Characteristics of NMOS Transistors with Phosphorus Source/Drain Formed by Rapid Thermal Diffusion (고속 열확산 공정에 의해 형성된 Phosphorus Source/Drain을 갖는 NMOS 트랜지스터의 특성)
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- Journal of the Korean Institute of Telematics and Electronics
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- v.27 no.9
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- pp.1409-1418
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- 1990