and Multi-anneal

  • Kim KyongRae;Ko Han-kyoung;Lee Taeho;Park In-Sung;Ahn Jinho
    • Proceedings of the Korean Society Of Semiconductor Equipment Technology
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    • 2005.09a
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    • pp.151-154
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    • 2005
  • In this paper, we present the enhanced performance of resistive RAM devices with multi-step deposited and annealed oxides. By using multi-step deposition and low temperature multi-step annealins, forming-free Re-RAM is achieved with lower operation voltages and larger resistive ratio than those of conventional Re-RAM with typical single deposited oxide.

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Memristors based on Al2O3/HfOx for Switching Layer Using Single-Walled Carbon Nanotubes (단일 벽 탄소 나노 튜브를 이용한 스위칭 레이어 Al2O3/HfOx 기반의 멤리스터)

  • DongJun, Jang;Min-Woo, Kwon
    • Journal of IKEEE
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    • v.26 no.4
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    • pp.633-638
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    • 2022
  • Rencently, neuromorphic systems of spiking neural networks (SNNs) that imitate the human brain have attracted attention. Neuromorphic technology has the advantage of high speed and low power consumption in cognitive applications and processing. Resistive random-access memory (RRAM) for SNNs are the most efficient structure for parallel calculation and perform the gradual switching operation of spike-timing-dependent plasticity (STDP). RRAM as synaptic device operation has low-power processing and expresses various memory states. However, the integration of RRAM device causes high switching voltage and current, resulting in high power consumption. To reduce the operation voltage of the RRAM, it is important to develop new materials of the switching layer and metal electrode. This study suggested a optimized new structure that is the Metal/Al2O3/HfOx/SWCNTs/N+silicon (MOCS) with single-walled carbon nanotubes (SWCNTs), which have excellent electrical and mechanical properties in order to lower the switching voltage. Therefore, we show an improvement in the gradual switching behavior and low-power I/V curve of SWCNTs-based memristors.

Reproducible Resistance Switching and Physical Characteristics of TiOx films with Oxidation Temperature and Time

  • Kim, Jong-Gi;Na, Hee-Do;Sohn, Hyun-Chul
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.08a
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    • pp.171-171
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    • 2010
  • In this work, we investigated the effect of the oxidation temperature on the unipolar and bipolar resistance switching behaviors of the oxidized TiO-x films. TiOx films on Pt electrodes were fabricated by the oxidation of Ti films at $550^{\circ}C$ for 1 to 3 hours. The unipolar and bipolar resistance switching properties were investigated with the oxidation temperature and time. Also, the crystal structure and the physical properties such as chemical bonding states of TiOx layers were characterized in addition to the resistance switching characteristics. The resistance switching behaviors of TiOx films oxidized at above $450^{\circ}C$ and below $650^{\circ}C$ was shown. So, we investigated that the resistance switching behaviors of TiOx films oxidized at $550^{\circ}C$ with the oxidation time from 1 to 3 hour. The memory windows of unipolar switching in the oxidized TiOx films were reduced with increasing the oxidation time, but those of the bipolar switching were slightly enlarged. The enlargement of rutile TiO2 peak with increasing the oxidation time and temperature was studied by X-ray diffraction. An increase of non-lattice oxygen and Ti3+ in the TiOx films with the oxidation times was investigated by X-ray photoemission spectroscopy. It was expected that the uipolar and bipolar resistive switching of the oxidized TiOx film was strongly related with the migration of non-lattice oxygen anions and schottky barrier height, respectively.

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