• 제목/요약/키워드: Resistance memory

검색결과 255건 처리시간 0.027초

Pt 나노입자가 분산된 SiO2 박막의 저항-정전용량 관계 (Relation between Resistance and Capacitance in Atomically Dispersed Pt-SiO2 Thin Films for Multilevel Resistance Switching Memory)

  • 최병준
    • 한국재료학회지
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    • 제25권9호
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    • pp.429-434
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    • 2015
  • Resistance switching memory cells were fabricated using atomically dispersed Pt-$SiO_2$ thin film prepared via RF co-sputtering. The memory cell can switch between a low-resistance-state and a high-resistance-state reversibly and reproducibly through applying alternate voltage polarities. Percolated conducting paths are the origin of the low-resistance-state, while trapping electrons in the negative U-center in the Pt-$SiO_2$ interface cause the high-resistance-state. Intermediate resistance-states are obtained through controlling the compliance current, which can be applied to multi-level operation for high memory density. It is found that the resistance value is related to the capacitance of the memory cell: a 265-fold increase in resistance induces a 2.68-fold increase in capacitance. The exponential growth model of the conducting paths can explain the quantitative relationship of resistance-capacitance. The model states that the conducting path generated in the early stage requires a larger area than that generated in the last stage, which results in a larger decrease in the capacitance.

Resistance Switching Mechanism of Metal-Oxide Nano-Particles Memory on Graphene Layer

  • Lee, Dong-Uk;Kim, Dong-Wook;Kim, Eun-Kyu
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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    • pp.318-318
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    • 2012
  • A graphene layer is most important materials in resent year to enhance the electrical properties of semiconductor device due to high mobility, flexibility, strong mechanical resistance and transparency[1,2]. The resistance switching memory with the graphene layer have been reported for next generation nonvolatile memory device[3,4]. Also, the graphene layer is able to improve the electrical properties of memory device because of the high mobility and current density. In this study, the resistance switching memory device with metal-oxide nano-particles embedded in polyimide layer on the graphene mono-layer were fabricated. At first, the graphene layer was deposited $SiO_2$/Si substrate by using chemical vapor deposition. Then, a biphenyl-tetracarboxylic dianhydride-phenylene diamine poly-amic-acid was spin coated on the deposited metal layer on the graphene mono-layer. Then the samples were cured at $400^{\circ}C$ for 1 hour in $N_2$ atmosphere after drying at $135^{\circ}C$ for 30 min through rapid thermal annealing. The deposition of aluminum layer with thickness of 200 nm was done by a thermal evaporator. The electrical properties of device were measured at room temperature using an HP4156a precision semiconductor parameter analyzer and an Agilent 81101A pulse generator. We will discuss the switching mechanism of memory device with metal-oxide nano-particles on the graphene mono-layer.

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Thermomechanical and electrical resistance characteristics of superfine NiTi shape memory alloy wires

  • Qian, Hui;Yang, Boheng;Ren, Yonglin;Wang, Rende
    • Smart Structures and Systems
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    • 제30권2호
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    • pp.183-193
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    • 2022
  • Structural health monitoring and structural vibration control are multidisciplinary and frontier research directions of civil engineering. As intelligent materials that integrate sensing and actuation capabilities, shape memory alloys (SMAs) exhibit multiple excellent characteristics, such as shape memory effect, superelasticity, corrosion resistance, fatigue resistance, and high energy density. Moreover, SMAs possess excellent resistance sensing properties and large deformation ability. Superfine NiTi SMA wires have potential applications in structural health monitoring and micro-drive system. In this study, the mechanical properties and electrical resistance sensing characteristics of superfine NiTi SMA wires were experimentally investigated. The mechanical parameters such as residual strain, hysteretic energy, secant stiffness, and equivalent damping ratio were analyzed at different training strain amplitudes and numbers of loading-unloading cycles. The results demonstrate that the detwinning process shortened with increasing training amplitude, while austenitic mechanical properties were not affected. In addition, superfine SMA wires showed good strain-resistance linear correlation, and the loading rate had little effect on their mechanical properties and electrical resistance sensing characteristics. This study aims to provide an experimental basis for the application of superfine SMA wires in engineering.

