• Title/Summary/Keyword: Removal of impurities

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Removal of Impurities by Magnetic Separation from Waste Fluidized Cracking Catalyst for Its Reuse (폐FCC 촉매의 재활용 과정에서 자력 선별법에 의한 불순물 제거 연구)

  • Ban Bong-Chan;Lee Jin-Suk;Kim Dong-Su
    • Resources Recycling
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    • v.12 no.1
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    • pp.55-64
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    • 2003
  • Presently, the reuse of waste FCC catalysts, which generated from the refining process of crack oil, after the removal of con-taminated metallic impurities have not been attempted domestically yet because the separation technology f3r the impurities from waste catalysts has not been established. As a basic study far the reusable portion from the waste FCC catalysts and treatment of metallic impurities are assured, there will be invoked an significant contribution not only in the recycling of abandoned wastes up to date but also in the treatment efficiency of wastes and extraction of economical benefits from them. The magnetic separation of impurities such as Fe, Ni, and V, from waste FCC catalyst has been attempted with or without its pre-oxidation at high temperature for the purpose of its reuse. The results showed that the separability of impurities by magnetic force was high far non-preoxidized catalysts compared with preoxidized ones, and employment of screen-type matrix showed a higher separation efficiency than ball-type matrix. The separability increased with the strength of magnetic field, and the method of ball matrix has separation efficiency of maximum 51.10%. The amount of metallic impurities was in the decreasing order of V, Ni, and Fe depending upon ICP analysis.

Development of wast vinyl pretreatment system by dry method (폐비닐의 건식 전처리시스템 개발)

  • Lee Hyun-Yong;Lee Jae-Kyung;Ryoo Byung-Soon
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2006.05a
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    • pp.69-70
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    • 2006
  • Waste vinyl tretreatment system has been developed by the joint project between KIMM and Woosung Co. General process for removal of impurities from waste vinyl is consisted of feeding, separating, cutting, washing, drying and recovering impurities. However, there are problems such as wastewater when washing of waste vinyl. In order to solve these problems we have developed new dry type cleaning system.

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A Study on the Design of Compression Air Hole in Front of Spindle for Chip Removal (주축 전면부 칩 제거를 위한 압축공기 구멍 설계에 관한 연구)

  • Kang, Dong Wi;Lee, Choon Man
    • Journal of the Korean Society for Precision Engineering
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    • v.30 no.3
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    • pp.278-283
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    • 2013
  • While Built-in Spindle is working in machining center, the tool is changed by ATC(Automatic Tool Changer) automatically. However, impurities could be stacked in front of spindle because of chips formation while machining, and positional error between spindle and tool could be generated. Compressed air holes are necessary for removal of the impurities. But, the diameter and number of compressed air hole are different for each built-in spindle in market. In this paper, flow analysis is carried out to find out the efficient figuration of the compressed air hole by using velocity and pressure distributions.

Removal of Fe Impurities on Silicon Surfaces using Remote Hydrogen Plasma (리모트 수소 플라즈마를 이용한 Si 표면 위의 Fe 불순물 제거)

  • Lee, C.;Park, W.;Jeon, B.Y.;Jeon, H.T.;Ahn, T.H.;Back, J.T.;Shin, K.S.;Lee, D.H.
    • Korean Journal of Materials Research
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    • v.8 no.8
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    • pp.751-756
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    • 1998
  • Effects of remote hydrogen plasma cleaning process parameters on the removal of Fe impurities on Si surfaces and the Fe removal mechanism were investigated. Fe removal efficiency is enhanced with decreasing the plasma exposure time and increasing the rf-power. The optimum plasma exposure time and rf-power are 1 min and 100W. respectively, in the range below 10 min and 100W. Fe removal efficiency is better under lower pressures than higher pressures, and the optimum $\textrm{H}_2$ flow rate was found to be 20 and 60sccm, respectively, under a low and a high pressure. The post-RHP(remote hydrogen plasma) annealing enhanced metallic contaminants removal efficiency, and the highest efficiency was achieved at $600^{\circ}C$. According to the AFM analysis results Si surface roughness was improved by 30-50%, which seems to be due to the removal of particles by the plasma cleaning. Also. Fe impurities removal mechanisms by remote hydrogen plasma are discussed.

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Magnetocaloric Properties of AlFe2B2 Including Paramagnetic Impurities of Al13Fe4

  • Lee, J.W.;Song, M.S.;Cho, K.K.;Cho, B.K.;Nam, Chunghee
    • Journal of the Korean Physical Society
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    • v.73 no.10
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    • pp.1555-1560
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    • 2018
  • $AlFe_2B_2$ produced by using a conventional arc melter has a ferromagnetic material with a Curie temperature ($T_C$) of around 300 K, but the arc-melt generates paramagnetic $Al_{13}Fe_4$ impurities during the synthesis of $AlFe_2B_2$. Impurities are brought to cause a decrease in magnetocaloric effects (MCEs). To investigate the effects of $Al_{13}Fe_4$ impurities on MCEs, we prepared and compared ascast and acid-treated samples, where the acid treatment was performed to remove the $Al_{13}Fe_4$ impurities. For the structural analysis, powder X-ray diffraction was carried out, and the measured data were subjected to a Rietveld refinement. The presence of $Al_{13}Fe_4$ impurities in the as-cast sample was observed in the phase analysis measurements. Magnetic properties were investigated by using Superconducting Quantum Interference Device (SQUID) measurements for the as-cast and the acid-treated $AlFe_2B_2$ samples. From isothermal magnetization measurements, Arrott plots were obtained showing that the transition of $AlFe_2B_2$ has a second-order magnetic phase transition (SOMT). The $T_C$ and the saturation magnetization increased for the acid-treated sample due to removal of the paramagnetic impurities. As a consequence, the magnetic entropy change ($-{\Delta}S$) increased in the pure $AlFe_2B_2$ samples, but the full width at half maximum in the plot of $-{\Delta}S$ vs. T decreased due to the absence of impurities.

