• Journal of Applied Biological Chemistry
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• v.65 no.3
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• pp.173-181
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• 2022

This study was carried out to investigate the residual characteristics of flubendiamide in kale to establish pre-harvest residue limits (PHRL) and the removal efficiency according to the washing solvent and method. Field tests were conducted at two different greenhouses, field 1 (Anseong-si, Gyeonggi-do) and field 2 (Incheon-si, Gyeonggi-do). According to the safe use guidelines kale was sprayed with flubendiamide twice every 10 days and harvested 0 (after 2 h), 1, 2, 3, 5, 7 and 10 days after the final application. The biological half-live of flubendiamide in kale was calculated based on dissipation curves of the pesticide in samples analyzed by liquid chromatography coupled with tandem mass spectrometry. In the analysis, method limits of quantitation (MLOQ) were 0.01 mg/kg, and recoveries performed with two different fortification levels of 10 MLOQ and maximum residue limit (0.7 mg/kg) were 104.2±3.6 and 101.9±10.2%, respectively. The dissipation rate constant of flubendiamide in kales were 0.2437 at field 1 and 0.1981 at field 2. PHRL calculation equations obtained using the dissipation constants estimated as follows: if the residual concentration of flubendiamide in kale on 10 days before harvest is less than 8.0 mg/kg, the residual concentration on the harvest would be under MRL. The removal of flubendiamide from kale was the greatest when it was washed with vinegar (39.8%), followed by baking soda (31.7%), calcium powder (30.2%), neutral detergent (27.2%), and tap water (15.9%). The results of this study would be useful for both farmers and consumers to produce or consume safe agricultural products.

• BMB Reports
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• v.32 no.4
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• pp.326-330
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• 1999

An aspartase purified from Hafnia alvei was inactivated by diethylpyrocarbonate (DEP) in a pseudo-first-order inactivation. The first-order plot was biphasic. The inactivation process was not saturable and the second order rate constant was $1.3\;M^{-1}s^{-1}$. The inactivated aspartase was reactivated with NH₂OH. The difference absorption spectrum of DEP-inactivated vs native enzyme preparations revealed a marked peak around 242 nm. The pH dependence of the inactivation rate suggests that an amino acid residue having a pK value of 7.2 was involved in the inactivation. L-aspartate, fumarate (substrates), and chloride ion (inhibitor) protected the enzyme against inactivation, indicating that histidine residues for the enzyme activity are located at the active site of this aspartase. Inspection of the presence and absence of $Cl^-$ ion demonstrated that the number of essential histidine residues is less than two. Thus, one or two histidines are in or near the aspartate binding site and participate in an essential step of the catalytic reaction.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2001.07a
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• pp.866-869
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• 2001

In this study, (Ba,Sr)TiO$_3$(BST) thin films were etched with a magnetically enhanced inductively coupled plasma(MEICP). Etching characteristics of BST thin films including etch rate and selectivity were evaluated as a function of the etching parameters such as gas mixing ratio, rf power, dc bias voltage and chamber pressure. The maximum etch rate of the BST films was 1700 $\AA$/min at Ar(90)/CF$_4$(10), 600 W/350 V and 5 mTorr. The selectivity of BST to PR was 0.6, 0.7, respectively. To analyze the composition of surface residue remaining after the etching, samples etched with different CF$_4$/Ar gas mixing ratio were investigated with X-ray photoelectron spectroscopy (XPS) and secondary ion mass spectrometry (SIMS). From the results of XPS and SIMS, there are chemical reaction between Ba, Sr, Ti and C, F radicals during the etching and remained on the surface.

• Journal of Microbiology
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• v.34 no.3
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• pp.270-273
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• 1996

Micrococcus luteus purine nucleoside phosphorylase (PNP) has been purified and characterized. The physical and kinetic properties have been described previously. Chemical modification of the enzyme was attempted to gain insight on the active site. The enzyme was inactivated in a time-dependent manner by the arginine- specific modifying reagent phenylglyoxal. There was a linear relationship between the observed rate of inactivation and the phenylglyoxal concentration. At 30 $^{\circ}C$ the bimolecular rate constant for the modification was 0.015 $min^{-1}mM^{-1}$ in 50 mM $NaHCO_3$ buffer, pH 7.5. The plot of logk versus log phenylglyoxal concentration was a strainght line with a slope value of 0.9, indicating that modification of one arginine residue was needed to inactivate the enzyme. Preincubation with saturated solutions of substrates protected the enzyme from inhibition of phenylglyoxal, indicating that reactions with phenylglyoxal were directed at arginyl residues essential for the catalytic functioning of the enzyme.

• Korean Journal of Materials Research
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• v.3 no.5
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• pp.482-496
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• 1993

Radiation damage and contamination of silicons etched in the $CF_4+H_2$ and $CHF_3$ magnetron discharges have been characterized using Schottky diode characteristics, TEM, AES, and SIMS as a function of applied magnetic field strength. It turned out that, as the magnetic field strength increased, the radiation damage measured by cross sectional TEM and by leakage current of Schottky diodes decreased colse to that of wet dtched samples especially for $CF_4$ plasma etched samples, For $CF_4+H_2$and $CHF_3$ etched samples, hydrogen from the plasmas introduced extended defects to the silicon and this caused increased leakage current to the samples etched at low magnetic field strength conditions by hydrogen passivation. The thickness of polymer with the increasing magnetic field strength and showed the minimum polymer residue thickness near the 100Gauss where the silicon etch rate was maximum. Also, other contaminants such as target material were found to be minimum on the etched silicon surface near the highest etch rate condition.