Technology of MRAM (Magneto-resistive Random Access Memory) Using MTJ(Magnetic Tunnel Junction) Cell

  • Park, Wanjun;Song, I-Hun;Park, Sangjin;Kim, Teawan
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제2권3호
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    • pp.197-204
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    • 2002
  • DRAM, SRAM, and FLASH memory are three major memory devices currently used in most electronic applications. But, they have very distinct attributes, therefore, each memory could be used only for limited applications. MRAM (Magneto-resistive Random Access Memory) is a promising candidate for a universal memory that meets all application needs with non-volatile, fast operational speed, and low power consumption. The simplest architecture of MRAM cell is a series of MTJ (Magnetic Tunnel Junction) as a data storage part and MOS transistor as a data selection part. To be a commercially competitive memory device, scalability is an important factor as well. This paper is testing the actual electrical parameters and the scaling factors to limit MRAM technology in the semiconductor based memory device by an actual integration of MRAM core cell. Electrical tuning of MOS/MTJ, and control of resistance are important factors for data sensing, and control of magnetic switching for data writing.

형상기억합금을 이용한 복합재료 구조물의 저속충격특성 향상 (Improvement of Impact Resistance of Composite Structures using Shape Memory Alloys)

  • 김은호;임미선;이인;김형원
    • 한국추진공학회:학술대회논문집
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    • 한국추진공학회 2009년도 제33회 추계학술대회논문집
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    • pp.453-456
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    • 2009
  • 복합재료 구조물의 충격 특성을 향상시키기 위해 형상기억합금을 삽입한 복합재료 평판의 충격실험을 수행하였다. 형상기억합금은 일반 금속 재료에 비해 큰 극한 변형율과 강도를 가질 뿐 아니라 변형시에 상변화를 통해서 많은 변형에너지를 흡수할 수 있는 특징을 가진다. 이러한 형상기억합금을 복합재료에 삽입하여 충격에 약한 복합재료의 충격 저항성을 향상시키기 위한 연구를 수행하였다. 먼저 여러 온도에서 형상기억합금의 인장실험을 수행하여 형상기억합금의 열-기계학적 특성을 파악하였다. 이후 형상기억합금, 철, 알루미늄 선을 삽입한 복합재료 평판의 충격 실험을 통하여 보강재에 따른 충격 특성을 파악하였다. 또한 형상기억합금의 두께 방향으로의 삽입위치에 따른 충격 특성을 파악하였다.

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콘크리트 보강재용 Fe-Mn-Si-Ni-Cr-TiC계 형상기억합금의 내식성 (Corrosion Resistance of Fe-Mn-Si-Ni-Cr-TiC Shape Memory Alloy for Reinforcement of Concrete)

  • 주재훈;이현준;김도형;이욱진;이정훈
    • 한국표면공학회지
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    • 제52권6호
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    • pp.364-370
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    • 2019
  • Fe-Mn-Si-Ni-Cr-TiC alloys have a shape memory property, recovering initial shape by heating. With an aim to improve a durability and stability of building and infrastructure, this Fe-based shape memory alloy (FSMA) can be employed to reinforce concrete structure with creation of compressive residual stress. In this work, corrosion resistance of FSMA was compared with general rebar and S400 carbon steel to evaluate the stability in concrete environment. Potentiodynamic polarization test in de-ionized water, tap-water and 3.5 wt.% NaCl solution with variations of pH was used to compare the corrosion resistance. FSMA shows better corrosion resistance than rebar and S400 in tested solutions. However, Cl-containing solution is critical to significantly reduce the corrosion resistance of FSMA. Therefore, though FSMA can be a promising candidate to replace the rebar and S400 for the reinforcement of concrete structure, serious cautions are required in marine environments.

