Development of Plasma Assisted ALD equipment and Electrical Characteristic of TaN thin film deposited PAALD method (Plasma Assisted ALD 장비 계발과 PAALD법으로 증착 된 TaN 박막의 전기적 특성)
-
- Journal of the Semiconductor & Display Technology
- /
- v.4 no.2 s.11
- /
- pp.39-43
- /
- 2005