• Textile Coloration and Finishing
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• v.21 no.2
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• pp.40-47
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• 2009

Dimethylaminopropyl methacryamide was photografted onto PET fabrics by continuous UV irradiation under ambient conditions. Several factors affecting the photografting were studied including irradiation energy, monomer and photoinitiator concentrations. ATR and ESCA analysis showed the successful grafting of the monomer onto the PET surface. The grafted PET fabrics showed higher zeta potentials below pH 7 compared with the ungrafted PET. The dyeability of the grafted PET fabrics to two $\alpha$-bromoacrylamide reactive dyes was investigated under various dyeing conditions including dye concentration, pH, dyeing temperature and time. The grafting imparted the reactive dyeability to PET fabrics, which was proportional to the grafted monomer content. The reactive dyeing behavior of the grafted PET fabrics was similar to that of conventional wool fabrics.

• Fashion & Textile Research Journal
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• v.7 no.3
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• pp.339-345
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• 2005

It is difficult to dye nylon/viscose rayon mixture fabrics by one-bath one-step dyeing method, because acid dyes and reactive dyes require acidic dyebath for adsorption and alkaline dyebath for fixation respectively. In order to overcome the disadvantage of the conventional two bath two step dyeing method of nylon/viscose rayon mixture fabric, it was pretreated with cationizing agent containing chlorohydrine group in aqueous solution of sodium hydroxide. The pretreated nylon/viscose rayon mixture fabrics produced cationized fabrics that could be dyed with acid dyes and reactive dyes under neutral condition. This study was carried out to investigate dyeing possibilities, surface reflectance spectra and color characteristics of cationized nylon/viscose rayon mixture fabrics with acid dyes and reactive dyes in a non-electrolytic and neutral dyebath by one bath one step dyeing method.

• Proceedings of the Korean Society for Noise and Vibration Engineering Conference
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• 2003.11a
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• pp.333-337
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• 2003

The use of reactive shearing structural intensity to place small patches of constrained layer damping material in order to achieve the largest reduction in the radiated sound power of Air-conditioner outdoor unit is described. The normal surface velocity of each panel was measured using a laser doppler vibrometer. Experimental results indicated that patches of constrained layer damping material placed over areas of high reactive structural intensity reduced the radiated sound power significantly more than patches of the same area placed over areas of low reactive structural intensity

• Journal of the Korean Institute of Telematics and Electronics D
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• v.35D no.5
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• pp.33-39
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• 1998

The BST (Ba$_{1-x}$ Sr$_{x}$TiO$_{3}$)(50/50) thin film has been grown by RF magnetron reactive sputtering and its characteristics such as crystallization, surface roughness, and electrical properties have been investigated with varying the film thickness. The crystallization and surface roughness of BST thin film are investigated by using XRD and AFM, respectively The BST thin film anealed at 800.deg. C for 2 min has pure perovskite structure and good surface roughness of 16.1.angs.. We estimate that the thickness and dielectric constant of interface layer between BST film and electrode are 3nm and 18.9, respectively, by measuring the capacitance with various film thickness. As the film thickness increases form 80nm to 240nm, the dielectric constant at 10kHz increases from 199 to 265 and the leakage current density at 200kV/cm decreases from 0.682.mu.A/cm$^{2}$ to 0.181 .mu.A/cm$^{2}$. In the case of 240nm-thick BST thin film, the charge storage density and leakage current density at 5V are 50.5fC/.mu.m$^{2}$ and 0.182.mu.A/cm$^{2}$, respectively. The values indicate that the BST thin film is a very useful dielectric material for the DRAM capacitor.or.

• Journal of the Korean Society for Heat Treatment
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• v.14 no.5
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• pp.292-296
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• 2001

In this work, an ultra-high vacuum activated reactive evaporation equipment was built. With reaction of Al and oxygen plasma, $Al_2O_3$ was deposited on the surface of etched Al foil. The chamber was evacuated down to $2{\times}10^{-7}$ torr initially. The Ar and $O_2$ gas introduced into the chamber to maintain $5{\times}10^{-5}$ torr during deposition. Ar gas prevents recombining of the ionized oxygen. Evaporation was maintained by electron beam evaporator continuously. Heating filament and electrode were used in order to generate plasma. The substrate bias of -300V was introduced to accelerate deposition of evaporated Al atoms. The composition and morphology of deposited $Al_2O_3$ films were analyzed by x-ray photoelectron spectroscopy(XPS) and atomic force microscopy (AFM), respectively. The Al oxide was formed on the surface of etched Al foil. According to AFM results, the surface morphology of $Al_2O_3$ film indicates uniform feature. Dielectric characteristic was measured as a function of frequency. Measured withstanding voltage and capacitance were 52V and $24{\mu}F/cm^2$, respectively. The obtained $Al_2O_3$ film shows clean condition without contaminants, which could be adapted to capacitor production.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.29 no.8
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• pp.455-460
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• 2016