Variation-tolerant Non-volatile Ternary Content Addressable Memory with Magnetic Tunnel Junction

  • Cho, Dooho;Kim, Kyungmin;Yoo, Changsik
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제17권3호
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    • pp.458-464
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    • 2017
  • A magnetic tunnel junction (MTJ) based ternary content addressable memory (TCAM) is proposed which provides non-volatility. A unit cell of the TCAM has two MTJ's and 4.875 transistors, which allows the realization of TCAM in a small area. The equivalent resistance of parallel connected multiple unit cells is compared with the equivalent resistance of parallel connected multiple reference resistance, which provides the averaging effect of the variations of device characteristics. This averaging effect renders the proposed TCAM to be variation-tolerant. Using 65-nm CMOS model parameters, the operation of the proposed TCAM has been evaluated including the Monte-Carlo simulated variations of the device characteristics, the supply voltage variation, and the temperature variation. With the tunneling magnetoresistance ratio (TMR) of 1.5 and all the variations being included, the error probability of the search operation is found to be smaller than 0.033-%.

비휘발성 SNOSEFT EFFPROM 기억소자의 임피던스 효과에 관한 연구 (A Study on the Impedance Effect of Nonvolatile SNOSEFT EFFPROM Memory Devices)

  • 강창수;김동진;김선주;이상배;이성배;서광열
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1995년도 춘계학술대회 논문집
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    • pp.86-89
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    • 1995
  • In this pacer, The effect of the impedances in SNOSEFT s memory devices has been developed. The effect of source and drain impedances are measuring using the method of the field effect bias resistance in the inner resistance regions of the device structure and external bias resistance. The effect of impedance by source and drain resistance shows according to increasing to the storage of memory charges, shows according to a function of decreasing to the gate voltages, shows the delay of threshold voltages, The delay time of low conductance state and high conductance state by the impedance effect shows 3 [${\mu}$sec] and 1[${\mu}$sec] respectively.

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Synthesis and Characterization of a Pt/NiO/Pt Heterostructure for Resistance Random Access Memory

  • Kim, Hyung-Kyu;Bae, Jee-Hwan;Kim, Tae-Hoon;Song, Kwan-Woo;Yang, Cheol-Woong
    • Applied Microscopy
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    • 제42권4호
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    • pp.207-211
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    • 2012
  • We examined the electrical properties and microstructure of NiO produced using a sol-gel method and Ni nitrate hexahydrate ($Ni[NO_3]_2{\cdot}6H_2O$) to investigate if this NiO thin film can be used as an insulator layer for resistance random access memory (ReRAM) devices. It was found that as-prepared NiO film was polycrystalline and presented as the nonstoichiometric compound $Ni_{1+x}O$ with Ni interstitials (oxygen vacancies). Resistances-witching behavior was observed in the range of 0~2 V, and the low-resistance state and high-resistance state were clearly distinguishable (${\sim}10^3$ orders). It was also demonstrated that NiO could be patterned directly by KrF eximer laser irradiation using a shadow mask. NiO thin film fabricated by the sol-gel method does not require any photoresist or vacuum processes, and therefore has potential for application as an insulating layer in low-cost ReRAM devices.

전도성 형상 기억 폴리머 작동기의 개발 (Development of Conducting Shape Memory Polymer Actuators)

  • 백일현;윤광준;조재환;구남서
    • 제어로봇시스템학회논문지
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    • 제10권11호
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    • pp.976-980
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    • 2004
  • This study has introduced how to make conducting shape memory polyurethane(CSMPu) as a possible application to smart actuators. Different from conventional polyurethane, CSMPu can have a high conductivity and then electric power supplies enough energy to deform. To prepare conducting polyurethane, carbon nanotubes were incorporated into shape memory polyurethane. Basic experiments to reveal its characteristics have been conducted for a development of actuators. From the results conducted in the present study, optimized conditions for the process of actuating deformation were found. Thermo-electric characteristics such as the relation between temperature and specific resistance and trend curves of resistance variations according to elongations were measured. These data provided a strong possibility of CSMPu as a smart actuator.