• JSTS:Journal of Semiconductor Technology and Science
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• v.15 no.3
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• pp.334-341
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• 2015

This research outlines the design of a HR-TDC (High Resolution Time-to-Digital Converter) for high data rate communication systems using a $0.18{\mu}m$ CMOS process. The coarse-fine architecture has been adopted to improve the resolution of the TDC. A two-stage vernier time amplifier (2S-VTA) was used to amplify the time residue, and the gain of the 2S-VTA was larger than 64. The error during time amplification was compensated using two FTDCs (Fine-TDC) with their outputs. The resolution of the HR-TDC was 0.15 ps with a 12-bit output and the power consumption was 4.32 mW with a 1.8-V supply voltage.

• Journal of Korean Society on Water Environment
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• v.26 no.5
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• pp.775-780
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• 2010

Over 90% of the livestock excretions were treated and utilized by land application in Korea. Excessive application of the livestock manure as fertilizer has been issued as a main pollutant source in groundwater and watersheds. This study was seasonally conducted to identify the discharging characteristics with a certain artificial rainfall intensity (13 mm/hr) in terms of surface runoff, groundwater, and soil residue mass depending on the livestock manure types. A experimental field was constructed with three different sites that pig liquid fertilizer (LF), cattle manure (CM), and standard (S). The pig liquid fertilizer of 1,200 L and cattle manure of 900 kg were sprayed on each site ($50m^2$). The standard area was firmly prevented from any other contaminants. In the LF site, farmland discharging rate (FDR) was computed as 0.006 in CODcr, 0.015 in TN, and 0.029 in TP, resulted from the mass balance among total injection mass, surface runoff and groundwater. In the CM site, 29% of the nitrogen and phosphorus in each were discharged to the surface, and 64% and 58% of them were remained in the farmland. Surface runoff rate of the CM was higher than that of the LF, resulted from the solid form of the CM.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.13 no.12
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• pp.996-1002
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• 2000

Ferroelectric (Ba, Sr) TiO$_3$(BST) thin films have attracted much attention for use in new capacitor materials of dynamic random access memories (DRAMs). In order to apply BST to the DRAMs, the etching process for BST thin film with high etch rate and vertical profile must be developed. However, the former studies have the problem of low etch rate. In this study, in order to increase the etch rate, BST thin films were etched with a magnetically enhanced inductively coupled plasma(MEICP) that have much higher plasma density than RIE (reactive ion etching) and ICP (inductively coupled plasma). Experiment was done by varying the etching parameters such as CF$_4$/(CF$_4$+Ar) gas mixing ratio, rf power, dc bias voltage and chamber pressure. The maximum etch rate of the BST films was 170nm/min under CF$_4$/CF$_4$+Ar) of 0.1, 600 W/-350 V and 5 mTorr. The selectivities of BST to Pt and PR were 0.6 and 0.7, respectively. Chemical reaction and residue of the etched surface were investigated with X-ray photoelectron spectroscopy (XPS) and secondary ion mass spectroscopy (SIMS).

• Journal of Korean Society on Water Environment
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• v.28 no.5
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• pp.657-662
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• 2012

This study was carried out to evaluate the removal rate of organic and inorganic matters from landfill leachate using pre-treatment process as coagulation and limonite adsorption, and membrane process as RO (reverse osmosis) and NF(nanofiltration). By adding limonite adsorption as pre-treatment process, about 40% of organic matters in leachate was removed through pre-treatment process and 74.7% of boron was removed after RO process without pH adjustment. The rejection rate of boron in RO process mainly depends on the pH and increased at pH value of 10. RO process was performed as two stage system adjusting pH condtion to 7 and 10 in second RO stage for boron removal. Most (>90%) of TOC, Cl- and inorganic matters as Ca was rejected in first RO stage, the residue was rejected in second RO and the rejection rate was above 97%. Considering economic efficiency of operation cost, NF substituted for the first RO and total removal rate of TOC was above 90%. Through RO system toxicity to Daphnia in leachate was removed completely.

• Journal of the Korean institute of surface engineering
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• v.21 no.2
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• pp.53-67
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• 1988

The high temperature corrosion of Fe-C alloys were studied at I atm SO gas in the temperature range 500~80$0^{\circ}C$ by means of a thermogravimetric analysis. The Na2SO4 induced high tempwrature corrosion rate was also measured at atm O2 gas under above the temperature renge. The reaction products were identified with the aid of X-ray diffraction technique, and micostruction of the alloy/scale interface was observed with a optical microscope and SEM. The experimental results were disussed by the themodeynamic calcutions. Under above the experimental condition. the reaction rates decrbon with increasing carbon content. The transfer of Fe ion was limited by a residue of carbon precipitated at alloy scale interface due to the oxidation of Fe-C alloys at alloy surface. The effect of cold working on reaction rate was different between the Fe containing low carbon and Fe-C Alloy containing carbon above 0,73 wt%. In a cold worked iron containing low carbon content, the crystallization of metal surface leads to the poor adherence between the alloy and the cavity formed between the alloy and scale. The outward diffusion of ion through the scale is estimated to be hindered by the cavity formed between the scale, consequently decreasing reaction rate. In the case Fe-C containing carbon above 0.73 Wt% alloy, the reaction rate was little affected by cold working, because the effect of content on reaction rats is greater than the effect of cold working.