A textured front surface is required in high efficiency silicon solar cells to reduce reflectance and to improve light trapping. Wet etching with alkaline solution is usually applied for mono crystalline silicon solar cells. However, alkali texturing method is not appropriate for multi-crystalline silicon wafers due to grain boundary of random crystallographic orientation. Accordingly, acid texturing method is generally used for multi-crystalline silicon wafers to reduce the surface reflectance. To reduce reflectivity of multi-crystalline silicon wafers, double texturing method with combination of acid and reactive ion etching is an attractive technical solution. In this paper, we have studied to optimize RIE condition by different RF power condition (100, 150, 200, 250, 300 W).

• Journal of the Korean Ceramic Society
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• v.36 no.11
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• pp.1211-1216
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• 1999

TiO2 thin films were prepared by reactive magnetron sputtering on glass substrate and subjected into investigation about their hydrophilic properties. Varing Ar/O2 ration and post annealing at 50$0^{\circ}C$ for 12h anatase and rutile phases of TiO2 films were obtained. Hydrophilic properties were evaluated by determination of contact angle of water droplet on TiO2 surface. On as-annealed TiO2 films water droplet spreaded widely with ~0$^{\circ}$contact angle. Sonication(60 Hz, 28kHz 40kHz) and following dark room treatments turned these hydrophilic TiO2 films into hydrophobic state. All of hydrophobic films were converted recersibly into their original state after UV illumination. Hydrophobic states of anatase films were saturated after sonication and remain same during dark room treatment. But it was found that the conversion into hydrophobic state of rutile films progressed. further after sonication. Therefore it was concluded that Ti3+/Ti+4 ratio is the key to determine hydrophilicity of TiO2 surface so that different surface structure of polymorphs could lead to unique characteristics.

• JSTS:Journal of Semiconductor Technology and Science
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• v.13 no.1
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• pp.22-27
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• 2013

Detailed study on how the plasma process during the sidewall spacer formation suppresses the formation of silicide is done. In non-patterned wafer test, it is found that both fluorocarbon reactive ion etch (RIE) and TEOS plasma-enhanced deposition processes modify the Si surface so that the silicide reaction is chemically inhibited or suppressed. In order to investigate the cause of the chemical modification, we analyze the elements on the silicon surface through Auger Electron Spectroscopy (AES). From the AES result, it is found that the carbon induces chemical modification which blocks the reaction between silicon and nickel. Thus, protecting the surface from the carbon-containing plasma process prior to nickel deposition appears critical in successful silicide formation.

• Journal of the Korean institute of surface engineering
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• v.45 no.5
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• pp.206-211
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• 2012

Process analysis was carried out during deposition of MgO by inductively coupled plasma assisted reactive magnetron sputtering in Ar and $O_2$ ambient. At the initiation of Mg sputtering with bipolar pulsed dc power in Ar ambient, total pressure showed sharp increase and then slow fall. To analyse partial pressure change, QMS was used in downstream region, where the total pressure was maintained as low as $10^{-5}$ Torr during plasma processing, good for ion source and quadrupole operation. At base pressure, the major impurity was $H_2O$ and the second major impurity was $CO/N_2$ about 10%. During sputtering of Mg in Ar, $H_2$ soared up to 10.7% of Ar and remained as the major impurity during all the later process time. When $O_2$ was mixed with Ar, the partial pressure of Ar decreased in proportion to $O_2$ flow rate and that of $H_2$ dropped down to 2%. It was understood as Mg target surface was oxidized to stop $H_2$ emission by Ar ion sputtering. With ICP turned on, the major impurity $H_2$ was converted into $H_2O$ consuming $O_2$ and C was also oxidized to evolve CO and $CO_2$.

• Proceedings of the Korean Society of Propulsion Engineers Conference
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• 1995.11a
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• pp.11-30
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• 1995

The ignition characteristics of a reactive solid with rough surface by constant heat flux were studied. The geometry of surface was represented by a set of identical protrusions having a shape of wedge based on the block of reactive solid. Several regimes of ignition were found, depending on the ratio of the protrusion length and the depth of the heated layer, formed in course of ignition process: 1) when the substance is ignited as the massive block, and the effect of roughness is not pronounced; 2) when ignited are the individual protrusions; and 3) in the intermediate region between the first two. Critical ignition conditions: ignition time and ignition criterion, are determined for the three regimes. The results are compared with the results for the one-dimensional ignition of the semi-infinite body. It is shown, that the effect of geometry on ignition results in the considerable reduction of ignition delay, and the amount of energy required for the successful ignition is less compared to the one- dimensional case.