Evaluation of Mesoporous Alumina Adsorbent for the Purification of Paclitaxel (Paclitaxel 정제를 위한 메조기공 알루미나 흡착제 평가)

  • Oh, Hyeon-Jeong;Jung, Kyeong Youl;Kim, Jin-Hyun
    • Microbiology and Biotechnology Letters
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    • v.41 no.2
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    • pp.176-182
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    • 2013
  • Several types of mesoporous alumina adsorbents with different physical properties were prepared by spray pyrolysis and were used for the separation/purification of the anticancer agent paclitaxel. The pore diameter of the adsorbents had a greater effect than did the surface area and the pore volume on the removal of plant-derived impurities. An appropriate pore diameter (~10.8 nm) was required for effective impurity removal. At a constant pore diameter, the surface area of the adsorbent affected not only the purity but also the yield of paclitaxel. Also, increasing the surface area of the adsorbent resulted in an increase in the adsorption of paclitaxel and impurities (biomass-derived tar and wax components). Removal of these impurities was confirmed by HPLC analysis of the absorbent after the treatment and TGA of the organic substances that were bound to the adsorbent.

Effect of Impurities in Grain Boundary Phases on Wear Behavior of $Si_3N_4$ (질화규소의 입계상에 존재하는 불순물이 마모에 미치는 영향)

  • 오윤석;임대순;이경호
    • Journal of the Korean Ceramic Society
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    • v.33 no.3
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    • pp.277-284
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    • 1996
  • The water test results indicated that the impurities had detrimetal effect on the wear resistance of silicon nitride and the effects were getting severe as the temperature increased. Especially when Ca existed as an impurity the detrimental effects was the most severe. These results were resulted from the fact that impurities lowered the mechanical properties of the grain boundary phase of silicon nitride. The wear test results of glass/glass-ceramic specimens having a similar composition to the grain boundary phase of silicon nitride revea-led that the specimen containing CaO showed the lowest wear resistance. The existence of Fe and Ca at the grain boundary phase assisted forming a grain boundary phase with relatively low refractoriness. Therefore at a given wear condition the removal of deformed layer would be easier. The results showed that the glass phases could be modified by heat-treatment and this modification improved tribological characteristics of the silicon nitride.

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Effect of post-annealing on single-walled carbon nanotubes synthesized by arc-discharge

  • Park, Suyoung;Choi, Sun-Woo;Jin, Changhyun
    • Journal of Ceramic Processing Research
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    • v.20 no.4
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    • pp.388-394
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    • 2019
  • In this study, high-purity single-walled carbon nanotubes (SWCNTs) were prepared by removing the unreacted metal constituents and amorphous carbon impurities using a post-annealing process. Unlike conventional thermal processing techniques, this technique involved different gas atmospheres for efficient removal of impurities. A heat treatment was conducted in the presence of chlorine, oxygen, and chlorine + oxygen gases. The nanotubes demonstrated the best characteristics, when the heat treatment was conducted in the presence of a mixture of chlorine and oxygen gases. The scanning electron microscopy, transmission electron microscopy, ultraviolet absorbance, and sheet resistance measurements showed that the heat treatment process efficiently removed the unreacted metal and amorphous carbon impurities from the as-synthesized SWCNTs. The high-purity SWCNTs exhibited improved electrical conductivities. Such high-purity SWCNTs can be used in various carbon composites for improving the sensitivity of gas sensors.

A Study on the Removal of Cu and Fe Impurities on Si Substrate (Si 기판에서 구리와 철 금속불순물의 제거에 대한 연구)

  • Choi, Baik-Il;Jeon, Hyeong-Tag
    • Korean Journal of Materials Research
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    • v.8 no.9
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    • pp.837-842
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    • 1998
  • As the size of the integrated circuit is scaled down the importance of Si cleaning has been emphasized. One of the major concerns is abut the removal of metallic impurities such as Cu and Fe on Si surface. In this study, we intentionally contaminated Cu and Fe on the Si wafers and cleaned the wafer by cleaning splits of the chemical mixture of $\textrm{H}_2\textrm{O}_2$ and HF and the combination of HF treatment with UV/$\textrm{O}_3$ treatment. The contamination level was monitored by TXRF. Surface microroughness of the Si wafers was measured by AFM. The Si wafer surface was examined by SEM. AES analysis was carried out to analyze the chemical composition of Cu impurities. The amount of Cu impurities after intentional contamination was abut the level of $\textrm{10}^{14}$ atoms/$\textrm{cm}^2$. The amount of Cu was decreased down to the level of $\textrm{10}^{10}$ atoms/$\textrm{cm}^2$ by cleaning splits. The repeated treatment exhibited better Cu removal efficiency. The surface roughness caused by contamination and removal of Cu was improved by repeated treatment of the cleaning splits. Cu were adsorbed on Si surface not in a thin film type but in a particle type and its diameter was abut 100-400${\AA}$ and its height was 30-100${\AA}$. Cu was contaminated on Si surface by chemical adsorption. In the case of Fe the contamination level was $\textrm{10}^{13}$ atoms/$\textrm{cm}^2$ and showed similar results of above Cu cleaning. Fe was contaminated on Si surface by physical adsorption and as a particle type.

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